Projection Optical System, Exposure System, And Exposure Method
    71.
    发明申请
    Projection Optical System, Exposure System, And Exposure Method 失效
    投影光学系统,曝光系统和曝光方法

    公开(公告)号:US20070285633A1

    公开(公告)日:2007-12-13

    申请号:US11665490

    申请日:2005-10-12

    摘要: A imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The optical system satisfies the condition of 1

    摘要翻译: 成像光学系统是一种允许液体中的平面平行板被另一个替代的液浸式系统,而不会显着降低成像性能,同时确保边界透镜的足够高的激光电阻。 成像光学系统设置有最靠近第二平面定位的第一透光构件和邻近第一光学透明构件定位的第二光学透明构件。 第一光学透明构件和第二平面之间的光路可以被第一液体填充,并且第一光学透明构件和第二光学透明构件之间的光路可以被第二液体填充。 光学系统满足1

    Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
    72.
    发明申请
    Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices 失效
    投影曝光装置及方法,反折射光学系统及装置制造方法

    公开(公告)号:US20070268474A1

    公开(公告)日:2007-11-22

    申请号:US11878402

    申请日:2007-07-24

    IPC分类号: G03B27/54

    摘要: A catadioptric optical system forms an image of a first surface onto a second surface. The system includes a first lens having a first optical axis, a combination of a concave mirror and a second lens, the combination having a second optical axis, a third lens having a third optical axis, a first reflection plane that is arranged in an optical path between the first lens and the combination, and a second reflection plane that is arranged in an optical path between the combination and the third lens. An intersection line of an extension plane of the first reflection plane and an extension plane of the second reflection plane is set up so that the first optical axis, the second optical axis and the third optical axis intersect at one point. In addition, at least one of the first lens and the third lens is movable.

    摘要翻译: 反折射光学系统在第二表面上形成第一表面的图像。 该系统包括具有第一光轴的第一透镜,凹面镜和第二透镜的组合,所述组合具有第二光轴,具有第三光轴的第三透镜,配置在光学器件中的第一反射面 第一透镜和组合之间的路径,以及布置在组合和第三透镜之间的光路中的第二反射面。 第一反射面的延伸面和第二反射面的延伸面的交线被设定为使得第一光轴,第二光轴和第三光轴在一点相交。 此外,第一透镜和第三透镜中的至少一个是可移动的。

    Projection optical system, exposure apparatus, and exposure method
    73.
    发明申请
    Projection optical system, exposure apparatus, and exposure method 有权
    投影光学系统,曝光装置和曝光方法

    公开(公告)号:US20070037079A1

    公开(公告)日:2007-02-15

    申请号:US11583916

    申请日:2006-10-20

    申请人: Yasuhiro Omura

    发明人: Yasuhiro Omura

    IPC分类号: G03C5/00

    摘要: A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.

    摘要翻译: 用于在第二表面(W)上形成第一表面(R)的缩小图像的反射折射投影光学系统是具有优异成像性能的相对紧凑的投影光学系统,并且还针对各种像差进行校正,例如色差和曲率 并且能够确保大的有效的图像侧数值孔径,同时适当地抑制光学表面上的反射损失。 投影光学系统包括至少两个反射镜(CM 1,CM 2)以及其表面在第一表面侧具有正折射力的边界透镜(Lb)和边界透镜与第二表面之间的光路 填充有折射率大于1.1的介质(Lm)。 形成投影光学系统的每个透射构件和具有折射力的每个反射构件沿着单个光轴(AX)布置,并且投影光学系统具有不包括光轴的预定形状的有效成像区域。

    Projection optical system, exposure apparatus, and exposure method
    74.
    发明申请
    Projection optical system, exposure apparatus, and exposure method 有权
    投影光学系统,曝光装置和曝光方法

