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217 条记录 (耗时 0.042 秒)

    Antenna device
    71.
    发明授权
    Antenna device 失效
    天线设备

    公开(公告)号：US07443345B2

    公开(公告)日：2008-10-28

    申请号：US11131186

    申请日：2005-05-18

    申请人： Xin Zhang

    发明人： Xin Zhang

    IPC分类号： H01Q1/38

    CPC分类号： H01Q1/246 ,  H01Q1/38 ,  H01Q13/206 ,  H01Q19/108

    摘要： An antenna device has: a dielectric substrate; an electric supply line that has a microstrip line and is formed on the dielectric substrate; an antenna element that has a microstrip line and is formed on the dielectric substrate; and a reflector plate disposed on the dielectric substrate at a predetermined angle of inclination. The electric supply line and the antenna element deviate from a dimensional factor that allows the electric supply line and the antenna element to have an omnidirectivity, and the electric supply line and the antenna element has a dimensional factor that allows the electric supply line and the antenna element to have an elliptical directivity.

    摘要翻译： 天线装置具有：电介质基板; 电源线，其具有微带线并形成在所述电介质基板上; 天线元件，其具有微带线并形成在所述电介质基板上; 以及以预定的倾斜角度设置在电介质基片上的反射板。 电源线和天线元件偏离允许电源线和天线元件具有全向性的尺寸因子，并且电源线和天线元件具有允许供电线和天线的尺寸因子 元素具有椭圆方向性。

    DESIGN MANAGING MEANS, DESIGN TOOL AND METHOD FOR WORK BREAKDOWN STRUCTURE
    72.
    发明申请
    DESIGN MANAGING MEANS, DESIGN TOOL AND METHOD FOR WORK BREAKDOWN STRUCTURE 审中-公开
    设计管理手段，设计工具和工作中断结构的方法

    公开(公告)号：US20080177565A1

    公开(公告)日：2008-07-24

    申请号：US12055630

    申请日：2008-03-26

    申请人： Wei Sun ,  Zhong Tian ,  Xin Zhang ,  Sheng Ye

    发明人： Wei Sun ,  Zhong Tian ,  Xin Zhang ,  Sheng Ye

    IPC分类号： G06Q10/00

    CPC分类号： G06Q10/06 ,  G06Q10/063112 ,  G06Q10/063118 ,  G06Q10/06313 ,  G06Q10/06316 ,  G06Q10/0633

    摘要： A WBS design managing means in project management, comprising: a WBS tree-like architecture designing means for implementing graphical tree-like design of the work items included in a project and their relations, and mapping them into an enhanced WBS data structure; a WBS attribute editing means for defining and editing attributes of work items at each node of the tree-like architecture; and a WBS data managing means for storing and managing data constructed in accordance with said enhanced WBS data structure. The WBS design managing means may connect to a converter for converting said constructed data into the format required by a project management tool so as to input said structured data to the project management tool. Besides, there is provided an enhanced WBS design tool. The present invention makes the system design tool and project management tool be integrated, so that the system architect and the project management personal have more fluent channel for information exchange under the support of the present invention's tool, improving efficiency and accuracy of project management.

    摘要翻译： WBS设计管理手段，包括：WBS树状架构设计手段，用于实现项目中包含的工作项目的图形树状设计及其关系，并将其映射为增强的WBS数据结构; WBS属性编辑装置，用于在树状架构的每个节点处定义和编辑工作项的属性; 以及用于存储和管理根据所述增强的WBS数据结构构造的数据的WBS数据管理装置。 WBS设计管理装置可以连接到转换器，用于将所述构造的数据转换成项目管理工具所需的格式，以便将所述结构化数据输入到项目管理工具。 此外，还提供了一个增强的WBS设计工具。 本发明使得系统设计工具和项目管理工具得到整合，使得系统架构师和项目管理人员在本发明工具的支持下，有更流畅的信息交流渠道，提高项目管理的效率和准确性。

