公开(公告)号：US20110007293A1

公开(公告)日：2011-01-13

申请号：US12884485

申请日：2010-09-17

申请人： Damian Fiolka ,  Michael Totzeck ,  Alexandra Pazidis ,  Michael Ricker

发明人： Damian Fiolka ,  Michael Totzeck ,  Alexandra Pazidis ,  Michael Ricker

IPC分类号： G03B27/72 ,  G03F7/20

CPC分类号： G03F7/70083 ,  G03F7/70566

摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.

摘要翻译： 本公开涉及微光刻投影曝光装置，以及相关的部件和方法。 在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。 可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。 非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

公开(公告)号：US07847920B2

公开(公告)日：2010-12-07

申请号：US11703259

申请日：2007-04-30

申请人： Damian Fiolka ,  Axel Scholz ,  Manfred Maul

发明人： Damian Fiolka ,  Axel Scholz ,  Manfred Maul

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/70058 ,  G03F7/70566

摘要： An illumination system for illuminating a reticle that moves along a scanning direction in a microlithographic projection exposure apparatus has an optical axis and an optical component producing an illumination angle distribution of the projection light. In accordance with the illumination angle distribution, a plurality of poles is illuminated in a pupil plane of the illumination system. The poles form an arrangement that is only mirror-symmetrical with respect to an axis that is orthogonal to the optical axis of the illumination, but neither parallel nor perpendicular to the scanning direction.

摘要翻译： 用于照射在微光刻投影曝光装置中沿着扫描方向移动的掩模版的照明系统具有产生投影光的照明角度分布的光轴和光学部件。 根据照明角度分布，在照明系统的光瞳平面内照射多个极点。 极构成相对于与照明的光轴垂直但与扫描方向不平行或垂直的轴仅镜像对称的布置。

公开(公告)号：US20100283984A1

公开(公告)日：2010-11-11

申请号：US12818501

申请日：2010-06-18

申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC分类号： G03B27/54

CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

公开(公告)号：US20100277707A1

公开(公告)日：2010-11-04

申请号：US12836982

申请日：2010-07-15

申请人： Damian Fiolka

发明人： Damian Fiolka

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70108

摘要： Illumination optics for a microlithographic projection exposure apparatus is used for illumination of an object field in the object plane with illumination light of a radiation source. The illumination optics has an optical beam influencing element which is divided into at least two beam influencing regions in order to generate various illumination modes for the object field which are independent of a light attenuation. The optical beam influencing element is displaceable between a first beam influencing position where a first one of the beam influencing regions is exposed to a bundle of the illumination light, and at least another beam influencing position where another one of the beam influencing regions is exposed to the bundle of the illumination light. Each of the beam influencing regions has a surface which is exposable to illumination light and has a long and a short side length, with the optical beam influencing element being displaceable perpendicular to the long side length. The result is an illumination optics which allows rapid switching between various illumination settings, preferably within fractions of a second and substantially without light loss.

公开(公告)号：US07817250B2

公开(公告)日：2010-10-19

申请号：US12146200

申请日：2008-06-25

申请人： Damian Fiolka ,  Michael Totzeck ,  Alexandra Pazidis ,  Michael Ricker

发明人： Damian Fiolka ,  Michael Totzeck ,  Alexandra Pazidis ,  Michael Ricker

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70083 ,  G03F7/70566

摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.

摘要翻译： 本公开涉及微光刻投影曝光装置，以及相关的部件和方法。 在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。 可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。 非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

公开(公告)号：US07782443B2

公开(公告)日：2010-08-24

申请号：US12646021

申请日：2009-12-23

申请人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

发明人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

IPC分类号： G03B27/54 ,  G03B27/14 ,  G03B27/12

CPC分类号： G03F7/70208 ,  G03F7/70116

摘要： An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.

