Current limiting device with a superconductor and a control coil
    81.
    发明授权
    Current limiting device with a superconductor and a control coil 失效
    带超导体和控制线圈的限流装置

    公开(公告)号:US5475560A

    公开(公告)日:1995-12-12

    申请号:US891227

    申请日:1992-05-29

    摘要: A current limiting device using a superconductor limits a current flowing throu A c5 V pV:a current limiting coil, which mangetically couples to the superconductor. A control coil is provided to magnetically couple with the current limiting coil when the superconductor is switched to a normal conduction state. A variable control impedance is connected to the control coil to adjust a control current flowing through the control coil. The current limiting impedance value of the current limiting coil is adjusted by the value of the control impedance to obtain an adjustable value of the current flowing through the current limiting coil.

    摘要翻译: 使用超导体的限流装置限制了电流流过的电流A c5V pV:限流线圈,其与微超导体耦合。 当超导体切换到正常导通状态时,提供控制线圈以与限流线圈磁耦合。 可变控制阻抗连接到控制线圈以调节流过控制线圈的控制电流。 电流限制线圈的限流阻抗值通过控制阻抗的值来调节,以获得流过限流线圈的电流的可调整值。

    Scanning probe microscope and method for measuring surfaces by using
this microscope
    82.
    发明授权
    Scanning probe microscope and method for measuring surfaces by using this microscope 失效
    扫描探针显微镜和使用该显微镜测量表面的方法

    公开(公告)号:US5468959A

    公开(公告)日:1995-11-21

    申请号:US210397

    申请日:1994-03-18

    摘要: A microscope comprises a cantilever having a distal end equipped with an electrically conductive probe allowing current to flow and having a fine tip whose voltage is controllable, a position control mechanism for controlling position of a sample with respect to a base end of the cantilever, a small displacement measuring mechanism for measuring a deflection amount of the cantilever, and a deflection control mechanism for controlling deflection of the cantilever so as to adjust a distance between the fine tip of the probe and the sample. A method for measuring surfaces using this novel microscope comprises steps of: maintaining deflection of the cantilever at a constant value by using the small displacement measuring mechanism and the deflection control mechanism; applying a constant voltage between the electrically conductive probe and the sample; scanning the sample along surface of the sample with the probe, while a tunneling current is maintained at a constant value by using the position control mechanism; and measuring a control amount of the position control mechanism in a direction vertical to the sample and a control amount of the deflection control mechanism.

    摘要翻译: 显微镜包括具有远端的悬臂,其具有允许电流流动并具有可控电压的细尖端的导电探针,用于控制样品相对于悬臂的基端的位置的位置控制机构, 用于测量悬臂的偏转量的小位移测量机构,以及用于控制悬臂的偏转的偏转控制机构,以调节探针的细尖端与样品之间的距离。 使用这种新型显微镜测量表面的方法包括以下步骤:通过使用小位移测量机构和偏转控制机构来将悬臂的偏转维持在恒定值; 在导电探针和样品之间施加恒定电压; 用探头沿着样品的表面扫描样品,同时通过使用位置控制机构将隧道电流维持在恒定值; 并且在垂直于样品的方向和偏转控制机构的控制量中测量位置控制机构的控制量。

    Method of making a cantilever stylus for an atomic force microscope
    83.
    发明授权
    Method of making a cantilever stylus for an atomic force microscope 失效
    制作原子力显微镜的悬臂式触针的方法

    公开(公告)号:US5336369A

    公开(公告)日:1994-08-09

    申请号:US67612

    申请日:1993-05-27

    摘要: A method of making a cantilever stylus for an atomic force microscope comprises forming a film on a surface of a substrate, the film comprising a stylus material that is different from the material of the substrate. A resist thin film of a material different from the stylus material is formed on the surface of the stylus material so as to have a tip. The stylus material is then etched with an isotropic etching technique to a depth of etching greater than the radius of curvature of the tip of the resist film so that the stylus material, having two opposite principal surfaces, has a tip formed on one of the principal surfaces with a radius of curvature less than 0.1 .mu.m which protrudes beyond a tip of the other principal surface. At least the resist thin film and the substrate at the tips of the principal surfaces of the stylus material are then removed.

    摘要翻译: 制造用于原子力显微镜的悬臂触针的方法包括在基板的表面上形成膜,所述膜包括不同于所述基板的材料的触针材料。 在触针材料的表面上形成具有与触针材料不同的材料的抗蚀剂薄膜以具有尖端。 然后用各向同性蚀刻技术将触针材料蚀刻到蚀刻深度大于抗蚀剂膜的尖端的曲率半径,使得具有两个相对主表面的触笔材料具有形成在主体之一上的尖端 具有小于0.1μm的曲率半径的表面突出超过另一主表面的尖端。 然后去除至少抗蚀剂薄膜和触针材料主表面顶端的基底。

    Field-emission type switching device
    84.
    发明授权
    Field-emission type switching device 失效
    场致发射型开关装置

    公开(公告)号:US5300853A

    公开(公告)日:1994-04-05

    申请号:US1549

    申请日:1993-01-06

    CPC分类号: H01J21/105 H01J3/022

    摘要: A field-emission type switching device includes a substrate formed with a recess having a straight edge and serrated edge opposite to the straight edge. A gate electrode is formed at the bottom of the recess. An emitter electrode is provided over the substrate and formed with a serrated edge which is slightly off alignment with the serrate edge of the recess so as to provide an emitter overhanging portion overhanging the recess. Similarly, a collector electrode is provided over the substrate and formed with a straight edge which is slightly off alignment with the straight edge of the recess so as to provide a collector overhanging portion overhanging the recess. The emitter and collector electrodes are disposed in one plane and the gate electrode is disposed in another plane below the one plane.

    摘要翻译: 场发射型切换装置包括形成有具有与直边相反的直边缘和锯齿状边缘的凹部的基板。 栅电极形成在凹部的底部。 发射电极设置在衬底上并且形成有锯齿形边缘,该锯齿形边缘与凹槽的锯齿形边缘稍微偏离对准,以便提供突出于凹部的发射体悬伸部分。 类似地,集电极设置在衬底上并且形成有与凹部的直边稍微偏离对准的直边缘,以提供突出于凹部的收集器悬伸部分。 发射极和集电极设置在一个平面中,栅电极设置在一个平面下方的另一个平面中。