公开(公告)号：US20100214566A1

公开(公告)日：2010-08-26

申请号：US12775883

申请日：2010-05-07

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01B11/00 ,  H01L23/544

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US20100121627A1

公开(公告)日：2010-05-13

申请号：US12624555

申请日：2009-11-24

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G06G7/48 ,  G06F17/10

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method of preparation of reference data for measuring the profile of a patterned structure for use in control of a manufacturing process, the method including: providing a model for generating profiles based on the manufacturing process; generating the profiles by simulation of the manufacturing process; and preparing diffraction signal reference data corresponding to the generated profiles.

Abstract translation: 一种制备参考数据的方法，用于测量用于控制制造过程的图案化结构的轮廓，所述方法包括：提供用于基于制造过程产生轮廓的模型; 通过模拟制造过程生成轮廓; 并准备对应于所生成的轮廓的衍射信号参考数据。

公开(公告)号：US20100048100A1

公开(公告)日：2010-02-25

申请号：US12608112

申请日：2009-10-29

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: B24B49/04 ,  B24B49/12

CPC classification number: B05C11/1005 ,  B24B37/013 ,  B24B49/04 ,  B24B49/12

Abstract: A method and system are presented for monitoring a process sequentially applied to a stream of substantially identical articles by a processing tool, so as to terminate the operation of the processing tool upon detecting an end-point signal corresponding to a predetermined value of a desired parameter of the article being processed. The article is processed with the processing tool. Upon completing the processing in response to the end-point signal generated by an end-point detector continuously operating during the processing of the article, integrated monitoring is applied to the processed article to measure the value of the desired parameter. The measured value of the desired parameter is analyzed to determine a correction value thereof to be used for adjusting the end-point signal corresponding to the predetermined value of the desired parameter for terminating the processing of the next article in the stream.

Abstract translation: 提出了一种方法和系统，用于通过处理工具监视顺序地施加到基本上相同的物品流的处理，以便在检测到对应于期望参数的预定值的终点信号时终止处理工具的操作 的被处理物品。 文章用处理工具处理。 一旦响应由在物品处理过程中持续运行的端点检测器产生的终点信号完成处理，则将综合监控应用于经处理的物品以测量所需参数的值。 分析所需参数的测量值以确定其用于调整对应于期望参数的预定值的终点信号的修正值，以终止流中下一个物品的处理。

公开(公告)号：US07614932B2

公开(公告)日：2009-11-10

申请号：US11726805

申请日：2007-03-23

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: B24B49/12

CPC classification number: B05C11/1005 ,  B24B37/013 ,  B24B49/04 ,  B24B49/12

Abstract: A method and system are presented for monitoring a process sequentially applied to a stream of substantially identical articles by a processing tool, so as to terminate the operation of the processing tool upon detecting an end-point signal corresponding to a predetermined value of a desired parameter of the article being processed. The article is processed with the processing tool. Upon completing the processing in response to the end-point signal generated by an end-point detector continuously operating during the processing of the article, integrated monitoring is applied to the processed article to measure the value of the desired parameter. The measured value of the desired parameter is analyzed to determine a correction value thereof to be used for adjusting the end-point signal corresponding to the predetermined value of the desired parameter for terminating the processing of the next article in the stream.

Abstract translation: 提出了一种方法和系统，用于通过处理工具监视顺序地施加到基本上相同的物品流的处理，以便在检测到对应于期望参数的预定值的终点信号时终止处理工具的操作 的被处理物品。 文章用处理工具处理。 一旦响应由在物品处理过程中持续运行的端点检测器产生的终点信号完成处理，则将综合监控应用于经处理的物品以测量所需参数的值。 分析所需参数的测量值以确定其用于调整对应于期望参数的预定值的终点信号的修正值，以终止流中下一个物品的处理。

公开(公告)号：US07477405B2

公开(公告)日：2009-01-13

申请号：US10724113

申请日：2003-12-01

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G01B11/14

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A measurement method and system configured to determine parameters of a structure during production, the system including: a stage configured to support the structure during measurements; a measuring unit coupled to the stage; and a processor coupled to the measuring unit. The measuring unit includes: an illumination system configured to direct incident light of substantially broad wavelengths band toward a surface of the structure during measurements; and a detection system coupled to the illumination system and configured to detect light propagating from the surface of the structure during measurements. The measuring unit is configured to generate one or more output signals in response to the detected light during measurements. The processor is configured to determine the parameters of the structure from the one or more output signals during measurements. The parameters include a critical dimension of the structure and a layer characteristic of the structure.

