公开(公告)号：US20120098953A1

公开(公告)日：2012-04-26

申请号：US13379042

申请日：2010-07-01

申请人： Go Kotaki ,  Atsushi Miyamoto ,  Ryoichi Matsuoka

发明人： Go Kotaki ,  Atsushi Miyamoto ,  Ryoichi Matsuoka

IPC分类号： H04N7/18

CPC分类号： H01J37/28 ,  H01J37/222 ,  H01J2237/2817 ,  H01L22/12 ,  H01L2924/0002 ,  H04N5/23238 ,  H01L2924/00

摘要： In a panoramic image construction technology of dividing a wide-range imaging area (EP) of semiconductor patterns into a plurality of imaging areas (SEP), and joining a group of images, which are obtained by imaging the SEPs using an SEM, through image processing, a fact that although a pattern serving as a key to joining is not contained in an overlap area between some of the SEPs, all the images can be joined in some cases is noted so that: although the number of patterns serving as keys to joining is small, SEPs whose images are all joined can be determined; or even if such SEPs cannot be determined, SEPs satisfying user's request items as many as possible can be determined. The cases are extracted by optimizing an SEP arrangement, whereby the number of cases in which SEPs whose images are all joined can be determined is increased.

摘要翻译： 在将半导体图案的宽范围成像区域（EP）分割为多个成像区域（SEP）的全景图像构造技术中，并且通过图像通过图像将通过使用SEM对SEP进行成像而获得的一组图像进行接合 处理，虽然作为加入关键码的图案不包含在一些SEP之间的重叠区域中，但是在某些情况下可以连接所有图像，使得：尽管用作键的图案的数量 连接小，可以确定其图像全部连接的SEP; 或者即使不能确定这样的SEP，也可以确定尽可能多地满足用户请求项目的SEP。 通过优化SEP布置来提取情况，从而可以确定其中图像全部被连接的SEP的情况的数量。

公开(公告)号：US08077962B2

公开(公告)日：2011-12-13

申请号：US12366196

申请日：2009-02-05

申请人： Yasutaka Toyoda ,  Hideo Sakai ,  Ryoichi Matsuoka

发明人： Yasutaka Toyoda ,  Hideo Sakai ,  Ryoichi Matsuoka

IPC分类号： G06K9/00

CPC分类号： G06K9/00 ,  G01R31/31813 ,  G06K9/6255 ,  G06T7/001 ,  G06T2207/30141

摘要： Although there has been a method for evaluating pattern shapes of electronic devices by using, as a reference pattern, design data or a non-defective pattern, the conventional method has a problem that the pattern shape cannot be evaluated with high accuracy because of the difficulty in defining an exact shape suitable for the manufacturing conditions of the electronic devices. The present invention provides a shape evaluation method for circuit patterns of electronic devices, the method including a means for generating contour distribution data of at least two circuit patterns from contour data sets on the circuit patterns; a means for generating a reference pattern used for the pattern shape evaluation, from the contour distribution data; and a means for evaluating the pattern shape by comparing each evaluation target pattern with the reference pattern.

摘要翻译： 尽管通过使用设计数据或无缺陷图案作为参考图案来评估电子设备的图案形状的方法，但是由于难度而存在不能高精度地评估图案形状的问题 在定义适合于电子设备的制造条件的精确形状时。 本发明提供一种电子设备的电路图案的形状评估方法，该方法包括一种用于从电路图形上的轮廓数据集生成至少两个电路图案的轮廓分布数据的装置; 从轮廓分布数据生成用于图案形状评估的参考图案的装置; 以及用于通过将每个评估对象图案与参考图案进行比较来评估图案形状的装置。

公开(公告)号：US20110074817A1

公开(公告)日：2011-03-31

申请号：US12871675

申请日：2010-08-30

申请人： Shinichi Shinoda ,  Yasutaka Toyoda ,  Ryoichi Matsuoka ,  Atsushi Miyamoto ,  Go Kotaki

发明人： Shinichi Shinoda ,  Yasutaka Toyoda ,  Ryoichi Matsuoka ,  Atsushi Miyamoto ,  Go Kotaki

IPC分类号： G09G5/00

CPC分类号： G06T7/344 ,  G06T2207/10056 ,  G06T2207/30148

摘要： A composite picture forming method and picture forming apparatus forms pattern attribute information contained in an overlapping domain for the overlapping domain between a plurality of pictures to select the pictures to be targeted for a composition in accordance with the pattern attribute information and combine the selected pictures, and the composition of the pictures is also performed in plural stages by using the pattern attribute information in the overlapping domain.

