公开(公告)号：US20030098231A1

公开(公告)日：2003-05-29

申请号：US10334564

申请日：2002-12-31

Applicant: Unaxis Balzers Aktiengesellschaft

Inventor： Felix Mullis

IPC: C23C014/32 ,  B05D001/00

CPC classification number: H01J37/32935 ,  H01J37/3299

Abstract: Method for manufacturing a workpiece by a vacuum treatment process includes providing a vacuum treatment system with first second parts in a vacuum chamber. Either a sensor or an adjusting element with first signal connection is mounted on the second part. An electronic unit in the chamber has a reference potential and a second electric signal connection. The first part is connected to a system reference potential. A workpiece goes into the chamber and the method includes operating the second part at a further electric potential different from the system reference potential by at least 12 V. The method includes connecting the first electric signal connection to the second electric signal connection and maintaining the reference connection during operation on the further electric potential by metallically connecting the reference connection to the second part.

Abstract translation: 通过真空处理工艺制造工件的方法包括在真空室中提供具有第一第二部分的真空处理系统。 传感器或具有第一信号连接的调节元件安装在第二部分上。 腔室中的电子单元具有参考电位和第二电信号连接。 第一部分连接到系统参考电位。 工件进入腔室，该方法包括将不同于系统参考电位的另一个电位操作第二部分至少12V。该方法包括将第一电信号连接与第二电信号连接相连并保持参考 通过金属地连接参考连接到第二部分，在进一步的电势操作期间的连接。

公开(公告)号：US20030054620A1

公开(公告)日：2003-03-20

申请号：US10244476

申请日：2002-09-17

Inventor： Junri Ishikura

IPC: B05D001/00

CPC classification number: C23C14/228 ,  C23C14/22 ,  C23C14/543

Abstract: To provide a film forming method, a film forming apparatus and a manufacturing method of ultrafine particle films, implementing an efficient and proper film thickness control. The manufacturing method of ultrafine particle films includes the steps of: guiding metal ultrafine particles generated in an ultrafine particle generation chamber together with a carrier gas through a conveying pipe to the film forming chamber; and forming a film on a substrate installed over a stage in the film forming chamber through a nozzle, and the evaporated amount of said evaporation material or the thickness of a formed film is controlled by using either the intensity of the emission spectrum intrinsic to an evaporation material or that of the emission spectrum intrinsic to the carrier gas, or else by using both of these.

Abstract translation: 提供一种成膜方法，成膜装置和超细颗粒膜的制造方法，实现有效且适当的膜厚控制。 超细颗粒膜的制造方法包括以下步骤：将超细粒子产生室中产生的金属超细颗粒与载气一起通过输送管引导至成膜室; 并且通过喷嘴在安装在成膜室的台上的基板上形成膜，并且通过使用蒸发固有的发射光谱的强度来控制所述蒸发材料的蒸发量或所形成的膜的厚度 材料或载气固有的发射光谱的材料，或通过使用这两者。

公开(公告)号：US20030049373A1

公开(公告)日：2003-03-13

申请号：US10238799

申请日：2002-09-10

Inventor： Johannes Hubertus Antonius Van De Rijdt ,  Olav Johannes Seijger ,  Arnoldus Johannes Martinus Joseph Ras

IPC: C23C016/00 ,  B05D001/00

CPC classification number: H05K3/125 ,  B05C5/0212

Abstract: The invention relates to an apparatus (1) for and a method of applying a substance (16), such as a solution containing an electroluminescent (EL) material or a suspension containing silver particles, to a substrate (7). The apparatus comprises a substrate carrier (5), a nozzle head (12) comprising at least one nozzle (12A) for ejecting the substance (16), and means (2,3,4) for moving the substrate carrier (5) and the nozzle head (12) with respect to each other. It further comprises a first imaging device (13) fixed relative to the nozzle head (12), a second imaging device (9), and one or more references (8) fixed relative to and positioned within the image field of the second imaging device (9). The mechanical link between the substrate (7) and the nozzle head (12) is thus substantially circumvented and inaccuracies originating from this link are avoided.

