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    Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method
    71.
    发明授权
    Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method 有权
    微光刻投影曝光装置的光学系统和微光刻曝光方法

    公开(公告)号：US08593618B2

    公开(公告)日：2013-11-26

    申请号：US12971798

    申请日：2010-12-17

    申请人： Michael Totzeck

    发明人： Michael Totzeck

    IPC分类号： G03B27/54 ,  G02B5/30 ,  G03F7/20

    CPC分类号： G03F7/70191 ,  G02B27/642 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70341 ,  G03F7/70566

    摘要： The disclosure relates to an optical system of a microlithographic projection exposure apparatus and to a microlithographic exposure method. An optical system of a microlithographic projection exposure apparatus includes an image rotator, which is arranged in the optical system such that light impinging on the image rotator is at least partially polarized. The image rotator rotates, for light impinging on the image rotator, both the intensity distribution and the polarization distribution of through a given angle of rotation.

    摘要翻译： 本公开涉及微光刻投影曝光装置的光学系统和微光刻曝光方法。 微光刻投影曝光装置的光学系统包括图像旋转器，其被布置在光学系统中，使得入射到图像旋转器上的光至少部分地偏振。 图像旋转器旋转，用于光照射在图像旋转器上，通过给定的旋转角度的强度分布和偏振分布。

    Illumination system for a microlithography projection exposure apparatus
    72.
    发明授权
    Illumination system for a microlithography projection exposure apparatus 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US08305558B2

    公开(公告)日：2012-11-06

    申请号：US12390676

    申请日：2009-02-23

    申请人： Toralf Gruner ,  Michael Totzeck

    发明人： Toralf Gruner ,  Michael Totzeck

    IPC分类号： G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/70566 ,  B82Y10/00 ,  G03F7/70008 ,  G21K2201/061 ,  H05G2/00

    摘要： An illumination system for a microlithographic projection exposure apparatus includes an EUV light source which generates an emission beam of linearly polarized EUV illumination light. An illumination optics guides the emission beam along an optical axis which causes an illumination field in a reticle plane to be illuminated by the emission beam. The illumination system also includes an illumination subunit of the illumination system. The illumination subunit includes at least the EUV light source and a polarization setting device for setting a defined polarization of the EUV emission beam of the illumination subunit.

    摘要翻译： 用于微光刻投影曝光装置的照明系统包括产生线偏极化EUV照明光的发射光束的EUV光源。 照明光学器件沿着光轴引导发射光束，其使得光栅平面中的照明场被发射光束照射。 照明系统还包括照明系统的照明子单元。 照明子单元至少包括EUV光源和用于设定照明子单元的EUV发射光束的限定极化的偏振设置装置。

    Optical system of a microlithographic projection exposure apparatus
    73.
    发明授权
    Optical system of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的光学系统

    公开(公告)号：US08237918B2

    公开(公告)日：2012-08-07

    申请号：US12498475

    申请日：2009-07-07

    申请人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

    发明人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70566

    摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.

    摘要翻译： 公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。 光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。 光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。 可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％ 平面内的强度，机械手配置在该区域。

    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    76.
    发明申请
    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置的光学系统

    公开(公告)号：US20090323042A1

    公开(公告)日：2009-12-31

    申请号：US12498475

    申请日：2009-07-07

    申请人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

    发明人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

    IPC分类号： G03F7/20 ,  G03B27/72 ,  G02B27/28

    CPC分类号： G03F7/70566

    摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.

    摘要翻译： 公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。 光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。 光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。 可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％ 平面内的强度，机械手配置在该区域。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    78.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置

    公开(公告)号：US20090021719A1

    公开(公告)日：2009-01-22

    申请号：US12146200

    申请日：2008-06-25

    申请人： Damian Fiolka ,  Michael Totzeck ,  Alexandra Pazidis ,  Michael Ricker

    发明人： Damian Fiolka ,  Michael Totzeck ,  Alexandra Pazidis ,  Michael Ricker

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70083 ,  G03F7/70566

    摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.

    摘要翻译： 本公开涉及微光刻投影曝光装置，以及相关的部件和方法。 在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可在像平面上产生物平面的图像。 可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。 非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。

    Optical system, in particular illumination system, of a microlithographic projection exposure apparatus
    80.
    发明授权
    Optical system, in particular illumination system, of a microlithographic projection exposure apparatus 有权
    光学系统，特别是照明系统，微光刻投影曝光装置

    公开(公告)号：US07405808B2

    公开(公告)日：2008-07-29

    申请号：US11014199

    申请日：2004-12-16

    申请人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

    发明人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B5/08

    CPC分类号： G03F7/70191 ,  G02B5/04 ,  G02B5/3066 ,  G02B27/286 ,  G03F7/70566

    摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.

    摘要翻译： 微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。 所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。 根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。