Ultraviolet water treatment apparatus
    81.
    发明授权
    Ultraviolet water treatment apparatus 有权
    紫外线水处理设备

    公开(公告)号:US08742365B2

    公开(公告)日:2014-06-03

    申请号:US13021185

    申请日:2011-02-04

    IPC分类号: H01J37/00

    摘要: According to one embodiment, an ultraviolet water treatment apparatus includes an ultraviolet lamp unit provided with a first plumbing flange coupling on each of both ends thereof, and further provided therein with an ultraviolet irradiation tube including an ultraviolet lamp and a lamp protective tube configured to protect the ultraviolet lamp, and a cleaning device drive unit provided with a second plumbing flange coupling on each of both ends thereof and configured to drive a cleaning device configured to clean a surface of the lamp protective tube. The ultraviolet lamp unit and the cleaning device drive unit are coupled with each other on the first and second plumbing flange couplings.

    摘要翻译: 根据一个实施方案,一种紫外线水处理装置包括:紫外线灯单元,其在其两端各设有第一管道法兰接头,并且还设置有包括紫外线灯和保护管的紫外线照射管, 紫外线灯和清洁装置驱动单元,其在其两端的每一端设置有第二管道法兰联接器,并且构造成驱动构造成清洁灯保护管的表面的清洁装置。 紫外灯单元和清洁装置驱动单元在第一和第二管道法兰联接器上彼此联接。

    Method for manufacturing carboxyl group-containing water-soluble polymer
    82.
    发明授权
    Method for manufacturing carboxyl group-containing water-soluble polymer 有权
    制备含羧基的水溶性聚合物的方法

    公开(公告)号:US08629230B2

    公开(公告)日:2014-01-14

    申请号:US13383339

    申请日:2010-07-27

    摘要: In manufacturing of a carboxyl group-containing water-soluble polymer by a precipitation polymerization method, a method which can improve production efficiency with increasing practicality continuously adds a monomer solution wherein a monomer component containing an α,β-unsaturated carboxylic acid is dissolved in an inert solvent in a concentration of 20 to 50% by volume to an inert solvent charged in a reaction vessel. In this case, the amount of the inert solvent charged in the reaction vessel is set so that the concentration of the monomer component in the total amount summed up with the monomer solution is 10 to 24% by volume, and the time period until completion of continuous addition of the total amount of the monomer solution is set so that the conversion of the monomer component at the time of completion of addition of the total amount of the monomer solution is 60% or more. The monomer component may contain a polymerizable compound having two or more ethylenically unsaturated groups.

    摘要翻译: 在通过沉淀聚合法制造含羧基的水溶性聚合物时,可以连续提高生产效率的方法连续添加单体溶液,其中含有α,β-不饱和羧酸的单体组分溶于 惰性溶剂的浓度为20体积%至50体积%的反应容器中的惰性溶剂。 在这种情况下,将装入反应容器中的惰性溶剂的量设定为使单体成分总量与单体溶液相加的浓度为10〜24体积%,直到完成时间为止 设定单体溶液的总量的连续添加,使得在完成添加总量的单体溶液时的单体组分的转化率为60%以上。 单体成分可以含有具有两个以上烯键式不饱和基团的聚合性化合物。

    ULTRAVIOLET IRRADIATION DEVICE
    84.
    发明申请
    ULTRAVIOLET IRRADIATION DEVICE 审中-公开
    超紫外线辐射装置

    公开(公告)号:US20130068964A1

    公开(公告)日:2013-03-21

    申请号:US13561927

    申请日:2012-07-30

    IPC分类号: C02F1/32

    摘要: An ultraviolet irradiation device includes a treatment vessel, an ultraviolet irradiation member, and a support member. The treatment vessel has a water inlet and a water outlet and through which water to be treated as a treatment target flows in a first direction from the water inlet toward the water outlet, the treatment vessel receiving the water to be treated through the water inlet and discharging the water to be treated through the water outlet. The ultraviolet irradiation member is provided inside the treatment vessel along a second direction crossing the first direction and which irradiates the water to be treated flowing through the treatment vessel with an ultraviolet ray. The support member is provided inside the treatment vessel along the second direction with both end portions of the support member being firmly fixed to wall surfaces of the treatment vessel.

