公开(公告)号：US20090218514A1

公开(公告)日：2009-09-03

申请号：US11720842

申请日：2005-12-07

申请人： Derk Jan Wilfred Klunder ,  Maarten Van Herpen ,  Marcello Balistreri ,  Coen Liedenbaum ,  Menno Prins ,  Reinhold Wimberger-Friedl ,  Ralph Kurt

发明人： Derk Jan Wilfred Klunder ,  Maarten Van Herpen ,  Marcello Balistreri ,  Coen Liedenbaum ,  Menno Prins ,  Reinhold Wimberger-Friedl ,  Ralph Kurt

IPC分类号： G01J1/58

CPC分类号： G01N21/6456 ,  G01N21/6452 ,  G01N21/648 ,  G01N2021/1772 ,  G01N2021/6463 ,  G01N2021/6478 ,  G01N2201/0461

摘要： The invention relates to a method and an apparatus for the investigation of a sample material by multiple sample light spots (501) generated by evanescent waves. An array of source light spots (510) is generated by a multi-spot generator, e.g. a multi-mode interferometer (106), and mapped onto sample light spots (501) in a sample layer (302) by (micro-)lenses (202, 203) or by the Talbot effect. The input light (504) of the source light spots (510) is shaped such that all of it is totally internally reflected at the interface between a transparent carrier plate (301) and the sample layer (302). Thus the sample light spots (501) consist of evanescent waves only and are restricted to a limited volume. In a preferred application, fluorescence stimulated in the sample light spots (501) is detected with spatial resolution by a CCD array (401).

摘要翻译： 本发明涉及一种通过由ev逝波产生的多个样本光点（501）来研究样品材料的方法和装置。 源光点阵列（510）由多点发生器产生，例如， 多模干涉仪（106），并且通过（微）透镜（202,203）或通过Talbot效应将样品层（302）中的样品光点（501）映射。 源光点（510）的输入光（504）被成形为使得它们全部在内部被透明载体板（301）和样品层（302）之间的界面反射。 因此，样本光点（501）仅由ev逝波组成，并被限制在有限的体积。 在优选的应用中，通过CCD阵列（401）以空间分辨率检测样品光点（501）中刺激的荧光。

公开(公告)号：US07465943B2

公开(公告)日：2008-12-16

申请号：US11296701

申请日：2005-12-08

申请人： Vadim Yevgenyevich Banine ,  Sonia Margart Skelly ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Vadim Yevgenyevich Banine ,  Sonia Margart Skelly ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21K5/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

摘要： A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.

摘要翻译： 光刻设备包括收集器，其被配置为收集来自辐射源的辐射，所述收集器包括形成分离的隔室的多个壳体，以及包括气体入口和气体出口的清洁装置，所述清洁装置构造成清洁所述多个 通过引导气流从入口通过隔间引导到​​出口。 清洁装置包括分配系统，其配置为将气流分成几个子流，每个子流对应于一个或多个隔间，以及被配置为控制子流的相对量的控制系统。

公开(公告)号：US20080302976A1

公开(公告)日：2008-12-11

申请号：US12096183

申请日：2006-11-28

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Marcello Leonardo Mario Balistreri ,  Derk Jan Wilfred Klunder ,  Coen Theodorus Hubertus Fransiscus Liedenbaum

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Marcello Leonardo Mario Balistreri ,  Derk Jan Wilfred Klunder ,  Coen Theodorus Hubertus Fransiscus Liedenbaum

IPC分类号： G01T1/10

CPC分类号： G01N21/6456

摘要： The present invention provides a sensor and a method for detecting an optically variable molecule (9) in a sample (3). The sensor comprises an excitation radiation source (1) for irradiating the sample (4) and exciting the optically variable molecule (9), thus generating a luminescence signal (7). The sensor furthermore comprises a modulation means (4) for modulating the excitation radiation beam (2) in a direction different from, preferably substantially perpendicular to, a scanning direction of the excitation radiation beam (2) over the sample (3). The method and sensor according to the invention lead to an improved signal-to-noise ratio by reducing and even minimising the background signal in the luminescence signal (7) and to an improved accuracy by minimising signals coming from false-positives.

摘要翻译： 本发明提供一种用于检测样品（3）中的光学可变分子（9）的传感器和方法。 传感器包括用于照射样品（4）并激发光学可变分子（9）的激发辐射源（1），从而产生发光信号（7）。 传感器还包括调制装置（4），用于在与样品（3）上的激发辐射束（2）的扫描方向不同，优选地基本上垂直的方向上调制激发辐射束（2）。 根据本发明的方法和传感器通过减少甚至最小化发光信号（7）中的背景信号并通过最小化来自假阳性的信号来提高精度，从而提高了信噪比。

公开(公告)号：US07462850B2

公开(公告)日：2008-12-09

申请号：US11296702

申请日：2005-12-08

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： H05G2/00

CPC分类号： G03F7/70933 ,  G03F7/70925

摘要： A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.

