公开(公告)号：US06819401B2

公开(公告)日：2004-11-16

申请号：US10383332

申请日：2003-03-07

申请人： Susumu Tsujikawa ,  Yukio Taniguchi ,  Hirotaka Yamaguchi ,  Masakiyo Matsumura

发明人： Susumu Tsujikawa ,  Yukio Taniguchi ,  Hirotaka Yamaguchi ,  Masakiyo Matsumura

IPC分类号： G03B1328

CPC分类号： G03F7/70058 ,  G03F7/70216 ,  G03F7/70283 ,  G03F7/70358

摘要： An exposure method includes the light incidence step of letting at least a part of light emitted from a light source for exposure use be incident on a mask supported by a supporting device, and the imaging step of forming an image of a mask pattern on a photosensitive material by guiding the reflecting light from the mask such that the photosensitive material supported by the supporting device receives the reflecting light coming from an incidence direction which is different from the incidence direction of the light incident on the mask.

摘要翻译： 曝光方法包括：将从用于曝光的光源发射的光的至少一部分入射到由支撑装置支撑的掩模上的光入射步骤，以及在感光体上形成掩模图案的图像的成像步骤 通过引导来自掩模的反射光使得由支撑装置支撑的感光材料接收来自与入射在掩模上的光的入射方向不同的入射方向的反射光。

公开(公告)号：US08009345B2

公开(公告)日：2011-08-30

申请号：US12962750

申请日：2010-12-08

申请人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Kazufumi Azuma ,  Tomoya Kato ,  Takahiko Endo

发明人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Kazufumi Azuma ,  Tomoya Kato ,  Takahiko Endo

IPC分类号： G02F1/01

CPC分类号： B23K26/066

摘要： A crystallization apparatus includes a light modulation element, and an image forming optical system that forms a light intensity distribution set based on light transmitted through the light modulation element on an irradiation surface. The crystallization apparatus irradiates a non-single crystal semiconductor film with light having the light intensity distribution to generate a crystallized semiconductor film. A curvature radius of at least one isointensity line of a light intensity substantially varies along the isointensity line in the light intensity distribution on the irradiation surface, and a curvature radius of at least a part of the isointensity line has a minimum value of 0.3 μm or below.

摘要翻译： 结晶装置包括光调制元件和形成光学系统，其形成基于在照射表面上透过光调制元件的光的光强度分布。 结晶装置用具有光强度分布的光照射非单晶半导体膜以产生结晶半导体膜。 光强度的至少一个等距线的曲率半径沿着照射面上的光强度分布中的强度线实质上变化，并且至少部分等距线的曲率半径具有0.3μm的最小值或 下面。

公开(公告)号：US20110075237A1

公开(公告)日：2011-03-31

申请号：US12962750

申请日：2010-12-08

申请人： Yukio TANIGUCHI ,  Masakiyo Matsumura ,  Kazufumi Azuma ,  Tomoya Kato ,  Takahiko Endo

发明人： Yukio TANIGUCHI ,  Masakiyo Matsumura ,  Kazufumi Azuma ,  Tomoya Kato ,  Takahiko Endo

IPC分类号： G02F1/01

CPC分类号： B23K26/066

摘要： A crystallization apparatus includes a light modulation element, and an image forming optical system that forms a light intensity distribution set based on light transmitted through the light modulation element on an irradiation surface. The crystallization apparatus irradiates a non-single crystal semiconductor film with light having the light intensity distribution to generate a crystallized semiconductor film. A curvature radius of at least one isointensity line of a light intensity substantially varies along the isointensity line in the light intensity distribution on the irradiation surface, and a curvature radius of at least a part of the isointensity line has a minimum value of 0.3 μm or below.

摘要翻译： 结晶装置包括光调制元件和形成光学系统，其形成基于在照射表面上透过光调制元件的光的光强度分布。 结晶装置用具有光强度分布的光照射非单晶半导体膜以产生结晶半导体膜。 光强度的至少一个等距线的曲率半径沿着照射面上的光强度分布中的强度线实质上变化，并且至少部分等距线的曲率半径具有0.3μm的最小值或 下面。

公开(公告)号：US07897946B2

公开(公告)日：2011-03-01

申请号：US12051213

申请日：2008-03-19

申请人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Kazufumi Azuma ,  Tomoya Kato ,  Takahiko Endo

