公开(公告)号：US08552395B2

公开(公告)日：2013-10-08

申请号：US12969077

申请日：2010-12-15

Applicant: Shinji Kobayashi ,  Norimitsu Abe ,  Takahiro Soma ,  Akihiko Shirota

Inventor： Shinji Kobayashi ,  Norimitsu Abe ,  Takahiro Soma ,  Akihiko Shirota

IPC: G01J1/42

CPC classification number: C02F1/325 ,  C02F1/283 ,  C02F1/52 ,  C02F1/76 ,  C02F2201/3223 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2209/40 ,  C02F2209/44 ,  C02F2301/08 ,  C02F2303/04

Abstract: According to one embodiment, an ultraviolet irradiation system that sterilizes, disinfects, and inactivates raw water such as city water or underground water, includes a plurality of ultraviolet irradiation devices connected in series, and a controller configured to control output and non-output of the ultraviolet irradiation devices. The ultraviolet irradiation device includes a water processing vessel through which the raw water flows, an ultraviolet lamp configured to irradiate the raw water in the water processing vessel with ultraviolet rays, and an ultraviolet sensor configured to measure an amount of ultraviolet rays emitted from the ultraviolet lamp.

Abstract translation: 根据一个实施例，对诸如城市用水或地下水等原水进行灭菌，消毒，灭活的紫外线照射系统包括串联连接的多个紫外线照射装置，以及控制器，其被配置为控制所述紫外线照射系统的输出和非输出 紫外线照射装置。 紫外线照射装置包括：原水流过的水处理容器，配置成对水处理容器内的原水进行紫外线照射的紫外线灯;以及紫外线传感器，其被配置为测定从紫外线照射的紫外线的量 灯。

公开(公告)号：US08137542B2

公开(公告)日：2012-03-20

申请号：US12340321

申请日：2008-12-19

Applicant: Norimitsu Abe ,  Seiichi Murayama ,  Takeshi Ide ,  Akira Morikawa ,  Shojiro Tamaki

Inventor： Norimitsu Abe ,  Seiichi Murayama ,  Takeshi Ide ,  Akira Morikawa ,  Shojiro Tamaki

IPC: B01D65/02

CPC classification number: C02F1/444 ,  B01D61/18 ,  B01D61/22 ,  B01D65/02 ,  B01D65/027 ,  B01D2321/00 ,  B01D2321/04 ,  C02F1/32 ,  C02F1/38 ,  C02F1/5236 ,  C02F2209/006 ,  C02F2209/02 ,  C02F2209/03 ,  C02F2209/11 ,  C02F2209/40 ,  C02F2209/42

Abstract: Disclosed is a water treatment system including a raw water tank, a module which includes a filtration membrane, a feed pump, a filtered water tank, a backwash pump which flows filtered water backward from the filtered water tank to the module, a valve and a channel which switch the direction of the water flow between the forward and reverse directions, a controller which suspends the supply of raw water from the raw water tank to the module, switches the valve and channel to the reverse direction, makes the backwash pump to supply filtered water from the filtered water tank to the module thereby backwashing the filtration membrane, and washing drainage treatment line including which treats backwashing drainage generated by backwashing of the filtration membrane, and returns the water to the raw water tank.

Abstract translation: 公开了一种水处理系统，其包括原水槽，包括过滤膜，进料泵，过滤水箱，将过滤水从过滤水箱向后流动到模块的反冲洗泵的模块，阀和 通道，其将正向和反向的水流方向切换，将原水从原水槽供给到模块的控制器，将阀和通道反向切换，使反冲洗泵供应 过滤水从过滤的水箱到模块，从而反向洗涤过滤膜，以及洗涤排水处理管线，其包括处理通过过滤膜的反冲洗产生的反冲洗排水，并将水返回到原水槽。

