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    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE
    2.
    发明申请
    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开
    成像光学系统和投影曝光安装与这种类型的成像光学系统的微型计算

    公开(公告)号：US20120069312A1

    公开(公告)日：2012-03-22

    申请号：US13197065

    申请日：2011-08-03

    申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

    发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

    IPC分类号： G03F7/20 ,  G03B27/70 ,  G02B17/06

    CPC分类号： G03F7/70233 ,  G02B17/0647 ,  G02B17/0652 ,  G02B17/0663 ,  G03F7/7015 ,  G03F7/7025

    摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

    摘要翻译： 成像光学系统具有多个反射镜，其对图像平面中的图像场中的物体平面中的物体场进行成像。 成像光学系统具有光瞳遮蔽。 在物场和图像场之间的成像光的光束路径中的最后一个反射镜具有用于成像光通过的通孔。 在物场和图像场之间的成像光的光束路径中的成像光学系统的倒数第二反射镜没有通过成像光通过的通孔。 结果是成像光学系统提供成像光的小成像误差，可管理的生产和良好的吞吐量的组合。

    CATADIOPTRIC PROJECTION OBJECTIVE
    8.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE 有权
    目标投影目标

    公开(公告)号：US20110235167A1

    公开(公告)日：2011-09-29

    申请号：US13153544

    申请日：2011-06-06

    申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf M. Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

    发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf M. Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

    IPC分类号： G02B17/08

    CPC分类号： G02B17/0804 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0844 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225

    摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

    摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

    Projection objective
    9.
    发明授权
    Projection objective 有权
    投影目标

    公开(公告)号：US08027022B2

    公开(公告)日：2011-09-27

    申请号：US12174131

    申请日：2008-07-16

    申请人： Johannes Zellner ,  Hans-Juergen Mann ,  Wilhelm Ulrich

    发明人： Johannes Zellner ,  Hans-Juergen Mann ,  Wilhelm Ulrich

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70233 ,  G02B17/0657

    摘要： The disclosure relates a projection objective for imaging an object field in an object plane into an image field in an image plane. The disclosure also relates to a microlithographic projection exposure apparatus including such a projection objective. The disclosure further relates to methods of using such a projection exposure apparatus to fabricate microstructured or nanostructured components, such as highly integrated semiconductor components. In addition, the disclosure relates to components fabricated by such methods.

    摘要翻译： 本公开涉及用于将物平面中的对象场成像成像面中的图像场的投影物镜。 本公开还涉及包括这种投影物镜的微光刻投影曝光装置。 本公开还涉及使用这种投影曝光装置来制造微结构化或纳米结构化部件（诸如高度集成的半导体部件）的方法。 此外，本公开涉及通过这些方法制造的部件。

    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION
    10.
    发明申请
    IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION 有权
    成像光学系统和投影曝光安装

    公开(公告)号：US20100265481A1

    公开(公告)日：2010-10-21

    申请号：US12767627

    申请日：2010-04-26

    申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Stephan Muellender ,  Hartmut Enkisch

    发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Stephan Muellender ,  Hartmut Enkisch

    IPC分类号： G03F7/20 ,  G02B17/06 ,  G21K1/06 ,  G03B27/70

    CPC分类号： G02B5/0891 ,  G02B13/143 ,  G02B17/06 ,  G03F7/70175 ,  G03F7/70233

    摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.

    摘要翻译： 成像光学系统具有多个反射镜。 这些图像将物体平面中的对象场映射成图像平面中的图像场。 在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。 这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长 小于10nm。