-
61.发明授权Colored curable composition, color resist, ink-jet ink, color filter and method for producing the same, solid-state image pickup device, image display device, liquid crystal display, organic el display, and colorant compound and tautomer thereof 有权彩色固化性组合物，着色抗蚀剂，喷墨油墨，滤色器及其制造方法，固体摄像装置，图像显示装置，液晶显示器，有机EL显示器，着色剂化合物及其互变异构体公开(公告)号：US08741508B2
公开(公告)日：2014-06-03
申请号：US13259166
申请日：2010-06-10
申请人： Yoshihiko Fujie , Shinichi Kanna , Kazuya Oota , Yoshiharu Yabuki , Hiroaki Idei , Yasuhiro Ishiwata
发明人： Yoshihiko Fujie , Shinichi Kanna , Kazuya Oota , Yoshiharu Yabuki , Hiroaki Idei , Yasuhiro Ishiwata
IPC分类号： G02B5/20
CPC分类号： C08K5/47 , C09B29/3691 , C09B56/16 , C09B69/106 , C09D11/32 , G02B5/201 , G02B5/223 , G02B5/23 , G03F7/0007
摘要： A colored curable composition including: at least one selected from the group consisting of a compound represented by the following Formula (1a) and a tautomer thereof; and at least one polymerizable compound, wherein R11, R12, R13, R14, R15, and R16 each independently represent a hydrogen atom or a monovalent substituent; and R11 and R12, and R15 and R16 independently may bond to each other in each pair to form a ring.
摘要翻译： 一种着色固化性组合物，包括：选自由下式（1a）表示的化合物及其互变异构体的至少一种; 和至少一种可聚合化合物，其中R11，R12，R13，R14，R15和R16各自独立地表示氢原子或一价取代基; R11和R12，R15和R16各自独立地可以在每一对中彼此键合形成环。
-
公开(公告)号：US08507194B2
公开(公告)日：2013-08-13
申请号：US12871969
申请日：2010-08-31
申请人： Hideaki Tsubaki , Shinichi Kanna
发明人： Hideaki Tsubaki , Shinichi Kanna
摘要： A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
-
公开(公告)号：US08507193B2
公开(公告)日：2013-08-13
申请号：US12145270
申请日：2008-06-24
申请人： Hideaki Tsubaki , Shinichi Kanna
发明人： Hideaki Tsubaki , Shinichi Kanna
摘要： A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
-
64.发明授权Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method 有权图案形成方法，图案形成方法中使用的多次显影用抗蚀剂组合物，图案形成方法中使用的负显影用显影剂和图案形成方法中使用的负显影用冲洗液公开(公告)号：US08227183B2
公开(公告)日：2012-07-24
申请号：US11964454
申请日：2007-12-26
申请人： Hideaki Tsubaki , Shinichi Kanna
发明人： Hideaki Tsubaki , Shinichi Kanna
CPC分类号： G03F7/325 , G03F7/038 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/16 , G03F7/2002 , G03F7/2024 , G03F7/30 , G03F7/32 , G03F7/40 , Y10T428/24802
摘要： A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
摘要翻译： 一种图案形成方法，包括：（A）用正性显影剂中的溶解度增加的正性抗蚀剂组合物涂覆基材，并且在用光化学辐射或辐射照射时，在负极显影剂中的溶解度降低，以形成抗蚀剂膜; （B）曝光抗蚀膜; 和（D）用负极显影剂显影抗蚀膜; 该方法中使用的用于多重显影的正性抗蚀剂组合物; 用于该方法的开发人员; 以及用于该方法的负显影用冲洗液。
-
65.发明申请PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD 有权图案形成方法，用于图案形成方法中使用的多个开发的抵抗性组合物，用于图案形成方法中使用的负面开发的开发者，以及用于图案形成方法中使用的负面开发的冲洗解决方案公开(公告)号：US20100323305A1
公开(公告)日：2010-12-23
申请号：US12871969
申请日：2010-08-31
申请人： Hideaki TSUBAKI , Shinichi Kanna
发明人： Hideaki TSUBAKI , Shinichi Kanna
