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公开(公告)号：US08842284B2
公开(公告)日：2014-09-23
申请号：US13357222
申请日：2012-01-24
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
CPC分类号： G02B5/08 , F21V7/00 , G02B17/0663 , G03F7/70233
摘要： A magnifying imaging optical unit has at least four mirrors to image an object field in an object plane into an image field in an image plane. An absolute value of the Petzval radius of the image field is greater than 500 mm. The imaging optical unit can be used to inspect with sufficient imaging quality relatively large mask sections of lithography masks used during projection exposure to produce large scale integrated semiconductor components.
摘要翻译： 放大成像光学单元具有至少四个镜，用于将物平面中的物场映像成像平面中的图像场。 图像场的Petzval半径的绝对值大于500 mm。 成像光学单元可以用于以足够的成像质量来检查在投影曝光期间使用的光刻掩模的相对较大的掩模部分以产生大规模集成半导体部件。
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公开(公告)号：US08810903B2
公开(公告)日：2014-08-19
申请号：US13481431
申请日：2012-05-25
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G02B17/06 , G03F7/24 , H01L21/027
CPC分类号： G03F7/702 , G02B17/06 , G02B17/0647 , G02B17/0663 , G03F7/70191 , G03F7/70233
摘要： The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The disclosure also generally relates to projection exposure installations that include such imaging optical systems, methods of using such projection exposure installations, and components made by such methods.
摘要翻译： 本发明一般涉及成像光学系统，其包括多个反射镜，其对位于像平面中的图像场中的物体平面中的物体场进行成像，其中至少一个反射镜具有用于成像光的通孔 通过 本公开还通常涉及包括这种成像光学系统的投影曝光装置，使用这种投影曝光装置的方法以及由这些方法制成的部件。
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公开(公告)号：US08643824B2
公开(公告)日：2014-02-04
申请号：US13045723
申请日：2011-03-11
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
CPC分类号： G03F7/702 , G02B17/0848 , G02B17/0892 , G03F7/70225 , G03F7/70275
摘要： A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by such methods, are disclosed.
摘要翻译： 一种用于微光刻的投影光学器件，其将物平面中的物场成像为图像平面中的图像场，其中所述投影光学器件包括至少一个弯曲镜，并且包括至少一个折射子单元以及相关系统， 公开了通过这些方法制备的方法和产品。
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公开(公告)号：US08629972B2
公开(公告)日：2014-01-14
申请号：US12884670
申请日：2010-09-17
CPC分类号： G03F7/70316 , G02B17/0663 , G03F7/702 , G03F7/70233
摘要： A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.
摘要翻译： 用于微光刻的投影物镜用于将物平面中的物体场成像到图像平面中的图像场中。 投影物镜包括至少六个反射镜，其中至少一个反射镜具有自由形反射表面。 投影物镜的总长（T）与物体像偏移（dOIS）之间的比例可以小于12.像平面是物平面下游的投影物镜的第一场平面。 投影物镜可以具有多个反射镜，其中总长度（T）和物体图像偏移（dOIS）之间的比率小于2。
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公开(公告)号：US08436985B2
公开(公告)日：2013-05-07
申请号：US13479768
申请日：2012-05-24
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译： 本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。 投影装置包括反射元件，通过该反射元件定义光线路径。 光束路径中的光瞳组合停止。 组合止动件具有用作孔径光阑的第一开口（孔口）。 组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。 此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。
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公开(公告)号：US08363315B2
公开(公告)日：2013-01-29
申请号：US11578101
申请日：2005-04-07
IPC分类号： G02B17/00
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. The mirror group entry is positioned in a region where radiation exiting the front lens group has an entry chief ray height. A second reflecting area is positioned in a region where radiation impinging on the second mirror has a second chief ray height deviating from the entry chief ray height in a first direction; and a fourth reflecting area is positioned in a region where radiation impinging on the fourth mirror has a fourth chief ray height deviating from the entry chief ray height in a second direction opposite to the first direction.
摘要翻译： 用于将布置在投影物镜的物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场的反射折射投射物镜具有前透镜组，包括四个反射镜的镜组和 具有物体侧反射镜组入口，图像侧反射镜组出口和反射镜组平面，其横向于光轴对准并且几何地布置在反射镜组入口和反射镜组出口之间; 和后透镜组。 反射镜组的镜子被布置成使得至少一个中间图像位于反射镜组入口和反射镜组出口之间的反射镜组内，并且来自镜组入口的辐射至少穿过镜组平面四次， 在镜组出口处离开镜组之前，在镜组的凹面镜面上反射至少两次。 反射镜组入口位于离开前透镜组的辐射具有入射主光线高度的区域中。 第二反射区域位于辐射入射在第二反射镜上的第一主光线高度偏离第一方向上的入射光线高度的区域中; 并且第四反射区域位于与第一反射镜相反的第二方向上具有偏离入射光线高度的第四主光线高度的入射在第四反射镜上的辐射区域。
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公开(公告)号：US20120236272A1
公开(公告)日：2012-09-20
申请号：US13479768
申请日：2012-05-24
IPC分类号： G03B27/32
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译： 本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。 投影装置包括反射元件，通过该反射元件定义光线路径。 光束路径中的光瞳组合停止。 组合止动件具有用作孔径光阑的第一开口（孔口）。 组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。 此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。
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公开(公告)号：US20120147347A1
公开(公告)日：2012-06-14
申请号：US13326516
申请日：2011-12-15
申请人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
发明人： Hans-Juergen Mann , Johannes Zellner , Aurelian Dodoc , Marco Pretorius , Christoph Menke , Wilhelm Ulrich , Martin Endres
CPC分类号： G02B17/0663 , G02B27/0905 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.
