DRAWING APPARATUS, DRAWING SYSTEM, AND DRAWING METHOD

    公开(公告)号:US20230418162A1

    公开(公告)日:2023-12-28

    申请号:US18039339

    申请日:2021-12-03

    Inventor: Shota MAJIMA

    CPC classification number: G03F7/20

    Abstract: Provided is a drawing apparatus capable of drawing with high accuracy on a surface having a shape whose height exceeds a focal depth without complicatedly adjusting focus of an optical system. A substrate can be placed on a stage. A drawing head includes a spatial light modulator that generates modulated light, and a projection optical system that focuses the modulated light on a focus position in a height direction over the stage. A mover relatively moves the stage and the drawing head in the horizontal direction. A controller controls the mover and the drawing head. The controller controls the spatial light modulator based on correction pattern data representing a correction pattern, and the correction pattern data is generated by correcting design pattern data representing a design pattern based on surface profile data representing a surface profile of the substrate.

    SEMANTIC REPRESENTATION GENERATION METHOD, SEMANTIC REPRESENTATION GENERATION DEVICE, AND RECORDING MEDIUM

    公开(公告)号:US20230359831A1

    公开(公告)日:2023-11-09

    申请号:US18310790

    申请日:2023-05-02

    CPC classification number: G06F40/30 G06F40/289

    Abstract: In a semantic representation generation method, syntax data is generated by a superficial analysis on text data described in a natural language. A concept tag is provided to each morpheme based on the syntax data with reference to a CT system table in which concept information hierarchically and ambiguously representing a meaning of the morpheme for a part of speech. Provided is a first semantic tag indicating semantic information representing a semantic relation between a first phrase/sequence of phrases and a second phrase/sequence of phrases to a first pair made up of the first phrase/sequence of phrases corresponding to a predicate and the second phrase/sequence of phrases having a modification relation with the predicate based on the syntax data. Semantic representation data is generated based on the concept tag provided to each morpheme and the first semantic tag provided to the first pair.

    Substrate processing device and substrate processing method

    公开(公告)号:US11804387B2

    公开(公告)日:2023-10-31

    申请号:US17219887

    申请日:2021-04-01

    CPC classification number: H01L21/67051 H01L21/68728 H01L21/68785

    Abstract: A substrate processing device includes a holding member for holding a substrate, and an opposed member having a body portion and an extended portion extending from at least a part of a peripheral edge part of the body portion. A protrusion is provided on one part of a tip side part of the extended portion and a side surface part of the holding member, and the other part is provided with a restricting structure disposed opposite to the protrusion and restricting relative motion of the protrusion. The relative motion between the holding member and the opposed member is restricted, and the substrate processing device further includes a rotating mechanism, and a nozzle for discharging a processing solution and the protrusion and the restricting structure are disposed below an upper surface of the holding member.

    IMAGE ACQUISITION APPARATUS AND IMAGE ACQUISITION METHOD

    公开(公告)号:US20230342896A1

    公开(公告)日:2023-10-26

    申请号:US18180526

    申请日:2023-03-08

    Inventor: Takuya Yasuda

    Abstract: In an image acquisition apparatus, acquired are picked-up images 71 representing divided regions, respectively, which are obtained by dividing a predetermined region on a target object, and in the picked-up images 71, each image pair 72 representing adjacent divided regions has an overlapping region 73. The amount of relative positional deviation in each image pair 72 is specified by generating a similarity map 74 indicating a distribution of the degree of similarity. Combination positions of the picked-up images 71 are determined on the basis of the amounts of positional deviation in image pairs 72 included in the picked-up images 71 while it is assumed that an image pair 72 whose similarity map 74 has a directivity is a specific image pair 72 and a weight of the specific image pair 72 is set to be lower than those of other image pairs 72.

    Light irradiation type thermal process apparatus using a gas ring

    公开(公告)号:US11798823B2

    公开(公告)日:2023-10-24

    申请号:US17075739

    申请日:2020-10-21

    CPC classification number: H01L21/67115 H01L21/67109 H05B3/0047

    Abstract: A gas ring is attached to an upper portion of a chamber side portion as a side wall of a chamber. The gas ring is formed by overlapping an upper ring and a lower ring. A gap between the upper ring and the lower ring provides a flow path for processing gas. A labyrinthine resisting unit is formed in the flow path. The mass of the lower ring having an inner wall surface is increased to increase heat capacity. The lower ring is attached to the chamber side portion to be in surface contact with the chamber side portion, so that thermal conductivity from the lower ring to the chamber side portion has a large value, and the amount of heat accumulated in the lower ring is reduced. An increase in temperature of the lower ring at thermal processing is thereby suppressed to prevent discoloration of the gas ring.

    SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

    公开(公告)号:US20230323205A1

    公开(公告)日:2023-10-12

    申请号:US18043320

    申请日:2021-07-21

    CPC classification number: C09K13/00 H01L21/6708 H01L21/30608

    Abstract: According to the present invention, a substrate W is provided with a recess 95. The width of the recess 95 is smaller than the depth of the recess 95. An etching target which is at least one of a single crystal of silicon, a polysilicon and an amorphous silicon is exposed in at least a part of the upper part of a lateral surface 95s and in at least a part of the lower part of the lateral surface 95s. The etching target is etched by supplying an alkaline first etching liquid, in which an inert gas is dissolved, to the substrate W. The etching target is etched by supplying an alkaline second etching liquid, in which a dissolution gas is dissolved, and which has a dissolved oxygen concentration higher than that of the first etching liquid, to the substrate W before or after the first etching liquid is supplied to the substrate W.

    PRINTING APPARATUS AND INK DISCHARGE HEAD MAINTENANCE METHOD

    公开(公告)号:US20230311512A1

    公开(公告)日:2023-10-05

    申请号:US18018799

    申请日:2021-08-20

    Inventor: Kaisei KAJIHARA

    CPC classification number: B41J2/16511 B41J2/16523 B41J2002/16514

    Abstract: The seal member can be held in close contact with the head unit by being elastically deformed according to the shape of the head unit including the head (seal close contact operation). Accordingly, the drying of the nozzles can be prevented by isolating the nozzles inside the seal members from the atmosphere outside the seal members. Further, the cap can be brought into contact with the head unit while the seal member is separated from the head unit (cap contact operation). In this cap contact operation, the cap in contact with the head unit allow air flows between the outside and inside of the cap. At the time of purging, the cap contact operation is performed, whereby the cap is caused to face the nozzles and the ink flowing out from the nozzles is received by the cap.

    SUBSTRATE PROCESSING APPARATUS
    80.
    发明公开

    公开(公告)号:US20230307256A1

    公开(公告)日:2023-09-28

    申请号:US18180405

    申请日:2023-03-08

    CPC classification number: H01L21/67023 B08B3/022

    Abstract: This invention includes a substrate holder provided rotatably about an axis of rotation extending in a vertical direction while sucking and holding a central part of a lower surface of a substrate, a rotating mechanism for outputting a rotational driving force for rotating the substrate holder, a processing mechanism for processing the substrate by supplying a processing liquid to the substrate held by the substrate holder, and a rotating cup provided rotatably about the axis of rotation while surrounding an outer periphery of the rotating substrate and configured to collect liquid droplets of the processing liquid scattered from the substrate. The rotating mechanism includes a power transmitter for transmitting a part of the rotational driving force as a cup driving force to the rotating cup, and simultaneously rotates the substrate holder and the rotating cup by the rotational driving force.

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