公开(公告)号：US4687322A

公开(公告)日：1987-08-18

申请号：US931013

申请日：1986-11-17

申请人： Akikazu Tanimoto ,  Shoji Ishizaka ,  Yutaka Endo ,  Hiroyuki Suzuki ,  Masamitsu Yanagihara

发明人： Akikazu Tanimoto ,  Shoji Ishizaka ,  Yutaka Endo ,  Hiroyuki Suzuki ,  Masamitsu Yanagihara

IPC分类号： H01L21/30 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7026

摘要： An apparatus for forming the optical image of a photo-pattern placed on a first plane on a second plane comprises projection means having a projection optical system disposed between the first plane and the second plane to form the optical image, focus detecting means including means for detecting the position of the second plane relative to the projection optical system, the in-focus position corresponding to the position of the second plane when the imaging plane of the projection optical system and the second plane are coincident with each other being preset, the focus detecting means putting out a detection signal when the in-focus position is detected by the detecting means, fluctuation detecting means for determining the amount of fluctuation of the imaging plane of the projection optical system caused correspondingly to a variation in the refractive index of the atmosphere, and means responsive to the fluctuation detecting means to control the focus detecting means so that the in-focus position is re-set correspondingly to the amount of fluctuation of the imaging plane determined by the fluctuation detecting means.

摘要翻译： 用于形成放置在第二平面上的第一平面上的光图案的光学图像的装置包括投影装置，其具有设置在第一平面和第二平面之间的投影光学系统以形成光学图像，焦点检测装置包括： 检测第二平面相对于投影光学系统的位置，当投影光学系统和第二平面的成像平面彼此一致时，对应于第二平面的位置的对焦位置被预设，焦点 检测装置，当由检测装置检测到对焦位置时，放出检测信号;波动检测装置，用于确定投影光学系统的成像面的波动量对应于大气折射率的变化 以及响应于所述波动检测装置来控制所述焦点检测装置的装置， n焦点位置对应于由波动检测装置确定的成像平面的波动量重新设定。

公开(公告)号：US4801977A

公开(公告)日：1989-01-31

申请号：US198688

申请日：1988-05-24

申请人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

发明人： Shoji Ishizaka ,  Hideo Mizutani ,  Susumu Makinouchi ,  Akikazu Tanimoto

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52 ,  G03B27/74 ,  G03B27/80

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70858 ,  G03F7/70883

摘要： A projection optical apparatus comprises a projection optical system for projecting the image of an object onto a substrate, data collecting means for obtaining data regarding a factor which causes a variation in the optical characteristic of the projection optical system, adjusting means for adjusting the relation between the substrate and the image of the object relative to the variation in the optical characteristic of the projection optical system, means for determining the amount of adjustment by the adjusting means in accordance with a model formula using a predetermined parameter on the basis of the data obtained by the data collecting means, means for independently measuring the variation in the optical characteristic of the projection optical system, and means for correcting the parameter of the model formula on the basis of the result measured by the measuring means.

摘要翻译： 投影光学装置包括用于将物体的图像投影到基板上的投影光学系统，用于获得关于引起投影光学系统的光学特性变化的因素的数据的数据收集装置，用于调整投影光学系统的光学特性之间的关系的调整装置 基板和物体相对于投影光学系统的光学特性的变化的图像，用于根据获得的数据使用预定参数根据模型公式确定调节装置的调整量的装置 通过数据采集装置，用于独立地测量投影光学系统的光学特性的变化的装置，以及用于基于由测量装置测量的结果来校正模型公式的参数的装置。

公开(公告)号：US4701606A

公开(公告)日：1987-10-20

申请号：US792764

申请日：1985-10-30

申请人： Akikazu Tanimoto ,  Shoji Ishizaka

发明人： Akikazu Tanimoto ,  Shoji Ishizaka

IPC分类号： H01L21/30 ,  G02B27/18 ,  G03F7/20 ,  G03F9/02 ,  H01L21/027 ,  H01J40/14

CPC分类号： G03F7/70241 ,  G03F7/70883

摘要： A projection optical apparatus adapted for use in lithographic apparatus for semiconductor device manufacturing purposes and the like. A monitoring light beam of a given polarization is introduced into an imaging optical system of the projection optical apparatus and a polarized component of the monitoring light beam transmitted through the imaging optical system is subjected to photoelectric conversion. A variation of an optical characteristic of the imaging optical system is detected in accordance with the photoelectrically converted output signal.

