公开(公告)号：US08169595B2

公开(公告)日：2012-05-01

申请号：US12357126

申请日：2009-01-21

申请人： Martin Schriever ,  Ulrich Wegmann ,  Stefan Hembacher ,  Bernhard Geuppert ,  Juergen Huber ,  Norbert Kerwien ,  Michael Totzeck ,  Markus Hauf

发明人： Martin Schriever ,  Ulrich Wegmann ,  Stefan Hembacher ,  Bernhard Geuppert ,  Juergen Huber ,  Norbert Kerwien ,  Michael Totzeck ,  Markus Hauf

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70825 ,  G03F7/70041 ,  G03F7/70266

摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.

摘要翻译： 本发明涉及一种光学装置，其包括以具有脉冲频率的光脉冲形式发光的光源，并且包括至少一个光学元件。 本公开还涉及包括脉冲光源和投影物镜的投影曝光机，以及用于修改诸如投影曝光机中的这种装置的成像行为的方法。

公开(公告)号：US20090174876A1

公开(公告)日：2009-07-09

申请号：US12357126

申请日：2009-01-21

申请人： Martin Schriever ,  Ulrich Wegmann ,  Stefan Hembacher ,  Bernhard Geuppert ,  Juergen Huber ,  Norbert Kerwien ,  Michael Totzeck ,  Markus Hauf

发明人： Martin Schriever ,  Ulrich Wegmann ,  Stefan Hembacher ,  Bernhard Geuppert ,  Juergen Huber ,  Norbert Kerwien ,  Michael Totzeck ,  Markus Hauf

IPC分类号： G03B27/72 ,  G02B26/00

CPC分类号： G03F7/70825 ,  G03F7/70041 ,  G03F7/70266

摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.

摘要翻译： 本发明涉及一种光学装置，其包括以具有脉冲频率的光脉冲形式发光的光源，并且包括至少一个光学元件。 本公开还涉及包括脉冲光源和投影物镜的投影曝光机，以及用于修改诸如投影曝光机中的这种装置的成像行为的方法。

公开(公告)号：US07286245B2

公开(公告)日：2007-10-23

申请号：US10628431

申请日：2003-07-29

申请人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

发明人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

IPC分类号： G01B9/02

CPC分类号： G03F7/70566 ,  G01J4/04 ,  G01M11/0271 ,  G01M11/0285 ,  G02B27/0025 ,  G03F7/70591

摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.

摘要翻译： 一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态， 并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。 还公开了可用于此目的的分析装置。 使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

公开(公告)号：US20080037905A1

公开(公告)日：2008-02-14

申请号：US11874493

申请日：2007-10-18

申请人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

发明人： Ulrich Wegmann ,  Michael Hartl ,  Markus Mengel ,  Manfred Dahl ,  Helmut Haidner ,  Martin Schriever ,  Michael Totzeck

IPC分类号： G06K9/03

CPC分类号： G03F7/70566 ,  G01J4/04 ,  G01M11/0271 ,  G01M11/0285 ,  G02B27/0025 ,  G03F7/70591

摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.

摘要翻译： 一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态， 并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。 还公开了可用于此目的的分析装置。 使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

公开(公告)号：US09134626B2

公开(公告)日：2015-09-15

申请号：US12517583

申请日：2007-11-20

申请人： Hans-Juergen Mann ,  Michael Totzeck ,  Norbert Kerwien

发明人： Hans-Juergen Mann ,  Michael Totzeck ,  Norbert Kerwien

IPC分类号： G02B27/28 ,  G03F7/20 ,  G02B21/00 ,  G02B21/06 ,  G02B21/16 ,  G03F1/00

CPC分类号： G03F7/70625 ,  G02B21/0092 ,  G02B21/06 ,  G02B21/16 ,  G02B27/28 ,  G02B27/283 ,  G03F1/0092 ,  G03F1/84 ,  G03F7/70616

摘要： A microscope is provided for space-resolved measurement of a predetermined structure. The microscope includes a source of radiation, which emits electromagnetic radiation of a predetermined wavelength, an optical system, which irradiates the electromagnetic radiation onto the structure to be measured and images the structure, irradiated with the electromagnetic radiation, onto a detector. The optical system has two eigen polarization conditions, and the optical system includes a polarization module by which a polarization condition can be set for the electromagnetic radiation of the source of radiation, the polarization conditions corresponding to the eigen polarization conditions.

摘要翻译： 提供了用于预定结构的空间分辨测量的显微镜。 显微镜包括发射预定波长的电磁辐射的辐射源，将电磁辐射照射到待测量的结构上并将被电磁辐射照射的结构成像到检测器上的光学系统。 光学系统具有两个本征极化条件，并且光学系统包括偏振模块，通过该偏振模块可以对辐射源的电磁辐射设置偏振条件，对应于特征极化条件的偏振条件。

公开(公告)号：US20100142042A1

公开(公告)日：2010-06-10

申请号：US12517583

申请日：2007-11-20

申请人： Hans-Juergen Mann ,  Michael Totzeck ,  Norbert Kerwien

发明人： Hans-Juergen Mann ,  Michael Totzeck ,  Norbert Kerwien

IPC分类号： G02B21/06

CPC分类号： G03F7/70625 ,  G02B21/0092 ,  G02B21/06 ,  G02B21/16 ,  G02B27/28 ,  G02B27/283 ,  G03F1/0092 ,  G03F1/84 ,  G03F7/70616

摘要： A microscope is provided for space-resolved measurement of a predetermined structure (12), said microscope comprising a source of radiation (2), which emits electromagnetic radiation (3) of a predetermined wavelength, an optical system (13), which irradiates the electromagnetic radiation (3) onto the structure (12) to be measured and images the structure (12), irradiated with the electromagnetic radiation, onto a detector (9), wherein the optical system (13) has two eigen polarization conditions (Z1, Z2), and the apparatus includes a polarization module (4) by which a polarization condition can be set for the electromagnetic radiation (3) of the source of radiation (2), which condition includes only components of a known quantity which correspond to the eigen polarization conditions (Z1, Z2).

