公开(公告)号：US10202680B2

公开(公告)日：2019-02-12

申请号：US14590329

申请日：2015-01-06

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Byungrok Moon ,  Kwonhyuk Lee

IPC分类号： B05B1/06 ,  B05B17/06 ,  C23C14/12 ,  H01L51/56

摘要： An apparatus for manufacturing a display apparatus, the apparatus including an organic material supply unit; a bagging pump unit that is connected to the organic material supply unit such that the organic material supply unit supplies an organic material to the bagging pump unit; an organic material adjusting unit that is connected to the bagging pump unit such that the bagging pump unit selectively supplies the organic material to the organic material adjusting unit; and a nozzle unit that is connected to the organic material adjusting unit such that the organic material adjusting unit adjusts an amount of the organic material provided to the nozzle unit, the nozzle unit changing the organic material into particles and spraying the particles.

公开(公告)号：US10196737B2

公开(公告)日：2019-02-05

申请号：US16063295

申请日：2016-11-25

申请人： Sharp Kabushiki Kaisha

发明人： Satoshi Inoue ,  Shinichi Kawato ,  Yuhki Kobayashi

IPC分类号： H01L21/00 ,  C23C14/24 ,  H01L51/56 ,  C23C14/12 ,  C23C14/04 ,  H01L51/00

摘要： On a vapor deposition target surface of a vapor deposition target substrate placed on a substrate tray in a vapor deposition device, display regions on which vapor deposition particles are to be deposited are arranged in alignment to be apart from each other in a direction parallel with a scanning direction, and the substrate tray includes a blocking part configured to block the vapor deposition particles to be deposited onto regions adjacent to the display regions in a direction parallel with the scanning direction. This prevents a degree of freedom in designing of the vapor deposition target substrate from being restricted even in performing scan vapor deposition.

公开(公告)号：US20190032193A1

公开(公告)日：2019-01-31

申请号：US15575877

申请日：2017-11-16

申请人： WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.

发明人： Junying Mu

IPC分类号： C23C14/24 ,  C23C14/12 ,  C23C14/54

摘要： A vapor deposition device includes an evaporation part, a nozzle, and an output part disposed between the evaporation part and the nozzle. The evaporation part is configured to evaporate vapor deposition material to form vapor. The nozzle is configured to transmit the vapor to the substrate. The output part is configured to transmit the vapor from the evaporation part to the nozzle. A surface of the output part facing the substrate is an arc surface.

公开(公告)号：US20190017163A1

公开(公告)日：2019-01-17

申请号：US15736660

申请日：2017-09-20

申请人： Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.

发明人： Fan TANG ,  YungSheng CHEN

IPC分类号： C23C14/24 ,  C23C14/04 ,  C23C14/12 ,  H01L51/00 ,  H01L51/56

摘要： The disclosure discloses an evaporation apparatus, an evaporation equipment, and an evaporation method of a display substrate, the evaporation apparatus of a display substrate includes an evaporation source, a regulation mechanism, and a mask plate; the regulation mechanism may filter the evaporation particles having an incident angle a of the evaporation source smaller than or equal to a predetermined incident angle. The disclosure can effectively reduce the shadow pattern generated during the evaporation process.

公开(公告)号：US10131982B2

公开(公告)日：2018-11-20

申请号：US15547348

申请日：2017-01-23

申请人： BOE TECHNOLOGY GROUP CO., LTD. ,  ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.

发明人： Fengli Ji ,  Yinan Liang ,  Shanshan Bai

IPC分类号： H01L51/56 ,  C23C14/04 ,  C23C14/24 ,  C23C14/12 ,  H01L27/12 ,  H01L51/00

摘要： A mask includes a graphic mask layer having a plurality of graphic mask blocks mutually spaced apart and arranged in parallel, and a covering mask layer having a plurality of covering mask blocks mutually spaced apart and arranged in parallel. The covering mask block covers a gap between adjacent graphic mask blocks. The graphic mask block includes an effective region, an ineffective region, and a marginal region between the effective region and the ineffective region, wherein each region has a plurality of pixel shaping openings, and the covering mask block further covers the pixel shaping openings of the ineffective regions of the adjacent graphic mask blocks. The motherboard is used for manufacturing the mask. The device for manufacturing mask comprises the motherboard, a base table, a stretcher and a welding machine. The system for evaporating the display substrate includes an evaporator and the mask.

公开(公告)号：US10113227B2

公开(公告)日：2018-10-30

申请号：US14436925

申请日：2014-09-28

申请人： BOE TECHNOLOGY GROUP CO., LTD. ,  BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.

发明人： Ang Xiao

IPC分类号： C23C14/12 ,  C23C14/24

摘要： The present invention provides a crucible, and belongs to the field of evaporation technology, for solving such problems of an existing crucible that evaporation material loss occurs in evaporation process, the crucible is inconvenient to clean, and the evaporation material filled in the crucible is not uniform. The crucible of the present invention includes a main cavity and a plurality of sub-cavities which are used for containing evaporation material and are arranged in the main cavity, each sub-cavity being provided with an opening. The crucible of the present invention may be used in preparation of an OLED device.

