Co-Cr-Pt-B alloy sputtering target
    71.
    发明授权
    Co-Cr-Pt-B alloy sputtering target 有权
    Co-Cr-Pt-B合金溅射靶

    公开(公告)号:US07927434B2

    公开(公告)日:2011-04-19

    申请号:US10598997

    申请日:2005-02-15

    IPC分类号: C22C19/07

    摘要: Provided is a Co—Cr—Pt—B alloy sputtering target comprising an island-shaped rolled structure formed from a Co-rich phase based on the primary crystal formed upon casting, and a Co—Cr—Pt—B alloy sputtering target in which the island-shaped rolled structure has an average size of 200 μm or less. This Co—Cr—Pt—B alloy sputtering target has an uniform and fine rolled structure with minimal segregation and residual stress upon casting, and the present invention aims to enable the stable and inexpensive manufacture of the target, prevent or suppress the generation of particles, and to improve the production yield of deposition.

    摘要翻译: 提供了一种Co-Cr-Pt-B合金溅射靶,其包括由铸造时形成的基体上的富Co相形成的岛状卷绕结构和Co-Cr-Pt-B合金溅射靶,其中 岛状卷绕结构的平均尺寸为200μm以下。 该Co-Cr-Pt-B合金溅射靶具有均匀且细小的轧制结构,铸造时的偏析和残余应力极小,本发明的目的在于能够稳定且廉价地制造靶,防止或抑制颗粒的产生 ,并提高沉积的产量。

    MOBILE COMMUNICATION METHOD, RADIO CONTROL STATION, AND RADIO BASE STATION
    72.
    发明申请
    MOBILE COMMUNICATION METHOD, RADIO CONTROL STATION, AND RADIO BASE STATION 有权
    移动通信方法,无线电控制站和无线电基站

    公开(公告)号:US20110059742A1

    公开(公告)日:2011-03-10

    申请号:US12741991

    申请日:2008-11-07

    IPC分类号: H04W40/00

    摘要: A mobile communication method according to the present invention includes a step A of offering a particular service through a second radio data link established between a mobile station and a cell in the second area in a state in which a first radio data link is not established between the mobile station and a cell in the first area and a step B of suspending the offer of the particular service through the second radio data link when the state in which the first radio data link is not established continues for a predetermined time period.

    摘要翻译: 根据本发明的移动通信方法包括步骤A,其通过在移动台与第二区域中的小区之间建立的第二无线电数据链路提供特定服务,其中在第二无线电数据链路之间未建立第一无线电数据链路的状态 所述移动站和所述第一区域中的小区以及当所述第一无线电数据链路未建立的状态持续预定时间段时通过所述第二无线电数据链路中止所述特定服务的提供的步骤B.

    Cushion and acoustic system with the cushion
    73.
    发明授权
    Cushion and acoustic system with the cushion 有权
    垫子和声学系统与缓冲垫

    公开(公告)号:US07771375B2

    公开(公告)日:2010-08-10

    申请号:US10573423

    申请日:2004-09-27

    IPC分类号: A61H23/00 A47C17/86

    摘要: A cushion comprises a resin body with a spring structure having permeability comprising a three-dimensional structure including voids at a predetermined bulk density, the three-dimensional structure being obtained by contacting, entwining, and gathering adjacent ones of random loops or curls of continuous filaments made from a thermoplastic resin in such a manner as to allow the resulting structure to have a layered structure in which layers composed of filaments having a high bulk density as superficial layers are formed on a front and a rear of the resin body in a lengthwise direction, and a layer composed of the filaments having a low bulk density as a core layer is interposed between the superficial layers; and a speaker incorporated in the resin body or disposed on one of the superficial layers of the resin body.