公开(公告)号：US20110150708A1

公开(公告)日：2011-06-23

申请号：US12969177

申请日：2010-12-15

Applicant: Shinji KOBAYASHI ,  Norimitsu Abe ,  Takahiro Soma ,  Akihiko Shirota

Inventor： Shinji KOBAYASHI ,  Norimitsu Abe ,  Takahiro Soma ,  Akihiko Shirota

IPC: B01J19/08

CPC classification number: C02F1/325 ,  C02F1/283 ,  C02F1/52 ,  C02F1/76 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2209/44

Abstract: According to one embodiment, an ultraviolet irradiation device that sterilizes, disinfects, and inactivates raw water such as city water or underground water, includes a water processing vessel, an ultraviolet sensor, and a controller. The water processing vessel includes a water supply port into which the raw water flows, at least a pair of ultraviolet lamps configured to irradiate the raw water that flows into the water processing vessel with ultraviolet rays, and a water discharge port from which the raw water irradiated with the ultraviolet rays is discharged. The ultraviolet sensor is configured to measure an amount of ultraviolet rays irradiated from the ultraviolet lamps. The controller is configured to control turnon and turnoff of the ultraviolet lamps.

Abstract translation: 根据一个实施方案，对诸如城市用水或地下水等原水进行灭菌，消毒，灭活的紫外线照射装置包括水处理容器，紫外线传感器和控制器。 水处理容器包括：原水流入的供水口，至少一对紫外线灯，其配置成用紫外线照射流入水处理容器的原水;以及排水口，从该水源 用紫外线照射被排出。 紫外线传感器被配置为测量从紫外线灯照射的紫外线的量。 控制器被配置为控制紫外灯的旋转和关闭。

公开(公告)号：US20110024646A1

公开(公告)日：2011-02-03

申请号：US12900706

申请日：2010-10-08

Applicant: Norimitsu Abe ,  Takeshi Ide ,  Takahiro Soma ,  Seiichi Murayama ,  Masao Kaneko ,  Shojiro Tamaki ,  Masumi Nakadate ,  Akira Morikawa

Inventor： Norimitsu Abe ,  Takeshi Ide ,  Takahiro Soma ,  Seiichi Murayama ,  Masao Kaneko ,  Shojiro Tamaki ,  Masumi Nakadate ,  Akira Morikawa

IPC: C02F1/32

CPC classification number: C02F1/32 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/328

Abstract: An ultraviolet irradiation water treatment apparatus includes a vessel having a cylindrical side portion, and plural rod-shaped ultraviolet lamps are disposed in parallel with a central axis of the side portion in the vessel. A water inlet pipe through which water flows into the vessel is provided in an outer wall of the side portion at a position in a tangential direction of an inner periphery of the side portion.

Abstract translation: 紫外线照射水处理装置包括具有圆筒形侧部的容器，并且多个杆状紫外线灯与容器中的侧部的中心轴平行设置。 在侧部的内周的切线方向的位置处，在侧部的外壁上设置有水流入容器内的进水管。

公开(公告)号：US20100044285A1

公开(公告)日：2010-02-25

申请号：US12542571

申请日：2009-08-17

Applicant: Mii FUKUDA ,  Takashi Menju ,  Yasushi Yamamoto ,  Kazuyoshi Aoki ,  Takeshi Matsushiro ,  Ryoichi Arimura ,  Norimitsu Abe ,  Futoshi Kurokawa ,  Atsushi Yukawa ,  Tokusuke Hayami

Inventor： Mii FUKUDA ,  Takashi Menju ,  Yasushi Yamamoto ,  Kazuyoshi Aoki ,  Takeshi Matsushiro ,  Ryoichi Arimura ,  Norimitsu Abe ,  Futoshi Kurokawa ,  Atsushi Yukawa ,  Tokusuke Hayami

IPC: B01D15/18 ,  B01D35/157

CPC classification number: C02F9/00 ,  C02F1/001 ,  C02F1/008 ,  C02F1/283 ,  C02F1/385 ,  C02F1/52 ,  C02F1/66 ,  C02F1/76 ,  C02F2001/007 ,  C02F2209/001 ,  C02F2209/003 ,  C02F2303/16

