公开(公告)号：US5764342A

公开(公告)日：1998-06-09

申请号：US756832

申请日：1996-11-20

申请人： Paul Evans Bakeman, Jr. ,  Albert Stephan Bergendahl

发明人： Paul Evans Bakeman, Jr. ,  Albert Stephan Bergendahl

IPC分类号： G03F1/00 ,  G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70558 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/70308 ,  G03F7/70333 ,  G03F7/70466 ,  Y10S428/929 ,  Y10T428/24628 ,  Y10T428/24669 ,  Y10T428/24802 ,  Y10T428/249921 ,  Y10T428/31504

摘要： A method of exposing a radiation-sensitive medium through a mask and using an imaging system having a given depth of focus to control for pattern dependent distortion. The steps comprise: providing the radiation-sensitive medium within the depth of focus of the imaging system; providing radiation to the radiation-sensitive medium through the mask; providing the radiation-sensitive medium fully outside the depth of focus of the imaging system; and providing radiation to the radiation-sensitive medium through the mask. Corrections are automatically made by providing the radiation-sensitive medium fully outside the depth of focus of the imaging system, since in that regime the mask operates as a grey-scale mask, with the amount of light passing through any region of the mask dependent on the transmission of the masking pattern in that region.

摘要翻译： 一种通过掩模曝光辐射敏感介质并使用具有给定焦深的成像系统来控制图形相关失真的方法。 这些步骤包括：在成像系统的焦点深度内提供辐射敏感介质; 通过掩模向辐射敏感介质提供辐射; 将辐射敏感介质完全放置在成像系统的焦点深度之外; 并通过掩模向辐射敏感介质提供辐射。 通过将辐射敏感介质完全设置在成像系统的焦深之外自动进行校正，因为在该状态下，掩模作为灰度掩模进行操作，其中通过掩模的任何区域的光量取决于 在该区域中的掩模图案的传输。

公开(公告)号：US5656544A

公开(公告)日：1997-08-12

申请号：US391904

申请日：1995-02-21

申请人： Albert Stephan Bergendahl ,  Claude Louis Bertin ,  John Edward Cronin ,  Howard Leo Kalter ,  Donald McAlpine Kenney ,  Chung Hon Lam ,  Hsing-San Lee

发明人： Albert Stephan Bergendahl ,  Claude Louis Bertin ,  John Edward Cronin ,  Howard Leo Kalter ,  Donald McAlpine Kenney ,  Chung Hon Lam ,  Hsing-San Lee

IPC分类号： H01L27/10 ,  H01L21/8239 ,  H01L21/8242 ,  H01L21/8247 ,  H01L27/105 ,  H01L27/108 ,  H01L27/115 ,  H01L29/788 ,  H01L29/792 ,  H01L21/44 ,  H01L21/48

CPC分类号： H01L29/7882 ,  H01L27/105 ,  H01L27/1052 ,  H01L27/10829 ,  H01L27/115

摘要： A semiconductor device memory array formed on a semiconductor substrate comprising a multiplicity of field effect transistor DRAM devices disposed in array is disclosed. Each of the DRAM devices is paired with a non-volatile EEPROM cell and the EEPROM cells are disposed in a shallow trench in the semiconductor substrate running between the DRAM devices such that each DRAM-EEPROM pair shares a common drain diffusion. The EEPROM cells are arranged in the trench such that there are discontinuous laterally disposed floating gate polysilicon electrodes and continuous horizontally disposed program and recall gate polysilicon electrodes. The floating gate is separated from the program and recall gates by a silicon rich nitride. The array of the invention provides high density shadow RAMs. Also disclosed are methods for the fabrication of devices of the invention.

摘要翻译： 公开了一种形成在半导体衬底上的半导体器件存储器阵列，其包括设置成阵列的多个场效应晶体管DRAM器件。 每个DRAM器件与非易失性EEPROM单元配对，并且EEPROM单元被布置在运行在DRAM器件之间的半导体衬底中的浅沟槽中，使得每个DRAM-EEPROM对共享共同的漏极扩散。 EEPROM单元布置在沟槽中，使得存在不连续的侧向设置的浮栅多晶硅电极和连续的水平布置的程序和调用栅极多晶硅电极。 浮动栅极与程序分离，并通过富含硅的氮化物来调用栅极。 本发明的阵列提供高密度影子RAM。 还公开了用于制造本发明的装置的方法。

公开(公告)号：US5952160A

公开(公告)日：1999-09-14

申请号：US752113

申请日：1996-11-20

申请人： Paul Evans Bakeman, Jr. ,  Albert Stephan Bergendahl

发明人： Paul Evans Bakeman, Jr. ,  Albert Stephan Bergendahl

IPC分类号： G03F1/00 ,  G03F7/20 ,  G03F7/207

CPC分类号： G03F7/70558 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/70308 ,  G03F7/70333 ,  G03F7/70466 ,  Y10S428/929 ,  Y10T428/24628 ,  Y10T428/24669 ,  Y10T428/24802 ,  Y10T428/249921 ,  Y10T428/31504

摘要： A method of exposing a radiation-sensitive medium through a mask and using an imaging system having a given depth of focus to control for pattern dependent distortion. The steps comprise: providing the radiation-sensitive medium within the depth of focus of the imaging system; providing radiation to the radiation-sensitive medium through the mask; providing the radiation-sensitive medium fully outside the depth of focus of the imaging system; and providing radiation to the radiation-sensitive medium through the mask. Corrections are automatically made by providing the radiation-sensitive medium fully outside the depth of focus of the imaging system, since in that regime the mask operates as a gray-scale mask, with the amount of light passing through any region of the mask dependent on the transmission of the masking pattern in that region.

摘要翻译： 一种通过掩模曝光辐射敏感介质并使用具有给定焦深的成像系统来控制图形相关失真的方法。 这些步骤包括：在成像系统的焦点深度内提供辐射敏感介质; 通过掩模向辐射敏感介质提供辐射; 将辐射敏感介质完全放置在成像系统的焦点深度之外; 并通过掩模向辐射敏感介质提供辐射。 通过将辐射敏感介质完全设置在成像系统的焦深之外自动进行校正，因为在该状态下，掩模作为灰度掩模进行操作，其中通过掩模的任何区域的光量取决于 在该区域中的掩模图案的传输。