摘要翻译： 适用于半导体装置制造用的光刻装置的投影光学装置等。 将给定极化的监视光束引入到投影光学装置的成像光学系统中，并且通过成像光学系统透射的监视光束的偏振分量进行光电转换。 根据光电转换的输出信号检测成像光学系统的光学特性的变化。

公开(公告)号：US08384877B2

公开(公告)日：2013-02-26

申请号：US11808230

申请日：2007-06-07

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。

公开(公告)号：US08169592B2

公开(公告)日：2012-05-01

申请号：US12153354

申请日：2008-05-16

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.

摘要翻译： 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有表面并可移动到构件的表面面向光学元件的位置的构件。 该装置还包括清洁构件表面的清洁系统。

公开(公告)号：US20090011368A1

公开(公告)日：2009-01-08

申请号：US11884891

申请日：2006-02-23

申请人： Yutaka Ichihara ,  Ayako Nakamura ,  Naomasa Shiraishi ,  Akikazu Tanimoto ,  Yuji Kudo

发明人： Yutaka Ichihara ,  Ayako Nakamura ,  Naomasa Shiraishi ,  Akikazu Tanimoto ,  Yuji Kudo

IPC分类号： G03F7/22 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/70408 ,  G02B5/1838 ,  G02B5/1866 ,  G02B13/143 ,  G02B27/4222 ,  G02B27/4272 ,  G02B27/4277 ,  G03B27/42 ,  G03F7/70283 ,  G03F7/7035

摘要： An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.

摘要翻译： 目的是提供一种适合用于形成用于构成电子设备的精细图案的高分辨率和经济的曝光方法。 两个衍射光栅（P1，P2）串联在光路中; 用于构成电子设备的两个衍射光栅（P1，P2）和晶片等（W）以预定间隔布置; 由衍射光栅（P1，P2）产生的干涉条纹的暗暗图案被转印到晶片等（W）上以进行曝光。 在根据需要改变晶片等（W）和衍射光栅（P1，P2）之间的位置关系的同时进行曝光。

公开(公告)号：US20070247600A1

公开(公告)日：2007-10-25

申请号：US11767425

申请日：2007-06-22

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。

公开(公告)号：US20070064210A1

公开(公告)日：2007-03-22

申请号：US11603078

申请日：2006-11-22

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。

公开(公告)号：US06894763B2

公开(公告)日：2005-05-17

申请号：US10424815

申请日：2003-04-29

申请人： Seiro Murakami ,  Takaharu Miura ,  Akikazu Tanimoto ,  Yutaka Ichihara ,  Hideo Mizutani

发明人： Seiro Murakami ,  Takaharu Miura ,  Akikazu Tanimoto ,  Yutaka Ichihara ,  Hideo Mizutani

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/54 ,  G03B27/62 ,  G01N21/86

CPC分类号： G03F7/7005 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/70808

摘要： A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.

摘要翻译： 在掩模台RS 1上的掩模和掩模上的掩模的状态下，同步移动掩模载台RS 1和基板载台WS 1，并且掩模载台RS 2和基板载台RS 2同步移动 分别用来自照明光学系统IOP1，IOP2的照明光束照射舞台RS 2。 通过使掩模载台RS 1和掩模载台RS 2相互相反的方向移动，可以抵消由于级的移动导致的基板上的反作用力，以抑制曝光装置的振动。 通过在曝光操作中同时进行基板台WS 3，WS 4的对准操作，能够提高通过量。

公开(公告)号：US06713747B2

公开(公告)日：2004-03-30

申请号：US10207832

申请日：2002-07-31

申请人： Akikazu Tanimoto

发明人： Akikazu Tanimoto

IPC分类号： G01J132

CPC分类号： G03F7/70058 ,  G03F7/70358 ,  G03F7/70558

摘要： A scanning exposure apparatus and method uses an optical member to change an intensity distribution of exposure light in an illumination region.

摘要翻译： 扫描曝光装置和方法使用光学部件来改变照明区域中的曝光光的强度分布。