摘要翻译： 复合图像形成方法和图像形成装置形成包含在多个图像之间的重叠域的重叠域中的图案属性信息，以根据图案属性信息选择要组合的图像，并组合所选择的图像， 并且通过使用重叠域中的图案属性信息也可以在多个阶段中执行图像的组合。

公开(公告)号：US09343264B2

公开(公告)日：2016-05-17

申请号：US13379042

申请日：2010-07-01

申请人： Go Kotaki ,  Atsushi Miyamoto ,  Ryoichi Matsuoka

发明人： Go Kotaki ,  Atsushi Miyamoto ,  Ryoichi Matsuoka

IPC分类号： G06K9/00 ,  G01N23/00 ,  G21K7/00 ,  H01J37/28 ,  H04N5/232 ,  H01J37/22 ,  H01L21/66

CPC分类号： H01J37/28 ,  H01J37/222 ,  H01J2237/2817 ,  H01L22/12 ,  H01L2924/0002 ,  H04N5/23238 ,  H01L2924/00

摘要： In a panoramic image construction technology a wide-range imaging area (EP) of semiconductor patterns is divided into a plurality of imaging areas (SEP), and joined a group of images, which are obtained by imaging the SEPs using an SEM, through image processing. Although a pattern serving as a key to joining is not contained in an overlap area between some of the SEPs, all the images can be joined in some cases is noted so that: although the number of patterns serving as keys to joining is small, SEPs whose images are all joined can be determined; or even if such SEPs cannot be determined, SEPs satisfying user's request items as many as possible can be determined. The cases are extracted by optimizing an SEP arrangement, whereby the number of cases in which SEPs whose images are all joined can be determined is increased.

摘要翻译： 在全景图像构造技术中，半导体图案的宽范围成像区域（EP）被分成多个成像区域（SEP），并且通过图像将通过使用SEM对SEP进行成像而获得的一组图像 处理。 虽然作为加入键的图案不包含在一些SEP之间的重叠区域中，但是在某些情况下可以连接所有图像，使得：尽管用作加入键的图案数量少，但是SEP 可以确定其图像全部连接; 或者即使不能确定这样的SEP，也可以确定尽可能多地满足用户请求项目的SEP。 通过优化SEP布置来提取情况，从而可以确定其中图像全部被连接的SEP的情况的数量。

公开(公告)号：US09183622B2

公开(公告)日：2015-11-10

申请号：US13882141

申请日：2011-10-26

申请人： Yasutaka Toyoda ,  Norio Hasegawa ,  Ryoichi Matsuoka ,  Atsuko Yamaguchi

发明人： Yasutaka Toyoda ,  Norio Hasegawa ,  Ryoichi Matsuoka ,  Atsuko Yamaguchi

IPC分类号： G06K9/00 ,  G06T7/00 ,  H01J37/22 ,  H01J37/28 ,  G01N21/00 ,  H01L21/66

CPC分类号： G06T7/0004 ,  G06T7/001 ,  G06T2207/30141 ,  G06T2207/30152 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： An object of the present invention is to provide an image processing apparatus and a computer program which detects a defect such as a scum at high speed and with high precision. In order to accomplish the above-described object, the present invention proposes an image processing apparatus and a computer program which acquires image data, and detects edge branch points from this image data. Here, at each of the edge branch points, an edge associated therewith branches off in at least three or more directions. According to this configuration, it becomes possible to detect a defect such as a scum without utilizing the reference-pattern image. As a consequence, it becomes possible to detect the scum at high speed and with high precision.