摘要翻译： 提供了用于对预定结构（12）进行空间分辨测量的显微镜，所述显微镜包括发射预定波长的电磁辐射（3）的辐射源（2），光学系统（13），其照射 将电磁辐射（3）放置在要测量的结构（12）上并将照射有电磁辐射的结构（12）成像到检测器（9）上，其中光学系统（13）具有两个特征极化条件（Z1， Z2），并且该装置包括偏振模块（4），通过该偏振模块可以为辐射源（2）的电磁辐射（3）设置偏振条件，该条件仅包括已知量的对应于 特征极化条件（Z1，Z2）。

公开(公告)号：US09063439B2

公开(公告)日：2015-06-23

申请号：US12624993

申请日：2009-11-24

申请人： Aksel Goehnermeier ,  Daniel Kraehmer ,  Vladimir Kamenov ,  Michael Totzeck

发明人： Aksel Goehnermeier ,  Daniel Kraehmer ,  Vladimir Kamenov ,  Michael Totzeck

IPC分类号： G03B27/68 ,  G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70308 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70941

摘要： A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective. The parameter of the second projection objective is a stray light component at an exposure field of the second projection objective and/or a variation of the stray light component at the exposure field of the second projection objective. The second projection objective is different from the projection objective.

摘要翻译： 公开了一种用于微光刻的投影物镜，具有投影物镜的微光刻投影曝光设备，微结构元件的微光刻制造方法以及使用这种制造方法制造的元件。 投影物镜包括一个光学元件，其被构造成使得在投影物镜的使用期间，光学元件在投影物镜的曝光区域中产生杂散光分量，该投射物镜将投射物镜的参数适应于第二投影物镜的参数 。 该参数是在投影物镜的曝光场处的杂散光分量和/或投影物镜的曝光场处的杂散光分量的变化。 第二投影物镜的参数是在第二投影物镜的曝光场处的杂散光分量和/或第二投影物镜的曝光场处的杂散光分量的变化。 第二个投影目标与投影目标不同。

公开(公告)号：US08605257B2

公开(公告)日：2013-12-10

申请号：US11628356

申请日：2005-06-03

申请人： Alexandra Pazidis ,  Reiner Garreis ,  Michael Totzeck ,  Heiko Feldmann ,  Paul Graeupner ,  Hans-Juergen Rostalski ,  Wolfgang Singer ,  Guenter Scheible ,  Sigrid Scheible

发明人： Patrick Scheible ,  Alexandra Pazidis ,  Reiner Garreis ,  Michael Totzeck ,  Heiko Feldmann ,  Paul Graeupner ,  Hans-Juergen Rostalski ,  Wolfgang Singer

IPC分类号： G03B27/72 ,  G03B27/68

CPC分类号： G02B13/02 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70308

摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.

摘要翻译： 在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖 系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布 与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

公开(公告)号：US20110242544A1

公开(公告)日：2011-10-06

申请号：US13062566

申请日：2009-09-18

申请人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

发明人： Ulrich Stroessner ,  Gerd Klose ,  Michael Totzeck

IPC分类号： G01B11/02 ,  G01B11/14 ,  G01J4/00

CPC分类号： G03F1/84 ,  G03F7/70141

摘要： The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured. For this purpose, the illumination device (3, 3′) has setting means for coordinating the properties of the illumination light with the structure to be measured.

摘要翻译： 本发明涉及一种用于测量用于光刻的掩模（1）上的结构的方法，其中首先将掩模（1）安装在空间上可移动的平台（2）上。 在这种情况下，控制平台（2）的位置。 掩模（1）上的结构被来自发出相干光的照明光源的照明光照射。 来自掩模（1）的光通过成像光学单元（4）成像到检测装置（6）上并进行检测。 在评估装置（7）中评估检测到的信号，并确定结构的位置和尺寸。 本发明还涉及一种可以进行这些方法步骤的装置。 在这种情况下，通过与要测量的结构协调的照明光的特性来增加位置和尺寸确定的精度。 为此，照明装置（3,3'）具有用于使照明光的特性与被测量结构协调的设定装置。

公开(公告)号：US20110122392A1

公开(公告)日：2011-05-26

申请号：US12974436

申请日：2010-12-21

申请人： Damian Fiolka ,  Michael Totzeck ,  Hartmut Enkisch ,  Stephan Muellender

发明人： Damian Fiolka ,  Michael Totzeck ,  Hartmut Enkisch ,  Stephan Muellender

IPC分类号： G03B27/72

CPC分类号： G03F7/70191 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70566

摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.

摘要翻译： 用于微光刻的照明光学单元用照明光照亮物场。 该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。 该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。 至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。