Method of reducing sputtering burn-in time, minimizing sputtered
particulate, and target assembly therefor
    71.
    发明授权
    Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor 失效
    降低溅射老化时间,最小化溅射颗粒的方法,以及靶组装

    公开(公告)号:US6030514A

    公开(公告)日:2000-02-29

    申请号:US850707

    申请日:1997-05-02

    IPC分类号: C23C14/34 B65B31/00

    CPC分类号: C23C14/3414

    摘要: A target for sputtering is subjected to a surface treatment process and special packaging after target manufacture for improved sputtering performance and process and yield by reducing particulates. The sputtering target is first surface treated to remove oxides, impurities and contaminants. The surface treated target is then covered with a metallic enclosure and, optionally, a passivating barrier layer. The metallic enclosure protects the target surface from direct contact with subsequently employed packaging material such as plastic bags, thereby eliminating sources of organic materials during sputtering operations. The surface treatment of the target removes deformed material, smearing, twins, or burrs and the like from the target surface, reducing "burn-in" or sputter conditioning time prior to production sputtering of thin films.

    摘要翻译: 在目标制造之后对溅射靶进行表面处理和特殊包装,以改善溅射性能和工艺,并通过减少微粒产生收率。 首先对溅射靶进行表面处理以除去氧化物,杂质和污染物。 然后用金属外壳和任选的钝化阻挡层覆盖表面处理的靶。 金属外壳保护目标表面免受与随后使用的包装材料如塑料袋的直接接触,从而在溅射操作期间消除有机材料的来源。 靶的表面处理从目标表面去除变形的材料,涂抹,双胞胎或毛刺等,在薄膜的生产溅射之前减少“老化”或溅射调理时间。

    Safety razor
    72.
    发明授权
    Safety razor 失效
    安全剃须刀

    公开(公告)号:US3950848A

    公开(公告)日:1976-04-20

    申请号:US441007

    申请日:1974-03-18

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: B26B21/22 B26B21/14

    CPC分类号: B26B21/225

    摘要: A safety razor comprising a razor blade support member connected to a handle through a linkage assembly is disclosed. The linkage assembly maintains the angle of the razor blade support member in relation to the handle at substantially a constant angle to prevent the razor blade from moving in a circular path. The razor blade support member is spring biased and retracts responsive to pressure being applied to it by the force during shaving, and maintains the pressure applied by the safety razor upon the face constant. The spring biasing means associated with the linkage assembly may be adjusted to vary the applied pressure.

    摘要翻译: 公开了一种安全剃刀,其包括通过连杆组件连接到手柄的剃刀刀片支撑构件。 连杆组件以大致恒定的角度保持剃刀刀片支撑构件相对于把手的角度,以防止剃刀刀片在圆形路径中移动。 剃刀刀片支撑构件被弹簧偏置并且响应于在剃刮期间的力施加到其上的压力而回缩,并且将由安全剃刀施加的压力保持在面部常数上。 可以调节与连杆组件相关联的弹簧偏压装置以改变施加的压力。

    Actuator for an Automobile
    76.
    发明申请
    Actuator for an Automobile 审中-公开
    汽车执行机构

    公开(公告)号:US20090165387A1

    公开(公告)日:2009-07-02

    申请号:US12226986

    申请日:2007-04-18

    IPC分类号: E05F15/10 E05F15/00

    摘要: An actuator adapted to actuate an element of an automobile, the actuator comprising at least one gear adapted to rotate eccentrically about a central axis during operation of the actuator.

    摘要翻译: 适于致动汽车元件的致动器,所述致动器包括适于在所述致动器的操作期间围绕中心轴线偏心旋转的至少一个齿轮。

    High reflector tunable stress coating, such as for a MEMS mirror

    公开(公告)号:US07420264B2

    公开(公告)日:2008-09-02

    申请号:US11400301

    申请日:2006-04-07

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: H01L23/58

    摘要: An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

    Light condenser
    78.
    发明授权
    Light condenser 有权
    光冷凝器

    公开(公告)号:US07237914B2

    公开(公告)日:2007-07-03

    申请号:US10713842

    申请日:2003-11-14

    申请人: Michael Goldstein

    发明人: Michael Goldstein

    IPC分类号: G02B5/10 G03B27/54

    CPC分类号: G03F7/702 G03B27/42

    摘要: A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illumination on the mask. The reflective surface has a curve segment that includes a section of a parabolic curve that is rotated relative to an optical axis and has a focal point at the light source.

    摘要翻译: 适用于EUV光刻的光聚光器,其包括与光轴同心的反射环。 每个环具有反射表面以反射从光源发出的光线,使得光线朝向掩模会聚,以在掩模上产生Köhler照明。 反射表面具有曲线段,该曲线段包括相对于光轴旋转并且在光源处具有焦点的抛物线曲线的一部分。

    Source multiplexing in lithography
    79.
    发明授权
    Source multiplexing in lithography 失效
    光刻中的光源复用

    公开(公告)号:US07183565B2

    公开(公告)日:2007-02-27

    申请号:US11196570

    申请日:2005-08-02

    IPC分类号: G21G5/00

    CPC分类号: G03F7/7005 G03F7/201

    摘要: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

    摘要翻译: 用于极紫外(EUV)光刻系统的照明系统可以包括多个EUV光源。 当照射面罩时,系统可以组合来自多个源的光。