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136 条记录 (耗时 0.058 秒)

    Optical element, jig for holding optical element, and apparatus including optical element
    71.
    发明授权
    Optical element, jig for holding optical element, and apparatus including optical element 失效
    光学元件，用于保持光学元件的夹具，以及包括光学元件的装置

    公开(公告)号：US06337773B1

    公开(公告)日：2002-01-08

    申请号：US09099146

    申请日：1998-06-18

    申请人： Kenji Kawano ,  Tsukasa Uehara ,  Seiji Iida

    发明人： Kenji Kawano ,  Tsukasa Uehara ,  Seiji Iida

    IPC分类号： G02B300

    CPC分类号： G02B17/086 ,  G02B17/0848

    摘要： An optical element is provided that allows accurate measurement of the shapes of the element and its surfaces which light is bound to strike, a jig is provided for holding the optical element, and an apparatus such as an image pickup apparatus or display apparatus is provided which includes the optical element. This optical element is characterized in that it includes surfaces which light is bound to strike and reference portions indicating the reference positions of the shapes of the surfaces, and the reference portions have curved surfaces defining points corresponding to the reference positions.

    摘要翻译： 提供一种光学元件，其允许精确测量光束被撞击的元件及其表面的形状，提供用于保持光学元件的夹具，并且提供诸如图像拾取装置或显示装置的装置，其中 包括光学元件。 该光学元件的特征在于，其包括光被束缚的表面和指示表面的形状的参考位置的参考部分，并且参考部分具有限定对应于参考位置的点的弯曲表面。

    Heating device, method for evaluating heating device and pattern forming method
    72.
    发明授权
    Heating device, method for evaluating heating device and pattern forming method 失效
    加热装置，加热装置的评价方法和图案形成方法

    公开(公告)号：US06191397B1

    公开(公告)日：2001-02-20

    申请号：US09345749

    申请日：1999-07-01

    申请人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

    发明人： Kei Hayasaki ,  Shinichi Ito ,  Kenji Kawano

    IPC分类号： H01L21205

    CPC分类号： H01L21/67115 ,  G03F7/168 ,  G03F7/38

    摘要： A heating apparatus for performing heat treatment on a wafer applied with a resist before or after exposure includes a heating plate for heating a wafer which is placed on the heating plate, a light intensity detecting apparatus for irradiating light on the wafer to detect intensity of reflected light from the resist on the wafer, and a control section for controlling heating performed by the heating plate on the basis of the detected intensity of reflected light so that heating amount applied to a plurality of wafers becomes constant. Accordingly, the heating amount of the wafer can be controlled to be constant and variations in dimension of resist patterns can be reduced.

    摘要翻译： 用于在曝光前后施加抗蚀剂的晶片上进行热处理的加热装置包括用于加热放置在加热板上的晶片的加热板，用于在晶片上照射光以检测反射的强度的光强度检测装置 来自晶片上的抗蚀剂的光，以及控制部分，用于根据检测到的反射光强度控制由加热板进行的加热，使得施加到多个晶片的加热量变得恒定。 因此，可以将晶片的加热量控制为恒定，并且可以减小抗蚀剂图案的尺寸变化。

    Light exposure mask
    74.
    发明授权
    Light exposure mask 失效
    曝光面膜

    公开(公告)号：US6030729A

    公开(公告)日：2000-02-29

    申请号：US79170

    申请日：1998-05-15

    申请人： Shinichi Ito ,  Kenji Kawano ,  Satoshi Tanaka

    发明人： Shinichi Ito ,  Kenji Kawano ,  Satoshi Tanaka

    IPC分类号： G03F1/30 ,  G03F1/68 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F1/30 ,  G03F1/26

    摘要： Attention is paid to the shifting of a focal point depth due to an interference between some light penetrating even a light shielding film, that is, a light shielding film having a nonzero transmittance, and light passing through an opening. Study has been made about how both the transmittance of the light shielding film and the phase difference between the light penetrating the light shielding film and light passing through a light transmitting medium the same in thickness as the light shielding film vary, arriving at a conclusion that the broadest focal point tolerance can be obtained if a phase difference of substantially n.multidot..pi. (n: an positive integer) exists between light penetrating the light shielding film and light passing through the light transmitting medium.

