公开(公告)号：US06933500B2

公开(公告)日：2005-08-23

申请号：US10620958

申请日：2003-07-16

申请人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

发明人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

IPC分类号： H01J37/26 ,  H01J37/05 ,  H01J37/28 ,  H01J27/26

CPC分类号： H01J37/28 ,  H01J37/05 ,  H01J2237/2594

摘要： An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

公开(公告)号：US20050127295A1

公开(公告)日：2005-06-16

申请号：US11052586

申请日：2005-02-07

申请人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

发明人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

IPC分类号： H01J37/26 ,  H01J37/05 ,  H01J37/28 ,  G01N23/00 ,  H01J49/42

CPC分类号： H01J37/28 ,  H01J37/05 ,  H01J2237/2594

摘要： An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

公开(公告)号：US06894790B2

公开(公告)日：2005-05-17

申请号：US10291675

申请日：2002-11-12

申请人： Yasuhiro Mitsui ,  Yasutsugu Usami ,  Isao Kawata ,  Yuya Toyoshima ,  Tadashi Otaka ,  Nobuyuki Iriki

发明人： Yasuhiro Mitsui ,  Yasutsugu Usami ,  Isao Kawata ,  Yuya Toyoshima ,  Tadashi Otaka ,  Nobuyuki Iriki

IPC分类号： G01Q30/04 ,  H01L23/544 ,  G01B11/02

CPC分类号： H01L22/34

摘要： A test pattern formed in a scribe line area of a wafer is irradiated with a light beam to measure the width thereof; the test pattern is irradiated with an electron beam so as to measure the width thereof; an amount of change in the width of the test pattern is calculated; a dummy pattern having the same width as that of a semiconductor device of the wafer is irradiated with an electron beam to measure the width thereof; and the width of a pattern is estimated by the use of the calculated amount of width change so as to determine the shape of the pattern. Thus, a shape measuring system and method capable of determining the shape of a micropattern in a semiconductor device without changing the dimensions of the micropattern can be provided.

摘要翻译： 用光束照射在晶片的划线区域中形成的测试图案，以测量其宽度; 用电子束照射测试图案以测量其宽度; 计算测试图案的宽度的变化量; 用电子束照射具有与晶片的半导体器件相同的宽度的虚拟图案，以测量其宽度; 并且通过使用计算出的宽度变化量来估计图案的宽度，以便确定图案的形状。 因此，可以提供能够在不改变微图案的尺寸的情况下确定半导体器件中的微图案的形状的形状测量系统和方法。

公开(公告)号：US5026995A

公开(公告)日：1991-06-25

申请号：US539810

申请日：1990-06-18

申请人： Eiichi Hazaki ,  Tadashi Otaka ,  Minoru Shimizu

发明人： Eiichi Hazaki ,  Tadashi Otaka ,  Minoru Shimizu

IPC分类号： F16K3/18 ,  H01J37/18

CPC分类号： H01J37/18 ,  F16K3/186 ,  F16K51/02

摘要： In a particle beam surface analyzer, having a partition wall separation a vacuum space, an opening that is provided in a partition wall through which the particle beam is taken out, a seal member which is moved along a seal surface of the seal member and seals the opening, a condenser lens which converges the particle beam onto the sample, and detector for detecting a physical quantity from the sample when the particle beam is irradiated on the sample, the surface analyzer further has a movable shift member that pushes one side surface of the seal member along the seal surface of the seal member and a stopping member which the other side surface of the seal member having a predetermined angle being larger than 55.degree. and smaller than 75.degree. to the seal surface is abutted so as to move the seal member along the other side surface till the seal member reaches the openings, whereby resultant forces between the seal member and the seal surface in the side of the one side surface is equal to that in the side of the other side surface. As the predetermined angle is larger than 55.degree. and smaller than 75.degree. to the seal surface, the abrasion and seizure of the seal member are prevented and the contamination of the sample is lessened.

摘要翻译： 在具有隔壁分离真空空间的分隔壁的粒子束表面分析装置中，设置在分隔壁中的用于取出粒子束的开口，密封构件沿密封构件的密封面移动并密封 开口，将粒子束收敛到样品上的聚光透镜，以及当将粒子束照射在样本上时用于检测来自样品的物理量的检测器，表面分析器还具有将移动部件的一侧表面 所述密封构件沿着所述密封构件的密封面被密封，所述密封构件的与所述密封面大于55度且小于75度的预定角度的另一侧面的止动构件抵接，以使所述密封件 构件沿着另一侧表面直到密封构件到达开口，由此密封构件和侧面中的密封表面之间的结合力等于t o在另一侧表面的一侧。 当预定角度大于55°且小于75°时，密封件的磨损和咬住被阻止，样品的污染减少。