    摘要翻译: 紫外线照射装置包括处理容器,紫外线照射部件和支撑部件。 处理容器具有进水口和出水口,待处理水作为处理对象的第一方向从入口向出水口流动,处理容器通过进水口接收待处理的水, 通过出水口排放待处理的水。 紫外线照射部件沿着与第一方向交叉的第二方向设置在处理容器内部,并且通过紫外线照射流过处理容器的被处理水。 支撑构件沿着第二方向设置在处理容器内部,支撑构件的两个端部牢固地固定在处理容器的壁表面上。

    Method for producing granulated carboxyl group-containing polymer particle and granulated carboxyl group-containing polymer particle
    85.
    发明授权
    Method for producing granulated carboxyl group-containing polymer particle and granulated carboxyl group-containing polymer particle 有权
    含有颗粒状含羧基的聚合物粒子和含有粒状的含羧基的聚合物粒子的制造方法

    公开(公告)号:US08304517B2

    公开(公告)日:2012-11-06

    申请号:US12663650

    申请日:2008-06-09

    IPC分类号: C08F6/00 C08G64/00

    摘要: An object of the present invention is to provide a method for easily producing granular carboxyl group-containing polymer particles that have a high bulk density and readily swell in water. The present invention provides a method for producing granular carboxyl group-containing polymer particles, which includes: producing carboxyl group-containing polymer particles; preparing an aggregate of the carboxyl group-containing polymer particles by allowing the carboxyl group-containing polymer particles to absorb an polar organic solvent to a liquid content of 5 to 25% by mass; and drying the aggregate of the carboxyl group-containing polymer particles and then grinding the dried aggregate.

    摘要翻译: 本发明的目的是提供一种容易制造具有高堆积密度并容易在水中溶胀的颗粒状含羧基聚合物颗粒的方法。 本发明提供一种含有颗粒状含羧基的聚合物粒子的制造方法,其包括:制造含有羧基的聚合物粒子; 通过使含羧基的聚合物颗粒吸收极性有机溶剂至液体含量为5至25质量%,从而制备含羧基聚合物颗粒的聚集体; 并干燥含羧基聚合物颗粒的聚集体,然后研磨干燥的聚集体。

    RESIST TREATMENT UNIT, RESIST COATING AND DEVELOPING APPARATUS, AND RESIST TREATMENT METHOD
    86.
    发明申请
    RESIST TREATMENT UNIT, RESIST COATING AND DEVELOPING APPARATUS, AND RESIST TREATMENT METHOD 审中-公开
    电阻治疗单元,电阻涂层和发展装置和电阻治疗方法

    公开(公告)号:US20110091821A1

    公开(公告)日:2011-04-21

    申请号:US13000234

    申请日:2009-06-10

    申请人: Shinji Kobayashi

    发明人: Shinji Kobayashi

    IPC分类号: G03F7/26 B05C9/12 G03B27/52

    CPC分类号: G03F7/26 G03F7/168

    摘要: A resist treatment unit for performing treatment on a resist film which has been formed on a substrate is disclosed. This resist treatment unit includes: a treatment container capable of maintaining a vacuum therein; a mounting table provided in the treatment container for mounting the substrate on which the resist film has been formed thereon; a gas supply part for jetting a mixture gas containing a first gas and a second gas which are chemically inert toward the mounting table at a predetermined flow rate; and an exhaust part capable of exhausting the treatment container to a degree of vacuum at which the mixture gas jetted from the gas supply part at the predetermined flow rate is able to be a molecular beam in the treatment container.

