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1.发明申请公开(公告)号：US20080285840A1
公开(公告)日：2008-11-20
申请号：US12213748
申请日：2008-06-24
申请人： Akitoshi Kawai
发明人： Akitoshi Kawai
IPC分类号： G06K9/00
CPC分类号： G01N21/8851 , G01N21/956 , G06T7/001 , G06T2207/30148
摘要： A defect inspection apparatus obtains a color image signal of an inspection target. Based on a plurality of signal components forming this color image signal, a plurality of analysis images are obtained. Defect detection of an inspection target is implemented for each of the a plurality of analysis images. A differential is detected for a defect nomination detected for each of the analysis images, and thereby whether a plurality of defects exist or not in successive defect positions of the inspection target is determined.
摘要翻译： 缺陷检查装置获得检查对象的彩色图像信号。 基于形成该彩色图像信号的多个信号分量，获得多个分析图像。 针对多个分析图像中的每一个实现检查对象的缺陷检测。 针对每个分析图像检测到的缺陷提取检测到差分，从而确定在检查对象的连续缺陷位置中是否存在多个缺陷。
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公开(公告)号：US06405610B1
公开(公告)日：2002-06-18
申请号：US09323113
申请日：1999-06-01
IPC分类号： G01N1908
CPC分类号： B25J9/109 , H01L21/67766
摘要： This invention relates to a wafer inspection apparatus having various types of structures for realizing a reduction in convey time of a selected wafer as an inspection target, an improvement in operability, or the like. In particular, this wafer inspection apparatus has a first convey system and a second convey system. The first convey system is movable in a direction perpendicular to a wafer convey reference surface and has a plurality of arm portions operable independently of each other. The second convey system has a plurality of rotary arm portions that are movable in the direction perpendicular to the wafer convey reference surface. Thus, a structure in which the wafer convey time is shorter than in a conventional wafer inspection apparatus is realized. This wafer inspection apparatus also has a lifting unit with a specific structure, thus realizing an improvement in operability of the apparatus or the like.
摘要翻译： 本发明涉及具有各种结构的晶片检查装置，其用于实现作为检查对象的所选晶片的输送时间的减少，可操作性的提高等。 特别地，该晶片检查装置具有第一输送系统和第二输送系统。 第一传送系统可以在垂直于晶片传送基准表面的方向上移动，并且具有彼此独立地可操作的多个臂部。 第二输送系统具有可沿与晶片输送基准表面垂直的方向移动的多个旋转臂部分。 因此，实现了晶片传送时间比传统的晶片检查装置短的结构。 该晶片检查装置也具有具有特定结构的提升单元，能够实现装置的操作性的提高等。
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公开(公告)号：US20090147247A1
公开(公告)日：2009-06-11
申请号：US12314995
申请日：2008-12-19
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/21 , G03F7/70625
摘要： A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.
摘要翻译： 缺陷检查装置检查具有在表面上形成的图案的样品的缺陷。 缺陷检查装置设置有放置在其上的样品并且线性地移动和转动的台架; 光源; 照明光学系统，其从光源中选择任意波长区域，并通过偏振器和物镜对样品表面进行外照射; 检测光学系统，其通过经由物镜的表面通过照射光学系统施加的反射光和通过偏振器满足交叉尼可可斯条件的分析仪获得瞳孔图像; 以及检测部，其通过将获得的瞳孔图像与先前存储的瞳孔图像进行比较来检测样本的缺陷。 可以在短时间内判断要检查的基板上的图案的一致性。
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公开(公告)号：US08730465B2
公开(公告)日：2014-05-20
申请号：US12314995
申请日：2008-12-19
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/21 , G03F7/70625
摘要： A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.
摘要翻译： 缺陷检查装置检查具有在表面上形成的图案的样品的缺陷。 缺陷检查装置设置有放置在其上的样品并且线性地移动和转动的台架; 光源; 照明光学系统，其从光源中选择任意波长区域，并通过偏振器和物镜对样品表面进行外照射; 检测光学系统，其通过经由物镜的表面通过照射光学系统施加的反射光和通过偏振器满足交叉尼可可斯条件的分析仪获得瞳孔图像; 以及检测部，其通过将获得的瞳孔图像与先前存储的瞳孔图像进行比较来检测样本的缺陷。 可以在短时间内判断要检查的基板上的图案的一致性。
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公开(公告)号：US08599370B2
公开(公告)日：2013-12-03
申请号：US12314995
申请日：2008-12-19
IPC分类号： G01N21/88
摘要： A defect inspecting apparatus inspects defects of a sample having a pattern formed on the surface. The defect inspecting apparatus is provided with a stage which has a sample placed thereon and linearly moves and turns; a light source; an illuminating optical system, which selects a discretionary wavelength region from the light source and epi-illuminates the sample surface through a polarizer and an objective lens; a detecting optical system, which obtains a pupil image, by passing through reflection light applied by the illuminating optical system from the surface of the sample through the objective lens and an analyzer which satisfies the cross-nichols conditions with the polarizer; and a detecting section which detects defects of the sample by comparing the obtained pupil image with a previously stored pupil image. Conformity of the pattern on a substrate to be inspected can be judged in a short time.
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公开(公告)号：US20170241919A1
公开(公告)日：2017-08-24
申请号：US15507999
申请日：2014-09-02
CPC分类号： G01N23/04 , G01B15/04 , G01N23/046 , G01N2223/304 , G01N2223/306 , G01N2223/646
摘要： A measurement processing device used for an x-ray inspection apparatus that detects an x-ray passing through a specimen with a detection unit to sequentially inspect a plurality of specimens on the basis of an acquired transmission image, includes a setting unit that sets a region to be inspected on a portion of the specimen; a determination unit that determines the non-defectiveness of the region to be inspected by using a transmission image of the x-ray that passed through the region to be inspected; a correction unit that performs a correction on the region to be inspected on the basis of a determination result by the determination unit; and a display control unit that displays the corrected region to be inspected corrected by the correction unit.
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