    摘要翻译： 注意由于一些穿透即使是遮光膜的光，即具有非零透射率的遮光膜和穿过开口的光之间的干涉也导致焦点深度偏移。 已经研究了遮光膜的透射率以及透过遮光膜的光和穿过光透射介质的光的厚度与遮光膜的厚度相同的相位差是如何变化的，得出如下结论： 如果穿透遮光膜的光与通过光传输介质的光之间存在基本上nx pi（n：正整数）的相位差，则可以获得最宽的焦点公差。

    Information processing apparatus with a software protecting function
    75.
    发明授权
    Information processing apparatus with a software protecting function 失效
    具有软件保护功能的信息处理设备

    公开(公告)号：US5995623A

    公开(公告)日：1999-11-30

    申请号：US791486

    申请日：1997-01-27

    申请人： Kenji Kawano ,  Masahiro Taguchi ,  Kazuo Saito

    发明人： Kenji Kawano ,  Masahiro Taguchi ,  Kazuo Saito

    IPC分类号： H04L9/08 ,  G06F1/00 ,  G06F12/14 ,  G06F21/00 ,  G06F21/24 ,  G09C1/00 ,  H04L9/14 ,  H04L9/00 ,  H04K1/10 ,  H04L9/16

    CPC分类号： G06F21/10

    摘要： The present invention provides an information processing apparatus which comprises separating means for separating inputted data into identification data and data to be encrypted, determination means for determining an encryption method specified by a combination of an encryption key and an encryption algorithm in accordance with the identification data separated by the separating means, encryption means for encrypting the data to be encrypted by utilizing the encryption method determined by the determination means and generating encrypted data having the number of bits same as that of the data to be encrypted, and locating means for locating the identification data showing the encryption method used for encrypting the data to be encrypted in a predetermined position in the encrypted data.

    摘要翻译： 本发明提供了一种信息处理装置，包括：分离装置，用于将输入的数据分离成识别数据和要加密的数据;确定装置，用于根据识别数据确定加密密钥和加密算法的组合所指定的加密方法; 由分离装置分隔的加密装置，用于通过利用由确定装置确定的加密方法加密要加密的数据并产生具有与要加密的数据相同数量的加密数据的加密装置;以及定位装置， 表示用于加密在加密数据中的预定位置加密的数据的加密方法的识别数据。

    Ultra-high-speed semiconductor optical modulator with traveling-wave electrode
    76.
    发明授权
    Ultra-high-speed semiconductor optical modulator with traveling-wave electrode 失效
    具有行波电极的超高速半导体光调制器

    公开(公告)号：US5995270A

    公开(公告)日：1999-11-30

    申请号：US951533

    申请日：1997-10-16

    申请人： Kenji Kawano

    发明人： Kenji Kawano

    IPC分类号： G02F1/015 ,  G02F1/017

    CPC分类号： B82Y20/00 ,  G02F1/01708 ,  G02F2001/0159 ,  G02F2201/127

    摘要： A wideband semiconductor electro-absorption optical modulator including a semiconductor core shorter in absorption-peak wavelength than a wavelength of optical signal, and an electrode for applying an electric signal to absorb the optical signal by shifting the absorption-peak wavelength to a long wavelength region when a voltage is applied, wherein an electric signal input port and an electric signal output port are disposed so that the electrode is constructed in the form of a traveling-wave electrode, and a total thickness of non-doped layers including the semiconductor core is reduced to decrease a driving voltage. Degradation of optical modulation bandwidth and reflection characteristics of the electric signal caused by mismatching of characteristic impedance to an outer circuit are reduced by decreasing an interaction length of the electric signal and the optical signal. Further, mismatching of characteristic impedance is corrected by adjusting a doping concentration of a p-type or n-type doped layer located above or beneath the semiconductor core.

