公开(公告)号：US06911296B2

公开(公告)日：2005-06-28

申请号：US10299226

申请日：2002-11-19

Applicant: Peter S. Pappas ,  Alan Monk ,  Shashikant Saraiya ,  Jianbing Huang

Inventor： Peter S. Pappas ,  Alan Monk ,  Shashikant Saraiya ,  Jianbing Huang

IPC: G03F7/039 ,  B41C1/10 ,  B41M5/36 ,  C08G18/28 ,  C08G18/38 ,  C08G18/54 ,  C08G73/02 ,  C08G73/06 ,  C08G77/26 ,  C08G85/00

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/262 ,  B41C2210/264 ,  B41C2210/266 ,  C08G18/285 ,  C08G18/3848 ,  C08G18/542 ,  C08G73/0273 ,  C08G73/0694 ,  C08G83/008 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/109 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165 ,  C09D163/00 ,  C08L101/00

Abstract: The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer. The process includes contacting a hydrocarbyl-substituted isocytosine and a diisocyanate to produce a mono-adduct and contacting the mono-adduct and a polyfunctional material to produce the supramolecular polymer.

Abstract translation: 本发明还包括可成像元件，其包括基材和可热成像组合物，其包含热敏聚合物，其在加热时在显影剂水溶液中显示出增加的溶解度。 热敏聚合物包括至少一个共价键合单元和至少一个热可逆非共价键合单元，其包括在每个非共价键合单元内的两个或更多个中心H键。 本发明还包括一种制造成像元件的方法。 本发明还包括可热成像的组合物，其包含根据本发明的热敏聚合物和制备作为超分子聚合物的热敏聚合物的方法。 该方法包括使烃基取代的异胞嘧啶与二异氰酸酯接触以产生单加合物，并使单加成物与多官能物质接触以产生超分子聚合物。

公开(公告)号：US20070269727A1

公开(公告)日：2007-11-22

申请号：US11570079

申请日：2005-06-15

Applicant: Celin Savariar-Hauck ,  Alan Monk ,  Rene Ullrich

Inventor： Celin Savariar-Hauck ,  Alan Monk ,  Rene Ullrich

IPC: B41M5/36 ,  B41C1/10

CPC classification number: B41M5/368 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

Abstract: Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.

Abstract translation: 辐射敏感的负性工作元件包括（a）具有亲水表面的基底和（b）基底的亲水表面上的层，其中所述层包含可通过使（i）聚合物与-COOH反应获得的改性聚合物， SO 3 H，-P 3 H 2和/或-PO 4 H 2，其中所述聚合物可溶于碱性水溶液中，并且所述溶解度不被IR辐射改变，和（ii）与无机或有机阳离子的盐，其中所述改性聚合物 可溶于碱性水溶液中，溶解度不受IR辐射改变，所述层可溶于含水碱性显影剂，但通过IR辐射使其不溶于含水碱性显影剂。

公开(公告)号：US06506536B2

公开(公告)日：2003-01-14

申请号：US09751650

申请日：2000-12-29

Applicant: S. Peter Pappas ,  Alan Monk ,  Shashikant Saraiya ,  Jianbing Huang

Inventor： S. Peter Pappas ,  Alan Monk ,  Shashikant Saraiya ,  Jianbing Huang

IPC: C08G8500

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/262 ,  B41C2210/264 ,  B41C2210/266 ,  C08G18/285 ,  C08G18/3848 ,  C08G18/542 ,  C08G73/0273 ,  C08G73/0694 ,  C08G83/008 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/109 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165 ,  C09D163/00 ,  C08L101/00

Abstract: The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer. The process includes contacting a hydrocarbyl-substituted isocytosine and a diisocyanate to produce a mono-adduct and contacting the mono-adduct and a polyfunctional material to produce the supramolecular polymer.

公开(公告)号：USD444198S1

公开(公告)日：2001-06-26

申请号：US29117541

申请日：2000-01-24

Applicant: Steven Alan Monk ,  Keith E. Kearns

Designer： Steven Alan Monk ,  Keith E. Kearns