Abstract translation: 一种测量方法和系统，其被配置为在生产期间确定结构的参数，所述系统包括：被配置为在测量期间支撑所述结构的平台; 耦合到所述台的测量单元; 以及耦合到所述测量单元的处理器。 测量单元包括：照明系统，被配置为在测量期间将基本上宽的波长带的入射光引向结构的表面; 以及耦合到所述照明系统并被配置为在测量期间检测从所述结构的表面传播的光的检测系统。 测量单元被配置为在测量期间响应于检测到的光而产生一个或多个输出信号。 处理器被配置为在测量期间从一个或多个输出信号确定结构的参数。 参数包括结构的临界尺寸和结构的层特性。

公开(公告)号：US20080059141A1

公开(公告)日：2008-03-06

申请号：US11931435

申请日：2007-10-31

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G06G7/48

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

Abstract translation: 提出了一种用于确定图案化结构中的线轮廓的方法和系统，其目的在于控制该结构的制造过程。 图案化结构包括多个不同的层，结构中的图案由图案化区域和未图案化区域形成。 进行至少第一次和第二次测量，每次利用具有在一定入射角度指向结构的入射光的宽波长带的结构照明，检测从该结构返回的光的光谱特性，以及产生测量 数据代表。 分析通过第一测量获得的测量数据，从而确定结构的至少一个参数。 然后，利用该确定的参数，同时分析通过第二测量获得的测量数据，使得能够确定结构的轮廓。

公开(公告)号：US07301163B2

公开(公告)日：2007-11-27

申请号：US11580997

申请日：2006-10-16

Applicant: Boaz Brill ,  Moshe Finarov ,  David Schiener

Inventor： Boaz Brill ,  Moshe Finarov ,  David Schiener

IPC: G01N21/84

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

公开(公告)号：US07292341B2

公开(公告)日：2007-11-06

申请号：US10525568

申请日：2003-05-08

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01N21/55 ,  G01N21/00

CPC classification number: G01N21/55

Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.

Abstract translation: 一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于 收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的特定位置 ，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述 限定所选入射角中的一个的至少一个可移动偏转元件。

公开(公告)号：US07245375B2

公开(公告)日：2007-07-17

申请号：US11141199

申请日：2005-06-01

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: G01J4/00

CPC classification number: G01N21/956 ,  G01N21/211 ,  G01N21/8806

Abstract: A system and method are presented for measurement on an article. The system comprises an illuminator for producing light of at least one predetermined wavelength range; an optical system; a displacement arrangement; and a control system. The optical system is configured to define at least a measurement channel, and comprises a light directing assembly for directing an input light beam, propagating along an input light path from the illuminator, onto the article and directing a light beam returned from the illuminated region of the article to at least one light detector. The displacement arrangement is associated with at least the light directing assembly of the optical system, and is configured and operable by the control system to rotate said at least light directing assembly of the optical system with respect to a stage supporting the article about a rotational axis substantially normal to the stage.

Abstract translation: 提出了一种用于物品测量的系统和方法。 该系统包括用于产生至少一个预定波长范围的光的照明器; 光学系统; 排水安排; 和控制系统。 光学系统被配置为至少限定测量通道，并且包括光导组件，用于将输入光束沿着从照明器的输入光路传播到物品上并且引导从照明区域返回的光束 该物品至少有一个光检测器。 所述位移布置与至少所述光学系统的所述光导组件相关联，并且被所述控制系统配置和操作以使所述光学系统的所述至少光导向组件相对于支撑所述制品的旋转轴线 基本上正常于舞台。

公开(公告)号：US07169015B2

公开(公告)日：2007-01-30

申请号：US10860019

申请日：2004-06-04

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: B24B49/00

CPC classification number: B24B37/345 ,  B24B49/12 ,  H01L21/67253 ,  H01L21/6838

Abstract: The present invention is aimed to provide a measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.

Abstract translation: 本发明的目的是提供一种可在加工设备内安装的测量系统，更具体地说可以在抛光机的出口台内。 该系统的光学方案包括分光光度通道，成像通道以及用于保持测量晶片的装置。