Abstract translation: 本发明涉及用于将含有电致发光（EL）材料的溶液或含有银颗粒的悬浮液的物质（16）施加到基板（7）上的装置（1）和方法。 该设备包括一个衬底托架（5），一个包括至少一个用于喷射物质（16）的喷嘴（12A）的喷嘴头（12）和用于移动衬底托架（5）的装置（2,3,4）和 所述喷嘴头（12）相对于彼此。 它还包括相对于喷嘴头（12）固定的第一成像装置（13），第二成像装置（9）和相对于第二成像装置（12）固定在第二成像装置 （9）。 因此基板（7）和喷嘴头（12）之间的机械连接因此被基本绕过，并且避免了源自该连杆的错误。

公开(公告)号：US20030012951A1

公开(公告)日：2003-01-16

申请号：US10079834

申请日：2002-02-22

Inventor： Mark S.F. Clarke ,  Pavel Nikolaev ,  Sivaram Arepalli

IPC: B05D001/00 ,  B32B005/02

CPC classification number: B82Y15/00 ,  B82Y30/00 ,  D01F9/127 ,  Y10T428/249929 ,  Y10T428/249945 ,  Y10T428/2975

Abstract: Methods of analyzing single-walled carbon nanotube structures dispersed in aqueous solutions with dispersal agents are accomplished by depositing the structures in solution on a suitable substrate and forming an array of isolated structures that are substantially free of contaminating material. Transmission electron microscopy and atomic force microscopy are utilized to characterize the isolated structures formed on the substrate.

Abstract translation: 分散在具有分散剂的水溶液中的单壁碳纳米管结构的方法通过将溶液中的结构沉积在合适的衬底上并形成基本上不含污染材料的分离结构的阵列来实现。 透射电子显微镜和原子力显微镜用于表征在基底上形成的分离结构。

公开(公告)号：US20030003593A1

公开(公告)日：2003-01-02

申请号：US10211293

申请日：2002-08-05

Applicant: GroupTek, Inc., a Delaware corporation

Inventor： Donald F.H. Wallach

IPC: G01N033/52 ,  B05D001/00

CPC classification number: G01N21/78 ,  G01N21/76

Abstract: A detector for monitoring an analyte includes an analyte-sensing composition. The analyte-sensing composition has a visible color intensity or emission intensity (e.g., fluorescence intensity) that changes as the analyte concentration contacting the detector changes. The intensity changes can be visible to the human eye, or identified by an instrument. The analyte can include carbon dioxide, a volatile amine or a volatile carboxylic acid.

公开(公告)号：US20020192357A1

公开(公告)日：2002-12-19

申请号：US09881750

申请日：2001-06-15

Inventor： Mark E. Dion

IPC: B05D001/02 ,  B05D001/00

CPC classification number: B05D5/06 ,  B01F13/1055 ,  B01F13/1063 ,  B01F15/00123 ,  B01F2215/005 ,  B05B7/32 ,  B05B12/1418 ,  G01J3/46

Abstract: A method of painting a product in a production painting facility includes the steps of selecting a hue and a chroma corresponding to the hue. The production painting facility utilizes a plurality of base paints that are mixable to constitute the hue and chroma selected. The base paints are pumped to a blending device in a ratio determined to be necessary to formulate the hue and chroma selected. The base paints are blended in the blending device according to the predetermined ratio forming a secondary paint having the hue and chroma previously selected. The secondary paint is delivered to a paint applicator such as an atomizer bell or an equivalent and is applied to the product being painted. The base paints are mixed at the production facility to create a virtually limitless number of secondary paint colors with only a limited number of base paints.

公开(公告)号：US20020168465A1

公开(公告)日：2002-11-14

申请号：US10072638

申请日：2002-02-07

Inventor： Victor Steven LaFay ,  Stephen Louis Neltner

IPC: B05D001/00

CPC classification number: B22C1/14 ,  B22C3/00

Abstract: Sand casting is an old art. In this molding process sand is compacted around a pattern and the pattern is removed, leaving a mold cavity the shape of the pattern. Molten metal can then be poured into the cavity to form the object. To increase the life of the mold, and to make removal of the pattern easier, the pattern must be coated with a protective material. Despite many available pattern coating compounds, mineral seal oil, and a mixture of mineral seal and clay, have been the commercial choices. Hereby the advantages of mineral seal oil-clay pattern coating compositions are retained without its detriments by utilizing a vegetable oil base in a pattern coating composition to replace some or all of the mineral seal oil to provide biodegradable coating compositions with reduced VOC content.

