公开(公告)号：US4673471A

公开(公告)日：1987-06-16

申请号：US925965

申请日：1986-11-03

申请人： Hiroshi Kagechika ,  Akira Tonouchi ,  Roland Kammel

发明人： Hiroshi Kagechika ,  Akira Tonouchi ,  Roland Kammel

IPC分类号： C25D3/56

CPC分类号： C25D3/56 ,  C25D3/562

摘要： The invention provides a Cr alloy plating bath comprising a sulfate bath consisting essentially of divalent Cr ion and trivalent Cr ion in a total amount of between 1.5 to 2.0 mol/l, cation of one or more than two selected from the group consisting of potassium ion, sodium ion and ammonium ion in a total amount of 1.5 to 2.5 mol/l, and metal ion of one or more than two selected from the group consisting of Fe, Ni and Co, in an amount of less than 0.6 mol/l, wherein the invention provides stable plating, without requiring a separation between electrolytes with a diaphragm, and provides good deposition at high current efficiencies.

摘要翻译： 本发明提供了一种Cr合金电镀浴，其包含基本上由二价Cr离子和三价Cr离子组成的硫酸盐浴，其总量为1.5-2.0mol / l，一种或多于两种选自钾离子 ，钠离子和铵离子的总量为1.5〜2.5mol / l，选自Fe，Ni和Co中的一种或多于两种的金属离子的量小于0.6mol / l， 其中本发明提供了稳定的电镀，而不需要在隔膜之间分离电解质，并以高电流效率提供良好的沉积。

公开(公告)号：US4601801A

公开(公告)日：1986-07-22

申请号：US753223

申请日：1985-07-09

申请人： Shuzo Fukuda ,  Yutaka Ohkubo ,  Toshio Ishii ,  Masaru Sagiyama ,  Akira Tonouchi

发明人： Shuzo Fukuda ,  Yutaka Ohkubo ,  Toshio Ishii ,  Masaru Sagiyama ,  Akira Tonouchi

IPC分类号： C25D3/22 ,  C25D7/06 ,  C25D17/00

CPC分类号： C25D7/0628

摘要： A vertical type electro-galvanizing apparatus, which comprises: a U-shaped electro-galvanizing tank including a first vertical path (12) at a steel strip inlet side, a second vertical path (13) at a steel strip outlet side and a horizontal path (14) for communicating the lower end of the first vertical path (12) to the lower end of the second vertical path (13); a first conductor roll (2), arranged above the first vertical path (12), for directing a steel strip (5) downwardly into the first vertical path (12) and applying electricity to the steel strip (5); at least one sink roll (3, 3'), arranged in the horizontal path (14), for upwardly reversing the travelling direction of the steel strip (5); a second conductor roll (4), arranged above the second vertical path (13), for directing the steel strip (5) upwardly from the second vertical path (13) and applying electricity to the steel strip (5); at least one first electrode plate (6, 6) arranged in the first vertical path (12); at least one second electrode plate (7, 7) arranged in the second vertical path (13); an electro-galvanizing solution supply pipe (17) arranged at a top portion (15) of the first vertical path (12) and/or a top portion (16) of the second vertical path (13); and at least one electro-galvanizing bath discharge pipe (18) arranged at the top portion (15) of the first vertical path (12) and/or the top portion (16) of the second vertical path (13).

