公开(公告)号：US20050167589A1

公开(公告)日：2005-08-04

申请号：US11091660

申请日：2005-03-28

申请人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

发明人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

IPC分类号： H01J37/26 ,  H01J37/05 ,  H01J37/28 ,  H01J40/00 ,  G21K7/00

CPC分类号： H01J37/28 ,  H01J37/05 ,  H01J2237/2594

摘要： An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

摘要翻译： 提供了一种能够以高分辨率观察的电子显微镜。 电子显微镜能够定量地检测电子束相对于狭缝的开口的偏离，从而将电子束精确地移动到狭缝的开口的中心，以执行能量选择。 电子显微镜具有能量过滤器控制单元，用于通过基于由能量过滤器电子束检测器传递的信号移位电子束的位置来调节电子束和狭缝之间的相对位置。 还提供了一种用于控制能量滤波器的方法，其包括以下步骤：移动电子束的位置，确定电子束的位置，并且通过控制电子束的位置使电子束通过狭缝的开口的中心 电子束的狭缝或位置。

公开(公告)号：US06933500B2

公开(公告)日：2005-08-23

申请号：US10620958

申请日：2003-07-16

申请人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

发明人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

IPC分类号： H01J37/26 ,  H01J37/05 ,  H01J37/28 ,  H01J27/26

CPC分类号： H01J37/28 ,  H01J37/05 ,  H01J2237/2594

摘要： An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

公开(公告)号：US20050127295A1

公开(公告)日：2005-06-16

申请号：US11052586

申请日：2005-02-07

申请人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

发明人： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

IPC分类号： H01J37/26 ,  H01J37/05 ,  H01J37/28 ,  G01N23/00 ,  H01J49/42

CPC分类号： H01J37/28 ,  H01J37/05 ,  H01J2237/2594

摘要： An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

公开(公告)号：US08334520B2

公开(公告)日：2012-12-18

申请号：US13124599

申请日：2009-10-22

申请人： Tadashi Otaka ,  Hiroyuki Ito ,  Ryoichi Ishii ,  Manabu Yano ,  Hajime Kawano

发明人： Tadashi Otaka ,  Hiroyuki Ito ,  Ryoichi Ishii ,  Manabu Yano ,  Hajime Kawano

IPC分类号： H01J37/26

CPC分类号： H01J37/20 ,  H01J37/28 ,  H01J2237/20214 ,  H01J2237/2811 ,  H01J2237/2817

摘要： An exemplary a charged particle beam apparatus converts an inspection position on a test sample (wafer coordinate system) to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm and a rotating stage being rotated to be moved for the inspection position on the test sample. In this case, inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism.

摘要翻译： 一种带电粒子束装置的示例将测试样品（晶片坐标系）上的检查位置转换成检查机构（载台坐标系（极坐标系））的设置位置，旋转臂和旋转台旋转为 移动到测试样品上的检查位置。 在这种情况下，检查装置设置在由旋转台的旋转中心旋转的轨迹上。 提供了一种用于计算误差（例如，旋转台的中心偏移）和补偿误差的功能，通过该功能，在装备有双轴旋转平台机构的带电粒子束装置中提高了检查精度。

公开(公告)号：US07659508B2

公开(公告)日：2010-02-09

申请号：US10450852

申请日：2002-03-27

申请人： Osamu Nasu ,  Tadashi Otaka ,  Hiroki Kawada ,  Ritsuo Fukaya ,  Makoto Ezumi

发明人： Osamu Nasu ,  Tadashi Otaka ,  Hiroki Kawada ,  Ritsuo Fukaya ,  Makoto Ezumi

IPC分类号： H01J37/28 ,  G01N23/225

CPC分类号： H01J37/28 ,  G01B15/00 ,  G01N23/225 ,  H01J2237/2814

摘要： The present invention suppresses decreases in the volumes of the patterns which have been formed on the surfaces of semiconductor samples or of the like, or performs accurate length measurements, irrespective of such decreases. In an electrically charged particle ray apparatus by which the line widths and other length data of the patterns formed on samples are to be measured by scanning the surface of each sample with electrically charged particle rays and detecting the secondary electrons released from the sample, the scanning line interval of said electrically charged particle rays is set so as not to exceed the irradiation density dictated by the physical characteristics of the sample. Or measured length data is calculated from prestored approximation functions.

摘要翻译： 本发明抑制在半导体样品的表面上形成的图案的体积减少，或者执行精确的长度测量，而不管这种减少。 在带电粒子射线装置中，通过用带电粒子射线扫描每个样品的表面并检测从样品释放的二次电子，测量在样品上形成的图案的线宽和其它长度数据，扫描 所述带电粒子束的线间隔被设定为不超过由样品的物理特性决定的照射密度。 或者测量的长度数据由预先存储的近似函数计算。

公开(公告)号：US07022983B2

公开(公告)日：2006-04-04

申请号：US10751907

申请日：2004-01-07

申请人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

发明人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

IPC分类号： H01J37/05

CPC分类号： H01J37/05 ,  H01J37/153 ,  H01J37/28

摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

公开(公告)号：US20050006581A1

公开(公告)日：2005-01-13

申请号：US10911480

申请日：2004-08-05

申请人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

发明人： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

IPC分类号： G01B15/00 ,  H01J37/22 ,  H01J37/28 ,  H01L21/66 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/2814

摘要： A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.