    Antenna device
    73.
    发明申请
    Antenna device 失效
    天线设备

    公开(公告)号：US20080158089A1

    公开(公告)日：2008-07-03

    申请号：US12010156

    申请日：2008-01-22

    申请人： Xin Zhang

    发明人： Xin Zhang

    IPC分类号： H01Q19/10 ,  H01Q9/04

    CPC分类号： H01Q1/246 ,  H01Q1/38 ,  H01Q13/206 ,  H01Q19/108

    摘要： An antenna device, includes a plurality of substrate type antennas arranged in a direction, each of the substrate type antennas includes a dielectric substrate, an electric supply line that includes a microstrip line and is formed on the dielectric substrate, and antenna elements each of which includes microstrip lines and formed on the dielectric substrate, and a reflector plate located along the direction that the substrate type antennas are arranged. The substrate type antennas each have different angles of inclination relative to the reflector plate.

    摘要翻译： 天线装置包括沿方向配置的多个基板型天线，每个基板型天线包括电介质基板，包括微带线并形成在电介质基板上的供电线，天线元件各自 包括微带线并形成在电介质基板上，以及沿着衬底型天线布置的方向设置的反射板。 基板型天线各自具有相对于反射板的不同的倾斜角。

    General charging method
    75.
    发明授权
    General charging method 有权
    一般充电方式

    公开(公告)号：US07313230B2

    公开(公告)日：2007-12-25

    申请号：US10558620

    申请日：2003-12-31

    申请人： Zhijian Lu ,  Xin Zhang ,  Xiaozheng Guo ,  Qingchen Chu ,  Youkun Chen

    发明人： Zhijian Lu ,  Xin Zhang ,  Xiaozheng Guo ,  Qingchen Chu ,  Youkun Chen

    IPC分类号： H04M15/00

    CPC分类号： H04L12/14 ,  G06Q30/0284 ,  G06Q30/04 ,  G06Q50/188

    摘要： The present invention provides a general charging method applicable to a charging system in the communication field, comprising steps of establishing a charging strategy and performing the charging based upon the charging strategy. The charging strategy comprises a plurality of priorities each of which comprises a plurality of periods of time, and each of the periods of time corresponds to a type of rate segmentation and is provided a plurality of rate segments in each of which there are a plurality of rates. The step of performing the charging comprises steps of: searching for the highest priority in the charging strategy; searching for a corresponding period of time in the priority based upon the time a subscriber uses a service, and if found, performing the charging based upon the rate segments in the period of time; when the charging has been completed or the priorities have been searched through, and if there is any usage quantity that can't be charged, recording it and terminating the charging. With such a structure of general charging strategy, the present invention can satisfy various charging demands and provide generality and adequate expansibility. Also, the present invention enables subscribers to configure different charging methods as needed.

    摘要翻译： 本发明提供了一种适用于通信领域中的计费系统的通用计费方法，其特征在于包括基于计费策略建立计费策略和执行计费的步骤。 充电策略包括多个优先级，每个优先级包括多个时间段，并且时间段中的每个时间段对应于速率分段的类型，并且被提供多个速率段，每个速率段中有多个速率段 价格。 执行充电的步骤包括以下步骤：在充电策略中搜索最高优先级; 基于用户使用服务的时间，优先搜索相应的时间段，并且如果发现，则在该时间段内基于速率段执行计费; 当充电已经完成或已经搜索到优先级，并且如果存在不能充电的任何使用量，记录并终止充电。 通过这种一般充电策略的结构，本发明可以满足各种充电需求，并提供通用性和充分的可扩展性。 而且，本发明使订户能够根据需要配置不同的计费方法。

    Semiconductor device having optimized shallow junction geometries and method for fabrication thereof
    77.
    发明授权
    Semiconductor device having optimized shallow junction geometries and method for fabrication thereof 有权
    具有优化的浅结几何形状的半导体器件及其制造方法

    公开(公告)号：US07033879B2

    公开(公告)日：2006-04-25

    申请号：US10835121

    申请日：2004-04-29

    申请人： Brian E. Hornung ,  Xin Zhang ,  Lance S. Robertson ,  Srinivasan Chakravarthi ,  Beriannan Chidambaram

