摘要:
Provided is a light-emitting apparatus which can improve the light extraction efficiency without adversely influencing a functional layer of a light-emitting device and which includes a substrate; a light-emitting device formed on the substrate, the light-emitting device including: a first electrode formed on the substrate; an insulating member covering a periphery of the first electrode; and a functional layer formed on an exposed portion of the first electrode and including an emission layer; and a second electrode formed on the functional layer and the insulating member, in which a periodic structure is formed on a surface of the insulating member opposite to a substrate side, and an optical waveguide is formed between a bottom portion of the periodic structure and the first electrode or between the bottom portion of the periodic structure and the substrate.
摘要:
A nonvolatile semiconductor memory device comprises a memory cell configured to store data and a resistor element provided around the memory cell. The memory cell includes a charge storage layer provided above a substrate, a first semiconductor layer formed on a top surface of the charge storage layer via an insulating layer, and a first low resistive layer formed on a top surface of the first semiconductor layer and having resistance lower than that of the first semiconductor layer. The resistor element includes a second semiconductor layer formed on the same layer as the first semiconductor layer, and a second low resistive layer formed on the same layer as the first low resistive layer and on a top surface of the second semiconductor layer, having resistance lower than that of the second semiconductor layer. The second semiconductor layer is formed to extend in a first direction parallel to the substrate. The second low resistive layer is formed at both ends of the second semiconductor layer in the first direction.
摘要:
A semiconductor memory device includes a memory cell array, a voltage generating circuit, a memory circuit which stores a reference pulse number of an advance-write voltage of the memory cell array and a parameter, and a control circuit which controls, when a pulse number of the advance-write voltage is less than the reference pulse number of the advance-write voltage, the voltage generating circuit in a manner to decrease at least an initial value of a write voltage and a step-up width of the write voltage in accordance with the parameter.
摘要:
A NAND-structured flash memory including a selection transistor having a first conducting path, one end of the first conducting path being connected to a bit line or a source line, at least one dummy gate having a second conducting path and a control gate, one end of the second conducting path being connected to the other end of the first conducting path of the selection transistor, a nonvolatile memory linked unit for storing external data, which includes a plurality of electrically erasable/writable nonvolatile memory cells having third conducting paths and control gates, the third conducting paths being connected in series, one end of the series of the third conducting paths being connected to the other end of the second conducting path of the dummy gate, a dummy gate driving circuit controlling a potential of the control gate of the dummy gate, and a memory cell driving circuit selectively driving the control gates of the plurality of nonvolatile memory cells to write, read or erase bit data for storing the external data.
摘要:
A liquid crystal display includes a liquid crystal display panel having a first substrate, a second substrate disposed on an observer side with respect to the first substrate and opposed to the first substrate, a liquid crystal held between the first substrate and the second substrate, an upper polarizing plate disposed on the observer side with respect to the second substrate, and a resin film disposed on the observer side with respect to the upper polarizing plate and affixed in contact with the upper polarizing plate. The resin film is higher in surface hardness than the upper polarizing plate and has a surface hardness of at least 3H in terms of surface pencil hardness. Each of the first and second substrates have a thickness of no greater than 0.5 mm, and a total thickness of the liquid crystal display panel is no greater than 2 mm.
摘要:
A semiconductor device formed in a silicon-on-insulator substrate includes a silicon channel region located between silicon source and drain regions, and a low-carrier-concentration layer that underlies the channel region. The low-carrier-concentration layer makes contact with both the channel region and the source region. The channel region and the low-carrier-concentration layer are of the same conductive type, but the low-carrier-concentration layer is doped to have a lower carrier concentration than the channel region. The low-carrier-concentration layer eliminates the floating substrate effect, because carriers that would otherwise accumulate in the channel region can escape through the low-carrier-concentration layer into the source region.
摘要:
A semiconductor storage device comprises a semiconductor layer; a plurality of memory cells formed on the semiconductor layer, data writing, erasing or reading with respect to each of the memory cells being possible based on a voltage applied to a control electrode and a voltage applied to the semiconductor layer; a first booster circuit supplying a voltage to control electrodes of selected memory cells into which data is to be written; and a second booster circuit supplying a voltage to control electrodes of inhibited memory cells into which data is not to be written, wherein when erasing data in the memory cells, a potential at the semiconductor layer is boosted in a first boosting mode in which a boosting capability of the first booster circuit is low and a boosting capability of the second booster circuit is high, and then the potential at the semiconductor layer is boosted in a second boosting mode in which the boosting capability of the second booster circuit is low and the boosting capability of the first booster circuit is high.
摘要:
A semiconductor storage device comprises a semiconductor layer; a plurality of memory cells formed on the semiconductor layer, data writing, erasing or reading with respect to each of the memory cells being possible based on a voltage applied to a control electrode and a voltage applied to the semiconductor layer; a first booster circuit supplying a voltage to control electrodes of selected memory cells into which data is to be written; and a second booster circuit supplying a voltage to control electrodes of inhibited memory cells into which data is not to be written, wherein when erasing data in the memory cells, a potential at the semiconductor layer is boosted in a first boosting mode in which a boosting capability of the first booster circuit is low and a boosting capability of the second booster circuit is high, and then the potential at the semiconductor layer is boosted in a second boosting mode in which the boosting capability of the second booster circuit is low and the boosting capability of the first booster circuit is high.
摘要:
A semiconductor device includes an electrical circuit formed on a substrate; a level detector outputting a first level signal which has a signal level based on power supply voltage and which determines an operation of the electrical circuit; a command decoder decoding a command that is inputted from the outside, and outputting a command signal; a control circuit to which the command signal is inputted, the control circuit outputting a state signal expressing whether the electrical circuit is in an operation state; and a first latch circuit to which the first level signal and the state signal are inputted, the first latch circuit latching the first level signal at a time based on the state signal.
摘要:
Several a transistor, which are inhibited short channel effect moderately according to each transistor's channel length, are formed on a same SOI substrate.In the present invention, forming a first transistor on SOI substrate, and forming a second transistor which has a gate electrode whose length is longer than a gate length of the first transistor in a channel directionThe impurities are doped from above a surface of the SOI substrate in an oblique direction against the surface, and from source side and drain side of the first transistor and the second transistor.By this means, a pocket layer is formed under an insulator layer of a SOI substrate.