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/0392 , G03F7/0397 , G03F7/0758 , G03F7/2024 , G03F7/325
摘要： A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
摘要翻译： 一种图案形成方法，包括：（A）用正性显影剂中的溶解度增加的正性抗蚀剂组合物涂覆基材，并且在用光化学辐射或辐射照射时，在负极显影剂中的溶解度降低，以形成抗蚀剂膜; （B）曝光抗蚀膜; 和（D）用负极显影剂显影抗蚀膜; 该方法中使用的用于多重显影的正性抗蚀剂组合物; 用于该方法的开发人员; 以及用于该方法的负显影用冲洗液。
-
公开(公告)号：US20080261150A1
公开(公告)日：2008-10-23
申请号：US12145270
申请日：2008-06-24
申请人： Hideaki TSUBAKI , Shinichi Kanna
发明人： Hideaki TSUBAKI , Shinichi Kanna
IPC分类号： G03F7/20
CPC分类号： G03F7/095 , G03F7/0035 , G03F7/0392 , G03F7/0397 , G03F7/0758 , G03F7/2024 , G03F7/322 , G03F7/325 , G03F7/40
摘要： A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
-
公开(公告)号：US07198880B2
公开(公告)日：2007-04-03
申请号：US10422789
申请日：2003-04-25
IPC分类号： G03F7/004
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound which is capable of generating an acid by the action of actinic ray or radiation.
摘要翻译： 正性抗蚀剂组合物包含
-
公开(公告)号：US07138217B2
公开(公告)日：2006-11-21
申请号：US10099981
申请日：2002-03-19
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprises: (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, wherein the resin (A) contains a specified repeating unit.
-
公开(公告)号：US06939662B2
公开(公告)日：2005-09-06
申请号：US10448041
申请日：2003-05-30
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/114
摘要： A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation.
摘要翻译： 一种正性抗蚀剂组合物，其包含：（A1）含有由所述特定式表示的重复单元的树脂，其通过酸的作用增加在碱性显影液中的溶解度，和（B）能够产生酸的化合物 用光化射线和辐射之一照射时。
-
70.发明授权Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic EL display, image display device and colorant compound 有权彩色固化组合物，抗蚀剂液体，喷墨印刷油墨，滤色器，彩色滤光片的制造方法，固态图像传感器，液晶显示器，有机EL显示器，图像显示装置和着色剂化合物公开(公告)号：US08815478B2
公开(公告)日：2014-08-26
申请号：US13501650
申请日：2010-10-07
申请人： Junichi Ito , Yuki Mizukawa , Yoshiharu Yabuki , Shinichi Kanna , Haruki Inabe , Yushi Kaneko , Akiyoshi Goto
发明人： Junichi Ito , Yuki Mizukawa , Yoshiharu Yabuki , Shinichi Kanna , Haruki Inabe , Yushi Kaneko , Akiyoshi Goto
IPC分类号： G03F1/00
CPC分类号： C09D11/101 , C09B57/10 , C09B69/109 , C09D11/322 , G03F7/0007 , G03F7/105 , G03F7/40
摘要： The invention provides a colored curable composition including a dipyrromethene compound having a structure in which a polymerizable group and a carboxyl group are introduced in the same molecule, a resist liquid, an ink for inkjet printing, a color filter, a method of producing a color filter, a solid-state image sensor, a liquid crystal display, an organic EL display, an image display device and a colorant compound.
摘要翻译： 本发明提供一种着色固化性组合物，其包含具有将聚合性基团和羧基引入同一分子的结构的二吡咯亚甲基化合物，抗蚀剂液体，喷墨印刷用油墨，滤色器，颜色的制造方法 滤光片，固态图像传感器，液晶显示器，有机EL显示器，图像显示装置和着色剂化合物。
-
-
-
-
-
-
-
-
-
搜索结果
96 条记录 (耗时 0.07 秒)