Abstract: An activated carbon adder adds activated carbon to raw water before flocculating sedimentation, to adsorb suspended matter contained in raw water, a liquid cyclone is adapted to separate activated carbon with suspended matter adsorbed thereon, from raw water containing activated carbon, an inflow line is connected with the liquid cyclone so as to cause raw water containing activated carbon before flocculating sedimentation to flow into the liquid cyclone and swirl therein, an activated carbon discharge line discharges activated carbon spun down out of raw water containing activated carbon in the liquid cyclone, from the liquid cyclone, and a pretreated water discharge line discharges raw water having got rid of activated carbon as pretreated water from the liquid cyclone, allowing for a reduced amount of chemicals to be used, with production of a reduced amount of sludge.

Abstract translation: 活性炭加料器在絮凝沉淀前将活性炭加入到原水中，吸附原水中的悬浮物，液体旋风分离器将活性炭与吸附在其上的悬浮物质分离，从含活性炭的原水中分离， 在液体旋风器中引起含有活性炭的原水，然后絮凝沉淀物流入液体旋风并在其中旋流，活性炭排放管线从液体旋风分离器中排出含有活性炭的原水中的活性炭，从 液体旋风分离器和经预处理的排水管线从液体旋风分离器中排出已除去活性炭的原水作为预处理水，从而减少了使用的化学物质量，同时生产了减少量的污泥。

公开(公告)号：US20120235059A1

公开(公告)日：2012-09-20

申请号：US13421649

申请日：2012-03-15

Applicant: Shinji KOBAYASHI ,  Norimitsu ABE ,  Akihiko SHIROTA ,  Naoto YOSHIZAWA ,  Takahiro SOMA

Inventor： Shinji KOBAYASHI ,  Norimitsu ABE ,  Akihiko SHIROTA ,  Naoto YOSHIZAWA ,  Takahiro SOMA

IPC: C02F1/32

CPC classification number: C02F1/325 ,  C02F1/283 ,  C02F1/52 ,  C02F1/76 ,  C02F2201/3223

Abstract: A ultraviolet irradiation apparatus includes: an ultraviolet-irradiation water tank; a protection pipe provided in the ultraviolet-irradiation water tank; an ultraviolet lamp provided in the protection pipe to be lit up with high-frequency discharge at a frequency of 10 kHz to 10 MHz, inclusive; protection covers respectively provided on the two ends of the ultraviolet-irradiation water tank; an electronic ballast provided in one of the protection covers; and a feeder wire electrically connecting the ultraviolet lamp to the electronic ballast. Each of the ultraviolet-irradiation water tank and the protection covers is made of a conductive material with a specific conductivity and a relative magnetic permittivity whose product is equal to or larger than 1, and has a thickness at least three times as large as a skin depth at a frequency of a high-frequency current that flows through the ultraviolet lamp.

Abstract translation: 紫外线照射装置包括：紫外线照射水箱; 设置在紫外线照射水箱内的保护管; 设置在保护管内的紫外线灯以10kHz至10MHz的频率以高频放电点亮; 分别设置在紫外线照射水箱两端的防护罩; 设置在所述保护盖之一中的电子镇流器; 以及将紫外线灯电连接到电子镇流器的馈线。 紫外线照射水箱和保护罩中的每一个都由具有等于或大于1的比电导率和相对磁介电常数的导电材料制成，并且具有至少三倍于皮肤的厚度 在穿过紫外线灯的高频电流的频率处的深度。

公开(公告)号：US20090166276A1

公开(公告)日：2009-07-02

申请号：US12340321

申请日：2008-12-19

Applicant: Norimitsu ABE ,  Seiichi Murayama ,  Takeshi Ide ,  Akira Morikawa ,  Shojiro Tamaki

Inventor： Norimitsu ABE ,  Seiichi Murayama ,  Takeshi Ide ,  Akira Morikawa ,  Shojiro Tamaki

