公开(公告)号：US08419963B2

公开(公告)日：2013-04-16

申请号：US13031674

申请日：2011-02-22

申请人： Tsuyoshi Moriya

发明人： Tsuyoshi Moriya

IPC分类号： B44C1/22 ,  C03C25/68 ,  C03C15/00 ,  C23F1/00

CPC分类号： C03C19/00 ,  B24B37/005 ,  B24B37/042 ,  C03C17/28 ,  C03C23/0005

摘要： A defect distribution in the vicinity of a surface of a glass substrate is inspected by a positron annihilation gamma ray measurement. A buffer layer including a brittle layer and/or a coating layer is created on the surface of the glass substrate. The brittle layer is formed by irradiating a gas cluster ion on the surface to deteriorate the glass. The coating layer is formed by coating the surface with a soft substance. Next, a thickness of the created buffer layer is measured by a positron annihilation gamma ray measurement. The surface of the glass substrate is then cleaned. To create a slurry, abrasive particles for the slurry are uniformly scattered on a polishing implement for polishing the glass substrate and a liquid component for the slurry is added thereto. The glass substrate is then chemically mechanically polished from the buffer layer with the slurry.

摘要翻译： 通过正电子湮灭伽马射线测量来检查玻璃基板表面附近的缺陷分布。 在玻璃基板的表面上形成包含脆性层和/或涂层的缓冲层。 通过在表面上照射气体团簇离子形成脆性层，使玻璃劣化。 涂层通过用软物质涂覆表面而形成。 接下来，通过正电子湮灭伽马射线测量来测量所产生的缓冲层的厚度。 然后清洁玻璃基板的表面。 为了产生浆料，用于浆料的磨料颗粒均匀地散布在用于抛光玻璃基底的抛光工具上，并且向其中添加用于浆料的液体组分。 然后将玻璃基板用浆料从缓冲层进行化学机械抛光。

公开(公告)号：US20130083425A1

公开(公告)日：2013-04-04

申请号：US13627057

申请日：2012-09-26

申请人： Hoya Corporation

发明人： Masanori TAMAKI ,  Hiroki NAKAGAWA ,  Yoshihiro TAWARA

IPC分类号： B24B37/04 ,  G11B21/12 ,  G11B5/82

CPC分类号： B24B37/044 ,  A61C17/00 ,  B24D3/005 ,  C03C19/00 ,  C03C21/002 ,  C03C21/008 ,  C09G1/02 ,  G11B5/73 ,  G11B5/8404

摘要： A manufacturing method of a glass substrate for a magnetic disk is provided whereby nano pits and/or nano scratches cannot be easily produced in polishing a principal face of a glass substrate using a slurry containing zirconium oxide as an abrasive. The manufacturing method of a glass substrate for a magnetic disk includes, for instance, a polishing step of polishing a principal face of a glass substrate using a slurry containing, as an abrasive, zirconium oxide abrasive grains having monoclinic crystalline structures (M) and tetragonal crystalline structures (T).

摘要翻译： 提供了一种用于磁盘的玻璃基板的制造方法，其中使用含有氧化锆作为研磨剂的浆料在玻璃基板的主面研磨时不容易产生纳米凹坑和/或纳米划痕。 用于磁盘的玻璃基板的制造方法包括例如使用包含作为磨料的含有单斜晶体结构（M）和四方晶系的氧化锆磨粒的浆料研磨玻璃基板的主面的抛光步骤 晶体结构（T）。

公开(公告)号：US08408970B2

公开(公告)日：2013-04-02

申请号：US13243313

申请日：2011-09-23

申请人： Masaaki Ueda

发明人： Masaaki Ueda

IPC分类号： B24B1/00

CPC分类号： G11B5/8404 ,  C03C19/00

摘要： A method of manufacturing a glass substrate for a magnetic disk having polishing accuracy on an inner circumferential end face of the substrate, and reduced thermal asperities. An inner circumferential end face of a cylindrical polishing object 12, comprising a plurality of stacked glass substrates 20, is polished. A plurality of polishing cloths disposed around a rotation axis of an inner circumference polishing section having the rotation axis are contacted to the inner circumferential end face 116 of the polishing object at even pressure. Then a polishing liquid is supplied between the inner circumferential end face of the polishing object and the inner circumference polishing section. Finally, the inner circumference polishing section and the polishing object are relatively rotated/moved with the rotation axis as a center, or relatively moved in a direction of the rotation axis, whereby the inner circumferential end face of the polishing object is polished.

