公开(公告)号：US11866365B2

公开(公告)日：2024-01-09

申请号：US17144197

申请日：2021-01-08

Applicant: AGC Inc.

Inventor： Kazutaka Otsuka ,  Kyushiro Igarashi ,  Takeshi Shimizu ,  Minoru Tamada

IPC: B32B15/04 ,  B32B17/06 ,  C03C3/087 ,  G02B1/18 ,  B60K35/00 ,  C03B5/183 ,  C03B5/187 ,  C03B5/23 ,  B60K37/02 ,  C03C3/095 ,  C03C3/083 ,  C03C17/34 ,  C03C17/00 ,  C03C21/00

CPC classification number: C03C3/087 ,  B60K35/00 ,  B60K37/02 ,  C03B5/183 ,  C03B5/187 ,  C03B5/23 ,  C03C3/083 ,  C03C3/095 ,  C03C17/3405 ,  G02B1/18 ,  B60K2370/27 ,  B60K2370/693 ,  B60K2370/98 ,  C03C17/00 ,  C03C21/002 ,  C03C2204/08

Abstract: The present invention relates to a cover glass for a display, which is a glass plate having a first main surface and a second main surface. The cover glass contains, as represented by mol percentage based on oxides, from 50 to 75% of SiO2, from 5 to 20% of Al2O3, from 2 to 20% of Na2O, from 0 to 6% of K2O, from 0 to 15% of MgO, from 0 to 10% of a total amount (CaO+SrO+BaO) of CaO, SrO and BaO, from 0 to 5% of a total amount (ZrO2+TiO2) of ZrO2 and TiO2, from 0 to 10% of B2O3, and from 0 to 20% of Li2O. The cover glass has a ream minimum distance of 100 mm or more and 1,000 mm or less, and a ream period of 1 mm or more and 30 mm or less.

公开(公告)号：US20180188419A1

公开(公告)日：2018-07-05

申请号：US15903990

申请日：2018-02-23

Applicant: SUMITOMO METAL MINING CO., LTD.

Inventor： Hiromitsu TAKEDA ,  Kenji ADACHI

IPC: G02B1/02 ,  G02B5/20 ,  C01G39/00 ,  C03C17/00 ,  H01B1/20 ,  H01B1/08 ,  C01G41/02 ,  C01G41/00

CPC classification number: G02B1/02 ,  C01G39/00 ,  C01G41/00 ,  C01G41/006 ,  C01G41/02 ,  C01P2002/77 ,  C01P2002/84 ,  C01P2004/03 ,  C01P2004/54 ,  C03C17/00 ,  C03C17/008 ,  C03C2217/219 ,  C03C2217/24 ,  C03C2217/29 ,  C03C2217/445 ,  C03C2217/475 ,  C03C2218/11 ,  G02B5/208 ,  H01B1/08 ,  H01B1/20 ,  Y10T428/26 ,  Y10T428/2982

Abstract: An infrared-shielding nanoparticle dispersion has a property whereby visible light is adequately transmitted, and light in the near-infrared region is adequately shielded. The infrared-shielding nanoparticles include a plural aggregate of electroconductive particles composed of a tungsten oxide expressed by the general formula WyOz (where W is tungsten, O is oxygen, and 2.2≤z/y≤2.999), and/or a composite tungsten oxide expressed by the general formula MxWyOz (where M is one or more elements selected from H, alkali metals, alkaline-earth metals, rare earth elements, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, and I; W is tungsten; O is oxygen; 0.001≤x/y≤1.1; and 2.2≤z/y≤3.0).

公开(公告)号：US09700983B2

公开(公告)日：2017-07-11

申请号：US14424388

申请日：2013-08-30

Applicant: CERON Technologies Inc.

