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公开(公告)号：US06927901B2
公开(公告)日：2005-08-09
申请号：US10208842
申请日：2002-08-01
CPC分类号： G03F7/70233 , G02B5/0891 , G02B5/10 , G02B17/0657 , G03F7/70958
摘要： A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.
摘要翻译： 用于使用来自极紫外（EUV）光谱区域的电磁辐射将布置在物平面中的物体图案成像到图像平面的投影透镜在其物平面和图像平面之间具有限定投影透镜的光轴的成像反射镜，并且 有反光涂层。 这些反射镜中的至少一个具有梯度反射涂层，其具有相对于涂覆轴线旋转对称的膜厚度梯度，其中该涂覆轴相对于投影透镜的光轴被倾斜地布置。 提供至少一个中心，渐变，反射涂层允许设计投影透镜，允许高度均匀的场照度，并结合高透光率。
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公开(公告)号：US06859328B2
公开(公告)日：2005-02-22
申请号：US10201652
申请日：2002-07-22
申请人： Jörg Schultz , Johannes Wangler , Karl-Hein Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Hans-Juergen Mann , Wilhelm Ulrich
发明人： Jörg Schultz , Johannes Wangler , Karl-Hein Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Hans-Juergen Mann , Wilhelm Ulrich
CPC分类号： B82Y10/00 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.
摘要翻译： 使用波长<= 193nm的用于微光刻的投影曝光装置包括（A）主光源，（B）具有（1）像平面的照明系统，（2）多个光栅元件，用于接收来自 初级光源，以及（3）用于接收来自所述多个光栅元件的光并用于形成在所述像平面中具有多个场点的弧形场的场反射镜，以及（C）投影物镜。 照明系统具有与多个场点中的每一个相关联的原理射线，从而限定多个原则射线。 多个原始光线分散地投射到投影物镜中。
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公开(公告)号：US10481500B2
公开(公告)日：2019-11-19
申请号：US13197065
申请日：2011-08-03
摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
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84.发明授权公开(公告)号：US08605255B2
公开(公告)日：2013-12-10
申请号：US12767627
申请日：2010-04-26
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译： 成像光学系统具有多个反射镜。 这些图像将物体平面中的对象场映射成图像平面中的图像场。 在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。 这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长 小于10nm。
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85.发明申请IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开成像光学系统和投影曝光安装与这种类型的成像光学系统的微型计算公开(公告)号：US20120069312A1
公开(公告)日：2012-03-22
申请号：US13197065
申请日：2011-08-03
CPC分类号： G03F7/70233 , G02B17/0647 , G02B17/0652 , G02B17/0663 , G03F7/7015 , G03F7/7025
摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
摘要翻译： 成像光学系统具有多个反射镜，其对图像平面中的图像场中的物体平面中的物体场进行成像。 成像光学系统具有光瞳遮蔽。 在物场和图像场之间的成像光的光束路径中的最后一个反射镜具有用于成像光通过的通孔。 在物场和图像场之间的成像光的光束路径中的成像光学系统的倒数第二反射镜没有通过成像光通过的通孔。 结果是成像光学系统提供成像光的小成像误差，可管理的生产和良好的吞吐量的组合。
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公开(公告)号：US07592598B2
公开(公告)日：2009-09-22
申请号：US12257910
申请日：2008-10-24
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。
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87.发明申请MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM AND METHOD FOR MANUFACTURING A DEVICE 审中-公开微型投影光学系统及其制造方法公开(公告)号：US20090052073A1
公开(公告)日：2009-02-26
申请号：US12233384
申请日：2008-09-18
申请人： Hans-Juergen Mann , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wilhelm Ulrich
IPC分类号： G02B17/06
CPC分类号： G03F7/702 , G02B17/08 , G03F1/62 , G03F7/70058 , G03F7/70233
摘要： In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This optical system can have an object-image shift (OIS) of about 75 mm or less. Metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. Such a catoptric microlithgraphy projection optical system can be implemented in a microlithography tool. Such a microlithography tool can be used to produce microstructured components.
摘要翻译： 在一些实施例中，反射微结构投影光学系统包括多个反射光学元件，其被布置成将来自物体平面中的物场的辐射图像映像到图像平面中的图像场。 图像场可以具有至少1mm×1mm的尺寸。 该光学系统可以具有约75mm或更小的物体图像偏移（OIS）。 尽管光学系统围绕旋转轴旋转，但可以容易地实现测量和测试。 这种反射式微立方体投影光学系统可以在微光刻工具中实现。 这种微光刻工具可用于生产微结构化组件。
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88.发明申请公开(公告)号：US20090051890A1
公开(公告)日：2009-02-26
申请号：US12235957
申请日：2008-09-23
申请人： Hans-Juergen Mann , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wilhelm Ulrich
IPC分类号： G03B27/54
CPC分类号： G03F7/702 , G02B17/08 , G03F1/62 , G03F7/70058 , G03F7/70233
摘要： A microlithography projection optical system is disclosed. The system can include a plurality of optical elements arranged to image radiation having a wavelength λ from an object field in an object plane to an image field in an image plane. The plurality of optical elements can have an entrance pupil located more than 2.8 m from the object plane. A path of radiation through the optical system can be characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This can allow the use of face shifting masks as objects to be imaged, in particular for EUV wavelengths.
摘要翻译： 公开了一种微光刻投影光学系统。 该系统可以包括多个光学元件，其布置成将具有波长λ的辐射从物体平面中的物体场图像映像到图像平面中的图像场。 多个光学元件可以具有距离物面大于2.8μm的入射光瞳。 通过光学系统的辐射路径的特征在于主要光线相对于物平面的法线具有3°或更大的角度。 这可以允许使用面部移动掩模作为要成像的对象，特别是对于EUV波长。
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公开(公告)号：US07450301B2
公开(公告)日：2008-11-11
申请号：US11723831
申请日：2007-03-22
CPC分类号： G03F7/70233 , G02B5/0891 , G02B5/10 , G02B17/0657 , G03F7/70958
摘要： A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.
摘要翻译： 用于使用来自极紫外（EUV）光谱区域的电磁辐射将布置在物平面中的物体图案成像到图像平面的投影透镜在其物平面和图像平面之间具有限定投影透镜的光轴的成像反射镜，并且 有反光涂层。 这些反射镜中的至少一个具有梯度反射涂层，其具有相对于涂覆轴线旋转对称的膜厚度梯度，其中该涂覆轴相对于投影透镜的光轴被倾斜地布置。 提供至少一个中心，渐变，反射涂层允许设计投影透镜，允许高度均匀的场照度，并结合高透光率。
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公开(公告)号：US20070120072A1
公开(公告)日：2007-05-31
申请号：US11649199
申请日：2007-01-03
申请人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
CPC分类号： B82Y10/00 , G02B13/143 , G02B17/0657 , G02B17/0663 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/70175 , G03F7/70191 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06 , G21K5/00 , G21K5/04 , G21K2201/061
摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。
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