摘要翻译： 一种在基板的内周端面上制造具有研磨精度的磁盘用玻璃基板的制造方法，降低了热凹凸。 抛光包括多个堆叠的玻璃基板20的圆柱形抛光对象12的内圆周端面。 围绕具有旋转轴线的内圆周抛光部分的旋转轴设置的多个抛光布以均匀的压力与抛光对象的内圆周端面116接触。 然后在抛光对象物的内周端面与内周研磨部之间供给研磨液。 最后，内圆周抛光部分和抛光对象以旋转轴线为中心相对旋转/移动，或者沿旋转轴线的方向相对移动，从而研磨抛光对象物的内周端面。

公开(公告)号：US08397537B2

公开(公告)日：2013-03-19

申请号：US12669381

申请日：2007-07-16

申请人： Richard R Grzybowski ,  Alexander Mikhailovich Streltsov ,  James Scott Sutherland

发明人： Richard R Grzybowski ,  Alexander Mikhailovich Streltsov ,  James Scott Sutherland

IPC分类号： C03B23/02 ,  B23K26/02 ,  B23K26/00

CPC分类号： C03C23/0025 ,  B29D11/00384 ,  C03C19/00 ,  C03C23/0005 ,  C03C23/007 ,  C03C2204/08 ,  Y10T428/24479

摘要： A method of forming, on the surface of a glass material, a raised feature having a height within a target range, comprising (1) providing a glass material having a surface, (2) providing the glass material locally, at a location at or below the surface, with an amount of energy causing local expansion of the glass material so as to raise a feature on the surface at the location, (3) detecting the height of the raised feature or the height over time of the raised feature, (4) (a) if the height is below or approaching a value below the target range, providing the glass material at the location with energy in a greater amount, or (b) if the height is above or approaching a value above the target range, providing the glass material at the location with energy in a lesser amount, and (5) repeating steps (3) and (4) as needed to bring the height within the target range. Methods and devices for automating this process are also disclosed.

摘要翻译： 一种在玻璃材料的表面上形成高度在目标范围内的凸起特征的方法，包括（1）提供具有表面的玻璃材料，（2）将玻璃材料局部放置在 在表面下面，一定量的能量引起玻璃材料的局部膨胀，以便在该位置上提高表面上的特征，（3）检测凸起特征的高度或随着时间的升高的特征的高度（ 4）（a）如果高度低于或接近低于目标范围的值，则在该位置处提供更大量的能量的玻璃材料，或（b）如果高度高于或接近高于目标范围的值 在该位置处提供较少量的能量的玻璃材料，以及（5）根据需要重复步骤（3）和（4）以使高度在目标范围内。 还公开了用于自动化该方法的方法和装置。

公开(公告)号：US20130042649A1

公开(公告)日：2013-02-21

申请号：US13397180

申请日：2012-02-15

申请人： Hideki ISONO ,  Akira Murakami ,  Shinji Eda

发明人： Hideki ISONO ,  Akira Murakami ,  Shinji Eda

IPC分类号： G11B5/84 ,  C03B11/00

CPC分类号： C03B7/10 ,  C03B7/14 ,  C03B7/16 ,  C03B11/088 ,  C03B40/04 ,  C03B2215/70 ,  C03C19/00 ,  C03C21/001 ,  G11B5/8404

摘要： A manufacturing method of a glass blank for magnetic disk including a pair of principal surfaces, the method including: dropping process for dropping a lump of molten glass; pressing process for forming a sheet glass material by sandwiching simultaneously the lump from both sides of the dropping path of the lump with surfaces of the pair of dies facing together, and performing press forming to the lump; and temperature adjusting process for adjusting temperature of the lump before the pressing process such that viscosity variation of the lump is reduced with respect to positions over the entirety of the lump in the pressing process.