摘要翻译： 成像光学系统具有多个反射镜，其将物平面中的对象场成像到图像平面中的图像场。 至少一个反射镜的反射面构成为不能用旋转对称的功能描述的自由表面。 物体场的纵横比大于1.物体场的最小和最大横向尺寸的比可以小于0.9。
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公开(公告)号：US08194230B2
公开(公告)日：2012-06-05
申请号：US11949376
申请日：2007-12-03
申请人： Danny Chan , Hans-Juergen Mann
发明人： Danny Chan , Hans-Juergen Mann
CPC分类号： G03F7/70958 , G02B5/0891 , G03F7/70233 , G03F7/70891
摘要： An optical system has a plurality of elements arranged to image radiation at a wavelength λ from an object surface to an image surface, the elements include mirror elements having a reflective surface positioned at a path of radiation. At least one of the mirror elements is a pupil mirror having a pupil mirror surface arranged at or near to a pupil surface of the optical system. At least one of the remaining mirror elements is a highly loaded mirror having a mirror surface arranged at a position where at least one of a largest value of a range of angles of incidence and a largest value of an average angle incidence of all remaining mirrors occurs, where the remaining mirrors include all mirrors except for the pupil mirror. The pupil mirror surface is formed by a reflective coating designed as a one-dimensionally graded coating including a multilayer stack of layers of different materials, the layers having a geometrical layer thickness which varies according to a first grading function in a first direction of the coating and which is substantially constant in a second direction perpendicular to the first direction. The mirror surface of the highly loaded mirror is coated with a reflective mirror coating designed as a graded coating according to a second grading function.
摘要翻译： 光学系统具有多个元件，其被布置成将从波长λ的从物体表面到图像表面的辐射成像，所述元件包括具有位于辐射路径的反射表面的反射镜元件。 镜元件中的至少一个是具有布置在光学系统的光瞳表面处或附近的光瞳镜表面的光瞳镜。 剩余镜像元件中的至少一个是高负载镜，其具有布置在其中入射角范围的最大值和所有剩余镜的平均入射角的最大值中的至少一个的镜面 发生，剩下的镜子包括除了瞳孔镜子之外的所有镜子。 瞳孔镜表面由反射涂层形成，反射涂层被设计为一维梯度涂层，其包括不同材料层的多层堆叠，所述层具有根据涂层第一方向上的第一分级功能而变化的几何层厚度 并且在垂直于第一方向的第二方向上基本恒定。 高负载镜的镜面涂覆有根据第二分级功能设计为渐变涂层的反射镜涂层。
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80.发明申请IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS 有权成像光学和投影曝光安装用于成像光学的微观算法公开(公告)号：US20120008125A1
公开(公告)日：2012-01-12
申请号：US13218962
申请日：2011-08-26
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
CPC分类号： G03F7/70233 , G02B17/0652 , G02B17/0657
摘要： An imaging optics has at least six mirrors, which image an object field in an object plane in an image field in an image plane. An entry pupil of the imaging optics is arranged in the imaging beam path in front of the object field. At least one of the mirrors has a through-opening for the passage of imaging light. A mechanically accessible pupil, in which an obscuration stop is arranged for the central shading of the pupil of the imaging optics, is located in a pupil plane in the imaging beam path between the object field and a first of the through-openings. A first imaging part beam directly after a second mirror in the imaging beam path after the object field and a second imaging part beam directly after a fourth mirror in the imaging beam path after the object field intersect one another in an intersection region. The result is an imaging optics, in which a handleable combination of small imaging errors, manageable production and a good throughput for the imaging light is achieved.
摘要翻译： 成像光学器件具有至少六个反射镜，其在图像平面中的图像场中对物体平面中的物体场进行成像。 成像光学器件的入射光瞳被布置在物场前方的成像光束路径中。 至少一个反射镜具有用于成像光通过的通孔。 设置有用于成像光学器件的瞳孔的中心阴影的遮挡止挡件的机械可访问的瞳孔位于物场和第一通孔之间的成像光束路径中的光瞳平面中。 第一成像部分直接在物场之后的成像光束路径中的第二反射镜之后，以及在物场在交叉区域中彼此相交之后，直接在成像光束路径中的第四镜之后的第二成像部分光束。 结果是成像光学器件，其中实现了成像光的小成像误差，可管理生产和良好生产量的可处理组合。
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