公开(公告)号：US5766359A

公开(公告)日：1998-06-16

申请号：US802790

申请日：1997-02-18

申请人： Eggo Sichmann ,  Reinhard Gerigk

发明人： Eggo Sichmann ,  Reinhard Gerigk

IPC分类号： B05C11/08 ,  B05C11/10 ,  B05C5/00

CPC分类号： B05C11/1039 ,  B05C11/08 ,  B05C11/10 ,  B05C11/1042

摘要： An apparatus for surface coating or for lacquering a substrate, such as a disk-shaped substrate 2, which can be placed on a substrate carrier 14 and can be driven or given a rotating movement by means of a drive device, wherein the material or the lacquer fluid 5 to be applied is placed on the substrate 2 from a feed device 6. The fluid medium or the lacquer 4 released by the substrate support 14 is delivered at least to a first collecting reservoir 17 which is connected with at least one filter 28, from where the fluid is indirectly or directly conducted via a pump 29 to the first collecting reservoir 27, wherein an underpressure can be set between a first flow-off line 33 of the first collecting reservoir 27 and the pump 29.

摘要翻译： 用于表面涂覆或用于对基板（例如盘状基板2）进行涂漆的装置，其可以放置在基板载体14上并且可以通过驱动装置被驱动或给予旋转运动，其中所述材料或 要施加的漆流体5从进料装置6放置在基板2上。由基板支撑件14释放的流体介质或漆4至少被输送到第一收集容器17，该收集容器17与至少一个过滤器28连接 从液体经由泵29间接地或直接地通过泵29传导到第一收集容器27，其中可以在第一收集容器27的第一流出物流33和泵29之间设置负压。

公开(公告)号：US5876082A

公开(公告)日：1999-03-02

申请号：US801644

申请日：1997-02-18

申请人： Stefan Kempf ,  Michael Reising

发明人： Stefan Kempf ,  Michael Reising

IPC分类号： C23C14/50 ,  C23C14/56 ,  G11B7/26 ,  G11B17/02 ,  G11B23/00 ,  H01L21/687 ,  B23Q3/08

CPC分类号： H01L21/68721 ,  C23C14/50 ,  C23C14/566 ,  G11B23/00 ,  H01J37/32733 ,  H01J37/34 ,  H01L21/68771 ,  G11B17/02 ,  G11B7/26

摘要： A device 1 for gripping and holding substrates 2 with one or several substrate holders 5 arranged in a vacuum chamber 4, 4', 4" and one or several displaceably arranged grippers 3, which can be displaced into a first position through the action of an operating pressure or against the action of a spring 6, and into a second position through the action of a diaphragm 7, which can be exposed to a pneumatic pressure P.sub.a and/or to an operating element 8 cooperating with it, wherein the substrate 2 is held when the diaphragm is in a first position and the substrate 2 is released for being further transported when the diaphragm is in a second position. The diaphragm 7 is integrated into the vacuum chamber in such a way that in an operating position it is exposed to atmospheric pressure P.sub.a on the one side 9 and on the other side 10 to vacuum pressure P.sub.v, and in a second position is exposed to vacuum pressure P.sub.v on both sides.

摘要翻译： 用于夹持和保持基板2的装置1，其具有布置在真空室4,4'和4“中的一个或多个基板保持器5和一个或多个可移位布置的夹纱器3，其可以通过 操作压力或抵抗弹簧6的作用，并且通过可以暴露于气动压力Pa和/或与其配合的操作元件8的隔膜7的作用进入第二位置，其中基板2 当隔膜处于第一位置时被保持，并且当隔膜处于第二位置时基板2被释放以进一步输送。 隔膜7以这样的方式集成到真空室中，使得在操作位置，其在一侧9和另一侧10暴露于大气压力Pa至真空压力Pv，并且在第二位置暴露于真空 双方压力Pv。

公开(公告)号：US5879121A

公开(公告)日：1999-03-09

申请号：US802792

申请日：1997-02-18

申请人： Stefan Kempf

发明人： Stefan Kempf

IPC分类号： C23C14/50 ,  C23C14/56 ,  B65G65/02

CPC分类号： H01J37/32733 ,  C23C14/50 ,  H01J37/34 ,  Y10S414/121

摘要： An apparatus for transporting substrates between a first device and at least one second device for gripping and holding substrates with a substrate holder disposed in a vacuum chamber. The first device for gripping and holding substrates is equipped with one or more movable grippers which are movable by a mechanical and/or electromechanical or magnetically operating displacement device into a position that holds or releases the substrate, and the second device for gripping and holding substrates is equipped with one or more movable grippers which are movable counter to the action of a control pressure or of a spring, into a first position and, via the action of a diaphragm that can be subjected to a pneumatic pressure and/or a vacuum pressure and an adjusting part cooperating with the diaphragm, into a second position, wherein in the one position the substrate is held and in the second position the substrate is released for further transport, and in the position of the two devices for transfer of the substrate two substrate receiving parts can be aligned and fixed coaxially with one another.

