公开(公告)号：US06179031B2

公开(公告)日：2001-01-30

申请号：US09167548

申请日：1998-10-07

申请人： Andreas Rack ,  Peter Sauer ,  Stefan Szellas

发明人： Andreas Rack ,  Peter Sauer ,  Stefan Szellas

IPC分类号： B32B3116

CPC分类号： B29C65/521 ,  B29C65/4845 ,  B29C65/7847 ,  B29C66/1122 ,  B29C66/452 ,  B29C66/8322 ,  B29C2035/0827 ,  B29L2017/003 ,  B29L2017/005 ,  G11B7/26 ,  Y10T156/17 ,  Y10T156/1798

摘要： Apparatus for the gluing of two substrates in six processing steps for fabrication of a digital video disc including a motor-driven plate (2) for holding the first substrate (5), a glue dispenser disposed above the plate (2), grasping and holding device for providing vertical movement of the second substrate (7). The side of the plate turned toward the first substrate (5) has a radially outer plane portion (10) in the form of a disk concentric to its axis of rotation (R) and a radially inner portion (11) adjacent to this where the face (F) of this inner portion (11) turned toward the substrate (5) is formed by the outer face of a flat, straight frustum of a cone whose peak (S) strikes the axis of rotation (R) below the plane of application (E) of the substrate (5). In the transitional area from the annular portion (10) to the conical portion (11) an annular groove (12) running coaxially to the axis of rotation is cut into the plate (2) which is connected to a pressure source via channels (13, 13′, . . . ) and corresponds to teardrop or finger-like indentations or recesses (14, 14′, . . . ) in the conical portion (11) extending from the annular groove (12) radially inward.

摘要翻译： 用于在六个处理步骤中胶合两个基板的装置，用于制造包括用于保持第一基板（5）的电动驱动板（2）的数字视盘，设置在板（2）上方的胶分配器， 用于提供第二基板（7）的垂直移动的装置。 转向第一基板（5）的板的侧面具有与其旋转轴线（R）同心的圆盘形状的径向外平面部分（10）和与其相邻的径向内部部分（11），其中 该内部部分（11）朝向基板（5）转向的面（F）由锥形的平坦的直的平截头体的外表面形成，其顶端（S）与旋转轴线（R）在 （5）的应用（E）。 在从环形部分（10）到锥形部分（11）的过渡区域中，与旋转轴线同轴运行的环形槽（12）被切割成通过通道（13）连接到压力源的板（2） ，13'，...），并且对应于从环形槽（12）径向向内延伸的锥形部分（11）中的泪珠或指状凹陷或凹陷（14,14'，...）。

公开(公告)号：US5510012A

公开(公告)日：1996-04-23

申请号：US888825

申请日：1992-05-27

申请人： Siegfried Schulz ,  Christoph Daube ,  Alfred Belz ,  Andreas Rack

发明人： Siegfried Schulz ,  Christoph Daube ,  Alfred Belz ,  Andreas Rack

IPC分类号： C23C14/14 ,  C23C14/34

CPC分类号： C23C14/14

摘要： For the production of a coating formed by cathode sputtering, a target made from an alloy of gold and preferably vanadium is used. During the cathode sputtering, nitrogen gas is used as the reactive gas. The result is the formation of vanadium nitrides on the substrate to be coated. By varying the nitrogen content, the proportion of the vanadium nitrides can be changed thereby causing the appearance and the hardness of the coating to also change. This change in coating characteristics can accommodate a broad range of requirements avoiding the necessity of using different targets for different coating characteristics.

摘要翻译： 为了制造通过阴极溅射形成的涂层，使用由金和优选钒的合金制成的靶。 在阴极溅射期间，使用氮气作为反应气体。 结果是在待涂覆的基底上形成氮化钒。 通过改变氮含量，可以改变氮化钒的比例，从而导致涂层的外观和硬度也改变。 涂层特性的这种变化可以适应宽范围的要求，避免了为不同的涂层特性使用不同的目标。

公开(公告)号：US5407548A

公开(公告)日：1995-04-18

申请号：US54690

申请日：1993-04-29

申请人： Uwe Kopacz ,  Christoph Daube ,  Andreas Rack ,  Horst Becker ,  Uwe Konietzka ,  Martin Weigert

发明人： Uwe Kopacz ,  Christoph Daube ,  Andreas Rack ,  Horst Becker ,  Uwe Konietzka ,  Martin Weigert

IPC分类号： C23C14/00 ,  C23C14/14 ,  C23C14/34 ,  H01J37/34

CPC分类号： H01J37/3426 ,  C23C14/0036 ,  C23C14/14 ,  C23C14/3407 ,  H01J37/3408 ,  H01J37/3491 ,  H01J2237/3321

摘要： The invention concerns a process for coating a substrate 1 of little or no corrosion resistance, especially a metal substrate having an alloy consisting at least of Ni, Cr and Fe, in an evacuable coating chamber 15, 15a. It comprises making an electrode that can be connected to a current supply 10, this electrode being electrically connected to a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1. Reactive process gases are, for this purpose, supplied to the coating chamber 15, 15a, so that an amorphously depositing layer 2 is applied onto the substrate.

摘要翻译： 本发明涉及一种在可抽真空的涂布室15,15a中涂覆几乎或不具有耐腐蚀性的基材1，特别是具有至少由Ni，Cr和Fe组成的合金的金属基材的方法。 它包括制造可以连接到电流源10的电极，该电极电连接到溅射的靶3，并且溅射的颗粒沉积在衬底1上。为此，提供反应性工艺气体 到涂覆室15,15a，使得非晶体沉积层2被施加到基底上。