Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
    81.
    发明授权
    Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates 失效
    使用含有缩醛聚合物的肉桂酸基团用于辐射敏感组合物和平版印刷版

    公开(公告)号:US06596456B2

    公开(公告)日:2003-07-22

    申请号:US10119392

    申请日:2002-04-11

    IPC分类号: G03F7021

    摘要: Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates. The copolymer contains about 25 to 55 mol % of unit A which has the formula The copolymer contains about 0.5 to 25 mol % of unit B which has the formula wherein R1 is selected from the group consisting of alkyl, aryl and aralkyl. The copolymer contains about 0.5 to 40 mol % of unit C which has the formula wherein X is an aliphatic or aromatic spacer group, and Ac is an acidic group selected from the group consisting of —COOH, —SO3H, —SO2NR9R10 with R9 and R10 independently being selected from hydrogen and alkyl; and when X is phenylene, Ac can also be OH. The copolymer contains about 20 to 70 mol % of unit D which has the formula wherein Ci is selected from the group consisting of Ci-1, Ci-2, Ci-3 and Ci-4 which are represented by the following formulae wherein: k, m and n are integers independently selected from 0 to 5, R3, R4 and R7 are independently selected from the group consisting of alkyl, alkoxy, —COOR8, —NR9R10, —NH—CO—CH3, halogen, and cyano, R8 is selected from hydrogen and alkyl, R9 and R10 are independently selected from hydrogen and alkyl, R5 is selected from the group consisting of hydrogen, alkyl, aryl and aralkyl, R6 is selected from the group consisting of alkyl, aryl and aralkyl and Y is selected from the group consisting of alkylene, arylene and arylenealkylene. The copolymer contains about 0 to 50 mol % of unit E which has the formula wherein R2 is selected from the group consisting of alkyl, aryl and aralkyl groups.

    摘要翻译: 含有单元A,B,C,D和任选E的共聚物用于制备辐射敏感组合物和平版印刷版。 该共聚物含有约25至55摩尔%的具有下式的单元A:共聚物含有约0.5至25摩尔%的单元B,其具有选自R 1的烷基,芳基和芳烷基。共聚物含有约0.5 至40摩尔%的具有方解子X的单元C是脂族或芳族间隔基,Ac是选自-COOH,-SO 3 H,-SO 2 NR 9 R 10的酸性基团,其中R 9和R 10独立地选自氢和 烷基; 并且当X是亚苯基时,Ac也可以是OH。共聚物含有约20至70mol%的单元D,其具有选自C 1 -C 1,C 1-2,C 1-3和C 1- 4,其由下式表示:k,m和n是独立地选自0至5的整数,R 3,R 4和R 7独立地选自烷基,烷氧基,-COOR 8,-NR 9 R 10,-NH-CO -CH 3,卤素和氰基,R 8选自氢和烷基,R 9和R 10独立地选自氢和烷基,R 5选自氢,烷基,芳基和芳烷基,R 6选自 的烷基,芳基和芳烷基,Y选自亚烷基,亚芳基和亚芳基亚烷基。共聚物含有约0至50摩尔%的单元E,其具有式R 2选自烷基,芳基和芳烷基 。

    BEAM COMBINING DEVICE FOR A LIGHT-SOURCE DEVICE
    82.
    发明申请
    BEAM COMBINING DEVICE FOR A LIGHT-SOURCE DEVICE 有权
    用于光源装置的光束组合装置

    公开(公告)号:US20140340760A1

    公开(公告)日:2014-11-20

    申请号:US14281023

    申请日:2014-05-19

    IPC分类号: G02B27/14 G02B27/28

    摘要: A beam combining device for combining light from a first light source and light from a second light source of a light-source device for a medical apparatus includes a body made of a transparent material, a face which reflects in at least either a dichroic or polarization-dependent manner and is situated in or on the body, which face is transparent to light having a first spectrum or a first polarization and reflects light having a second spectrum or a second polarization, and a light-entrance face on the body, which light-entrance face is provided and arranged so that light enters the beam combining device through the light-entrance face. At least either the light-entrance face or the face reflecting in a dichroic or polarization-dependent manner is curved.

    摘要翻译: 用于组合来自第一光源的光和用于医疗设备的光源装置的第二光源的光束组合装置包括由透明材料制成的主体,至少反射二向色或极化的面 并且位于身体中或身体上,该面对于具有第一光谱或第一偏振的光是透明的,并且反射具有第二光谱或第二偏振的光以及身体上的光入射面,该光 提供并布置了入射面,使得光通过光入射面进入光束组合装置。 光入射面或以二向色或偏振依赖的方式反射的面中的至少一个是弯曲的。

    PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION
    90.
    发明申请
    PROCESSING OF LITHOGRAPHIC PRINTING PLATES WITH HYDROPHILIC POLYMER IN FINISHER SOLUTION 审中-公开
    在完成溶液中加工具有疏水性聚合物的平版印刷板

    公开(公告)号:US20110155009A1

    公开(公告)日:2011-06-30

    申请号:US12742459

    申请日:2008-11-19

    IPC分类号: B41N1/14 B41N3/00

    CPC分类号: B41N3/08 G03F7/40

    摘要: Process for the production of a lithographic printing plate, comprising (a) providing a lithographic printing plate precursor comprising (i) a substrate; (ii) a radiation-sensitive coating comprising one or more layers and (iii) optionally an oxygen-impermeable overcoat; (b) image-wise exposing the lithographic printing plate precursor to radiation of a wavelength to which the radiation-sensitive coating is sensitive; (c) optionally subjecting the image-wise exposed precursor to a preheat treatment and/or rinsing with water; (d) removing the non-image areas from the image-wise exposed precursor by means of an alkaline developer solution; (e) optionally subjecting the imaged precursor obtained in step (d) to rinsing with water; (f) treating the imaged lithographic printing plate obtained in step (d) or (e) with a finisher solution; and (g) optionally subjecting the finisher treated plate obtained in step (f) to at least one further process step selected from rinsing with water, drying and baking; characterized in that the finisher solution comprises 0.01 to 15 wt. %, based on the total weight of the finisher, of a hydrophilic polymer comprising: (m1) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from —COOH, —SO3H, —PO2H2 and PO3H2, and (m3) optionally alkylene oxide units —(CHR1—CH2—O)P—, wherein each R1 independently represents H or —CH3 and p is an integer from 1 to 50.

    摘要翻译: 制备平版印刷版的方法,包括(a)提供平版印刷版原版,其包含(i)基底; (ii)包含一层或多层的辐射敏感涂层和(iii)任选的不透氧外涂层; (b)将平版印刷版前体成像曝光于对辐射敏感涂层敏感的波长的辐射; (c)任选地使成像曝光的前体经受预热处理和/或用水冲洗; (d)通过碱性显影剂溶液从图像曝光的前体中除去非图像区域; (e)任选地使步骤(d)中获得的成像前体用水冲洗; (f)用整理剂溶液处理步骤(d)或(e)中获得的成像平版印刷版; 和(g)任选地将步骤(f)中获得的整理剂处理的板处理至少一个选自用水冲洗,干燥和烘烤的其它工艺步骤; 其特征在于整理剂溶液含有0.01至15wt。 (m1)伯,仲和/或叔氨基和(m2)选自-COOH,-SO 3 H,-P 2 H 2和PO 3 H 2的酸基的亲水性聚合物,以及 (m3)任选的环氧烷单元 - (CHR1-CH2-O)P-,其中每个R1独立地表示H或-CH3,p是1至50的整数。