公开(公告)号：US20180298489A1

公开(公告)日：2018-10-18

申请号：US16015946

申请日：2018-06-22

申请人： JOLED INC.

发明人： Akira TAKIGUCHI

IPC分类号： C23C14/54 ,  C23C14/24 ,  C23C14/56 ,  H01L51/52 ,  C23C14/12 ,  H01L51/56

摘要： A vapor deposition method for depositing different vapor deposition materials onto a vapor deposition target provided in a chamber is disclosed. A first vapor deposition material is heated, via a first heater, for a predetermined period for increasing a temperature of the first vapor deposition material. Based on the increased heat, vapor of the first vapor deposition material is ejected from a first vapor deposition source towards the vapor deposition target. After the predetermined period has elapsed and via a second heater, the second vapor deposition material is heated for increasing a temperature of a second vapor deposition material. Based on the increased heat, vapor of the second vapor deposition material is ejected from a second vapor deposition source towards the vapor deposition target. The first vapor deposition material contains an organic functional material, and the second vapor deposition material contains a metal material.

公开(公告)号：US10077207B2

公开(公告)日：2018-09-18

申请号：US13906065

申请日：2013-05-30

申请人： CORNING INCORPORATED

发明人： Christopher Morton Lee ,  Xiao-feng Lu ,  Michael Xu Ouyang ,  Junhong Zhang

IPC分类号： C03C17/00 ,  C03C17/42 ,  C23C14/04 ,  C23C14/12 ,  C23C14/24 ,  C23C14/50 ,  C23C14/56 ,  B05D5/08 ,  B05D1/00

CPC分类号： C03C17/00 ,  B05D1/60 ,  B05D5/083 ,  B05D2203/35 ,  C03C17/002 ,  C03C17/42 ,  C03C2217/734 ,  C03C2217/76 ,  C03C2217/78 ,  C03C2218/151 ,  C03C2218/32 ,  C23C14/044 ,  C23C14/12 ,  C23C14/24 ,  C23C14/505 ,  C23C14/56

摘要： This disclosure is directed to an improved process for making glass articles having optical coating and easy-to clean coating thereon, an apparatus for the process and a product made using the process. In particular, the disclosure is directed to a process in which the application of the optical coating and the easy-to-clean coating can be sequentially applied using a single apparatus. Using the combination of the coating apparatus and the substrate carrier described herein results in a glass article having both optical and easy-to-clean coating that have improved scratch resistance durability and optical performance, and in addition the resulting articles are “shadow free.”

公开(公告)号：US20180195177A1

公开(公告)日：2018-07-12

申请号：US15912644

申请日：2018-03-06

申请人： Dai Nippon Printing Co., Ltd.

发明人： Chikao IKENAGA ,  lsao MIYATANI

IPC分类号： C23F1/00 ,  C23F1/02 ,  C23C14/24 ,  C23C14/02 ,  C23C14/04 ,  C23C14/12

摘要： The object of the present invention is to provide a metal plate having an excellent transportability. A maximum value of a steepness degree at a central area in a width direction of the metal plate is not more than 0.4%. In addition, the maximum value of the steepness degree at the central area is not more than a steepness degree at one end side area, and is not more than a steepness degree at the other end side area. Further, a difference between the maximum value of the steepness degree at the one end side area and the maximum value of the steepness degree at the other end side area is not more than 0.4%.

公开(公告)号：US20180148836A1

公开(公告)日：2018-05-31

申请号：US15316646

申请日：2015-06-17

申请人： AIXTRON SE

发明人： Michael LONG ,  Birgit Irmgard BECCARD ,  Claudia CREMER ,  Karl-Heinz TRIMBORN ,  Andy EICHLER ,  Andreas POQUÉ

IPC分类号： C23C16/448 ,  C23C14/12 ,  C23C14/24 ,  C23C14/54 ,  C23C16/52

CPC分类号： C23C16/4483 ,  C23C14/12 ,  C23C14/246 ,  C23C14/26 ,  C23C14/54 ,  C23C16/4486 ,  C23C16/4487 ,  C23C16/52 ,  F22D1/003

摘要： In a device and a method for generating vapor in a CVD or PVD device, particles are vaporized by bringing the particles into contact with a first heat transfer surface of a vaporization device. The vapor generated by vaporizing the particles is transported by a carrier gas out of the vaporization device and into a single or multistage modulation device. In a vapor transfer phase, second heat transfer surfaces of the modulation device are adjusted to a first modulation temperature, at which the vapor passes through the modulation device without condensing on the second heat transfer surfaces. At an intermission phase, the second heat transfer surfaces are adjusted to a second modulation temperature, at which at least some of the vapor condenses on the second heat transfer surfaces.