    摘要翻译: 公开了一种用于对形成在基板上的抗蚀剂膜进行处理的抗蚀剂处理单元。 该抗蚀剂处理单元包括:能够保持真空的处理容器; 设置在处理容器中的安装台,用于安装其上形成有抗蚀剂膜的基板; 气体供给部,用于以预定的流量向装载台喷射含有第一气体和第二气体的化学惰性的混合气体; 以及能够将处理容器排出到以规定流量从气体供给部喷射的混合气体能够成为处理容器内的分子束的真空度的排气部。

    Thin film removing device and thin film removing method
    87.
    发明授权
    Thin film removing device and thin film removing method 有权
    薄膜去除装置和薄膜去除方法

    公开(公告)号:US07879251B2

    公开(公告)日:2011-02-01

    申请号:US11925467

    申请日:2007-10-26

    IPC分类号: H01L21/302

    摘要: A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage plates 23 capable of being disposed substantially flush with the surface of a substrate M mounted on a support table 22 is positioned close to the substrate M mounted on the support table 22. Removing nozzles 30 jet a solvent toward edge parts of the substrate M and suck a solution produced by dissolving part of the resist in the solvent while the removing nozzles 30 are moved along side edges of the substrate M and the approach stage 20 disposed close to the substrate M. Thus, the removing nozzles 30 jet the solvent uniformly over the edge parts and corners of the substrate M and suck the solution without changing modes of jetting the solvent and sucking the solution. Consequently, straight parts of a thin film formed on the square substrate M can be removed from the corners of the substrate M, and the formation of mists can be suppressed.

    摘要翻译: 薄膜去除装置和薄膜去除方法能够从基板的角部去除在正方形基板上形成的薄膜的直线部分,并且抑制雾的形成。 具有能够与安装在支撑台22上的基板M的表面基本齐平的平台台23的接近台20靠近安装在支撑台22上的基板M定位。去除喷嘴30向边缘喷射溶剂 将基板M的一部分吸附并且将去除喷嘴30沿着基板M和接近台20的侧边缘移动而将抗蚀剂的一部分溶解在溶剂中而产生的溶液。因此,除去喷嘴 30将溶剂均匀地喷射在基板M的边缘部分和拐角上,并吸取溶液,而不改变喷射溶剂并吸取溶液的模式。 因此,可以从基板M的角部去除在正方形基板M上形成的薄膜的直线部分,并且可以抑制雾的形成。

    WATER-SOLUBLE ACRYLIC ACID SALT POLYMER AND GELLING BASE
    88.
    发明申请
    WATER-SOLUBLE ACRYLIC ACID SALT POLYMER AND GELLING BASE 审中-公开
    水溶性丙烯酸盐聚合物和凝胶基

    公开(公告)号:US20110021642A1

    公开(公告)日:2011-01-27

    申请号:US12934150

    申请日:2009-06-05

    IPC分类号: A61K9/10 C08F120/18

    CPC分类号: C09K5/08 A61F7/10 C08F220/06

    摘要: An object of the present invention is to provide a water-soluble acrylate polymer that can form a gelling base. When used in forming a poultice or cooling sheet, the gelling base not only imparts desirable stretchability, but also has an appropriate reaction rate with a polyvalent metal. The gelling base is free from gel penetration to the back side of a support or gel seeping from the support while the gel is being cured, and is easily applied to the support. When the gelling base is gelated by being allowed to stand under the conditions of 25° C. and a relative humidity of 60%, the gel strength is 3,200 to 7,000 dyn/cm2 after standing for 7.5 hours and 5,000 to 9,000 dyn/cm2 after standing for 200 hours, and satisfies the following relationship: Gel strength after standing for 7.5 hours]≦Gel strength after standing for 200 hours.

    摘要翻译: 本发明的目的是提供可以形成胶凝基质的水溶性丙烯酸酯聚合物。 当用于形成泥敷剂或冷却片时,胶凝剂不仅赋予所需的拉伸性,而且与多价金属具有适当的反应速率。 当凝胶固化时,胶凝基体不会凝胶渗透到支撑体或凝胶从支持体渗出的背面,并且容易地施加到载体上。 凝胶化凝胶化后,在25℃,相对湿度60%的条件下凝胶化,静置7.5小时后的凝胶强度为3200〜7000dyn / cm2,后处理为5000〜9000dyn / cm 2 静置200小时,静置7.5小时后的凝胶强度为>静置200小时后的凝胶强度。