摘要翻译： 一种用于包括一对主表面的磁盘用玻璃坯料的制造方法，所述方法包括：滴下熔融玻璃片的滴落工序; 压制工艺用于通过将一对模具的表面面向一体的同时从块体的下落路径的两侧夹持块体，并进行冲压成形而形成片状玻璃材料; 以及用于在压制过程之前调节块的温度的温度调节过程，使得块的粘度变化相对于在压制过程中的整体上的位置减小。

公开(公告)号：US08328602B2

公开(公告)日：2012-12-11

申请号：US12833410

申请日：2010-07-09

申请人： Masahiko Tamura ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

发明人： Masahiko Tamura ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

IPC分类号： C03B27/00 ,  B24C3/08 ,  G11B9/04

CPC分类号： G11B5/8404 ,  B24B37/042 ,  B24B37/08 ,  C03C19/00 ,  G11B5/7315

摘要： The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.

摘要翻译： 本发明涉及一种用于信息记录介质的玻璃基板的制造方法，该方法包括：研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤，用含有氧化铈磨料的浆料研磨圆形玻璃板，其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异（SiO 2 -Al 2 O 3）为62％ 摩尔或更少; 该方法还包括：随后的氧化铈抛光步骤，用硫酸浓度为20质量％以上且80质量％以下的清洗液清洗圆形玻璃板的清洗工序， 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量％以上且10质量％以下，在清洗工序后，对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。

公开(公告)号：US08318035B2

公开(公告)日：2012-11-27

申请号：US11812902

申请日：2007-06-22

申请人： Mark W. Kiehlbauch ,  John E. Daugherty

发明人： Mark W. Kiehlbauch ,  John E. Daugherty

IPC分类号： C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC分类号： C03C23/0075 ,  C03C15/00 ,  C03C19/00 ,  C03C2204/08 ,  Y10S438/905 ,  Y10S438/906

摘要： Methods of surface finishing a component useful for a plasma processing apparatus are provided. The component includes at least one plasma-exposed quartz glass surface. The method includes mechanically polishing, chemically etching and cleaning the plasma-exposed surface to achieve a desired surface morphology. Quartz glass sealing surfaces of the component also can be finished by the methods. Plasma-exposed surface and sealing surfaces of the same component can be finished to different surface morphologies from each other.

摘要翻译： 提供表面处理用于等离子体处理装置的部件的方法。 该组件包括至少一个等离子体暴露的石英玻璃表面。 该方法包括机械抛光，化学蚀刻和清洁等离子体暴露表面以实现期望的表面形态。 石英玻璃密封面的组件也可以通过这种方法完成。 等离子体暴露的表面和相同部件的密封表面可以被完成为不同的表面形态彼此。

公开(公告)号：US20120244388A1

公开(公告)日：2012-09-27

申请号：US13490154

申请日：2012-06-06

申请人： Tetsuya NAKASHIMA ,  Katsuaki Miyatani

发明人： Tetsuya NAKASHIMA ,  Katsuaki Miyatani

IPC分类号： G11B5/84 ,  C03C3/04 ,  G11B5/73

CPC分类号： G11B5/7315 ,  C03C3/091 ,  C03C19/00 ,  C03C23/0075 ,  G11B5/8404

摘要： A process for producing a glass substrate for information recording media, comprising lapping a glass disk made of low alkali aluminosilicate glass that contains no alkali metal oxide or contains alkali metal oxides in a total amount of less than 4 mol %, and subsequently polishing the glass disk by using a slurry that contains cerium oxide abrasives, characterized by cleaning the glass disk by using a cleaning liquid that contains sulfuric acid at a concentration of from 20 mass % to 80 mass % and hydrogen peroxide at a concentration of from 0.5 mass % to 10 mass % at a liquid temperature of from 50° C. to 100° C., and thereafter polishing the main surface of the glass disk, by using a slurry that contains colloidal silica abrasives.

