公开(公告)号：US4853745A

公开(公告)日：1989-08-01

申请号：US210808

申请日：1988-06-24

申请人： Saburo Kamiya ,  Kazuaki Suzuki ,  Akikazu Tanimoto

发明人： Saburo Kamiya ,  Kazuaki Suzuki ,  Akikazu Tanimoto

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/70

摘要： An exposure apparatus for exposing to a substrate the image of the desired pattern of a mask having a mark and a desired pattern formed thereon. Light source for illuminating the mask by at least part of the laser light from the light source, a projection optical system, movable stage, position detecting for detecting the relative position of the stage and the mask and outputting a position signal, a fiducial member formed integrally with the stage, the fiducial member having a fiducial pattern disposed thereon. A second illuminating optical system for illuminating the fiducial pattern from the opposite side of the projection optical system with respect to the fiducial member. The second illuminating optical system having a plurality of reflecting members for directing at least part of the laser light from the light source to the fiducial pattern. Normalizing a second detection signal on the basis of a first detection signal, and processing for determining the position of the image of the mark formed on the predetermined surface by the projection optical system, on the basis of a position signal and the second normalized detection signal.

摘要翻译： 一种曝光装置，用于将形成有标记和期望图案的掩模的期望图案的图像曝光于基板。 用于通过来自光源的至少一部分激光照射掩模的光源，投影光学系统，可移动台，用于检测平台和掩模的相对位置并输出位置信号的位置检测，形成的基准部件 与舞台一体地，具有设置在其上的基准图案的基准构件。 第二照明光学系统，用于相对于基准构件从投影光学系统的相对侧照射基准图案。 第二照明光学系统具有多个反射构件，用于将来自光源的至少一部分激光引导到基准图案。 基于第一检测信号对第二检测信号进行归一化，以及基于位置信号和第二归一化检测信号来确定由投影光学系统形成在预定表面上的标记的图像的位置的处理 。

公开(公告)号：US4801977A

公开(公告)日：1989-01-31

申请号：US198688

申请日：1988-05-24

申请人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

发明人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/74 ,  G03B27/80

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70858 ,  G03F7/70883

摘要： A projection optical apparatus comprises a projection optical system for projecting the image of an object onto a substrate, data collecting means for obtaining data regarding a factor which causes a variation in the optical characteristic of the projection optical system, adjusting means for adjusting the relation between the substrate and the image of the object relative to the variation in the optical characteristic of the projection optical system, means for determining the amount of adjustment by the adjusting means in accordance with a model formula using a predetermined parameter on the basis of the data obtained by the data collecting means, means for independently measuring the variation in the optical characteristic of the projection optical system, and means for correcting the parameter of the model formula on the basis of the result measured by the measuring means.

摘要翻译： 投影光学装置包括用于将物体的图像投影到基板上的投影光学系统，用于获得关于引起投影光学系统的光学特性变化的因素的数据的数据收集装置，用于调整投影光学系统的光学特性之间的关系的调整装置 基板和物体相对于投影光学系统的光学特性的变化的图像，用于根据获得的数据使用预定参数根据模型公式确定调节装置的调整量的装置 通过数据采集装置，用于独立地测量投影光学系统的光学特性的变化的装置，以及用于基于由测量装置测量的结果来校正模型公式的参数的装置。

公开(公告)号：US4769523A

公开(公告)日：1988-09-06

申请号：US004265

申请日：1987-01-09

申请人： Akikazu Tanimoto ,  Keiichiro Sakato ,  Joji Iwamoto ,  Hiroshi Shirasu ,  Kiyoto Mashima

发明人： Akikazu Tanimoto ,  Keiichiro Sakato ,  Joji Iwamoto ,  Hiroshi Shirasu ,  Kiyoto Mashima

IPC分类号： B23K26/04 ,  B23K26/06 ,  B23K26/073 ,  B23K26/08 ,  H01L21/68 ,  H01L23/544 ,  B23K26/00

CPC分类号： H01L23/544 ,  B23K26/042 ,  B23K26/066 ,  B23K26/0732 ,  B23K26/082 ,  B23K26/0853 ,  B23K26/705 ,  H01L21/68 ,  B23K2201/40 ,  H01L2223/5446 ,  H01L2924/0002

摘要： A laser processing apparatus for projecting a spot of laser beam onto a portion of a microcircuit pattern on a semiconductor wafer, photographic mask or the like to cut the lead or anneal the limited area. The laser processing apparatus includes a mark detector for detecting the positions of first marks preliminarily provided on a work as the relative positions to the detection centers of the mark detector itself, a controller for controlling a processing energy beam generator so as to form on the work second marks detectable by the mark detector, and an error detector responsive to the results of the position detection of the second marks by the mark detector so as to detect relative positional errors between the focussing centers of the energy beam on the work and the detection centers of the mark detector.

