公开(公告)号：US07465943B2

公开(公告)日：2008-12-16

申请号：US11296701

申请日：2005-12-08

申请人： Vadim Yevgenyevich Banine ,  Sonia Margart Skelly ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Vadim Yevgenyevich Banine ,  Sonia Margart Skelly ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21K5/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

摘要： A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.

摘要翻译： 光刻设备包括收集器，其被配置为收集来自辐射源的辐射，所述收集器包括形成分离的隔室的多个壳体，以及包括气体入口和气体出口的清洁装置，所述清洁装置构造成清洁所述多个 通过引导气流从入口通过隔间引导到​​出口。 清洁装置包括分配系统，其配置为将气流分成几个子流，每个子流对应于一个或多个隔间，以及被配置为控制子流的相对量的控制系统。

公开(公告)号：US07750326B2

公开(公告)日：2010-07-06

申请号：US11150466

申请日：2005-06-13

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： H05G2/00

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供氢自由基的源，与源结合使用的引导件，用于将氢自由基引导到由氢自由基靶向的施用表面。 引导件具有氢自由基复合常数小于0.2的涂层。 以这种方式，可以以较少的损失运输自由基，并且能够更好地与应用表面（例如镜面）上的剩余污染物相互作用。

公开(公告)号：US20100149512A1

公开(公告)日：2010-06-17

申请号：US12718682

申请日：2010-03-05

申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/72 ,  G02B5/22

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on the multi-layer stack. The spectral filter top layer includes a first spectral purity enhancement layer that includes a first material m1 and has a first layer thickness d1, an intermediate layer that includes a second material m2 and has a second layer thickness d2. The intermediate layer is arranged on the multi-layer stack top layer. The first material is selected from SiN, Si3N4, SiO2, ZnS, Te, diamond, CsI, Se, SiC, amorphous carbon, MgF2, CaF2, TiO2, Ge, PbF2, ZrO2, BaTiO3, LiF or NaF. The second material includes a material different from the first material, and d1+d2 has a thickness between 1.5 and 40 nm.

摘要翻译： 多层反射镜包括多层堆叠。 多层堆叠包括多层交叠层，多层叠层顶层和布置在多层堆叠上的光谱过滤器顶层。 光谱过滤器顶层包括第一光谱纯度增强层，其包括第一材料m1并且具有第一层厚度d1，包括第二材料m2并具有第二层厚度d2的中间层。 中间层布置在多层堆叠顶层上。 第一种材料选自SiN，Si3N4，SiO2，ZnS，Te，金刚石，CsI，Se，SiC，无定形碳，MgF2，CaF2，TiO2，Ge，PbF2，ZrO2，BaTiO3，LiF或NaF。 第二材料包括与第一材料不同的材料，并且d1 + d2具有在1.5和40nm之间的厚度。

公开(公告)号：US20090309048A1

公开(公告)日：2009-12-17

申请号：US12465118

申请日：2009-05-13

申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardu Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardu Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

IPC分类号： G01J3/10 ,  G21K5/00

CPC分类号： G03F7/70916 ,  G01N21/15 ,  G03F7/70558

摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。

公开(公告)号：US07504643B2

公开(公告)日：2009-03-17

申请号：US11444535

申请日：2006-06-01

申请人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G03F7/20 ,  G21G5/00 ,  A61N5/00 ,  C23F1/00 ,  C25F1/00 ,  H05H1/00 ,  H05H1/24

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.

摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积以及配置成提供气体的泵 缓冲体积在0.001毫巴（0.1帕）至1毫巴（100帕）之间的压力。 清洁装置还可以包括气体返回系统。

公开(公告)号：US07463413B2

公开(公告)日：2008-12-09

申请号：US11337807

申请日：2006-01-24

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： F21V9/04 ,  F21V9/06 ,  G02B5/08 ,  G02B5/20

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： 多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。 该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。 因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。 可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。

公开(公告)号：US20080273188A1

公开(公告)日：2008-11-06

申请号：US11797358

申请日：2007-05-02

申请人： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Vadim Yevgenyevich Banine ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Derk Jan Wilfred Klunder

发明人： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Vadim Yevgenyevich Banine ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/74

CPC分类号： G03F7/70916 ,  G03F7/70558 ,  G03F7/7085

摘要： A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.

摘要翻译： 一个装置被安排来测量与辐射有关的数量。 该装置包括被配置为测量该数量的传感器，布置成保护传感器免受从被配置为发射极紫外辐射的源射出的入射颗粒的屏幕，以及被配置为重定向由该源发射的超过紫外线的过滤器， 到传感器。

公开(公告)号：US07863591B2

公开(公告)日：2011-01-04

申请号：US12465118

申请日：2009-05-13

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Niels Machiel Driessen

IPC分类号： G21K5/00

CPC分类号： G03F7/70916 ,  G01N21/15 ,  G03F7/70558

摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.

摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。

公开(公告)号：US07598503B2

公开(公告)日：2009-10-06

申请号：US11451601

申请日：2006-06-13

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Johannes Hubertus Josephina Moors

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Johannes Hubertus Josephina Moors

IPC分类号： G01J3/10 ,  G21K5/10 ,  H05G2/00

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

摘要翻译： 公开了一种光刻设备。 该装置包括用于供应氢自由基的源，与源结合使用的引导件，用于将氢自由基引导到由氢自由基靶向的施加表面。 引导件具有氢自由基复合常数小于0.2的涂层。 以这种方式，可以以较少的损失运输自由基，并且能够更好地与应用表面（例如镜面）上的剩余污染物相互作用。

公开(公告)号：US07736820B2

公开(公告)日：2010-06-15

申请号：US11418465

申请日：2006-05-05

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Koen Van Ingen Schenau ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Koen Van Ingen Schenau ,  Derk Jan Wilfred Klunder

IPC分类号： G03F1/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G03F7/70575 ,  G21K1/062

摘要： An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： EUV掩模在多层反射镜之上包括光谱纯度增强层，用于EUV光刻设备中。 在光谱纯度增强层的顶部，提供了图案化的吸收层。 光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可以存在中间层或第二光谱纯度增强层和中间层。 图案化的吸收层本身也可以用作抗反射（AR）涂层。 该吸收层的AR效应是图案中孔径尺寸的函数。 可以增强掩模的光谱纯度，使得DUV辐射比EUV辐射相对更强。