摘要翻译： 一种用于在第一装置和至少一个第二装置之间传送基板的装置，用于夹持和保持设置在真空室中的基板保持器的基板。 用于夹持和保持基板的第一装置配备有一个或多个可移动的夹持器，其可通过机械和/或机电或磁性操作的位移装置移动到保持或释放基板的位置，以及用于夹持和保持基板的第二装置 配备有一个或多个可移动的夹持器，其可与控制压力或弹簧的作用相反地移动到第一位置，并且经由能够经受气动压力和/或真空压力的隔膜的作用 以及与所述隔膜配合的调节部件进入第二位置，其中在所述一个位置中所述基板被保持，并且在所述第二位置，所述基板被释放以进一步输送，并且在所述两个装置的位置以转移所述基板两者 基板接收部件可以彼此同轴对准和固定。

公开(公告)号：US5863399A

公开(公告)日：1999-01-26

申请号：US833985

申请日：1997-04-11

申请人： Eggo Sichmann

发明人： Eggo Sichmann

IPC分类号： H01J37/34 ,  C23C14/34

CPC分类号： H01J37/3452 ,  H01J37/3408

摘要： A device for cathode sputtering for producing coatings on a substrate 27 by means of a sputtering cathode, which device can be introduced into a vacuum chamber and has magnets or ring magnets 9, 13 concentrically arranged in respect to the center axis 44 of the sputtering cathode, pole shoes 14 and a target 8. The target has a front surface 41 with at least a surface portion which is inclined with respect to the back surface 40 of the target. In the area of the back surface 40 of the target at least one second, outer ring magnet 42 with a larger diameter is provided in addition to the inner ring magnets 9, 13.

摘要翻译： 一种用于通过溅射阴极在衬底27上生产涂层的阴极溅射器件，该器件可以被引入到真空室中，并且具有相对于溅射阴极的中心轴线44同心布置的磁体或环形磁体9,13 ，极靴14和目标8.目标具有前表面41，其具有至少一个相对于目标的后表面40倾斜的表面部分。 除了内圈磁铁9,13之外，在目标的后表面40的区域中还设置有至少一个第二外径较大直径的外圈磁铁42。

公开(公告)号：US5863328A

公开(公告)日：1999-01-26

申请号：US801585

申请日：1997-02-18

申请人： Eggo Sichmann ,  Reinhard Gerigk

发明人： Eggo Sichmann ,  Reinhard Gerigk

IPC分类号： B05B15/10 ,  B05C11/08 ,  B05C11/10 ,  G03F7/16 ,  B05C5/00

CPC分类号： B05C11/1039 ,  B05B15/10 ,  B05C11/08 ,  G03F7/162

摘要： Apparatus for surface coating or for lacquering of a substrate, such as a disk-shaped substrate 2, which can be placed on a substrate support 14 and can be driven or made to perform a rotating movement, wherein the medium to be applied or the lacquer fluid is applied to the substrate 2 via a feed device 6 which can be displaced in relation to the substrate 2 and/or can be driven. The substrate 2 or the substrate support 14 can be displaced by means of a guide device or in a connecting link guide 7 in such a way that in the area of the substrate 2 the feed device 6 for applying the fluid or the lacquer is conducted approximately parallel with the surface of the substrate 2 and can be stopped at any arbitrary point above the substrate 2 at an even height distance.