IPC: B01D35/22 ,  B01D33/50

CPC classification number: C02F1/444 ,  B01D61/18 ,  B01D61/22 ,  B01D65/02 ,  B01D65/027 ,  B01D2321/00 ,  B01D2321/04 ,  C02F1/32 ,  C02F1/38 ,  C02F1/5236 ,  C02F2209/006 ,  C02F2209/02 ,  C02F2209/03 ,  C02F2209/11 ,  C02F2209/40 ,  C02F2209/42

Abstract: Disclosed is a water treatment system including a raw water tank, a module which includes a filtration membrane, a feed pump, a filtered water tank, a backwash pump which flows filtered water backward from the filtered water tank to the module, a valve and a channel which switch the direction of the water flow between the forward and reverse directions, a controller which suspends the supply of raw water from the raw water tank to the module, switches the valve and channel to the reverse direction, makes the backwash pump to supply filtered water from the filtered water tank to the module thereby backwashing the filtration membrane, and washing drainage treatment line including which treats backwashing drainage generated by backwashing of the filtration membrane, and returns the water to the raw water tank.

Abstract translation: 公开了一种水处理系统，其包括原水槽，包括过滤膜，进料泵，过滤水箱，将过滤水从过滤水箱向后流动到模块的反冲洗泵的模块，阀和 通道，其将正向和反向的水流方向切换，将原水从原水槽供给到模块的控制器，将阀和通道反向切换，使反冲洗泵供应 过滤水从过滤的水箱到模块，从而反向洗涤过滤膜，以及洗涤排水处理管线，其包括处理通过过滤膜的反冲洗产生的反冲洗排水，并将水返回到原水槽。

公开(公告)号：US20080210608A1

公开(公告)日：2008-09-04

申请号：US12068918

申请日：2008-02-13

Applicant: Norimitsu Abe ,  Takeshi Ide ,  Takeshi Matsushiro ,  Hiroyuki Suzuki ,  Seiichi Murayama

Inventor： Norimitsu Abe ,  Takeshi Ide ,  Takeshi Matsushiro ,  Hiroyuki Suzuki ,  Seiichi Murayama

IPC: B01D63/00 ,  B01D15/14

CPC classification number: C02F1/325 ,  B01D21/0009 ,  B01D21/0012 ,  B01D21/32 ,  C02F1/001 ,  C02F1/5236 ,  C02F1/66 ,  C02F1/76 ,  C02F2001/007 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2209/005 ,  C02F2209/11 ,  C02F2301/043

Abstract: A water treatment system that performs a water purifying treatment by use of ultraviolet radiation, comprises a front stage ultraviolet radiation device for radiating ultraviolet light in a front stage process in a water purifying treatment process, a rear stage ultraviolet radiation device for radiating ultraviolet light in a rear stage process, and a controller for controlling these ultraviolet radiation devices.

Abstract translation: 一种通过使用紫外线照射进行水净化处理的水处理系统，包括在净水处理工序中的前段工序中照射紫外线的前级紫外线照射装置，将紫外线照射的后级紫外线照射装置 后级处理，以及用于控制这些紫外线照射装置的控制器。

公开(公告)号：US06921476B2

公开(公告)日：2005-07-26

申请号：US10644015

申请日：2003-08-20

Applicant: Norimitsu Abe ,  Setsuo Suzuki ,  Seiichi Murayama ,  Kotaro Iyasu ,  Kie Kubo ,  Kenji Taguchi

Inventor： Norimitsu Abe ,  Setsuo Suzuki ,  Seiichi Murayama ,  Kotaro Iyasu ,  Kie Kubo ,  Kenji Taguchi