    发明人： Brian E. Hornung ,  Xin Zhang ,  Lance S. Robertson ,  Srinivasan Chakravarthi ,  Beriannan Chidambaram

    IPC分类号： H01L21/8238 ,  H01L21/336

    CPC分类号： H01L21/823814 ,  H01L21/823864

    摘要： The present invention provides, in one embodiment, a method of fabricating a semiconductor device (100). The method comprises growing an oxide layer (120) on a gate structure (114) and a substrate (102) and implanting a dopant (124) into the substrate (102) and the oxide layer (120). Implantation is such that a portion of the dopant (124) remains in the oxide layer (120) to form an implanted oxide layer (126). The method further includes depositing a protective oxide layer (132) on the implanted oxide layer (126) and forming etch-resistant off-set spacers (134). The etch-resistant off-set spacers (134) are formed adjacent sidewalls of the gate structure (114) and on the protective oxide layer (132). The etch resistant off-set spacers having an inner perimeter (135) adjacent the sidewalls and an opposing outer perimeter (136). The method also comprises removing portions of the protective oxide layer (132) lying outside the outer perimeter (136) of the etch-resistant off-set spacers (134). Other embodiments of the present invention include a transistor device (200) and method of manufacturing an integrated circuit (300).

    摘要翻译： 本发明在一个实施例中提供一种制造半导体器件（100）的方法。 该方法包括在栅极结构（114）和衬底（102）上生长氧化物层（120）并将掺杂剂（124）注入到衬底（102）和氧化物层（120）中。 注入使得掺杂剂（124）的一部分保留在氧化物层（120）中以形成注入的氧化物层（126）。 该方法还包括在注入的氧化物层（126）上沉积保护性氧化物层（132）并且形成耐腐蚀的偏置间隔物（134）。 在栅极结构（114）的侧壁和保护氧化物层（132）上形成耐蚀刻偏置间隔物（134）。 耐腐蚀的偏置间隔件具有邻近侧壁的内周边（135）和相对的外周边（136）。 该方法还包括去除位于耐蚀刻偏移间隔物（134）的外周（136）外的保护氧化物层（132）的部分。 本发明的其他实施例包括晶体管器件（200）和制造集成电路（300）的方法。

    Elimination of void formation in aluminum based interconnect structures
    78.
    发明授权
    Elimination of void formation in aluminum based interconnect structures 失效
    消除铝基互连结构中的空隙形成

    公开(公告)号：US5946589A

    公开(公告)日：1999-08-31

    申请号：US947884

    申请日：1997-10-09

    申请人： Yat Meng Ng ,  Xin Zhang

    发明人： Yat Meng Ng ,  Xin Zhang

    IPC分类号： H01L21/02 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/441

    CPC分类号： H01L21/02071 ,  H01L21/31138

    摘要： A process for forming aluminum based interconnect structures, with a reduced risk of void formation, occurring during photoresist removal and clean up procedures, has been developed. The process features removing the photoresist layer, used as a mask for patterning of an aluminum based layer, using a two phase, in situ photoresist removal procedure, followed by a cold water rinse. An aluminum oxide layer, formed during the initial phase of the two phase, in situ photoresist removal procedure, protects the sides of the aluminum based interconnect structure, during post-clean procedures, reducing the risk of galvanic corrosion and void formation. In addition the temperature of a DI water, post-clean procedure, has also been decreased to between about 5 to 10.degree. C., reduced, also reducing the risk of galvanic corrosion, that can occur during the post clean procedures.

    摘要翻译： 已经开发了一种用于形成铝基互连结构的方法，其在光致抗蚀剂去除和清洁过程中发生空隙形成的风险降低。 该方法的特征在于，使用两相原位光致抗蚀剂去除步骤，然后进行冷水冲洗，除去用作铝基层图案的掩模的光致抗蚀剂层。 在两相初始阶段形成的原位光致抗蚀剂去除工艺中的氧化铝层在后清洁过程中保护铝基互连结构的侧面，降低电偶腐蚀和空隙形成的风险。 此外，去离子水的温度，后清洁程序也降低到约5至10℃之间，减少，也降低了电镀腐蚀的风险，这可能在后清洗过程中发生。