公开(公告)号：US20150270122A1

公开(公告)日：2015-09-24

申请号：US14220001

申请日：2014-03-19

Applicant: ASM IP Holding B.V.

Inventor： John Tolle ,  Matthew G. Goodman ,  Robert Michael Vyne ,  Eric R. Hill

IPC: H01L21/02 ,  H01L21/3205 ,  H01L21/324

CPC classification number: H01L21/02049 ,  B08B5/00 ,  B08B7/0014 ,  B08B7/0071 ,  C30B23/025 ,  C30B25/186 ,  C30B29/06 ,  H01L21/02046 ,  H01L21/02068 ,  H01L21/0217 ,  H01L21/02301 ,  H01L21/02348 ,  H01L21/02532 ,  H01L21/02598 ,  H01L21/02636 ,  H01L21/02661 ,  H01L21/31116 ,  H01L21/3205 ,  H01L21/324

Abstract: A method for integrated circuit fabrication can include removing silicon oxide by a pre-clean process. The pre-clean process can include depositing a halogen-containing material on the surface of a substrate in a first reaction chamber, and transferring the substrate having the halogen-containing material to a second reaction chamber. Silicon oxide material can be removed from a surface of the substrate by sublimating the halogen-containing material in the second reaction chamber. A target material, such as a conductive material, may subsequently be deposited on the substrate surface in the second reaction chamber.

Abstract translation: 用于集成电路制造的方法可以包括通过预清洁工艺去除氧化硅。 预清洁方法可以包括在第一反应室中在基材的表面上沉积含卤素的材料，并将具有含卤素材料的基材转移到第二反应室。 氧化硅材料可以通过升华第二反应室中的含卤物质从基板的表面去除。 诸如导电材料的目标材料随后可以沉积在第二反应室中的基板表面上。

公开(公告)号：US20150267295A1

公开(公告)日：2015-09-24

申请号：US14219879

申请日：2014-03-19

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John Tolle ,  Matthew Goodman

IPC: C23C16/458 ,  C23C16/455 ,  H05B6/10

CPC classification number: C23C16/4581 ,  C23C16/45504 ,  H05B6/105

Abstract: A substrate tray, a susceptor assembly including a substrate tray, and a reactor including a substrate tray and/or susceptor assembly are disclosed. The substrate tray is configured to retain a substrate during processing and can be formed of a substantially non-reactive material. The substrate tray can be received by a susceptor, formed of another material, to form the susceptor assembly.

Abstract translation: 公开了一种基板托盘，包括基板托盘的基座组件和包括基板托盘和/或基座组件的反应器。 衬底托盘被配置为在加工过程中保持衬底并且可以由基本上不反应的材料形成。 衬底托盘可以由由另一种材料形成的基座接收，以形成基座组件。