摘要翻译： 微光刻投影曝光装置的照明系统包括包括多个光束偏转元件（例如镜子）的光束偏转阵列。 每个光束偏转元件适于使入射光束偏转响应于控制信号而变化的偏转角。 从光束偏转元件反射的光束在系统光瞳表面产生斑点。 在曝光处理期间在掩模被成像在光敏表面上的系统光瞳表面中照亮的光斑的数量大于光束偏转元件的数量。 这可以借助于将来自光束偏转元件反射的光束相乘的光束倍增器单元来实现。 在另一个实施例中，控制光束偏转元件，使得在系统光瞳表面中产生的辐照度分布在曝光过程的两个连续的光脉冲之间变化。

公开(公告)号：US20100177293A1

公开(公告)日：2010-07-15

申请号：US12729948

申请日：2010-03-23

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G03B27/54 ,  G02B5/30

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 由光学活性晶体材料组成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果 具有第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US20100157268A1

公开(公告)日：2010-06-24

申请号：US12646021

申请日：2009-12-23

申请人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

发明人： Damian Fiolka ,  Ralf Mueller ,  Andras G. Major

IPC分类号： G03B27/54

CPC分类号： G03F7/70208 ,  G03F7/70116

摘要： An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.

摘要翻译： 微光刻投影曝光装置的照明系统包括包括多个光束偏转元件（例如镜子）的光束偏转阵列。 每个光束偏转元件适于使入射光束偏转响应于控制信号而变化的偏转角。 从光束偏转元件反射的光束在系统光瞳表面产生斑点。 在曝光处理期间在掩模被成像在光敏表面上的系统光瞳表面中照亮的光斑的数量大于光束偏转元件的数量。 这可以借助于将来自光束偏转元件反射的光束相乘的光束倍增器单元来实现。 在另一个实施例中，控制光束偏转元件，使得在系统光瞳表面中产生的辐照度分布在曝光过程的两个连续的光脉冲之间变化。

公开(公告)号：US07551261B2

公开(公告)日：2009-06-23

申请号：US10590783

申请日：2005-02-24

申请人： Damian Fiolka

发明人： Damian Fiolka

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70075 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure apparatus has a light distribution device (21), which generates a two-dimensional intensity distribution from the light from a primary light source, for example a laser, in a first surface (25) of the illumination system. A fly's eye condenser (55) having a first and a second raster arrangement (40) of optical elements serves as a light mixing device for homogenizing the illumination in the illumination field of the illumination system. The fly's eye condenser has a first raster arrangement (35) of first raster elements (36) and also a second raster arrangement (40) of second raster elements (41). The light distribution device comprises at least one diffractive optical element (21) for generating an angular distribution whose far field has separate or contiguous luminous zones which are coordinated with the form and size of the first raster elements (36).

摘要翻译： 一种用于微光刻投影曝光装置的照明系统具有配光装置（21），该配光装置在照明的第一表面（25）中产生来自主光源（例如激光）的光的二维强度分布 系统。 具有光学元件的第一和第二光栅装置（40）的蝇眼聚光器（55）用作用于使照明系统的照明场中的照明均匀化的光混合装置。 蝇眼聚光器具有第一光栅元件（36）的第一光栅布置（35）和第二光栅元件（41）的第二光栅布置（40）。 配光装置包括用于产生角分布的至少一个衍射光学元件（21），其远场具有与第一光栅元件（36）的形式和尺寸协调的分离或连续的发光区域。

公开(公告)号：US20090027646A1

公开(公告)日：2009-01-29

申请号：US12191069

申请日：2008-08-13

申请人： Damian Fiolka ,  Nils Dieckmann

发明人： Damian Fiolka ,  Nils Dieckmann

IPC分类号： G03B27/54

CPC分类号： G03F7/70966 ,  G02B5/001 ,  G03F7/70191

摘要： The disclosure provides an illumination system of a microlithographic projection exposure apparatus, as well as related methods and components. In some embodiments, the illumination system includes an optical element configured so that, when a linearly polarised entry beam which has an angle spectrum is incident on the first optical element, a maximum aperture angle of the entry beam at the first optical element is not more than 35 mrad. A component, which is rotationally symmetric about an optical axis of the system, of a birefringence present in the illumination system can be at least partially compensated by the first optical element.

摘要翻译： 本公开提供了微光刻投影曝光装置的照明系统以及相关的方法和组件。 在一些实施例中，照明系统包括光学元件，其被配置为使得当具有角度光谱的线偏振入射光束入射在第一光学元件上时，入射光束在第一光学元件处的最大孔径角度不更大 超过35 mrad。 可以通过第一光学元件至少部分地补偿存在于照明系统中的双折射的关于系统的光轴旋转对称的分量。