公开(公告)号：US20070014996A1

公开(公告)日：2007-01-18

申请号：US11135857

申请日：2005-05-23

Applicant: Tania Bhatia ,  Wayde Schmidt ,  William Tredway ,  Venkata Vedula

Inventor： Tania Bhatia ,  Wayde Schmidt ,  William Tredway ,  Venkata Vedula

IPC: B32B13/04 ,  B32B9/04 ,  B05D1/08 ,  C23C16/00 ,  C23C14/32 ,  B32B15/04 ,  B05D1/04 ,  B32B19/00

CPC classification number: C04B41/89 ,  C04B41/009 ,  C04B41/52 ,  C23C28/321 ,  C23C28/322 ,  C23C28/34 ,  C23C28/341 ,  C23C28/345 ,  C23C28/3455 ,  C04B41/4539 ,  C04B41/4582 ,  C04B41/5024 ,  C04B41/5044 ,  C04B41/522 ,  C04B41/5045 ,  C04B41/4531 ,  C04B41/5096 ,  C04B41/5027 ,  C04B35/565 ,  C04B35/584 ,  C04B35/806

Abstract: A bond coat system for silicon based substrates wherein a compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer.

Abstract translation: 一种用于硅基衬底的粘合涂层系统，其中在硅基衬底和含金属氧的吸氧层之间提供具有30至130GPa的弹性模量的柔性层。

公开(公告)号：US20050255648A1

公开(公告)日：2005-11-17

申请号：US10846968

申请日：2004-05-13

Applicant: Tania Bhatia ,  Ellen Sun

Inventor： Tania Bhatia ,  Ellen Sun

IPC: B01J19/02 ,  B32B18/00 ,  C04B41/50 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C4/10 ,  C23C28/00 ,  C23C30/00 ,  F01D5/28 ,  F02C7/00 ,  H01L21/31 ,  H01L21/469 ,  H01L21/8238 ,  H01L21/8242

CPC classification number: C04B41/5044 ,  C04B41/009 ,  C04B41/4826 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C4/11 ,  C23C30/00 ,  F01D5/288 ,  F05D2300/21 ,  F05D2300/222 ,  C04B41/4527 ,  C04B41/5096 ,  C04B41/5024 ,  C04B41/5037 ,  C04B41/0072 ,  C04B35/565 ,  C04B35/584 ,  C04B35/806

Abstract: A top barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment and comprises at least 65 mol % hafnium oxide.

Abstract translation: 用于含硅衬底的顶部阻挡层，其在暴露于高温水溶液环境中时抑制形成气态物质，并且包含至少65mol％的氧化铪。

公开(公告)号：US06733908B1

公开(公告)日：2004-05-11

申请号：US10191050

申请日：2002-07-08

Applicant: Kang N. Lee ,  Narottam P. Bansal

Inventor： Kang N. Lee ,  Narottam P. Bansal

IPC: B32B900

CPC classification number: C04B35/488 ,  C04B35/185 ,  C04B35/52 ,  C04B41/009 ,  C04B41/4527 ,  C04B41/5042 ,  C04B41/52 ,  C04B41/89 ,  C04B2111/00405 ,  C04B2235/3246 ,  C04B2235/3463 ,  C04B2235/80 ,  C23C28/04 ,  F01D5/288 ,  Y02T50/67 ,  Y10T428/12674 ,  Y10T428/265 ,  C04B41/5096 ,  C04B41/5037 ,  C04B41/5024 ,  C04B41/5044 ,  C04B41/522 ,  C04B35/565 ,  C04B35/584 ,  C04B35/806

Abstract: A multilayer article includes a substrate that includes at least one of a ceramic compound and a Si-containing metal alloy. An outer layer includes stabilized zirconia. Intermediate layers are located between the outer layer and the substrate and include a mullite-containing layer and a chemical barrier layer. The mullite-containing layer includes 1) mullite or 2) mullite and an alkaline earth metal aluminosilicate. The chemical barrier layer is located between the mullite-containing layer and the outer layer. The chemical barrier layer includes at least one of mullite, hafnia, hafnium silicate and rare earth silicate (e.g., at least one of RE2SiO5 and RE2Si2O7 where RE is Sc or Yb). The multilayer article is characterized by the combination of the chemical barrier layer and by its lack of a layer consisting essentially of barium strontium aluminosilicate between the mullite-containing layer and the chemical barrier layer. Such a barium strontium aluminosilicate layer may undesirably lead to the formation of a low melting glass or unnecessarily increase the layer thickness with concomitant reduced durability of the multilayer article. In particular, the chemical barrier layer may include at least one of hafnia, hafnium silicate and rare earth silicate.

Abstract translation: 多层制品包括包含陶瓷化合物和含Si金属合金中的至少一种的基材。 外层包括稳定的氧化锆。 中间层位于外层和基材之间，并且包括含莫来石的层和化学阻挡层。 含莫来石的层包括1）莫来石或2）莫来石和碱土金属硅铝酸盐。 化学阻挡层位于含莫来石层和外层之间。 化学阻隔层包括莫来石，铪，硅酸铪和稀土硅酸盐中的至少一种（例如，RE为Sc或Yb的RE 2 SiO 5和RE 2 Si 2 O 7中的至少一种）。 多层制品的特征在于化学屏障层的组合，以及在莫来石含有层和化学屏障层之间缺少基本上由钡硅酸锶硅酸盐组成的层。 这种钡锶铝硅酸盐层可能不期望地导致形成低熔点玻璃或不必要地增加层厚度，同时降低多层制品的耐久性。 特别地，化学屏障层可以包括铪，硅酸铪和稀土硅酸盐中的至少一种。