摘要:
A semiconductor memory apparatus includes a plurality of unit cell arrays having a plurality of word lines which are disposed in a row direction and a plurality of global bit lines which are disposed in a column direction; a row decoder configured to activate at least two word lines among the plurality of word lines in response to a row address which designates one word line; a global column switch block configured to select two different global bit lines among the plurality of global bit lines in response to column control signals; and a column decoder configured to generate the column control signals in response to a column address.
摘要:
Disclosed is a semiconductor memory apparatus comprising an upper mat and a lower mat with a sense amplifier array region in between, where the sense amplifier array region includes a plurality of sense amplifiers. There is also a plurality of bit lines configured to extend toward the sense amplifier array region from the upper mat, and a plurality of complementary bit lines configured to extend toward the sense amplifier array region from the lower mat. Bit lines of the upper mat and complementary bit lines of the lower mat are configured to be alternately disposed at a predetermined interval in the sense amplifier array region, and the sense amplifier is configured to be formed between a bit line and a corresponding complementary bit line.
摘要:
A conductive layer may be fabricated on a semiconductor substrate by loading a silicon substrate in to a chamber whose inside temperature is at a loading temperature in the range of approximately 250° C. to approximately 300° C., increasing the inside temperature of the chamber from the loading temperature to a process temperature, and sequentially stacking a single crystalline silicon layer and a polycrystalline silicon layer over the silicon substrate by supplying a silicon source gas and an impurity source gas in to the chamber, where the chamber may be, for example, a CVD chamber or a LPCVD chamber.
摘要:
There are provided a semiconductor device and a manufacturing method thereof. The semiconductor device includes a pipe gate stack structure in which a portion of a first channel layer is buried. The semiconductor device includes the pipe gate stack structure in which a portion of a second channel layer is buried. The semiconductor device configured to individually control the first and second channel layers.
摘要:
A semiconductor device includes a pre-shift circuit and a shift circuit. The pre-shift circuit shifts an internal write signal by a pre-shift period to generate a pre-write signal. The shift circuit shifts the pre-write signal by a shift period to generate a shift write signal for generating a column selection signal. The column selection signal is activated to select a column path through which data are inputted or outputted. The pre-shift period is set as a period corresponding to a multiple of “L” times a cycle of a clock signal, wherein “L” is a natural number which is equal to or greater than two.