摘要:
The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer. The process includes contacting a hydrocarbyl-substituted isocytosine and a diisocyanate to produce a mono-adduct and contacting the mono-adduct and a polyfunctional material to produce the supramolecular polymer.
摘要:
The invention relates to cholesteric polymer flakes obtainable from a chiral polymerizable mesogenic material, to methods of manufacturing such cholesteric flakes, to the use of certain chiral and achiral polymerizable compounds with one or more terminal polymerizable groups for the manufacturing of such flakes and to the use of such cholesteric flakes as effect pigments in spraying or printing inks or paints or colored plastics for different applications, especially for automotive use, cosmetic products and security applications.
摘要:
The present invention relates to a method to polymerize monomer comprising contacting one or more monomer(s) with a catalyst system in a gas phase reactor having a recycle system, for removing a recycle gas and unreacted monomer(s) from the reactor and returning the recycle gas and fresh monomer(s) to the reactor, and a plenum, the method comprising the steps of: (a) cooling the recycle gas to form a cooled recycle gas; (b) optionally combining the cooled recycle gas with additional recycle gas; and (c) injecting the cooled recycle gas into the gas phase reactor through the plenum.
摘要:
A polymer based on a dicarboxylic acid and a diamine is prepared by polycondensation in an extruder, by (a) heating a mixture of a dicarboxylic acid having from 4 to 12 carbon atoms and a diamine having from 4 to 12 carbon atoms, which mixture is solid at room temperature and has a residual moisture content of less than 5% by weight, to a temperature in the range from 150 to 400° C. under autogenous pressure in a contrarotating twin-screw extruder to give a product A, (b) feeding the product A to a corotating twin-screw extruder, with the product A being exposed to a temperature in the range from 150 to 400° C. and residual water present and also water from the polycondensation being removed through the degassing openings, to give a product B, with the proviso that the corotating twin-screw extruder has at least two segments having different pressures.
摘要:
A process for preparing linear, alternating carbon monoxide copolymers, in which at least one olefinically unsaturated compound having from two to twenty carbon atoms (component K1) and carbon monoxide are copolymerized in the presence of a) metal complexes, b) if desired, a protonic or Lewis acid, and c) if desired, a hydroxyl compound, comprises metering into the copolymerization, as it proceeds, at least one olefinically unsaturated compound having from two to twenty carbon atoms (component K2≠component K1) in the form of pulses, i.e. as a regular or irregular sequence of feed, for which the term pulse is used, and non-feed. Carbon monoxide copolymers obtainable from said process are used for producing fibers, films or moldings, and the fibers, films and moldings produced from these polymers are described.
摘要:
The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF(249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, m is 1 or 2. Polymers of the present invention comprise repeating units derived from the comonomer of Chemical Formula 1, preferably together with monomers of the following Chemical Formula 2: wherein, R* is an acid-labile group, and W is 1 or 2.
摘要:
The invention relates to cholesteric polymer flakes obtainable from a chiral polymerizable mesogenic material, to methods of manufacturing such cholesteric flakes, to the use of certain chiral and achiral polymerizable compounds with one or more terminal polymerizable groups for the manufacturing of such flakes and to the use of such cholesteric flakes as effect pigments in spraying or printing inks or paints or colored plastics for different applications, especially for automotive use, cosmetic products and security applications.