摘要翻译： 一种激光处理装置，用于将激光束点投影到半导体晶片上的微电路图案的一部分，照相掩模等上以切割引线或退火有限区域。 该激光加工装置包括：标记检测器，用于检测预先设置在工件上的第一标记的位置作为与标记检测器本身的检测中心的相对位置;控制器，用于控制加工能量束发生器，以形成工件 标记检测器可检测的第二标记，以及响应于标记检测器对第二标记的位置检测结果的误差检测器，以便检测能量束在工件上的聚焦中心与检测中心之间的相对位置误差 的标记检测器。

公开(公告)号：US4701606A

公开(公告)日：1987-10-20

申请号：US792764

申请日：1985-10-30

申请人： Akikazu Tanimoto ,  Shoji Ishizaka

发明人： Akikazu Tanimoto ,  Shoji Ishizaka

IPC分类号： H01L21/30 ,  G02B27/18 ,  G03F7/20 ,  G03F9/02 ,  H01L21/027 ,  H01J40/14

CPC分类号： G03F7/70241 ,  G03F7/70883

摘要： A projection optical apparatus adapted for use in lithographic apparatus for semiconductor device manufacturing purposes and the like. A monitoring light beam of a given polarization is introduced into an imaging optical system of the projection optical apparatus and a polarized component of the monitoring light beam transmitted through the imaging optical system is subjected to photoelectric conversion. A variation of an optical characteristic of the imaging optical system is detected in accordance with the photoelectrically converted output signal.

摘要翻译： 适用于半导体装置制造用的光刻装置的投影光学装置等。 将给定极化的监视光束引入到投影光学装置的成像光学系统中，并且通过成像光学系统透射的监视光束的偏振分量进行光电转换。 根据光电转换的输出信号检测成像光学系统的光学特性的变化。

公开(公告)号：US4568835A

公开(公告)日：1986-02-04

申请号：US438468

申请日：1982-11-02

申请人： Kazunori Imamura ,  Akikazu Tanimoto ,  Nobutoshi Abe

发明人： Kazunori Imamura ,  Akikazu Tanimoto ,  Nobutoshi Abe

IPC分类号： G03B27/32 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  H01L21/027 ,  H01L21/66

CPC分类号： G01N21/94 ,  G01N21/956 ,  G01N2201/0642 ,  G01N2201/104

摘要： An apparatus for detecting foreign matter present on a planar substrate comprises apparatus for scanning the surface of the substrate with an oblique incident light beam, apparatus for photo-electrically detecting the scattered light generator in the trajectory of the light beam scanning on the substrate, and apparatus for eliminating stray light unnecessary for the foreign matter detection.

摘要翻译： 用于检测存在于平面基板上的异物的装置包括：用斜入射光束扫描基板的表面的装置，用于在基板上的光束扫描的轨迹中对散射光发生器进行光电检测的装置;以及 用于消除异物检测所不需要的杂散光的装置。

公开(公告)号：US4385838A

公开(公告)日：1983-05-31

申请号：US225049

申请日：1981-01-14

申请人： Kiwao Nakazawa ,  Akikazu Tanimoto

发明人： Kiwao Nakazawa ,  Akikazu Tanimoto

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： An alignment device for registering an object to a predetermined position with high precision and for calculating inclination of the object with respect to its predetermined position, which is constructed with a moving device for mounting thereon the object and moving the same two-dimensionally, a coordinate measuring device having orthogonally intersecting first and second measuring axes to measure the coordinates of the moving device in both directions of orthogonally intersecting first and second measuring axes of the object, an observing device having a first observing optical system with the center of observation (the first observation center) thereof being substantially on the first measuring axis and a second observing optical system with the center of observation (the second observation center) thereof being substantially on the second measuring axis, and a setting device to set, on the coordinate measuring device, the coordinate values of the first and second observation centers with the substantial intersection of the first and second measuring axes as the origin point, by detection, through movement of the moving device, of any one of a plurality of first marks on the object along the first axis when it is positioned at the first observation center, and of any one of a plurality of second marks along the second axis when it is positioned at the second observation center, thereby making the established coordinate values the references for movement of the moving device.

摘要翻译： 一种对准装置，用于将物体以高精度对准预定位置并且用于计算物体相对于其预定位置的倾斜度，该倾斜装置由用于在其上安装物体的移动装置和二维地移动该物体的坐标构成 测量装置具有正交相交的第一和第二测量轴，以测量移动装置在物体的正交相交的第一和第二测量轴的两个方向上的坐标;观察装置，具有具有观察中心的第一观察光学系统（第一 观察中心）基本上位于第一测量轴上，并且具有观察中心（第二观察中心）的第二观察光学系统基本上位于第二测量轴上;以及设定装置，其在坐标测量装置上， 第一和第二观察中心的坐标值 rs以第一和第二测量轴的实质交点作为原点，通过移动装置的移动，通过检测物体上的多个第一标记中的任何一个沿着第一轴线位于第一轴线处的第一轴线 观察中心，以及当位于第二观察中心时沿着第二轴的多个第二标记中的任何一个标记，从而使建立的坐标值成为移动装置的移动参考。