Inventor： Hironori Minami

IPC: B24B7/24 ,  B24B1/04 ,  B24B9/10 ,  C03B33/037 ,  C03B33/10 ,  G05B13/02 ,  B28D1/14 ,  C03C17/00 ,  G05B19/418 ,  B28D1/04 ,  B28D5/02 ,  B28D5/04 ,  B24D7/18

CPC classification number: B24B1/04 ,  B24B7/248 ,  B24B9/10 ,  B24D7/18 ,  B28D1/041 ,  B28D1/14 ,  B28D5/021 ,  B28D5/047 ,  C03B33/037 ,  C03B33/10 ,  C03C17/00 ,  G05B13/0205 ,  G05B19/418 ,  G05B2219/45009 ,  Y10T409/303752 ,  Y10T409/304312

Abstract: To provide a method of processing a tempered glass in which a length of time required for manufacturing one plate of a product glass is significantly reduced while the quality of the product glass is secured. In the method of processing the tempered glass in which a stacked block (1a) acting as a chemical tempered glass (1) is processed by using a processing device (8) under a condition that the processing device (8) is rotated and vibrated, the stacked block (1a) is cut out from a stack (1A) acting as the chemical tempered glass (1) by using a dicing blade (84), prior to the processing of the stacked block (1a) by using the processing device (8), and a finishing to an outer periphery of the stacked block (1a) is also performed during the processing of the stacked block (1a) by using the processing device (8).

公开(公告)号：US20170108625A1

公开(公告)日：2017-04-20

申请号：US15295107

申请日：2016-10-17

Applicant: Materion Corporation

Inventor： Jason I. Ridley

IPC: G02B1/18 ,  B05D1/18 ,  G02B1/14

CPC classification number: G02B1/18 ,  B05D1/18 ,  B05D1/185 ,  B32B15/00 ,  B32B15/018 ,  B32B15/04 ,  B32B15/08 ,  B32B17/00 ,  B32B17/06 ,  C03C17/00 ,  C03C17/06 ,  C03C17/28 ,  C23C30/00 ,  C23C30/005 ,  G02B1/10 ,  G02B1/14 ,  G02B5/08 ,  G02B5/0808 ,  Y10T428/12556 ,  Y10T428/12597 ,  Y10T428/12604 ,  Y10T428/12896 ,  Y10T428/12993 ,  Y10T428/315

Abstract: A corrosion-resistant optical device is disclosed. The device includes a substrate, a silver layer upon the substrate, and an insulating layer that provides abrasion resistance. The device is immersed in a thiol-rich solution. The thiols form a corrosion-inhibiting monolayer upon any exposed silver surface. This increases the environmental resistance of the optical device, keeping water from interacting with the silver layer.

公开(公告)号：US20160368100A1

公开(公告)日：2016-12-22

申请号：US15251453

申请日：2016-08-30

Applicant: CORNING INCORPORATED

Inventor： Sasha Marjanovic ,  Garrett Andrew Piech ,  Shyamala Shanmugam ,  Carlos Alberto Pons Siepermann ,  Sergio Tsuda ,  Zsigmond Varga ,  Robert Stephen Wagner

IPC: B23K26/384 ,  B23K26/402 ,  C03B33/09 ,  B23K26/04 ,  C03B33/02 ,  C03C15/00

CPC classification number: B23K26/384 ,  B23K26/04 ,  B23K26/0613 ,  B23K26/0617 ,  B23K26/0624 ,  B23K26/38 ,  B23K26/402 ,  B23K26/53 ,  B23K26/55 ,  B23K2103/50 ,  B32B17/064 ,  C03B33/0222 ,  C03B33/091 ,  C03C15/00 ,  C03C17/00 ,  C03C2217/70 ,  C09K13/00 ,  Y02P40/57 ,  Y10T428/24273 ,  Y10T428/24322

Abstract: Forming holes in a material includes focusing a pulsed laser beam into a laser beam focal line oriented along the beam propagation direction and directed into the material, the laser beam focal line generating an induced absorption within the material, the induced absorption producing a defect line along the laser beam focal line within the material, and translating the material and the laser beam relative to each other, thereby forming a plurality of defect lines in the material, and etching the material in an acid solution to produce holes greater than 1 micron in diameter by enlarging the defect lines in the material. A glass article includes a stack of glass substrates with formed holes of 1-100 micron diameter extending through the stack.