发明人： Yukio Taniguchi ,  Masakiyo Matsumura ,  Kazufumi Azuma ,  Tomoya Kato ,  Takahiko Endo

IPC分类号： A61N5/00

CPC分类号： B23K26/066

摘要： A crystallization apparatus includes a light modulation element, and an image forming optical system that forms a light intensity distribution set based on light transmitted through the light modulation element on an irradiation surface. The crystallization apparatus irradiates a non-single crystal semiconductor film with light having the light intensity distribution to generate a crystallized semiconductor film. A curvature radius of at least one isointensity line of a light intensity substantially varies along the isointensity line in the light intensity distribution on the irradiation surface, and a curvature radius of at least a part of the isointensity line has a minimum value of 0.3 μm or below.

公开(公告)号：US07751031B2

公开(公告)日：2010-07-06

申请号：US11749488

申请日：2007-05-16

申请人： Yukio Taniguchi ,  Masakiyo Matsumura

发明人： Yukio Taniguchi ,  Masakiyo Matsumura

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03B27/72

摘要： A light application apparatus includes an optical modulation element provided with a plurality of phase steps, a light beam which is entered into the optical modulation element being phase-modulated by the phase steps and exits from the optical modulation element as a light beam having a first light intensity distribution. An optical system is arranged between the optical modulation element and an predetermined plane. The optical system divides the phase-modulated light beam into at least two light fluxes having second and third light intensity distributions and different optical characteristics from each other, and projects a light beam including the divided two light fluxes, the light intensity distributions of the projected light fluxes being combined with each other, so that the projected light beam has a fourth light intensity distribution with an inverse peak shape on the predetermined plane and enters the predetermined plane. The first to fourth light intensity distributions are different from each other on the predetermined plane.

摘要翻译： 一种光应用装置，包括具有多个相位步进的光调制元件，入射到光调制元件中的光束被相位步进相位调制并从光调制元件出射，作为具有第一 光强分布。 光学系统布置在光调制元件和预定平面之间。 光学系统将相位调制光束分成具有第二和第三光强分布和不同光学特性的至少两个光束，并且投影包括分割的两个光束的光束，投影的光强度分布 光束彼此组合，使得投影光束在预定平面上具有反向峰值形状的第四光强分布并进入预定平面。 第一至第四光强分布在预定平面上彼此不同。

公开(公告)号：US20090051843A1

公开(公告)日：2009-02-26

申请号：US12256683

申请日：2008-10-23

申请人： Hirotaka Yamaguchi ,  Masakiyo Matsumura ,  Yukio Taniguchi

发明人： Hirotaka Yamaguchi ,  Masakiyo Matsumura ,  Yukio Taniguchi

IPC分类号： G02F1/1368 ,  H01L29/772

CPC分类号： H01L29/41733 ,  H01L29/66757

摘要： A method of producing a thin film transistor comprises irradiating a resist on a glass base plate with a ray from a light source through a mask and, thereafter, developing the resist to form contact holes, using an i-ray as the ray.

摘要翻译： 一种薄膜晶体管的制造方法，其特征在于，将来自光源的光线通过掩模在玻璃基板上照射抗蚀剂，然后利用i射线作为光线照射抗蚀剂，形成接触孔。

公开(公告)号：US07361221B2

公开(公告)日：2008-04-22

申请号：US11210863

申请日：2005-08-25

申请人： Masakiyo Matsumura ,  Yukio Taniguchi

发明人： Masakiyo Matsumura ,  Yukio Taniguchi

IPC分类号： C30B25/00

CPC分类号： H01L21/02678 ,  B23K26/064 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/123 ,  G03F1/34 ,  H01L21/2026 ,  H01L27/1285 ,  H01L27/1296 ,  Y10T117/1004

摘要： A light irradiation apparatus includes a light modulation element which has a phase modulation area having at least one basic pattern for modulating a light beam, an illumination system which illuminates the phase modulation area of the light modulation element with a light beam, and an image formation optical system which causes a light beam on an irradiation target surface a light intensity distribution having an inverse-peak-shaped pattern formed based on the light beam phase-modulated by the phase modulation element to fall on an irradiation target object. Dimensions of the basic pattern are not greater than a point spread function range of the image formation optical system converted in terms of the light modulation element. The phase modulation area is configured in such a manner that a phase distribution in a light complex amplitude distribution on the irradiation target surface becomes a saw-tooth-like distribution along a line segment in a lateral direction.