摘要翻译： 一种立式电镀装置，其特征在于，包括：U形电镀锌槽，其包括在钢带入口侧的第一垂直路径（12），钢带出口侧的第二垂直路径（13）和水平 用于将第一垂直路径（12）的下端连通到第二垂直路径（13）的下端的路径（14）; 布置在第一垂直路径（12）上方的用于将钢带（5）向下引导到第一垂直路径（12）中并向钢带（5）施加电力的第一导体辊（2）; 设置在所述水平路径（14）中的至少一个汇流槽（3,3'），用于向上反转所述钢带（5）的行进方向; 布置在第二垂直路径（13）上方的第二导体辊（4），用于将钢带（5）从第二垂直路径（13）向上引导并向钢带（5）施加电力; 布置在第一垂直路径（12）中的至少一个第一电极板（6,6）; 布置在第二垂直路径（13）中的至少一个第二电极板（7,7）; 布置在第一垂直路径（12）的顶部（15）和/或第二垂直路径（13）的顶部（16）处的电镀溶液供应管（17）。 以及布置在第一垂直路径（12）的顶部（15）和/或第二垂直路径（13）的顶部（16）处的至少一个电镀浴排放管（18）。

公开(公告)号：US4505785A

公开(公告)日：1985-03-19

申请号：US349681

申请日：1982-02-17

申请人： Hiroshi Miwa ,  Toshio Kaneko ,  Akira Tonouchi ,  Tatsuro Anan

发明人： Hiroshi Miwa ,  Toshio Kaneko ,  Akira Tonouchi ,  Tatsuro Anan

IPC分类号： C25D7/06 ,  C25D17/12 ,  C25D21/00

CPC分类号： C25D7/0614

摘要： Disclosed is a method for electroplating a steel strip by arranging a plurality of electrode rows each consisting of a plurality of electrodes disposed adjacent to each other along the direction of width of said steel strip in opposition to said strip travelling in an electrolytic cell holding an electrolytic solution, so that a metal constituting said electrodes may be electroplated on said steel strip, comprising the steps of intermittently or continuously transferring said electrodes of said electrode rows in a direction perpendicularly to the direction of travel of said steel strip at a speed so that a distribution of a deposition amount of the metal of said electrodes along the direction of width of said steel strip may be kept within an allowable tolerance, a width of said electrode rows being greater than the width of said steel strip; and unloading said electrode from one end of one of said electrode rows transferred by said transferring step and loading said electrode to the other end of said one electrode row or to an end of another of said electrode rows.

摘要翻译： 公开了一种电镀钢带的方法，该方法通过布置多个电极列，每个电极列由沿着所述钢带的宽度方向彼此相邻布置的多个电极构成，所述多个电极相对于在保持电解质的电解槽中行进的所述条 使得构成所述电极的金属可以电镀在所述钢带上，包括以垂直于所述钢带的行进方向的方向以一定速度间歇地或连续地传送所述电极列的电极的步骤，使得 所述电极的金属的沉积量沿着所述钢带的宽度方向的分布可以保持在容许公差内，所述电极列的宽度大于所述钢带的宽度; 以及从通过所述转移步骤转移的所述电极列之一的一端卸载所述电极，并将所述电极加载到所述一个电极列的另一端或另一个所述电极列的一端。

公开(公告)号：US4519878A

公开(公告)日：1985-05-28

申请号：US483564

申请日：1983-04-11

申请人： Tomihiro Hara ,  Takeshi Adaniya ,  Akira Tonouchi

发明人： Tomihiro Hara ,  Takeshi Adaniya ,  Akira Tonouchi

IPC分类号： C25D5/26 ,  C25D3/56 ,  C25D5/08 ,  C25D5/10 ,  C25D7/06

CPC分类号： C25D3/565 ,  C25D3/562 ,  C25D5/08 ,  Y10T428/12799

摘要： A strip horizontally travels within an electroplating apparatus while the plating solution is applied between the strip and anode, in which relative speed of the solution to the strip and/or current density are varied, whereby an outer plated layer on the strip is provided with Fe-Zn alloy of high Fe content while an inner plated layer on the strip is provided with Fe-Zn alloy of low Fe content.

摘要翻译： 在电镀设备中水平行进的条带，同时将电镀溶液施加在带和阳极之间，其中溶液与带的相对速度和/或电流密度发生变化，由此带上的外镀层设置有Fe -Zn高Fe含量的合金，而带材上的内镀层提供Fe含量低的Fe-Zn合金。