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135 条记录 (耗时 0.039 秒)

    Catadioptric projection objective
    74.
    发明授权
    Catadioptric projection objective 有权
    反射折射投影物镜

    公开(公告)号：US07385756B2

    公开(公告)日：2008-06-10

    申请号：US11035103

    申请日：2005-01-14

    申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

    发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

    IPC分类号： G02B17/00 ,  G02B21/00

    CPC分类号： G03F7/70958 ,  G02B13/22 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70966

    摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

    摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

    Optical system for ultraviolet light
    77.
    发明申请
    Optical system for ultraviolet light 有权
    紫外线光学系统

    公开(公告)号：US20060119750A1

    公开(公告)日：2006-06-08

    申请号：US11252598

    申请日：2005-10-19

    申请人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

    发明人： Alexander Epple ,  Toralf Gruner ,  Wolfgang Singer

    IPC分类号： G02F1/1335

    CPC分类号： G02B17/0892 ,  G02B3/12 ,  G02B3/14 ,  G02B13/143 ,  G02B17/0812

    摘要： An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength λ≦200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths λ≦200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

    摘要翻译： 波长λ<= 200nm的紫外光的光学系统可以特别设计为用于微光刻的反射折射投影物镜，具有多个光学元件，包括由合成石英玻璃制成的光学元件或透明于 波长λ<= 200nm。 至少两个光学元件用于形成至少一个液体透镜组，该液体透镜组包括第一限定光学元件，第二限定光学元件和液体透镜，该液体透镜组布置在第一限定光学元件和第二限定光学元件之间的间隙中 限定光学元件并且包含对波长λ<= 200nm的透明紫外光的液体。 这使得即使在难以校正色彩的系统的情况下也能够有效地校正色像差。

    Catadioptric projection objective
    78.
    发明申请
    Catadioptric projection objective 失效
    反射折射投影物镜

    公开(公告)号：US20050207029A1

    公开(公告)日：2005-09-22

    申请号：US11036155

    申请日：2005-01-18

    申请人： Alexander Epple ,  Aurelian Dodoc

    发明人： Alexander Epple ,  Aurelian Dodoc

    IPC分类号： G02B5/00 ,  G02B17/00 ,  G02B17/08 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G02B17/0892 ,  G02B5/005 ,  G02B13/22 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/7025 ,  G03F7/70275 ,  G03F7/70341

    摘要： A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective while generating a real intermediate image has a catadioptric objective part having at least one concave mirror and a beam deflecting device and also a dioptric objective part. The imaging system has a system diaphragm having a variable diaphragm diameter for variably limiting the cross section of the radiation passing through the projection objective. This system diaphragm is arranged in the catadioptric objective part, preferably in direct proximity to the concave mirror. The invention enables a projection objective with a simple construction.

    摘要翻译： 将产生真实中间图像的布置在投影物镜的物平面中的图案成像到投影物镜的像平面内的反射折射投影物镜具有反射折射物镜部分，其具有至少一个凹面镜和光束偏转装置，并且还具有 屈光客观部分。 成像系统具有可变光阑直径的系统隔膜，用于可变地限制通过投影物镜的辐射的横截面。 该系统隔膜布置在反折射物镜部分中，优选地直接靠近凹面镜。 本发明能够实现具有简单结构的投影物镜。

    Microlithographic projection exposure apparatus
    79.
    发明授权
    Microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置

    公开(公告)号：US09046787B2

    公开(公告)日：2015-06-02

    申请号：US13007039

    申请日：2011-01-14

    申请人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

    发明人： Toralf Gruner ,  Alexander Epple ,  Markus Degünther

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70108 ,  G03F7/70141 ,  G03F7/70191

    摘要： A projection exposure apparatus has a projection lens with an object plane, an image plane, an optical axis and a non-telecentric entrance pupil. The apparatus further comprises an illumination system having an intermediate field plane and a field stop. The field stop is positioned in or in close proximity to the intermediate field plane and defines an illuminated field in the object plane that does not contain the optical axis of the projection lens. The illumination system is configured such that, in the object plane, a mean of the angles formed between all principal rays emanating from the intermediate field plane on the one hand and the optical axis of the projection lens on the other hand differs from 0°.

    摘要翻译： 投影曝光装置具有物镜面，像面，光轴和非远心入射光瞳的投影透镜。 该装置还包括具有中间场平面和场停止的照明系统。 场停止件位于中间场平面中或紧邻中间场平面，并且在物平面中限定不包含投影透镜的光轴的照明场。 照明系统被配置为使得在物平面中，从一方面从中间场平面发射的所有主光线与另一方面的投影透镜的光轴之间形成的角度的平均值不同于0°。

    Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method
    80.
    发明授权
    Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method 有权
    反射折射投影物镜，瞳孔镜，投影曝光装置和投影曝光方法

    公开(公告)号：US08390784B2

    公开(公告)日：2013-03-05

    申请号：US12369460

    申请日：2009-02-11

    申请人： Alexander Epple

    发明人： Alexander Epple

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70225 ,  G03F7/70266 ,  G03F7/70275

    摘要： In certain aspects, catadioptric projection objectives for imaging a pattern from an object field arranged in an object surface of the projection objective onto an image field arranged in an image surface of the projection objective include a first objective part configured to image the pattern from the object surface into a first intermediate image, and having a first pupil surface, a second objective part configured to image the first intermediate image into a second intermediate image, and having a second pupil surface optically conjugate to the first pupil surface, and a third objective part configured to image the second intermediate image into the image surface, and having a third pupil surface optically conjugate to the first and second pupil surface. A pupil mirror having a reflective pupil mirror surface is positioned at or close to one of the first, second and third pupil surface. A pupil mirror manipulator operatively connected to the pupil mirror and configured to vary the shape of the reflective surface of the pupil mirror allows for dynamically correcting imaging aberrations originating from lens heating, compaction and other radiation induced imaging aberrations occurring during operation of the projection objective.

    摘要翻译： 在某些方面，用于将布置在投影物镜的物体表面中的物体场的图案成像到布置在投影物镜的图像表面中的图像场的反射折射投射物镜包括：第一物镜部件，被配置为从物体成像图案 表面成为第一中间图像，并具有第一光瞳表面，第二物镜部分被配置为将第一中间图像成像为第二中间图像，并且具有与第一瞳孔表面光学共轭的第二光瞳表面，以及第三目标部分 被配置为将所述第二中间图像成像到所述图像表面中，并且具有与所述第一和第二光瞳表面光学共轭的第三光瞳表面。 具有反射光瞳镜表面的光瞳反射镜位于或靠近第一，第二和第三光瞳表面中的一个。 可操作地连接到光瞳反射镜并被配置为改变瞳孔镜的反射表面的形状的瞳孔镜操纵器允许动态地校正源自投影物镜的操作期间发生的镜片加热，压实和其它辐射诱导的成像像差的成像像差。