公开(公告)号：US20160346960A1

公开(公告)日：2016-12-01

申请号：US15235461

申请日：2016-08-12

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Souichi FUKAYA ,  Hideo Nakagawa ,  Kouhei Sasamoto

IPC: B29C33/38 ,  C03C15/00 ,  G03F7/00

CPC classification number: B29C33/3842 ,  B82Y10/00 ,  B82Y40/00 ,  C03C15/00 ,  C03C17/00 ,  C03C17/23 ,  C03C17/3665 ,  C04B35/047 ,  C04B35/105 ,  C04B35/12 ,  C04B35/56 ,  C04B35/58 ,  G03F1/24 ,  G03F1/26 ,  G03F1/48 ,  G03F1/50 ,  G03F1/54 ,  G03F7/0002

Abstract: A hard mask film 2 provided on substrate 1 is formed by tin-containing chromium-containing material. In the chromium-containing material including tin, which forms the hard mask film 2, the etching resistance to fluorine-containing dry etching is equal to or higher than the etching resistance of the tin-free chromium-containing material, and it shows a significantly high etching rate as compared with a chromium-containing material free of tin under conditions for chlorine-containing dry etching. As a result, the time for chlorine-containing dry etching is shortened, and damage to a resist pattern is reduced. Thus, high-precision pattern transfer can be performed. The present invention provides a novel technique for increasing etching process-ability by increasing a dry-etching rate of a hard mask film made of a chromium-containing material while assuring a hard mask function of the hard mask film.

公开(公告)号：US20160033697A1

公开(公告)日：2016-02-04

申请号：US14447464

申请日：2014-07-30

Applicant: Lauri Sainiemi ,  Tapani Levola ,  Pasi Saarikko

Inventor： Lauri Sainiemi ,  Tapani Levola ,  Pasi Saarikko

IPC: G02B5/18 ,  B05C13/02 ,  B05C3/02

CPC classification number: G02B5/1857 ,  B05C3/02 ,  B05C13/02 ,  B05D1/18 ,  B05D5/06 ,  C03C15/00 ,  C03C17/00 ,  C03C2218/111 ,  C03C2218/33 ,  C23C16/45525 ,  C23F1/02 ,  G02B5/1828 ,  G02B6/0058 ,  G02B27/0103

Abstract: Microfabrication processes and apparatuses for fabricating microstructures on a substrate are disclosed. The substrate has a current diffraction grating pattern formed by current surface modulations over at least a portion of the substrate's surface that exhibit a substantially uniform grating linewidth over the surface portion. An immersion depth of the substrate in a fluid for patterning the substrate is gradually changed so that different points on the surface portion are immersed for different immersion times. The fluid changes the linewidth of the surface modulations at each immersed point on the surface portion by an amount determined by the immersion time of that point, thereby changing the current diffraction grating pattern to a new diffraction grating pattern formed by new surface modulations over the surface portion that exhibit a spatially varying grating linewidth that varies over the surface portion.

Abstract translation: 公开了一种用于在基板上制造微结构的微加工工艺和装置。 衬底具有通过在衬底的表面的至少一部分上的电流表面调制形成的电流衍射光栅图案，其在表面部分上表现出基本均匀的光栅线宽。 衬底在用于图案化衬底的流体中的浸入深度逐渐改变，使得表面部分上的不同点被浸入不同的浸渍时间。 流体将表面部分上的每个浸渍点处的表面调制线宽改变由该点的浸渍时间确定的量，从而将电流衍射光栅图案改变为通过表面上的新表面调制形成的新的衍射光栅图案 表现出在表面部分上变化的空间变化的光栅线宽的部分。

公开(公告)号：US09006620B2

公开(公告)日：2015-04-14

申请号：US12092710

申请日：2006-11-29

Applicant: Pablo Vilato ,  Franck Demol

Inventor： Pablo Vilato ,  Franck Demol

IPC: H05B6/12 ,  D06N7/00 ,  C03C17/00 ,  H05B3/74

CPC classification number: C03C17/00 ,  C03C2217/72 ,  C03C2218/34 ,  H05B3/74 ,  Y10T428/24364 ,  Y10T428/30