摘要翻译： 光照射装置包括光调制元件，该调制元件具有至少一个用于调制光束的基本图案的相位调制区域，照射光调制元件的相位调制区域的照明系统和图像形成 光学系统，其使得在照射目标表面上的光束具有基于由相位调制元件相位调制的光束形成的具有反峰形图案的光强度分布落在照射目标对象上。 基本图案的尺寸不大于根据光调制元件转换的图像形成光学系统的点扩散功能范围。 相位调制区域被配置为使得照射目标表面上的光复数振幅分布中的相位分​​布沿着横向方向的线段变成锯齿状分布。

公开(公告)号：US07347897B2

公开(公告)日：2008-03-25

申请号：US11098647

申请日：2005-04-05

申请人： Tomoya Kato ,  Masakiyo Matsumura ,  Yukio Taniguchi

发明人： Tomoya Kato ,  Masakiyo Matsumura ,  Yukio Taniguchi

IPC分类号： C30B35/00

CPC分类号： C30B1/00 ,  C30B13/24 ,  Y10T117/1004

摘要： A crystallization apparatus of the present invention irradiates a non-single-crystal semiconductor film with a luminous flux having a predetermined light intensity distribution to crystallize the film, and comprises a phase modulation device comprising a plurality of unit areas which are arranged in a certain period and which mutually have substantially the same pattern, and an optical image forming system disposed between the phase modulation device and the non-single-crystal semiconductor film. The unit area of the phase modulation device has a reference face having a certain phase, a first area disposed in the vicinity of a center of each unit area and having a first phase difference with respect to the reference face, and a second area disposed in the vicinity of the first area and having substantially the same phase difference as that of the first phase difference with respect to the reference face.

摘要翻译： 本发明的结晶装置用具有预定的光强度分布的光通量照射非单晶半导体膜，使薄膜结晶化，并且包括相位调制装置，该相位调制装置包括在一定时间内排列的多个单位区域 并且相互具有基本相同的图案，以及设置在相位调制装置和非单晶半导体膜之间的光学图像形成系统。 相位调制装置的单位面积具有一定的相位的基准面，设置在各单位面积的中心附近的第一区域，相对于基准面具有第一相位差，第二区域设置在 第一区域的附近并且具有与第一相位差相对于基准面大致相同的相位差。

公开(公告)号：US20060240604A1

公开(公告)日：2006-10-26

申请号：US11397925

申请日：2006-04-03

申请人： Hirotaka Yamaguchi ,  Masakiyo Matsumura ,  Yukio Taniguchi

发明人： Hirotaka Yamaguchi ,  Masakiyo Matsumura ,  Yukio Taniguchi

IPC分类号： H01L21/84 ,  H01L21/00

CPC分类号： H01L29/41733 ,  H01L29/66757

摘要： A method of producing a thin film transistor comprises irradiating a resist on a glass base plate with a ray from a light source through a mask and, thereafter, developing the resist to form contact holes, using an i-ray as the ray.

摘要翻译： 一种薄膜晶体管的制造方法，其特征在于，将来自光源的光线通过掩模在玻璃基板上照射抗蚀剂，然后利用i射线作为光线照射抗蚀剂，形成接触孔。

公开(公告)号：US07063478B2

公开(公告)日：2006-06-20

申请号：US10692798

申请日：2003-10-27

申请人： Yukio Taniguchi ,  Masakiyo Matsumura

发明人： Yukio Taniguchi ,  Masakiyo Matsumura

IPC分类号： G01F9/00

CPC分类号： H01L29/66757 ,  G03F7/00 ,  Y10T403/13

摘要： A crystallization apparatus includes a mask and an illumination system which illuminates the mask with a light beam, the light beam from the illumination system becoming a light beam having a light intensity distribution with an inverse peak pattern when transmitted through the mask, and irradiating a polycrystal semiconductor film or an amorphous semiconductor film, thereby generating a crystallized semiconductor film. The mask includes a light absorption layer having light absorption characteristics according to the light intensity distribution with the inverse peak pattern.

摘要翻译： 结晶装置包括掩模和用光束照射掩模的照明系统，当透射通过掩模时，来自照明系统的光束成为具有反峰值图案的光强度分布的光束，并且照射多晶体 半导体膜或非晶半导体膜，从而生成结晶半导体膜。 掩模包括具有根据具有反峰值图案的光强度分布的光吸收特性的光吸收层。