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1.发明授权Optical apparatus and method for modifying the imaging behavior of such apparatus 有权用于修改这种装置的成像行为的光学装置和方法公开(公告)号：US08169595B2
公开(公告)日：2012-05-01
申请号：US12357126
申请日：2009-01-21
申请人： Martin Schriever , Ulrich Wegmann , Stefan Hembacher , Bernhard Geuppert , Juergen Huber , Norbert Kerwien , Michael Totzeck , Markus Hauf
发明人： Martin Schriever , Ulrich Wegmann , Stefan Hembacher , Bernhard Geuppert , Juergen Huber , Norbert Kerwien , Michael Totzeck , Markus Hauf
CPC分类号： G03F7/70825 , G03F7/70041 , G03F7/70266
摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.
摘要翻译： 本发明涉及一种光学装置，其包括以具有脉冲频率的光脉冲形式发光的光源，并且包括至少一个光学元件。 本公开还涉及包括脉冲光源和投影物镜的投影曝光机，以及用于修改诸如投影曝光机中的这种装置的成像行为的方法。
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2.发明申请OPTICAL APPARATUS AND METHOD FOR MODIFYING THE IMAGING BEHAVIOR OF SUCH APPARATUS 有权用于修改这种装置的成像行为的光学装置和方法公开(公告)号：US20090174876A1
公开(公告)日：2009-07-09
申请号：US12357126
申请日：2009-01-21
申请人： Martin Schriever , Ulrich Wegmann , Stefan Hembacher , Bernhard Geuppert , Juergen Huber , Norbert Kerwien , Michael Totzeck , Markus Hauf
发明人： Martin Schriever , Ulrich Wegmann , Stefan Hembacher , Bernhard Geuppert , Juergen Huber , Norbert Kerwien , Michael Totzeck , Markus Hauf
CPC分类号： G03F7/70825 , G03F7/70041 , G03F7/70266
摘要： The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.
摘要翻译： 本发明涉及一种光学装置，其包括以具有脉冲频率的光脉冲形式发光的光源，并且包括至少一个光学元件。 本公开还涉及包括脉冲光源和投影物镜的投影曝光机，以及用于修改诸如投影曝光机中的这种装置的成像行为的方法。
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3.发明授权公开(公告)号：US08305174B2
公开(公告)日：2012-11-06
申请号：US12763367
申请日：2010-04-20
申请人： Peter Groeppel , Juergen Huber , Lothar Schoen , Matthias Uebler
发明人： Peter Groeppel , Juergen Huber , Lothar Schoen , Matthias Uebler
IPC分类号： H01H1/00
CPC分类号： G01R33/3815 , G01R33/3856 , H01F6/06 , H01F27/323 , H01F27/327 , Y10T29/49014
摘要： A superconducting coil for a magnetic resonance apparatus is formed by one or more wound superconducting conductors that are embedded in a cured sealing compound, with a filler composed only of nanoparticles added to the sealing compound.
摘要翻译： 用于磁共振装置的超导线圈由嵌入固化的密封化合物中的一个或多个缠绕超导导体形成，填充剂仅由添加到密封化合物中的纳米颗粒组成。
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4.发明申请CASTING COMPOUND SUITABLE FOR CASTING AN ELECTRONIC MODULE, IN PARTICULAR A LARGE-VOLUME COIL SUCH AS A GRADIENT COIL 有权用于铸造电子模块的铸造化合物，特别是作为梯级线圈的大容量线圈公开(公告)号：US20110115488A1
公开(公告)日：2011-05-19
申请号：US12940369
申请日：2010-11-05
CPC分类号： G01R33/3858 , B82Y30/00 , C08J5/005 , C08K3/22 , C08K2201/011 , H01F6/06 , H01F27/327 , Y10S977/773 , Y10S977/788 , Y10S977/95
摘要： Casting compound suitable for casting an electronic module, in particular a large-volume coil such as a gradient coil, which is composed of a support material forming a matrix, one or more fillers made of inorganic microparticles, and at least one filler made of polymer nanoparticles.
摘要翻译： 适用于铸造电子模块，特别是由形成基体的支撑材料构成的大容量线圈例如梯度线圈的铸造化合物，一种或多种由无机微粒制成的填料和至少一种由聚合物制成的填料 纳米颗粒。
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公开(公告)号：US20080197954A1
公开(公告)日：2008-08-21
申请号：US12033118
申请日：2008-02-19
IPC分类号： H01F5/06
CPC分类号： H01F5/06 , F28F2013/006 , F28F2265/24 , G01R33/3856 , G01R33/3858 , H01F27/22 , H01F27/2876 , H01F27/322 , H01F27/323
摘要： An arrangement for cooling a gradient coil has cooling tubes for coolant transport arranged for heat dissipation from coil positions of the gradient coil. Insulator plates for electrical insulation are arranged both between the coil positions and between the coil positions and the respective cooling tubes. The insulator plates include fabric layers (prepregs) that are impregnated with a reaction resin. The insulator plates exhibit a heat conductivity of greater than or equal to 0.5 W/mK.
