公开(公告)号：US20210407544A1

公开(公告)日：2021-12-30

申请号：US17472567

申请日：2021-09-10

Applicant: HOYA CORPORATION

Inventor： Kinobu OSAKABE

IPC: G11B5/73

Abstract: A substrate for a magnetic disk includes a substrate main body having two main surfaces and an outer circumferential edge surface that has a side wall surface and chamfered surfaces, and a film that is an alloy film containing Ni and P and provided on a surface of the substrate main body. A disk shape of the substrate main body has an outer diameter of 90 mm or more. A thickness T of the substrate that includes the film provided on the main surfaces is 0.520 mm or less. A total thickness D mm of the film on the main surfaces and the thickness T mm satisfy D≥0.0082/T−0.0015. A film thickness of the film on the outer circumferential edge surface is larger than a film thickness of the film on the main surfaces, and is 150% or less of the film thickness of the film on the main surfaces.

公开(公告)号：US11187972B2

公开(公告)日：2021-11-30

申请号：US16343505

申请日：2017-10-18

Applicant: HOYA CORPORATION

Inventor： Yohei Ikebe ,  Tsutomu Shoki

IPC: G03F1/24 ,  G03F7/20

Abstract: The present invention provides a reflective mask blank and reflective mask capable of reducing the shadowing effect of EUV lithography and forming a fine pattern. As a result, a semiconductor device can be more stably manufactured with high transfer accuracy. The reflective mask blank comprises a multilayer reflective film, an absorber film and an etching mask film on a substrate in that order, wherein the absorber film is made of a material containing nickel (Ni), and the etching mask film is made of a material containing chromium (Cr) or a material containing silicon (Si).

公开(公告)号：US20210364909A1

公开(公告)日：2021-11-25

申请号：US16755117

申请日：2018-11-20

Applicant: HOYA CORPORATION

Inventor： Osamu NOZAWA ,  Yasutaka HORIGOME ,  Hitoshi MAEDA

IPC: G03F1/32 ,  H01L21/033

Abstract: Provided is a mask blank including a phase shift film. The phase shift film is made of a material containing a non-metallic element and silicon and includes first, second, and third layers; refractive indexes n1, n2, and n3 of the first, second, and third layers, respectively, at the wavelength of an exposure light satisfy the relations of n1 n3; and extinction coefficients k1, k2, and k3 of the first, second, and third layers, respectively, at the wavelength of an exposure light satisfy the relation of k1>k2>k3.

公开(公告)号：US11119400B2

公开(公告)日：2021-09-14

申请号：US16603127

申请日：2018-04-02

Applicant: HOYA CORPORATION

Inventor： Ryo Ohkubo ,  Hiroaki Shishido ,  Takashi Uchida

IPC: G03F1/32

Abstract: In the present disclosure, an etching stopper film, a light shielding film comprising a material containing one or more elements selected from silicon and tantalum, and a hard mask film are laminated in that order on a transparent substrate. The etching stopper film is made of a material containing chromium, oxygen and carbon, the chromium content is 50 atomic % or more, the maximum peak in N1s narrow spectrum obtained by means of analysis using X-Ray photoelectron spectroscopy is below the detection limit, and Cr2p narrow spectrum obtained by means of analysis using X-Ray photoelectron spectroscopy has a maximum peak at a binding energy of 574 eV or less.

公开(公告)号：US20210275002A1

公开(公告)日：2021-09-09

申请号：US16326147

申请日：2017-10-13

Applicant: HOYA CORPORATION

Inventor： Yoshitsugu HOSOGOE ,  Keiichi SAITO

IPC: A61B1/00

Abstract: An example elevator attachable to and detachable from an endoscope including a lever pivotally provided at a distal end of an insertion part of the endoscope and a pivot part causing the lever to pivot, includes: a first elevating part having a recess at one surface thereof; a second elevating part protruding from an edge of the first elevating part; and a lever connection part located at an end of the second elevating part and connected to the lever.