摘要翻译： 本发明的目的是提供一种图像处理装置和计算机程序，其以高速和高精度检测浮渣等缺陷。 为了实现上述目的，本发明提出一种图像处理装置和计算机程序，其获取图像数据，并从该图像数据检测边缘分支点。 这里，在每个边缘分支点处，与其相关联的边缘在至少三个或更多个方向上分支。 根据该结构，能够在不利用基准图案图像的情况下检测浮渣等缺陷。 因此，可以高速，高精度地检测浮渣。

公开(公告)号：US08687921B2

公开(公告)日：2014-04-01

申请号：US13578651

申请日：2011-03-25

申请人： Shinichi Shinoda ,  Yasutaka Toyoda ,  Ryoichi Matsuoka

发明人： Shinichi Shinoda ,  Yasutaka Toyoda ,  Ryoichi Matsuoka

IPC分类号： G06K9/32

CPC分类号： G06T7/001 ,  G06T7/74 ,  G06T2207/10061 ,  G06T2207/30148

摘要： It is an object of the present invention is to provide an image processing technique that can detect the rotation of an observation image of a specimen with high accuracy. An image processing apparatus according to the present invention indirectly corrects a rotation gap between measurement image data and reference image data through wide-angle image data including a measurement part of a specimen (FIG. 1).

摘要翻译： 本发明的目的是提供一种可以高精度地检测样本的观察图像的旋转的图像处理技术。 根据本发明的图像处理装置通过包括样本的测量部分（图1）的广角图像数据间接校正测量图像数据和参考图像数据之间的旋转间隙。

公开(公告)号：US20130150998A1

公开(公告)日：2013-06-13

申请号：US13818643

申请日：2011-06-15

申请人： Ryoichi Matsuoka ,  Norio Hasegawa ,  Hiroaki Mito

发明人： Ryoichi Matsuoka ,  Norio Hasegawa ,  Hiroaki Mito

IPC分类号： G05B19/418

CPC分类号： G05B19/4183 ,  G03F1/70 ,  G03F7/705 ,  G03F7/70625 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： An object of the present invention is to provide a managing apparatus of a semiconductor manufacturing apparatus and a computer program capable of performing an accurate process monitoring based on the obtained pattern image and the like. To accomplish the above object, according to one aspect of the present invention, there are proposed a managing apparatus of a semiconductor manufacturing apparatus including a library which stores an association between shape information of a pattern of a plurality of positions and an exposure condition of an exposing device and a calculation device which compares the shape information of the plurality of positions extracted from image information with the shape information stored in the library, and extracts the exposure condition based on a logical product of a range of a plurality of exposure conditions corresponding to the shape information of the plurality of patterns extracted from the image information, and a computer program which executes the above processes.

摘要翻译： 本发明的目的是提供一种能够基于获得的图案图像等执行精确的处理监视的半导体制造装置和计算机程序的管理装置。 为了实现上述目的，根据本发明的一个方面，提出了一种半导体制造装置的管理装置，其包括存储多个位置的图案的形状信息和 曝光装置和计算装置，其将从图像信息提取的多个位置的形状信息与库中存储的形状信息进行比较，并且基于对应于多个曝光条件的多个曝光条件的范围的逻辑积来提取曝光条件 从图像信息提取的多个图案的形状信息，以及执行上述处理的计算机程序。