    摘要翻译: 衬垫包括具有弹性结构的树脂体,该弹性结构具有包含三维结构的弹性结构,所述三维结构包括预定体积密度的空隙,所述三维结构是通过使连续长丝的随机环或卷曲相邻, 由热塑性树脂制成,使得所得结构具有层状结构,其中树脂体的长度方向的前后分别形成有作为表层的高堆积密度的长丝构成的层 并且由表层之间插入由堆积密度低的长丝构成的层作为芯层; 和配置在树脂体中的配置在树脂体的表层之一上的扬声器。

    Manganese alloy sputtering target and method for producing the same
    74.
    发明授权
    Manganese alloy sputtering target and method for producing the same 有权
    锰合金溅射靶及其制造方法

    公开(公告)号:US07713364B2

    公开(公告)日:2010-05-11

    申请号:US11687765

    申请日:2007-03-19

    申请人: Yuichiro Nakamura

    发明人: Yuichiro Nakamura

    IPC分类号: C22F1/16 C22F1/14 C22F1/10

    摘要: A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.

    摘要翻译: 一种锰合金溅射靶,其特征在于,氧为1000ppm以下,硫为200ppm以下,锻造结构为特征,通过消除锰合金易受损的缺点,稳定地制造锻造锰合金靶的方法 破裂,破裂强度低。 从而可以得到能够抑制结瘤或颗粒的产生而形成表现出高特性,高耐腐蚀性的薄膜的锰合金溅射靶。

    System for producing resin molded article with spring structure
    75.
    发明授权
    System for producing resin molded article with spring structure 有权
    用于生产具有弹簧结构的树脂模塑制品的系统

    公开(公告)号:US07377762B2

    公开(公告)日:2008-05-27

    申请号:US10541550

    申请日:2003-12-24

    IPC分类号: D01D5/088

    摘要: The present invention relates to a resin-molded article with a spring structure, and to a method and apparatus for preparing a superficial layer of such a resin-molded article with a spring structure which has surfaces free from undulations, comprises fused filaments whose fusion is resistant to separation, maintains its cushioning activity and strength even after long use. A water flows from a cooling water outlet 53b into a space between a water-permeating sheet 55 and an inclined plate 51a. Some part of the flowing water C penetrates the water-permeating sheet 55 to appear on its top surface to form there an overlying current M on which receives lengthwise arranged peripheral continuous filaments, and agitates them to cause adjacent filaments to contact each other, to be entwined and gathered, thereby enabling the formation of a superficial layer of the three-dimensional structure 3.

    摘要翻译: 本发明涉及一种具有弹簧结构的树脂模塑制品,以及用于制备具有弹性结构的这种树脂模塑制品的表面层的方法和装置,所述弹性结构具有没有波纹的表面,其包括熔融长丝, 耐分离,即使长时间使用后仍能保持其缓冲活性和强度。 水从冷却水出口53b流入透水片55和倾斜板51a之间的空间。 流水C的一部分穿透透水板55,出现在其上表面上,形成上覆电流M,其上接收长度方向布置的外围连续长丝,并搅拌它们以使相邻的细丝彼此接触,成为 缠结和收集,从而能够形成三维结构3的表层。

    Manganese alloy sputtering target and method for producing the same
    76.
    发明授权
    Manganese alloy sputtering target and method for producing the same 有权
    锰合金溅射靶及其制造方法

    公开(公告)号:US07229510B2

    公开(公告)日:2007-06-12

    申请号:US10474451

    申请日:2002-02-18

    申请人: Yuichiro Nakamura

    发明人: Yuichiro Nakamura

    IPC分类号: C22C5/00 C22C22/00 C22C19/03

    摘要: A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.

    摘要翻译: 一种锰合金溅射靶,其特征在于,氧为1000ppm以下,硫为200ppm以下,锻造结构为特征,通过消除锰合金易受损的缺点,稳定地制造锻造锰合金靶的方法 破裂,破裂强度低。 从而可以得到能够抑制结瘤或颗粒的产生而形成表现出高特性,高耐腐蚀性的薄膜的锰合金溅射靶。