公开(公告)号：US20210267439A1

公开(公告)日：2021-09-02

申请号：US17257358

申请日：2019-12-24

Applicant: HOYA CORPORATION

Inventor： Kunihiko ONOBORI ,  Kohei IKETANI

IPC: A61B1/00 ,  A61B1/05 ,  A61B1/07 ,  A61B1/005

Abstract: An endoscope includes an insertion portion that is covered with an exterior tube with an outer diameter of 1 mm or less, an observation optical system that includes a rectangular image sensor fixed to a tip of the insertion portion and having a length of one side of 60% or less of the outer diameter of the insertion portion, an illumination fiber that is arranged between an inner surface of the exterior tube and an edge of the observation optical system and penetrates the exterior tube, a cable bundle that is connected to the image sensor and penetrates the exterior tube, and a connector that is connected to the cable bundle and the illumination fiber.

公开(公告)号：US11098224B2

公开(公告)日：2021-08-24

申请号：US16337310

申请日：2017-11-24

Applicant: HOYA CORPORATION

Inventor： Hiroki Nakagawa ,  Kashio Nakayama

IPC: C09G1/02 ,  B24B1/00 ,  B81C1/00 ,  B24B37/04 ,  C09K3/14 ,  C23C14/02 ,  C23C14/34 ,  G11B5/84

Abstract: A method for polishing a glass substrate, by which a polishing speed that is higher than a conventional polishing speed can be maintained for a long period of time in processing for polishing a glass substrate using cerium oxide as polishing abrasive particles is provided. A polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a polishing surface of a glass substrate, and the glass substrate is subjected to polishing processing. This polishing liquid contains the cerium oxide as polishing abrasive particles and a substance that reduces cerium oxide in response to light irradiation. Also, processing for irradiating the polishing liquid with light is performed when polishing processing is performed.

公开(公告)号：US20210256999A1

公开(公告)日：2021-08-19

申请号：US17266079

申请日：2019-08-07

Applicant: HOYA CORPORATION

Inventor： Shinji EDA

IPC: G11B5/73

Abstract: A disk-shaped substrate for a magnetic disk has a diameter D of 85 mm or more and a thickness T of 0.6 mm or less, and a material of the substrate has a Young's modulus E of 90 GPa or more.

公开(公告)号：US20210255536A1

公开(公告)日：2021-08-19

申请号：US17227655

申请日：2021-04-12

Applicant: HOYA CORPORATION

Inventor： Yohei IKEBE ,  Tsutomu SHOKI ,  Takahiro ONOUE ,  Hirofumi KOZAKAI

IPC: G03F1/24 ,  G03F1/26

Abstract: Provided are a reflective mask blank, having a phase shift film having little dependence of phase difference and reflectance on film thickness, and a reflective mask. The reflective mask blank is characterized in that the phase shift film is composed of a material comprised of an alloy having two or more types of metal so that reflectance of the surface of the phase shift film is more than 3% to not more than 20% and so as to have a phase difference of 170 degrees to 190 degrees, and when a group of metal elements that satisfies the refractive index n and the extinction coefficient k of k>α*n+β is defined as Group A and a group of metal elements that satisfies the refractive index n and the extinction coefficient k of k

公开(公告)号：US11081133B2

公开(公告)日：2021-08-03

申请号：US16349795

申请日：2017-11-14

Applicant: HOYA CORPORATION

Inventor： Koichi Sato ,  Kazuaki Hashimoto

IPC: G11B5/73 ,  C03C3/087 ,  C03C3/091

Abstract: A glass for magnetic recording medium substrate is an amorphous oxide glass. In terms of mol %, SiO2 content ranges from 45 to 68%, Al2O3 from 5 to 20%, total content of SiO2 and Al2O3 60 to 80%, B2O3 from 0 to 5%, MgO from 3 to 28%, CaO from 0 to 18%, total content of BaO and SrO 0 to 2%, total content of alkali earth metal oxides from 12 to 30%, total content of alkali metal oxides from 3.5 to 15%, and at least one kind selected from the group made of Sn oxide and Ce oxide being included, a total content of Sn oxide and Ce oxide ranges from 0.05 to 2.00%, a glass transition temperature ≥625° C., a Young's modulus ≥83 GPa, a specific gravity ≤2.85, and an average linear expansion coefficient at 100 to 300° C.≥48×10−7/° C.