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公开(公告)号：US12080520B2
公开(公告)日：2024-09-03
申请号：US18080547
申请日：2022-12-13
发明人： Anthony Oliveti , Dean Maw , Keith Rouse , Gary Russell , Tigran Poghosyan
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J2237/3322
摘要： A plasma generation system includes an impedance matching network calibrated to map desired matching network impedance values to closest available settings of impedance control components. The tuning controller defines a set of target impedance values spaced-apart throughout the tuning range and drives the matching network to generate a set of closest frame tuning values proximate to each target impedance value. The tuning controller computes interpolated tuning values between adjacent pairs of frame tuning values and stores a tuning database that maps available matching network impedance values to specific sets of settings for the impedance control components. After the calibration stage, the tuning controller automatically utilizes the tuning database to map desired matching network impedance values to available settings of the impedance control components on an ongoing basis. Representative embodiments include variable loading and tuning capacitors in series with a fixed or variable phase-shift inductor.
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公开(公告)号：US12051549B2
公开(公告)日：2024-07-30
申请号：US17879317
申请日：2022-08-02
发明人： Anthony Oliveti , Tigran Poghosyan
CPC分类号： H01G5/16 , H01G5/0132 , H01G5/014
摘要： A variable capacitor includes first and second movable capacitor plate assemblies disposed in the interior of an enclosure and include a first and second movable capacitor plates. A first fixed capacitor plate and a second fixed capacitor plate are respectively disposed proximal to the first and second movable capacitor plates. The capacitor plates may comprise variably interdigitated concentric cylindrical blades. The first movable capacitor plate and the first fixed capacitor plate may be coaxial with the second movable capacitor plate and the second fixed capacitor plate. Actuators may be provided for independently advancing and retracting the first and second movable capacitor plate assemblies with respect to the first and second fixed capacitor plate assemblies to vary the capacitance of the variable capacitor by independently adjusting an amount of interdigitization of the capacitor plates of respective capacitor plate assembly pairs.
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公开(公告)号：US20240145221A1
公开(公告)日：2024-05-02
申请号：US18484565
申请日：2023-10-11
CPC分类号： H01J37/32917 , G01R27/2605 , H01J37/32183 , H01J2237/24564 , H01J2237/332
摘要： A broad-band sensor for a radio frequency plasma processing system that includes a reaction chamber housing an electrode within a vacuum processing environment. The sensor includes an inductive pickup positioned in the vacuum processing environment proximate to the electrode. The inductive pickup includes a wire formed into a loop extending in an azimuthal direction about a symmetry axis of the reaction chamber. A lead carrying an electric signal from the inductive pickup extends through a vacuum wall of the reaction chamber outside the vacuum processing environment. An attenuator circuit including an electrical resistance bridge couples the lead to a signal carrier extending outside the vacuum processing environment. The broad-band sensor has radio frequency detection capability for measuring electromagnetic surface modes within the plasma chamber and coupling the measured electromagnetic surface modes to the signal carrier.
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公开(公告)号：US11961711B2
公开(公告)日：2024-04-16
申请号：US17152634
申请日：2021-01-19
CPC分类号： H01J37/32183 , H03H7/38 , H01J2237/24564
摘要： A method of providing data on radio frequency pulses in a radio frequency plasma processing system, the method including measuring an electrical parameter within a matching network of the radio frequency plasma processing system; determining an attribute of the measurement of the electrical parameter; defining a first statistic for the attribute of the measurement of the electrical parameter; defining a second statistic based on the first statistic for at least one of a phase and a process; delivering the first statistic and second statistic to a user; and storing the first statistic and the second statistic within the matching network.
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公开(公告)号：US11887820B2
公开(公告)日：2024-01-30
申请号：US17145221
申请日：2021-01-08
IPC分类号： H01J37/32
CPC分类号： H01J37/32568 , H01J37/3255 , H01J37/32183 , H01J37/32577
摘要： A radio frequency plasma processing system including a reaction chamber, an electrode having an electrode symmetry axis, the electrode disposed in the reaction chamber, and a plurality of plates, each having an electrically conducting layer, disposed in the reaction chamber azimuthally with respect to the electrode symmetry axis around a perimeter of the electrode at a gap from the electrode surface, each of the plurality of plates connected to an electrical ground through a variable reactance circuit.
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公开(公告)号：US20230141067A1
公开(公告)日：2023-05-11
申请号：US18093016
申请日：2023-01-04
发明人： Anthony OLIVETI
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J2237/3322
摘要： A method and system for plasma arc suppression includes a RF generator supplying power to a plasma chamber coupled to an impedance matching network reacting to impedance changes to match an impedance of the plasma chamber with an impedance of the radio frequency generator. An arc suppression device coupled to the RF generator and the plasma chamber detects plasma arcing causing a sharp impedance change increasing reflection of the power by the plasma chamber and switches a power dissipator reducing the power delivered to the plasma chamber extinguishing or mitigating the plasma arcing. The power dissipator is switched more quickly than the impedance matching network reacts to the sharp impedance change. For example, the impedance matching network may react to the impedance change on an order of hundredths of milliseconds or more, while the arc suppression device switches the power dissipator on an order of microseconds or less.
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公开(公告)号：US20220301826A1
公开(公告)日：2022-09-22
申请号：US17837767
申请日：2022-06-10
发明人： Gary Russell , Keith Rouse , Dean Maw
摘要： A method for repetitive tuning of a matching network in a radio frequency plasma processing device, the method including detecting a condition within the matching network and determining if the condition is a known condition for the matching network. Also, finding a prior solution and to the condition when the condition is the known condition for the matching network; and replicating the prior solution for the condition in the matching network.
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公开(公告)号：US20220189740A1
公开(公告)日：2022-06-16
申请号：US17685764
申请日：2022-03-03
发明人： Anthony Oliveti , Daniel Catalan , Liang Ouyang
摘要： A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A controller of the RF matching network receives the DC magnitude and phase error signals and varies an impedance of the RF matching network in response to the DC magnitude and phase error signals. The matching network operates in a first mode until a tuning dead-zone is determined. Once a tuning dead-zone is determined, the matching network operates in additional modes until the network is tuned. The controller uses a composite value of magnitude and phase error to drive the variable tuning and load capacitors. In some cases, a blended mode (representing multiple tuning algorithms concurrently) may be implemented as a single mode that weights across what would have been multiple modes and thereby tunes the network using a weighted blended mode.
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公开(公告)号：US11290080B2
公开(公告)日：2022-03-29
申请号：US16768224
申请日：2018-11-29
发明人： Liang Ouyang , Daniel Catalan , Anthony Oliveti
摘要： A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A controller of the RF matching network is configured to receive the DC magnitude and phase error signals and to vary an impedance of the RF matching network in response to the DC magnitude and phase error signals. The matching network operates in a first mode until a tuning dead-zone is determined. Once a tuning dead-zone is determined, the matching network operates in additional modes until the network is tuned. The controller uses a composite value of magnitude and phase error to drive of the variable tuning and load capacitors.
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公开(公告)号：US20210225613A1
公开(公告)日：2021-07-22
申请号：US17152625
申请日：2021-01-19
IPC分类号： H01J37/32
摘要： A method of controlling a radio frequency processing system, the method including determining an end time of a radio frequency pulse; stopping a load applied to the radio frequency processing system based on the end time of the radio frequency pulse; adjusting an additional load having a predetermined impedance applied to the radio frequency processing system in response to the determined end time; determining a start point of a second radio frequency pulse; and stopping the additional load before the second radio frequency pulse occurs.
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