摘要翻译： 一种宽度测量方法，用于减少或消除由光束直径尺寸导致的样品宽度测量误差，其中宽度测量对象的宽度测量值已经在 从其上具有待宽度测量对象的样品发射的二次粒子获得的二次信号的基础用相对于束直径的尺寸值的值进行校正。

公开(公告)号：US6114695A

公开(公告)日：2000-09-05

申请号：US307789

申请日：1999-05-10

申请人： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Sadao Terakado ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

发明人： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Sadao Terakado ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

IPC分类号： G01Q30/02 ,  G01B15/00 ,  G01B15/04 ,  G01Q30/04 ,  H01J37/26

CPC分类号： G01B15/00 ,  G01B15/04 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/281

摘要： An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.

摘要翻译： 照射可以透过部分试样并且可以到达不暴露于电子束的部分的电子束，并且基于从照射电子束的部分二次产生的信号获得扫描图像。 在扫描图像上设置尺寸测量开始点和终点，并测量它们之间的尺寸。 假设立方模型，修改立方体模型以匹配扫描图像，并且基于修改的立方体模型进行尺寸测量。

公开(公告)号：US5598002A

公开(公告)日：1997-01-28

申请号：US632664

申请日：1996-03-28

申请人： Hideo Todokoro ,  Tadashi Otaka ,  Tatsuya Maeda ,  Katsuhiro Sasada

发明人： Hideo Todokoro ,  Tadashi Otaka ,  Tatsuya Maeda ,  Katsuhiro Sasada

IPC分类号： H01J37/141 ,  H01J37/20 ,  H01J37/21 ,  H01L21/027 ,  G02B21/18

CPC分类号： H01J37/21 ,  H01J2237/216 ,  H01J2237/2482

摘要： An electron beam apparatus focusses an electron beam onto a specimen by means of an objective magnetic lens. In order to detect changes in the height of the specimen, a laser light beam from a laser source is incident on the specimen and the reflected laser beam is detected by a light detector. Any change in the height of the specimen changes the path of the laser beam to the detector. Therefore, by monitoring the detector, the focussing of the electron beam on the specimen can be controlled by varying the current to an excitation coil of the objective magnetic lens or by moving the specimen via a mounting stage. At least one of the pole pieces of the objective lens is on the opposite side of the path of the laser beam to the source of the electron beam, so that the objective magnetic lens may be close to the specimen, permitting a short focal length. Thus, the laser beam may pass between the pole pieces. An optical microscope may also be provided to permit the specimen to be viewed. The viewing path of the optical microscope extends through an opening in one or both of the pole pieces of the objective magnetic lens.

摘要翻译： 电子束装置通过物镜磁性透镜将电子束聚焦在样本上。 为了检测样品的高度变化，来自激光源的激光束入射到样品上，并且通过光检测器检测反射的激光束。 样品高度的任何变化会改变激光束到检测器的路径。 因此，通过监视检测器，可以通过改变到物镜磁性透镜的激励线圈的电流或通过安装级移动样本来控制电子束在样本上的聚焦。 物镜的极片中的至少一个位于激光束到电子束源的路径的相对侧，使得物镜磁性透镜可能靠近样本，允许短焦距。 因此，激光束可以在极片之间通过。 还可以提供光学显微镜以允许观察样品。 光学显微镜的观察路径延伸穿过物镜磁性透镜的一个或两个极片中的开口。

公开(公告)号：US5412210A

公开(公告)日：1995-05-02

申请号：US160336

申请日：1993-12-02

申请人： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

发明人： Hideo Todokoro ,  Kenji Takamoto ,  Tadashi Otaka ,  Fumio Mizuno ,  Satoru Yamada ,  Katsuhiro Kuroda ,  Ken Ninomiya ,  Tokuo Kure

IPC分类号： G01B15/04 ,  G01Q30/02 ,  G01Q30/04 ,  G01Q30/12 ,  G01Q30/16 ,  G01Q30/18 ,  G01Q70/00 ,  H01J37/28 ,  H01J37/30 ,  H01J37/26

CPC分类号： G01B15/04 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/226 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/281

摘要： A technique for displaying a scanned specimen image permits non-destructive observation of a surface structure having large or precipitous unevenness, an internal structure of a specimen or a specific structure of a defect or foreign matter, which non-destructive observation has hitherto been considered to be difficult to achieve. The technique can be applied to inspection and measurement so as to economically provide devices and parts of high quality and high reliability. Thus, secondary information such as secondary electrons resulting from interaction of primary information with a specimen, the primary information being generated as a result of interaction of a scanning electron beam with the specimen, is utilized as an image signal to form an image.

摘要翻译： 用于显示扫描的样本图像的技术允许对具有大的或陡峭的不均匀性，样本的内部结构或缺陷或异物的特定结构的表面结构进行非破坏性观察，迄今为止已经认为非破坏性观察 难以实现。 该技术可以应用于检测和测量，从而经济地提供高质量和高可靠性的设备和部件。 因此，作为图像信号利用作为扫描电子束与样本的相互作用的结果而生成的主要信息的次要信息，例如由主要信息与样本的相互作用产生的二次电子。