公开(公告)号：US6059887A

公开(公告)日：2000-05-09

申请号：US54511

申请日：1998-04-03

申请人： Hisashi Muraoka ,  Hiroshi Tomita ,  Soichi Nadahara ,  Norio Kobayashi

发明人： Hisashi Muraoka ,  Hiroshi Tomita ,  Soichi Nadahara ,  Norio Kobayashi

IPC分类号： H01L21/304 ,  H01L21/322 ,  C03C23/00

CPC分类号： H01L21/3221

摘要： A process of cleaning the interior of a semiconductor substrate containing metallic impurities therein is provided. The semiconductor substrate is heated, with one side or the both sides thereof being in contact with a melt of a metal or an inorganic salt, at a high temperature such that the melt does not react with these semiconductor and the semiconductor is not melted. By this process, the impurities present inside the substrate are removed out of the substrate and the interior thereof is cleaned.

摘要翻译： 提供了清洗其中含有金属杂质的半导体衬底的内部的工艺。 加热半导体衬底，其一侧或其两侧在高温下与金属或无机盐的熔体接触，使得熔体不与这些半导体反应，并且半导体不熔化。 通过该处理，存在于基板内的杂质从基板中除去，其内部被清洁。

公开(公告)号：US6054373A

公开(公告)日：2000-04-25

申请号：US6996

申请日：1998-01-14

申请人： Hiroshi Tomita ,  Hisashi Muraoka ,  Ryuji Takeda

发明人： Hiroshi Tomita ,  Hisashi Muraoka ,  Ryuji Takeda

IPC分类号： H01L21/304 ,  H01L21/00 ,  H01L21/322

CPC分类号： H01L21/67057 ,  H01L21/3221

摘要： A method of removing metallic impurities diffused in a semiconductor substrate, comprising, the semiconductor-substrate-heating step of heating a semiconductor substrate to at least 200.degree. C. or higher and promoting the release and rediffusion of metallic impurities diffused in the semiconductor substrate, and the metallic-impurity-removing step of dissolving the metallic impurities arrived at the surface of the semiconductor substrate with a chemical agent and removing them from the substrate.

摘要翻译： 一种去除在半导体衬底中扩散的金属杂质的方法，包括将半导体衬底加热到​​至少200℃或更高并促进在半导体衬底中扩散的金属杂质的释放和再扩散的半导体衬底加热步骤， 以及金属杂质去除步骤，用金属杂质去除步骤，用化学试剂将金属杂质溶解到半导体衬底的表面，并将其从衬底上除去。

公开(公告)号：US5958552A

公开(公告)日：1999-09-28

申请号：US606971

申请日：1996-02-26

申请人： Masayuki Fukuda ,  Hiroshi Tomita

发明人： Masayuki Fukuda ,  Hiroshi Tomita

IPC分类号： C08J5/18 ,  B29C55/02 ,  B29K67/00 ,  B29L9/00 ,  B32B27/20 ,  B32B27/36 ,  B41M5/52 ,  C08J7/04 ,  C08K7/16 ,  C08L67/00 ,  C08L67/02 ,  C08L71/00 ,  C08L71/02 ,  C09D167/02 ,  B32B27/08 ,  B32B27/18

CPC分类号： C08J7/047 ,  B32B27/20 ,  B32B27/36 ,  B41M5/506 ,  B41M5/508 ,  C09D167/025 ,  C08J2367/02 ,  C08J2467/00 ,  Y10T428/24355 ,  Y10T428/24802 ,  Y10T428/24893 ,  Y10T428/254 ,  Y10T428/31786

摘要： A laminated film comprising (A) an aromatic polyester film; and (B) a hydrophilic coating layer which is present on at least one side of the aromatic polyester film (A) and has a surface energy of at least 54 dyne/cm, the coating layer comprising (a) 50 to 80% by weight of a copolyester which contains a dicarboxylic acid component having a sulfonate group in an amount of 1 to 16 mol % of the total of all dicarboxylic acid components and has a secondary transition point of 20 to 90.degree. C., (b) 10 to 30% by weight of poly(alkylene oxide) homopolymer having a number average molecular weight of 600 to 2,000, and (c) 3 to 25% by weight of fine particles having an average particle diameter of 20 to 80 nm, based on the total of components (a), (b) and (c). The above laminated film is useful as a transparency for an overhead projector and a recording paper for an ink jet printer.