    摘要翻译： 一种宽带半导体电吸收光调制器，其包括具有比光信号的波长更短的吸收峰值波长的半导体芯片，以及用于通过将吸收峰值波长移位到长波长区域来施加电信号以吸收光信号的电极 当施加电压时，其中设置电信号输入端口和电信号输出端口，使得电极构造为行波电极的形式，并且包括半导体芯的非掺杂层的总厚度为 降低驱动电压。 通过减小电信号和光信号的相互作用长度，降低由特性阻抗与外部电路失配引起的电信号的光调制带宽和反射特性的降低。 此外，通过调整位于半导体芯上方或下方的p型或n型掺杂层的掺杂浓度来校正特性阻抗的失配。

    Exposure mask and method and apparatus for manufacturing the same
    78.
    发明授权
    Exposure mask and method and apparatus for manufacturing the same 失效
    曝光掩模及其制造方法和装置

    公开(公告)号：US5629115A

    公开(公告)日：1997-05-13

    申请号：US583857

    申请日：1996-01-11

    申请人： Kenji Kawano ,  Shinichi Ito ,  Iwao Higashikawa ,  Masamitsu Itoh ,  Takashi Kamo ,  Hiroaki Hazama ,  Takayuki Iwamatsu

    发明人： Kenji Kawano ,  Shinichi Ito ,  Iwao Higashikawa ,  Masamitsu Itoh ,  Takashi Kamo ,  Hiroaki Hazama ,  Takayuki Iwamatsu

    IPC分类号： G03F1/32 ,  G03F1/68 ,  G03F9/00

    CPC分类号： G03F1/32 ,  G03F1/68

    摘要： This invention provides an exposure mask including a translucent film formed on a light-transmitting substrate and having a mask pattern, and a stabilized region formed in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film to prevent variations in physical properties of the translucent film. In addition, this invention provides a method of manufacturing an exposure mask, including the steps of forming a translucent film on a light-transmitting substrate, forming a photosensitive resin film on the translucent film, forming a photosensitive resin pattern by exposing the photosensitive resin film to a radiation or a charged particle beam, removing an exposed portion of the translucent film by using the photosensitive resin pattern as a mask, removing the photosensitive resin pattern, and forming a stabilized region in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film before the step of forming the photosensitive resin film or after the step of forming the photosensitive resin pattern. Also, this invention provides an apparatus for manufacturing an exposure mask, including a light source for radiating light containing at least an exposure wavelength onto a translucent film formed on a light-transmitting substrate, a photodetecting unit for detecting light emitted from the light source and transmitted through or reflected by the translucent film, and a measuring unit for measuring the characteristic of the translucent film from the light detected by the photodetecting unit.

    摘要翻译： 本发明提供一种曝光掩模，其包括形成在透光基板上并具有掩模图案的半透明膜，以及形成在透光基板和半透膜之间的边界中的至少半透明的表面的稳定区域 膜以防止半透明膜的物理性质的变化。 此外，本发明提供一种制造曝光掩模的方法，包括以下步骤：在透光性基板上形成半透膜，在半透膜上形成感光性树脂膜，通过使感光性树脂膜曝光，形成感光性树脂图案 通过使用感光性树脂图案作为掩模去除透光性膜的露出部分，除去感光性树脂图案，在透光性基板与透光性的界面之间形成稳定区域 或在形成感光性树脂膜的步骤之前或在形成感光性树脂图案的步骤之后，至少在半透明膜的表面上。 另外，本发明提供了一种用于制造曝光掩模的装置，包括用于将至少包含曝光波长的光发射到形成在透光基板上的半透明膜上的光源，用于检测从光源发射的光的光电检测单元和 通过透光膜透射或反射，以及测量单元，用于根据由光检测单元检测到的光来测量半透膜的特性。