摘要翻译： 一种用于信息记录介质的玻璃基板的制造方法，包括：研磨不含碱金属氧化物的低碱性硅铝酸盐玻璃的玻璃盘，或者含有总量小于4摩尔％的碱金属氧化物，然后研磨玻璃 通过使用含有氧化铈研磨剂的浆料，其特征在于，使用含有浓度为20质量％〜80质量％的硫酸的清洗液和浓度为0.5质量％以上的过氧化氢至 在液体温度为50℃至100℃下为10质量％，然后通过使用含有胶体二氧化硅研磨剂的浆料研磨玻璃盘的主表面。

公开(公告)号：US08252488B2

公开(公告)日：2012-08-28

申请号：US12604991

申请日：2009-10-23

申请人： Yuki Shiota

发明人： Yuki Shiota

IPC分类号： G03F1/00

CPC分类号： B82Y40/00 ,  B82Y10/00 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0075 ,  G03F1/24

摘要： Provided is a mask blank substrate manufacturing method in which a low thermal expansion glass substrate containing titanium (Ti) oxide is polished using a polishing agent, then treated using an aqueous solution containing hydrofluoric acid, then cleaned using an acidic solution with a pH of 4 or less, and then further cleaned using an alkaline solution.

摘要翻译： 提供了一种掩模空白基板的制造方法，其中使用抛光剂对包含钛（Ti）氧化物的低热膨胀玻璃基板进行抛光，然后使用含有氢氟酸的水溶液进行处理，然后使用pH为4的酸性溶液 或更少，然后使用碱性溶液进一步清洁。

公开(公告)号：US08222170B2

公开(公告)日：2012-07-17

申请号：US12656512

申请日：2010-02-01

申请人： Mikio Ikenishi ,  Atsuko Morita ,  Xuelu Zou

发明人： Mikio Ikenishi ,  Atsuko Morita ,  Xuelu Zou

IPC分类号： C03C3/085 ,  C03C3/091 ,  G11B7/241

CPC分类号： G11B5/7315 ,  B24B37/042 ,  C03C3/064 ,  C03C3/083 ,  C03C3/085 ,  C03C3/089 ,  C03C3/091 ,  C03C3/093 ,  C03C19/00 ,  C03C21/00

摘要： Disclosed are a glass substrate for an information recording medium, having excellent scratch resistance and a light weight and having high fracture toughness, the glass substrate having a fragility index value, measured in water, of 12 μm−1/2 or less or having a fragility index value, measured in an atmosphere having a dew point of −5° C. or lower, of 7 μm−1/2 or less, or the glass substrate comprising, by mol %, 40 to 75% of SiO2, 2 to 45% of B2O3 and/or Al2O3 and 0 to 40% of R′2O in which R′ is at least one member selected from the group consisting of Li, Na and K), wherein the total content of SiO2, B2O3, Al2O3 and R′2O is at least 90 mol %, and a magnetic information recording medium comprising a magnetic recording layer formed on the glass substrate.

摘要翻译： 公开了一种用于信息记录介质的玻璃基板，具有优异的耐擦伤性和重量轻并且具有高断裂韧性，玻璃基板在水中测得的脆性指数值为12μm-1/2或更小，或具有 在露点为-5℃以下的气氛中测定的7μm-1/2以下的脆性指数值，或摩尔％为40〜75％的SiO 2的玻璃基板，2〜 45％的B 2 O 3和/或Al 2 O 3和0〜40％的R'2O，其中R'为选自Li，Na和K中的至少一种），其中SiO 2，B 2 O 3，Al 2 O 3和 R'2O为90摩尔％以上，磁性信息记录媒体包含形成在玻璃基板上的磁记录层。