    公开(公告)号:US20060001981A1

    公开(公告)日:2006-01-05

    申请号:US11224062

    申请日:2005-09-13

    申请人: Yasuhiro Omura

    发明人: Yasuhiro Omura

    IPC分类号: G02B3/00

    CPC分类号: G03F7/70241

    摘要: A projection optical system which uses, for example, an ArF excimer laser beam and can ensure a good imaging performance for an extended period while avoiding the variations in refractive index and the effect of the intrinsic double refraction of a fluorite containing a high-frequency component. A projection optical system for forming the demagnified image of a first plane (R) on a second plane (W). A first light transmitting member (L23) disposed closest to the second plane side and having almost no refraction power is provided. When the distance between the first light transmitting member and the second plane is WD, a numerical aperture on the second plane side NA, and the center wavelength of a light used L×10−6, the condition 0.06

    摘要翻译: 一种投影光学系统,其使用例如ArF准分子激光束并且可以在延长的时间段期间确保良好的成像性能,同时避免折射率的变化以及含有高频分量的萤石的本征双折射的影响 。 一种用于在第二平面(W)上形成第一平面(R)的缩小图像的投影光学系统。 设置最靠近第二平面侧并且几乎没有折射能力的第一透光构件(L 23)。 当第一透光构件和第二平面之间的距离为WD时,第二平面侧的数值孔径NA和使用的光的中心波长为L×10 -6,条件为0.06

    Projection optical system, exposure apparatus and exposure method
    75.
    发明授权
    Projection optical system, exposure apparatus and exposure method 失效
    投影光学系统,曝光装置和曝光方法

    公开(公告)号:US06909492B2

    公开(公告)日:2005-06-21

    申请号:US10412258

    申请日:2003-04-14

    申请人: Yasuhiro Omura

    发明人: Yasuhiro Omura

    CPC分类号: G03F7/70275 G03B21/006

    摘要: Disclosed is a projection optical system having relatively large image-side numerical aperture and projection field and being excellent in mechanical stability in respect of vibrations, and the like. The projection optical system includes a first image-forming optical system for forming a first intermediate image of a first surface (R), a second image-forming optical system having a concave reflective mirror and for forming a second intermediate image based on a radiation beam from the first intermediate image, and a third image-forming optical system for forming a final image on a second surface based on a radiation beam from the second intermediate image. Then, predetermined conditional expressions are satisfied with regard to a clear aperture diameter of the concave reflective mirror, a distance (L) between the first surface and the second surface, and a distance (H) between the concave reflective mirror and a reference optical axis.

    摘要翻译: 公开了具有相对大的图像侧数值孔径和投影场的投影光学系统,并且在振动方面的机械稳定性优异等。 投影光学系统包括用于形成第一表面(R)的第一中间图像的第一图像形成光学系统,具有凹面反射镜的第二图像形成光学系统,并且用于基于辐射束形成第二中间图像 以及第三图像形成光学系统,用于基于来自第二中间图像的辐射束在第二表面上形成最终图像。 然后,关于凹面反射镜的透明孔径,第一表面和第二表面之间的距离(L)以及凹面反射镜与参考光轴之间的距离(H),满足预定条件表达式 。

    Projection exposure methods and apparatus, and projection optical systems
    77.
    发明授权
    Projection exposure methods and apparatus, and projection optical systems 有权
    投影曝光方法和装置以及投影光学系统

    公开(公告)号:US06674513B2

    公开(公告)日:2004-01-06

    申请号:US10252427

    申请日:2002-09-24

    申请人: Yasuhiro Omura

    发明人: Yasuhiro Omura

    IPC分类号: G03B2754

    摘要: A dioptric projection optical system for imaging a reduced image of a pattern on a first surface onto a second surface using radiation-transmitting refractors. The projection optical system has a front lens unit of a positive refracting power and a rear lens unit of a positive refracting power. An aperture stop is located in the vicinity of a rear focal point of the front lens unit.