摘要翻译： 一种层压膜，其包含（A）芳族聚酯膜; 和（B）亲水性涂层，其存在于芳族聚酯膜（A）的至少一侧上并具有至少54达因/厘米的表面能，所述涂层包含（a）50至80重量％ 的共聚酯，其含有具有磺酸盐基的二羧酸成分，其量为所有二羧酸成分总量的1〜16摩尔％，二次转变点为20〜90℃，（b）10〜30 重量的数均分子量为600〜2,000的聚（环氧烷）均聚物，和（c）3〜25重量％的平均粒径为20〜80nm的微粒，基于 组分（a），（b）和（c）。 上述层合膜可用作高架投影仪的透明体和用于喷墨打印机的记录纸。

公开(公告)号：US5817174A

公开(公告)日：1998-10-06

申请号：US764591

申请日：1996-12-13

申请人： Hiroshi Tomita ,  Mami Takahashi

发明人： Hiroshi Tomita ,  Mami Takahashi

IPC分类号： C30B33/00 ,  C30B33/08

CPC分类号： C30B29/06 ,  C30B33/00 ,  Y10S117/913 ,  Y10S438/924

摘要： A method of treating a semiconductor substrate, which comprises the steps of subjecting a surface of the semiconductor substrate to an annealing treatment, performing an etching treatment of the surface of the semiconductor substrate under a condition where the semiconductor substrate is substantially prevented from being etched and a precipitate exposed from the surface of the semiconductor substrate is selectively etched away, and forming a monocrystalline film of a semiconductor material constituting the semiconductor substrate on the surface of the semiconductor substrate.

公开(公告)号：US5539909A

公开(公告)日：1996-07-23

申请号：US444385

申请日：1995-05-19

申请人： Tetsuo Tanaka ,  Hiroshi Tomita ,  Yasutaka Yamaguchi

发明人： Tetsuo Tanaka ,  Hiroshi Tomita ,  Yasutaka Yamaguchi

IPC分类号： G06F9/40 ,  G06F9/44 ,  G06F9/46 ,  G06F17/21

CPC分类号： G06F9/547

摘要： In a system allowing an application program (client) to call a procedure of another application program (server), when the client requests the server to supply a procedure call syntax, the server writes the procedure call syntax in a link management table. Thereafter, when the client searches the procedure call syntax from the link management table and calls the procedure, the server executes the procedure. Upon request of the procedure call, the server writes the procedure name and argument list specific to the server in the link management record. It is therefore unnecessary to consider the procedure call method when the client makes application programs.

摘要翻译： 在允许应用程序（客户机）调用另一应用程序（服务器）的过程的系统中，当客户端请求服务器提供过程调用语法时，服务器将过程调用语法写入链接管理表。 此后，当客户端从链接管理表搜索过程调用语法并调用过程时，服务器执行该过程。 根据过程调用的要求，服务器将链接管理记录中的服务器特有的过程名称和参数列表写入。 因此，当客户端进行应用程序时，不必考虑过程调用方法。

公开(公告)号：US5496688A

公开(公告)日：1996-03-05

申请号：US318712

申请日：1994-10-12

申请人： Hiroshi Okamoto ,  Kohtaro Katoh ,  Hiroshi Tomita ,  Kenji Suzuki ,  Kazuyoshi Saitoh

发明人： Hiroshi Okamoto ,  Kohtaro Katoh ,  Hiroshi Tomita ,  Kenji Suzuki ,  Kazuyoshi Saitoh

IPC分类号： G03C1/795 ,  G03C1/81 ,  G03C3/02

CPC分类号： G03C1/7954 ,  G03C1/795 ,  G03C2200/10 ,  Y10S428/913 ,  Y10T428/24372 ,  Y10T428/2495 ,  Y10T428/31786

摘要： A base film for a photographic film, wherein (a) the refractive index (nz) in the thickness direction is at least 1.498, (b) the haze value is 2.0% or less, (c) the base film has one direction in which the tan.delta. value, at 80.degree. C. by tensile viscoelasticity at 0.05 Hz, is 0.09 or less, (d) the anti-curling ratio at 70.degree. C. is at least 45%, (e) the thickness is in the range of from 40 to 120 .mu.m, and (f) the base film is formed from polyethylene-2,6-naphthalendedicarboxylate as a substantial raw material. This base film has various performances such as anti-curling properties, transparency and lubricity, suitable for use in a photographic film.

摘要翻译： PCT No.PCT / JP94 / 00181 Sec。 371日期：1994年10月12日 102（e）日期1994年10月12日PCT 1994年2月7日提交PCT公布。 第WO94 / 19722号公报 日本1994年9月1日。照相胶片用基膜，其中，（a）厚度方向的折射率（nz）为1.498以上，（b）雾度值为2.0％以下，（c） 基膜的一个方向是在0.05℃下通过拉伸粘弹性在80℃下的tanδ值为0.09以下，（d）70℃下的抗翘曲比例至少为45％，（e ），厚度在40〜120μm的范围内，（f）由聚2,6-萘二甲酸乙二醇酯作为基本原料形成基膜。 该基膜具有各种性能，如抗卷曲性，透明性和润滑性，适用于摄影胶片。

公开(公告)号：US5210863A

公开(公告)日：1993-05-11

申请号：US473818

申请日：1990-02-02

申请人： Hiroshi Tomita

发明人： Hiroshi Tomita

IPC分类号： G06F12/16 ,  G06F11/00 ,  G11C29/48

CPC分类号： G06F11/0751 ,  G06F11/0724 ,  G11C29/48

摘要： A multi-processor system wherein two processors are connected through a dual port memory which receives from one of the processors an interruption request signal together with the data to be transmitted to the other processor. The dual port memory then generates an interrupt signal for the other processor so that the other processor can fetch the data from the dual port memory using an interrupt procedure. The one processor also receives the interrupt signal transmitted by the dual port memory in order to confirm the status of the interrupt signal generating function of the dual port memory.