公开(公告)号：US08363923B2

公开(公告)日：2013-01-29

申请号：US13294828

申请日：2011-11-11

申请人： Yasutaka Toyoda ,  Hideo Sakai ,  Ryoichi Matsuoka

发明人： Yasutaka Toyoda ,  Hideo Sakai ,  Ryoichi Matsuoka

IPC分类号： G06K9/00

CPC分类号： G06K9/00 ,  G01R31/31813 ,  G06K9/6255 ,  G06T7/001 ,  G06T2207/30141

摘要： Although there has been a method for evaluating pattern shapes of electronic devices by using, as a reference pattern, design data or a non-defective pattern, the conventional method has a problem that the pattern shape cannot be evaluated with high accuracy because of the difficulty in defining an exact shape suitable for the manufacturing conditions of the electronic devices. The present invention provides a shape evaluation method for circuit patterns of electronic devices, the method including a means for generating contour distribution data of at least two circuit patterns from contour data sets on the circuit patterns; a means for generating a reference pattern used for the pattern shape evaluation, from the contour distribution data; and a means for evaluating the pattern shape by comparing each evaluation target pattern with the reference pattern.

公开(公告)号：US20110181688A1

公开(公告)日：2011-07-28

申请号：US13058226

申请日：2009-09-02

申请人： Atsushi Miyamoto ,  Go Kotaki ,  Ryoichi Matsuoka

发明人： Atsushi Miyamoto ,  Go Kotaki ,  Ryoichi Matsuoka

IPC分类号： H04N7/00

CPC分类号： G01B15/04 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2811 ,  H01J2237/2817

摘要： Provided is a panorama image synthesis technique using a scanning charged-particle microscope and capable of obtaining a panorama image synthesis that is robust against contamination and the imaging shift and distortion of an image in a wide-field imaging region (EP) for semiconductor fine patterns. The panorama image synthesis technique in the wide-field imaging region (EP) using the scanning charged-particle microscope is characterized in that the layout of each adjustment point, each local imaging region, and an imaging sequence comprising the imaging order of the each adjustment point are optimized and created as an imaging recipe.

摘要翻译： 提供了一种使用扫描带电粒子显微镜的全景图像合成技术，其能够获得对于半导体精细图案的宽场成像区域（EP）中的污染和图像的成像偏移和变形的鲁棒性的全景图像合成 。 使用扫描带电粒子显微镜的宽场成像区域（EP）中的全景图像合成技术的特征在于，每个调整点，每个局部成像区域以及包括每个调整的成像顺序的成像序列的布局 点被优化并创建为成像配方。

公开(公告)号：US20110096309A1

公开(公告)日：2011-04-28

申请号：US12913303

申请日：2010-10-27

申请人： Vincent Jean-Marie Pierre Paul Wiaux ,  Ryoichi Matsuoka ,  Shunsuke Koshihara ,  Hideo Sakai

发明人： Vincent Jean-Marie Pierre Paul Wiaux ,  Ryoichi Matsuoka ,  Shunsuke Koshihara ,  Hideo Sakai

IPC分类号： G03B27/52

CPC分类号： G03F7/70475 ,  G03F7/70466 ,  G03F7/70616 ,  G03F7/70633

摘要： A method and system for evaluating a lithographic pattern obtained using multiple-patterning lithographic processing are presented. In one aspect, the method includes aligning a target design with a lithographic pattern. The target design may comprise a first design and a second design. The method further comprises identifying in the lithographic pattern a stitching region based on a region of overlap between the first design and the second design. The method further comprises determining for the identified stitching region whether a predetermined criterion is fulfilled. In some embodiments, determining whether a predetermined criterion is fulfilled may comprise determining a line or trench minimum width. Alternately or additionally, determining whether a predetermined criterion is fulfilled may comprise determining a stitching metric for the identified stitching region, and evaluating whether or not the stitching metric fulfills the predetermined criterion.

摘要翻译： 提出了一种用于评估使用多图案化光刻处理获得的光刻图案的方法和系统。 一方面，该方法包括将目标设计与光刻图案对准。 目标设计可以包括第一设计和第二设计。 该方法还包括基于第一设计和第二设计之间的重叠区域，在光刻图案中识别缝合区域。 该方法还包括确定所识别的缝合区域是否满足预定标准。 在一些实施例中，确定是否满足预定标准可以包括确定线或沟槽最小宽度。 可选地或另外地，确定是否满足预定标准可以包括确定所识别的缝合区域的缝合度量，以及评估缝合度量是否满足预定标准。