Abstract translation: 砂铸是一种古老的艺术。 在该模制过程中，砂在模型周围压实，图案被去除，使得模腔具有图案的形状。 然后将熔融的金属倒入空腔中以形成物体。 为了增加模具的使用寿命，并且更容易去除图案，图案必须用保护材料涂覆。 尽管许多可用的图案涂料化合物，矿物密封油以及矿物密封和粘土的混合物已经成为商业选择。 因此，矿物密封油 - 粘土图案涂料组合物的优点通过利用图案涂料组合物中的植物油基质来替代部分或全部矿物密封油，以提供具有降低的VOC含量的可生物降解的涂料组合物而不损害其。

公开(公告)号：US20020155644A1

公开(公告)日：2002-10-24

申请号：US10127273

申请日：2002-04-22

Inventor： Kevin G. Donohoe ,  Guy T. Blalock

IPC: B05D001/00 ,  H01L021/332 ,  G01L021/30

CPC classification number: C23C16/45565 ,  C23C16/4405 ,  C23C16/45508 ,  C23C16/4558 ,  C23C16/507 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32522 ,  H01L21/67109

Abstract: A plasma process reactor is disclosed that allows for greater control in varying the functional temperature range for enhancing semiconductor processing and reactor cleaning. The temperature is controlled by splitting the process gas flow from a single gas manifold that injects the process gas behind the gas distribution plate into two streams where the first stream goes behind the gas distribution plate and the second stream is injected directly into the chamber. By decreasing the fraction of flow that is injected behind the gas distribution plate, the temperature of the gas distribution plate can be increased. The increasing of the temperature of the gas distribution plate results in higher O2 plasma removal rates of deposited material from the gas distribution plate. Additionally, the higher plasma temperature aids other processes that only operate at elevated temperatures not possible in a fixed temperature reactor.

公开(公告)号：US20020148282A1

公开(公告)日：2002-10-17

申请号：US10104203

申请日：2002-03-22

Applicant: Symyx Technologies, Inc.

Inventor： Damian Hajduk ,  Paul Mansky

IPC: B05D001/00 ,  G01N011/06

CPC classification number: G01N11/06

Abstract: An apparatus and method for measuring viscosity or related properties of fluid samples in parallel is disclosed. The apparatus includes a plurality of tubes and reservoirs in fluid communication with the tubes. The tubes provide flow paths for the fluid samples, which are initially contained within the reservoirs. The apparatus also includes a mechanism for filling the reservoirs with the fluid samples, and a device for determining volumetric flow rates of fluid samples flowing from the reservoirs through the plurality of tubes simultaneously. The disclosed apparatus is capable of measuring viscosity or related properties of at least five fluid samples simultaneously. Useful reservoirs and tubes include syringes.

公开(公告)号：US20020141477A1

公开(公告)日：2002-10-03

申请号：US10107361

申请日：2002-03-28

Applicant: Kabushiki Kaisha Toshiba

Inventor： Hiroshi Akahori ,  Shuichi Samata

IPC: B05D001/00 ,  F27D011/00 ,  G01J005/00 ,  C23C016/00 ,  A21B001/00

CPC classification number: C23C16/52

Abstract: A radiant light from a reaction chamber is measured outside the chamber, and a relation between a change of a radiation ratio of the radiant light, and a change of a thickness of a thin film is acquired, when a CVD apparatus is used to form the film on a substrate in the chamber. After acquiring the relation between the change of the radiation ratio and the change of the film thickness, the change of the radiation ratio is measured, when the CVD apparatus is used to form the film. The thickness of the film is estimated from the change of the radiation ratio measured in measuring the change of the radiation ratio from the relation between the change of the radiation ratio and the change of the film thickness acquired in acquiring the relation between the change of the radiation ratio and the change of the film thickness.

Abstract translation: 在室外测量来自反应室的辐射光，并且当使用CVD装置形成时，获得辐射光的辐射比的变化与薄膜的厚度的变化之间的关系 在室中的基底上的膜。 在获得辐射比的变化和膜厚的变化之间的关系之后，当使用CVD装置形成膜时，测量辐射比的变化。 膜的厚度是根据从辐射比的变化与所获取的膜厚变化之间的关系中测定的辐射比的变化而测定的放射率的变化来推定的， 辐射比和膜厚度的变化。