摘要翻译： 清洁装置被配置为清洁EUV光刻设备的EUV光学元件。 部分自由基压力范围在0.1-10Pa之间。清洁装置可以被配置在光刻设备的清洁茧内用于离线清洁。 它也可以在设备内的特定位置进行配置，以便在生产过程中清洁附近的光学元件。 在0.1-10Pa的压力范围内，原子氢进入光学器件的渗透率很高，而分子氢和氢消耗的复合受到限制。

公开(公告)号：US20080265175A1

公开(公告)日：2008-10-30

申请号：US11995826

申请日：2006-07-17

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Sjoerd Stallinga

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Sjoerd Stallinga

IPC分类号： G01J1/58

CPC分类号： G01N21/6452 ,  G01N21/648 ,  G01N2021/6478

摘要： The invention relates to a device (1) for detection of excitation (110) using a multiple spot arrangement (60), in which a multiple spot generator (50) is matched to the multiple spot arrangement (60) in such a way that light (100) entering the multiple spot generator (50) will be guided to defined areas on the multiple spot arrangement (60).

摘要翻译： 本发明涉及一种用于使用多点排列（60）检测激励（110）的装置（1），其中多点发生器（50）与多点排列（60）匹配，使得光 （100）进入多点发生器（50）将被引导到多点布置（60）上的限定区域。

公开(公告)号：US20080157006A1

公开(公告)日：2008-07-03

申请号：US11645809

申请日：2006-12-27

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

IPC分类号： G21G5/00

CPC分类号： G03F7/70916 ,  G03F7/70858 ,  H05G2/003 ,  H05G2/005

摘要： A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.

摘要翻译： 用于捕集来自碎屑产生辐射源的污染物质的碎片缓解系统。 该系统包括构造和布置成围绕轴线旋转的污染屏障，以及构造和布置成提供用于使来自辐射源的带电碎片偏转的磁场的磁体结构。 磁体结构被构造和布置成通过污染屏障提供磁场。 当通过污染屏障时，磁场沿着通常与污染屏障旋转轴线重合的平面定向。

公开(公告)号：US20080149854A1

公开(公告)日：2008-06-26

申请号：US11643951

申请日：2006-12-22

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Mandeep Singh ,  Harm-Jan Voorma ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Mandeep Singh ,  Harm-Jan Voorma ,  Derk Jan Wilfred Klunder

IPC分类号： G21G5/00 ,  G02B5/08

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/067

摘要： An EUV illumination system, for example, for use in a photolithographic apparatus is configured to condition a radiation beam. A hydrogen radical source configured to supply gas containing hydrogen or hydrogen radicals into the illumination system. The hydrogen gas is effective to remove carbonaceous contamination from the surface of a mirror in the illumination system or to form a buffer against unwanted gases. In order to prevent damage by hydrogen that penetrates the mirror, the mirror comprises a layer made of metal non-metal compound adjacent a reflection surface of the mirror. A transition metal carbide, nitride, boride or silicide compound or mixture thereof may be used for example.

摘要翻译： 例如，用于光刻设备的EUV照明系统被配置为调节辐射束。 氢自由基源，被配置为将含有氢或氢自由基的气体供应到照明系统中。 氢气有效地从照明系统中的反射镜表面除去碳质污染物或形成缓冲液以防止不需要的气体。 为了防止穿透反射镜的氢的破坏，反射镜包括与反射镜的反射面相邻的金属非金属化合物制成的层。 可以使用过渡金属碳化物，氮化物，硼化物或硅化物或其混合物。

公开(公告)号：US20080142741A1

公开(公告)日：2008-06-19

申请号：US11637937

申请日：2006-12-13

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Derk Jan Wilfred Klunder

IPC分类号： G21K5/00 ,  H05G2/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

摘要： The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.

摘要翻译： 本发明涉及一种用于产生电磁辐射的辐射系统。 辐射系统包括一对电极，其构造和布置成产生等离子体中的第一物质的等离子体和夹持物。 辐射系统还包括等离子体复合表面，该等离子体复合表面被布置成接近于夹紧，并且被配置为中和多个等离子体颗粒。

公开(公告)号：US07336416B2

公开(公告)日：2008-02-26

申请号：US11115406

申请日：2005-04-27

申请人： Maarten Marinus Johannes W Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes W Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： F21V9/04 ,  F21V9/06 ,  G02B5/08 ,  G02B5/20 ,  G02B1/10 ,  G03B27/72

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： 多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。 该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。 因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。 可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。