摘要翻译： 用于表面涂覆或用于涂覆诸如盘形基底2的基底的装置，其可以放置在基底支撑件14上并且可以被驱动或制成进行旋转运动，其中待施加的介质或者漆 流体通过可相对于基板2移位和/或可被驱动的进给装置6施加到基板2。 基板2或基板支撑件14可以通过引导装置或连接引导件7以这样的方式移位，使得在基板2的区域中，用于施加流体或涂漆的进给装置6大致进行 与基板2的表面平行，并且可以以均匀的高度距离停止在基板2上方的任意任意点处。

公开(公告)号：US5800687A

公开(公告)日：1998-09-01

申请号：US834142

申请日：1997-04-14

申请人： Stefan Kempf

发明人： Stefan Kempf

IPC分类号： C23C14/04 ,  H01J37/34 ,  C23C14/34

CPC分类号： H01J37/3447 ,  C23C14/042 ,  H01J37/3408

摘要： A device including a sputtering cathode 2 and masks for masking or covering portions of a surface of a substrates 27, having a center mask guide element 56 on which a center mask 26, which covers the substrate 27, is disposed and works together with an outer mask 4 in such a way that only the uncovered part of the substrate 27 is coated during the coating process. The inner and/or the outer masks 4, 26 can be adjusted independently of each other along a longitudinal center axis 58 of the device.

摘要翻译： 包括溅射阴极2和用于掩蔽或覆盖基板27的表面的部分的掩模的装置，具有中心掩模引导元件56，覆盖基板27的中心掩模26布置在其上并与外部 掩模4，使得在涂布过程中仅涂覆基底27的未覆盖部分。 内部和/或外部掩模4,26可以沿着装置的纵向中心轴线58彼此独立地调节。

公开(公告)号：US06054029A

公开(公告)日：2000-04-25

申请号：US803842

申请日：1997-02-24

申请人： Stefan Kempf ,  Eggo Sichmann

发明人： Stefan Kempf ,  Eggo Sichmann

IPC分类号： C23C14/50 ,  C23C14/56 ,  H01L21/00 ,  H01L21/687 ,  C23C14/34

CPC分类号： H01L21/67161 ,  C23C14/505 ,  C23C14/568 ,  H01L21/67196 ,  H01L21/68707

摘要： Apparatus 1 for gripping, holding and/or transporting substrates 2, components of which are an entry station 3 and several processing station 4 to 9 arranged in series or in a circle for receiving the substrate 2, to which the substrate 2 is passed on by means of a transporting device 1 disposed on gripper arms 13 and having gripper elements 24, or a turntable 12, and subsequently is deposited in one or several deposit stations 14, wherein several gripper arms 13 can be shifted in the horizontal and/or vertical direction by means of the turntable 12. Some of the gripper elements 24 can be shifted together in the horizontal or vertical direction by means of the turntable 12 and at least one gripper arm 13' can be shifted in at least one of the movement directions independently of the remaining gripper arms 13.

摘要翻译： 用于夹持，保持和/或传送基板2的装置1，其部件是入口台3和几个串联布置或圆形的处理台4至9，用于接收基板2，基板2通过 设置在夹持臂13上并具有夹持元件24或转盘12的输送装置1的装置，随后沉积在一个或多个沉积站14中，其中若干个夹臂13能够在水平和/或垂直方向上移动 通过转盘12，一些夹持元件24可以通过转台12在水平或垂直方向上一起移动，并且至少一个夹持臂13'可以在至少一个移动方向上移动，独立于 剩余的夹臂13。

公开(公告)号：US5913653A

公开(公告)日：1999-06-22

申请号：US833987

申请日：1997-04-11

申请人： Stefan Kempf

发明人： Stefan Kempf

IPC分类号： B65G49/07 ,  C23C14/50 ,  C23C14/56 ,  B65G65/02

CPC分类号： C23C14/50 ,  C23C14/56 ,  Y10S414/121

摘要： Apparatus for transporting substrates to and from at least one device (1) for holding substrates (2), the at least one device having a substrate support (5) disposed in a vacuum chamber (4, 4', 4"). The apparatus includes at least one displaceably disposed gripper (75), which can be displaced by a mechanical and/or electro-magnetically or magnetically operating positioning device (130) between a substrate gripping position and a substrate release position, and a centering device (157, 157', 161) for centering a substrate relative to the substrate support in conjunction with transport of the substrate by the apparatus to the substrate support.

摘要翻译： 用于将基板输送到至少一个用于保持基板（2）的装置（1）的装置，所述至少一个装置具有设置在真空室（4,4'，4“）中的基板支撑件（5）。 该装置包括至少一个可置换地布置的夹持器（75），其可以通过机械和/或电磁或磁力操作的定位装置（130）在基板夹持位置和基板释放位置之间移位，并且定心装置 157,157'，161），用于将衬底相对于衬底支架定中心，同时将衬底通过该装置运送到衬底支架。