    摘要翻译: 一种折射投影光学系统,用于使用辐射透射折射体将第一表面上的图案的缩小图像成像到第二表面上。 投影光学系统具有正折射率的前透镜单元和正折射率的后透镜单元。 孔径光阑位于前透镜单元的后焦点附近。

    Catadioptric imaging system and a projection exposure apparatus provided with said imaging system

    公开(公告)号:US06639734B2

    公开(公告)日:2003-10-28

    申请号:US10140169

    申请日:2002-05-08

    申请人: Yasuhiro Omura

    发明人: Yasuhiro Omura

    IPC分类号: G02B1700

    摘要: The object of the present invention is to provide a catadioptric imaging system, or the like, which is capable of obtaining a desired image-side NA and an image circle without increasing the size of a reflecting mirror with a smaller number of lenses. This catadioptric imaging system comprises a first imaging optical system and a second imaging optical system, wherein the first imaging optical system is provided with a positive first lens group, an aperture stop, and a positive second lens group in the order from the object side, and the second imaging optical system is provided with a primary mirror comprising a concave first reflecting surface having a first radiation transmitting portion at the center thereof, and a secondary mirror comprising a second reflecting surface having a second radiation transmitting portion at the center thereof. In this case, all of the refracting members for constituting the optical system is formed of the same optical material, or at least one of the refracting surfaces and the reflecting surfaces is formed to be aspherical, or a refracting member is disposed to be separated from the first reflecting surface or the second reflecting surface.

    Projection exposure methods and apparatus, and projection optical systems
    79.
    发明授权
    Projection exposure methods and apparatus, and projection optical systems 失效
    投影曝光方法和装置以及投影光学系统

    公开(公告)号:US06606144B1

    公开(公告)日:2003-08-12

    申请号:US10252426

    申请日:2002-09-24

    申请人: Yasuhiro Omura

    发明人: Yasuhiro Omura

    IPC分类号: G03B2742

    摘要: A projection exposure method and apparatus and method of fabricating a projection exposure apparatus that has an illumination optical system for supplying exposure light of a wavelength of not more than 200 nm to the projection master and a projection optical system for forming an image of a pattern on the projection master. The projection optical system has a front lens unit of a positive refracting power and a rear lens unit of a positive refracting power. An aperture stop is located in the vicinity of a rear focal point of the front lens unit.

    摘要翻译: 一种投影曝光方法及其制造方法,该投影曝光装置具有用于向投影母版提供波长不大于200nm的曝光光的照明光学系统和用于形成图案的图像的投影光学系统 投影大师。 投影光学系统具有正折射率的前透镜单元和正折射率的后透镜单元。 孔径光阑位于前透镜单元的后焦点附近。

    Catadioptric projection lens
    80.
    发明授权
    Catadioptric projection lens 失效
    反射折射投影透镜

    公开(公告)号:US06208473B1

    公开(公告)日:2001-03-27

    申请号:US09070536

    申请日:1998-04-30

    申请人: Yasuhiro Omura

    发明人: Yasuhiro Omura

    IPC分类号: G02B1700

    摘要: A catadioptric projection lens comprising a first lens group (G1) disposed along a first optical axis (16a), a mirror (18) which creates a second optical axis (16b), a beam splitter (20) which creates a third optical axis (16c), a second lens group (G2) including a concave mirror (L22) disposed along the third optical axis on one side of the beam splitter, and a third lens group (G3) disposed along the third optical axis on the side of the beam splitter. The first and third optical axes are parallel, a configuration which reduces aberrations arising from gravitational deformation of the lens elements, when the first and third axes are aligned with the direction of gravity.

    摘要翻译: 一种反射折射投影透镜,包括沿着第一光轴(16a)设置的第一透镜组(G1),产生第二光轴(16b)的反射镜(18),产生第三光轴的分束器(20) 16c),包括沿着分束器一侧的第三光轴设置的凹面镜(L22)的第二透镜组(G2)和沿着第三透镜组(G3)的第三透镜组 分束器。 第一和第三光轴是平行的,这是当第一和第三轴与重力方向对准时减少由于透镜元件的重力变形引起的像差的构造。