摘要翻译： 一种多处理器系统，其中两个处理器通过双端口存储器连接，双端口存储器从处理器中的一个接收中断请求信号以及要发送到另一个处理器的数据。 双端口存储器然后为另一个处理器生成中断信号，以便另一个处理器可以使用中断程序从双端口存储器中获取数据。 一个处理器还接收双端口存储器发送的中断信号，以确认双端口存储器的中断信号产生功能的状态。

公开(公告)号：US4728967A

公开(公告)日：1988-03-01

申请号：US799987

申请日：1985-11-20

申请人： Hiroshi Tomita ,  Michio Kunimitsu ,  Junji Maeda

发明人： Hiroshi Tomita ,  Michio Kunimitsu ,  Junji Maeda

IPC分类号： B41J11/02 ,  B41J11/04 ,  B41J15/16 ,  G01D15/24

CPC分类号： B41J15/165 ,  B41J11/04

摘要： A recording apparatus and, more particularly, a so-called thermal printer employs a thermal head as a recording head. A platen roller is in pressing engagement with the recording head and recording elements pass between the two. Biasing forces exerted on opposite ends of the recording head cause it to deform slightly. To accommodate for this deformation, the diameter of the platen roller is greater in the middle than at its opposite ends. This construction assures that both the recording head and the platen roller are pressed against each other under a uniform force, so that ink density irregularity on the recording paper, creasing of the recording paper and the ink sheet, and recording density irregularity resulting therefrom can be prevented, and thus stable recording performance can be assured.

摘要翻译： 更具体地说，一种记录装置，所谓的热敏打印机采用热敏打印头作为记录头。 压辊与记录头压接，记录元件在两者之间通过。 施加在记录头的两端的偏压力会使其稍微变形。 为了适应这种变形，压印辊的直径在中间比在其相对端更大。 这种结构确保了记录头和压纸辊在均匀的力下彼此压靠，使得记录纸上的墨浓度不均匀，记录纸和油墨片的压痕以及由此产生的记录密度不均匀可以是 从而可以确保记录性能的稳定。

公开(公告)号：US4647030A

公开(公告)日：1987-03-03

申请号：US654672

申请日：1984-09-26

申请人： Hiroshi Tomita

发明人： Hiroshi Tomita

IPC分类号： B65H3/56 ,  B65H1/26 ,  B65H3/06 ,  B65H3/46 ,  B65H3/52 ,  G03G15/00 ,  B65H3/30

CPC分类号： B65H1/266 ,  B65H3/06 ,  B65H3/46 ,  B65H2301/331 ,  B65H2511/10

摘要： A paper feed apparatus includes, in a cassette, a separation plate mounted upright so that it is positioned close to a feed roller slightly forward thereof in the direction of paper feed, and an upper guide plate mounted so that it is positioned above a stack of papers being fed and at a level about even with the upper end of the separation plate when the forward end of the upper guide plate is pivotably moved downward. A guide plate, the position of which is adjustable according to the size of papers, partially guides the papers at one side thereof as seen in paper feed direction.

摘要翻译： 供纸装置在盒式磁带中包括直立安装的分离板，使得其在进纸方向上位于其稍微向前的进料辊附近，以及安装成使其位于一堆 当上引导板的前端可向下移动时，纸张被馈送并且处于与分隔板的上端大致均匀的水平。 导纸板的位置根据纸张尺寸可调，可以在进纸方向看到的一侧部分地引导纸张。

公开(公告)号：US09364904B2

公开(公告)日：2016-06-14

申请号：US14128292

申请日：2011-07-05

申请人： Jiro Osawa ,  Tasuku Itoh ,  Shigetoshi Ukei ,  Hiroshi Tomita

发明人： Jiro Osawa ,  Tasuku Itoh ,  Shigetoshi Ukei ,  Hiroshi Tomita

IPC分类号： B23C5/10

CPC分类号： B23C5/10 ,  B23C2210/0492 ,  B23C2210/204 ,  B23C2210/241 ,  B23C2210/282 ,  B23C2210/405 ,  Y10T407/1946 ,  Y10T407/1948 ,  Y10T407/1954

摘要： A variable lead end mill has a plurality of peripheral cutting edges with different helix angles, the variable lead end mill having a flute bottom diameter of a plurality of helix flutes making up rake faces of the plurality of the peripheral cutting edges, the flute bottom diameter increasing in an axial direction from a tool tip toward a shank.

摘要翻译： 可变铅端铣刀具有多个具有不同螺旋角的周边切削刃，该可变前端铣刀具有构成多个外围切削刃的前刀面的多个螺旋槽纹的凹槽底部直径，凹槽底部直径 从工具尖端朝向柄部沿轴向方向增加。