Abstract: A transparent or translucent glass-ceramic plate, capable of covering or receiving at least one underlying heating element. The plate has a coating which at least partly masks the underlying heating element(s), while still allowing the heating element(s) and optional displays to be detected. At least 90% of the coating is on the face of the plate to be turned toward the heating element(s) and optional displays in the use position. The coating has a region or a group of regions known as a background region(s), wherein the background region(s) occupy most of the surface of the coating. The coating also has a region or a group of regions known as indicating region(s), wherein the indicating region(s) making it possible to display, relative to the background region(s), a pattern, a sign and/or the location of functional elements while also making it possible to detect if the elements are in operation.

Abstract translation: 透明或半透明的玻璃陶瓷板，能够覆盖或接收至少一个下面的加热元件。 板具有至少部分地掩盖下面的加热元件的涂层，同时仍然允许检测加热元件和可选显示器。 至少90％的涂层位于板的表面上，以朝向加热元件转动，并在使用位置上选择显示器。 涂层具有称为背景区域的区域或一组区域，其中背景区域占据涂层的大部分表面。 涂层还具有称为指示区域的区域或一组区域，其中使得可以相对于背景区域显示图案，符号和/或图案的指示区域 功能元件的位置，同时也可以检测元件是否在操作中。

公开(公告)号：US20150099330A1

公开(公告)日：2015-04-09

申请号：US14488943

申请日：2014-09-17

Applicant: CORNING INCORPORATED

Inventor： Joseph Eugene Canale ,  Jeffrey Stapleton King ,  Gary Richard Trott

IPC: H01L21/50

CPC classification number: H01L21/50 ,  C03C17/00 ,  H01L21/02422 ,  H01L21/02444 ,  H01L21/0245 ,  H01L21/02488 ,  H01L21/02491 ,  H01L2224/16145

Abstract: The present disclosure is directed to the use of glass wafers as carriers, interposers, or in other selected applications in which electronic circuitry or operative elements, such as transistors, are formed in the creation of electronic devices. The glass wafers generally include a glass having a coefficient of thermal expansion equal to or substantially equal to a coefficient of thermal expansion of semiconductor silicon, an indexing feature, and a coating on at least a portion of one face of the glass.

Abstract translation: 本公开涉及使用玻璃晶片作为载体，中介层或其它选择的应用，其中电子电路或诸如晶体管的操作元件在形成电子器件时形成。 玻璃晶片通常包括玻璃的热膨胀系数等于或基本上等于半导体硅的热膨胀系数，分度特征和玻璃的一个面的至少一部分上的涂层。

公开(公告)号：US20130115446A1

公开(公告)日：2013-05-09

申请号：US13721709

申请日：2012-12-20

Applicant: Yong-Oon HWANG ,  DongHo KANG

Inventor： Yong-Oon HWANG ,  DongHo KANG

IPC: H01B7/00 ,  C03C17/00

CPC classification number: H01B7/00 ,  C03C17/00 ,  G02F2001/133302 ,  G06F3/041 ,  G06F2203/04103 ,  Y10T428/266

Abstract: The present invention provides configuration of a flat display panel with a touch screen panel loaded thereon and a manufacturing method thereof. According to the present invention, a configuration of a flat display panel with a touch screen panel loaded thereon in which reduced number of sheets of glass substrate or resin film substrate is provided. The configuration includes a transparent electrode integrated encapsulation module in which the transparent electrode is formed on one surface of an encapsulation glass substrate without a separate glass substrate for electrode formation of a touch screen circuit. A method for manufacturing a transparent electrode integrated encapsulation module is provided.

Abstract translation: 本发明提供一种其上装有触摸屏面板的平板显示面板及其制造方法。 根据本发明，提供了一种其上装有触摸屏面板的平板显示面板的结构，其中设置了玻璃基板或树脂薄膜基板的数量减少。 该配置包括透明电极集成封装模块，其中透明电极形成在封装玻璃衬底的一个表面上，而没有用于触摸屏电路的电极形成的单独的玻璃衬底。 提供一种制造透明电极集成封装模块的方法。