IPC: C02F1/32 ,  B01F1/00 ,  B01F15/02 ,  B01J20/00 ,  C02F1/00 ,  C02F1/72 ,  C02F1/78

CPC classification number: C02F1/325 ,  C02F1/722 ,  C02F1/78 ,  C02F2201/3227 ,  C02F2201/326 ,  C02F2201/782 ,  C02F2201/784 ,  C02F2209/001 ,  C02F2209/005 ,  C02F2209/08 ,  C02F2209/20 ,  C02F2209/40

Abstract: A UV-assisted advanced-ozonation water treatment system comprises a water treating tank 1, an ozonic water tank 2, an ozonized gas generator 3, and a UV light source 4 disposed in the water treating tank 1 and having a UV-radiating surface 4a, and an ozonic water jetting device including jetting nozzles 5 for jetting the ozonic water onto the UV-radiating surface of the UV light source. An ozonized gas diffusing device 12 is placed in the ozonic water tank 2. An ozonized gas generated by the ozonized gas generator 3 and compressed by a compressor 13 at a pressure in the range of about 2 to about 3 kg/cm2 is diffused into the ozonic water tank 2 by the ozonized gas diffusing device 12. A high-pressure, a high-ozone-concentration ozonic water produced in the ozonized water tank 2 is jetted through the jetting nozzles 5 onto the UV-radiating surface 4a.

Abstract translation: 紫外线辅助先进臭氧化水处理系统包括设置在水处理槽1中的水处理槽1，臭氧水箱2，臭氧化气体发生器3和UV光源4，并具有UV辐射表面4 a和一个臭氧水喷射装置，其包括用于将臭氧水喷射到UV光源的UV辐射表面上的喷射喷嘴5。 将臭氧化气体扩散装置12放置在臭氧水箱2中。 由臭氧化气体发生器3产生的臭氧化气体，在压力为约2〜3kg / cm 2的压力下由压缩机13压缩的臭氧化气体被臭氧化的臭氧化气体 气体扩散装置12。 在臭氧水箱2中产生的高压，高臭氧浓度的臭氧水通过喷射喷嘴5喷射到UV辐射表面4a上。

公开(公告)号：US08507875B2

公开(公告)日：2013-08-13

申请号：US13421649

申请日：2012-03-15

Applicant: Shinji Kobayashi ,  Norimitsu Abe ,  Akihiko Shirota ,  Naoto Yoshizawa ,  Takahiro Soma

Inventor： Shinji Kobayashi ,  Norimitsu Abe ,  Akihiko Shirota ,  Naoto Yoshizawa ,  Takahiro Soma

IPC: C02F1/32

CPC classification number: C02F1/325 ,  C02F1/283 ,  C02F1/52 ,  C02F1/76 ,  C02F2201/3223

Abstract: A ultraviolet irradiation apparatus includes: an ultraviolet-irradiation water tank; a protection pipe provided in the ultraviolet-irradiation water tank; an ultraviolet lamp provided in the protection pipe to be lit up with high-frequency discharge at a frequency of 10 kHz to 10 MHz, inclusive; protection covers respectively provided on the two ends of the ultraviolet-irradiation water tank; an electronic ballast provided in one of the protection covers; and a feeder wire electrically connecting the ultraviolet lamp to the electronic ballast. Each of the ultraviolet-irradiation water tank and the protection covers is made of a conductive material with a specific conductivity and a relative magnetic permittivity whose product is equal to or larger than 1, and has a thickness at least three times as large as a skin depth at a frequency of a high-frequency current that flows through the ultraviolet lamp.

Abstract translation: 紫外线照射装置包括：紫外线照射水箱; 设置在紫外线照射水箱内的保护管; 设置在保护管内的紫外线灯以10kHz至10MHz的频率以高频放电点亮; 分别设置在紫外线照射水箱两端的防护罩; 设置在所述保护盖之一中的电子镇流器; 以及将紫外线灯电连接到电子镇流器的馈线。 紫外线照射水箱和保护罩中的每一个都由具有等于或大于1的比电导率和相对磁介电常数的导电材料制成，并且具有至少三倍于皮肤的厚度 在穿过紫外线灯的高频电流的频率处的深度。