摘要翻译： 用于冷却梯度线圈的布置具有用于冷却剂输送的冷却管，布置成用于从梯度线圈的线圈位置散热。 用于电绝缘的绝缘板布置在线圈位置之间以及线圈位置和相应的冷却管之间。 绝缘板包括用反应树脂浸渍的织物层（预浸料）。 绝缘板表现出大于或等于0.5W / mK的热导率。
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6.发明授权Casting compound suitable for casting an electronic module, in particular a large-volume coil such as a gradient coil 有权适用于铸造电子模块，特别是诸如梯度线圈的大容量线圈的铸造化合物公开(公告)号：US08866479B2
公开(公告)日：2014-10-21
申请号：US12940369
申请日：2010-11-05
IPC分类号： G01R33/385 , H01F6/06 , B82Y30/00 , C08K3/22 , C09D147/00 , H01F5/06 , C08J5/00 , H01F27/32
CPC分类号： G01R33/3858 , B82Y30/00 , C08J5/005 , C08K3/22 , C08K2201/011 , H01F6/06 , H01F27/327 , Y10S977/773 , Y10S977/788 , Y10S977/95
摘要： Casting compound suitable for casting an electronic module, in particular a large-volume coil such as a gradient coil, which is composed of a support material forming a matrix, one or more fillers made of inorganic microparticles, and at least one filler made of polymer nanoparticles.
摘要翻译： 适用于铸造电子模块，特别是由形成基体的支撑材料构成的大容量线圈例如梯度线圈的铸造化合物，一种或多种由无机微粒制成的填料和至少一种由聚合物制成的填料 纳米颗粒。
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公开(公告)号：US20100265019A1
公开(公告)日：2010-10-21
申请号：US12763367
申请日：2010-04-20
申请人： Peter Groeppel , Juergen Huber , Lothar Schoen , Matthias Uebler
发明人： Peter Groeppel , Juergen Huber , Lothar Schoen , Matthias Uebler
CPC分类号： G01R33/3815 , G01R33/3856 , H01F6/06 , H01F27/323 , H01F27/327 , Y10T29/49014
摘要： A superconducting coil for a magnetic resonance apparatus is formed by one or more wound superconducting conductors that are embedded in a cured sealing compound, with nanoparticles added to the sealing compound.
摘要翻译： 用于磁共振装置的超导线圈由嵌入在固化的密封化合物中的一个或多个缠绕超导导体形成，并将纳米颗粒添加到密封化合物中。
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8.发明申请公开(公告)号：US20110235012A1
公开(公告)日：2011-09-29
申请号：US13071237
申请日：2011-03-24
申请人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
发明人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
IPC分类号： G03B27/54
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.
摘要翻译： 用于生产半导体部件的用于微光刻的投影曝光装置包括至少一个光学组件，其具有可以以机械控制的方式被致动的至少一个光学元件安装在结构中。 为了执行机械致动，至少在投影曝光设备的特定操作状态期间，提供控制信号传输装置和/或能量传输装置，其将光学组件中没有寄生机械效应引入到光学组件中。
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9.发明授权Epoxy resin compounds in admixture with glycidyl phosphorus compounds and heterocyclic polyamines 失效环氧树脂化合物与缩水甘油基磷化合物和杂环多胺混合
公开(公告)号：US5376453A
公开(公告)日：1994-12-27
申请号：US33985
申请日：1993-03-19
IPC分类号： C08J5/24 , C08G59/00 , C08G59/30 , C08G59/32 , C08G59/38 , C08G59/50 , C08G59/62 , C08K13/04 , C08L63/00 , H05K1/03 , C08G59/20
CPC分类号： C08G59/32 , C08G59/304 , C08G59/3254 , C08G59/38 , C08G59/5086 , H05K1/0326 , H05K1/0373 , H05K2201/012 , H05K2203/122 , Y10S428/901 , Y10T428/31518 , Y10T428/31525
摘要： The invention provides epoxy resin compounds for manufacturing prepregs and composite materials, which can be obtained inexpensively and have good processibility, and provide--without having to add flameproofing agents--virtually inflammable molded materials with a high glass transition temperature. The epoxy resin compounds contain the following constituents:(A) an aromatic and/or heterocyclic polyepoxide resin that is free of phosphorous, optionally in a mixture with an aliphatic epoxy resin;(B) an epoxy-group-containing phosphorous compound and(C) an aromatic polyamine as a curing agent.
摘要翻译： 本发明提供用于制造预浸料和复合材料的环氧树脂化合物，其可以廉价地获得并且具有良好的加工性，并且提供 - 不必添加防火剂 - 实际上具有高玻璃化转变温度的易燃模塑材料。 环氧树脂化合物含有以下组分：（A）不含磷的芳族和/或杂环聚环氧化物树脂，任选与脂族环氧树脂混合; （B）含环氧基的磷化合物和（C）作为固化剂的芳族多胺。
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10.发明授权公开(公告)号：US08885143B2
公开(公告)日：2014-11-11
申请号：US13071237
申请日：2011-03-24
申请人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
发明人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.
摘要翻译： 用于生产半导体部件的用于微光刻的投影曝光装置包括至少一个光学组件，其具有可以以机械控制的方式被致动的至少一个光学元件安装在结构中。 为了执行机械致动，至少在投影曝光设备的特定操作状态期间，提供控制信号传输装置和/或能量传输装置，其将光学组件中没有寄生机械效应引入到光学组件中。
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