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公开(公告)号：US20240139663A1
公开(公告)日：2024-05-02
申请号：US18550839
申请日：2022-03-14
Applicant: CSK INC.
Inventor： GeunWoo Park
CPC classification number: B01D39/1692 , B01D19/0031 , B01D2239/10 , B01D2239/1216
Abstract: A method of manufacturing a porous filter includes a step of preparing a first porous filter having first micropores, a step of increasing the size of the first micropores by stretching while heating the first porous filter, a step of maintaining the increased size of the first micropores by sucking a liquid into the increased first micropores, and a step of forming a second porous filter having second micropores larger than the first micropores by evaporating the liquid.
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公开(公告)号：US20230211277A1
公开(公告)日：2023-07-06
申请号：US18001011
申请日：2021-05-26
Applicant: CSK INC.
Inventor： MyungKeun Noh , Hyeon Yun Cho , SoLim Kang , JinHong Kim , JaeMyeong Choi
CPC classification number: B01D53/0438 , B01D53/002 , B01F25/43163 , B01D46/24 , F23J15/06 , F23J15/025 , B01D53/0415 , B01D46/0036 , B01F2025/919
Abstract: An apparatus for a dry gas scrubber includes: a cooling chamber defined by a housing having an inlet for receiving an effluent stream for treatment by the dry gas scrubber, an outlet for providing the effluent stream for treatment by the dry gas scrubber, and at least one cooling plate within the chamber, the cooling plate being thermally coupled with the housing and configured to deviate a direction of flow of the effluent stream when flowing from the inlet to the outlet. In this way, the cooling chamber is interposed between the process tool and the resin chamber of the dry gas scrubber and operates to cool the effluent stream prior to its being delivered to the resin chamber. Cooling the effluent stream in this way helps to improve the performance of the resin, even when the effluent stream is at an elevated temperature.
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公开(公告)号：US20230356129A1
公开(公告)日：2023-11-09
申请号：US18246262
申请日：2021-09-21
Applicant: CSK INC.
Inventor： JinHong Kim , MyeongHoon Kang
CPC classification number: B01D46/0036 , B01D46/0005 , B01D46/24
Abstract: Provided in the present invention is an apparatus for collecting powder in exhaust gas comprising: a device for collecting powder contained in exhaust gas before the exhaust gas is introduced into a cylindrical adsorption reaction device that treats the exhaust gas using an adsorption reaction, wherein a cylindrical filter body includes a filter member that filters the exhaust gas and is disposed underneath the adsorption reaction device so as to be connected to the adsorption reaction device; a housing that provides an internal space to house the filter body, and a filter striking module that applies a physical impact to the filter body to dislodge powder adhering to the filter member.
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公开(公告)号：US20230219038A1
公开(公告)日：2023-07-13
申请号：US18001008
申请日：2021-05-26
Applicant: CSK INC.
Inventor： JinHong Kim , MyungKeun Noh , Hyeon Yun Cho , SoLim Kang , JaeMyeong Choi
CPC classification number: B01D53/81 , B01D53/266 , B01D53/0438 , B01D2258/0216
Abstract: A dry gas scrubber is disclosed. The dry gas scrubber is for treatment of an effluent stream and comprises: a chamber having an inlet for receiving the effluent stream, a cooler coupled with the inlet and configured to cool the effluent stream, and a resin chamber downstream of the cooler and configured to receive the effluent stream for treatment. In this way, the cooler is interposed between the process tool and the resin chamber and operates to cool the effluent stream prior to its being delivered to the resin chamber. Cooling the effluent stream in this way helps to improve the performance of the resin, even when the effluent stream is at an elevated temperature.
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公开(公告)号：US20220275933A1
公开(公告)日：2022-09-01
申请号：US17636957
申请日：2020-08-12
Applicant: CSK INC.
Inventor： Pil-Hyong Lee , Hee Jun Shin , Young-Woong Lee , MyungKeun Noh , Hyeon Yun Cho
Abstract: The present invention presents a burner for scrubbers equipped with the first nozzle that is in the shape of a pipe and that is equipped with the first main body, the second nozzle that is in the shape of a pipe and equipped with the second main body that is located to wrap the outer circumference of the aforementioned first main body, and the third nozzle that is in the shape of a pipe and that is equipped with the third main body located to wrap the outer circumference of the aforementioned second main body.
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Patent Agency Ranking
公开(公告)号：US20220176301A1
公开(公告)日：2022-06-09
申请号：US17536048
申请日：2021-11-28
Applicant: Samsung Electronics Co., Ltd. , CSK Inc.
Inventor： Seo Young MAENG , Il Jun JEON , Su Ji GIM , Jin Hong KIM , Young Seok ROH , Jong Yong BAE , Jung Joon PYEON
IPC: B01D46/76 , H01L21/02 , B01D46/24 , B01D46/64 , B01D46/00 , B01D53/04 , C23C16/34 , C23C16/455 , C23C16/44
Abstract: A method of fabricating a semiconductor device includes providing a wafer inside a process chamber, performing an ALD (atomic layer deposition) process inside the process chamber to deposit titanium nitride on the wafer, providing a process gas used for the ALD process to a scrubber, filtering a first powder contained in the process gas, using a filter unit disposed in the scrubber and including a plurality of filters, adsorbing a second powder remaining in the process gas after passing through the filter unit, using a fin structure extending in a vertical direction inside the filter unit, and exhausting the process gas, from which the first and second powders are removed, from the scrubber.
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公开(公告)号：US12290778B2
公开(公告)日：2025-05-06
申请号：US17536048
申请日：2021-11-28
Applicant: Samsung Electronics Co., Ltd. , CSK Inc.
Inventor： Seo Young Maeng , Il Jun Jeon , Su Ji Gim , Jin Hong Kim , Young Seok Roh , Jong Yong Bae , Jung Joon Pyeon
IPC: B01D46/76 , B01D46/00 , B01D46/24 , B01D46/64 , B01D53/04 , C23C16/34 , C23C16/44 , C23C16/455 , H01L21/02
Abstract: A method of fabricating a semiconductor device includes providing a wafer inside a process chamber, performing an ALD (atomic layer deposition) process inside the process chamber to deposit titanium nitride on the wafer, providing a process gas used for the ALD process to a scrubber, filtering a first powder contained in the process gas, using a filter unit disposed in the scrubber and including a plurality of filters, adsorbing a second powder remaining in the process gas after passing through the filter unit, using a fin structure extending in a vertical direction inside the filter unit, and exhausting the process gas, from which the first and second powders are removed, from the scrubber.
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公开(公告)号：US20240382895A1
公开(公告)日：2024-11-21
申请号：US18689666
申请日：2022-08-23
Applicant: CSK INC.
Inventor： Yun Soo Choi , Chan Kyoo Ko , Pil-Hyong Lee , Chun-Loon Cha , Jeong-Keun Lee , Ju Ha Kim , Hyun-A Shin
Abstract: A facility for treating gas includes a flow channel providing a passage through which a waste gas flows; a thermal decomposition unit for thermally decomposing the waste gas flowing through the flow channel; a quencher for cooling the waste gas passed through the thermal decomposition unit to a predetermined temperature; and a cooling chamber in communication with the flow channel such that the waste gas passed through the quencher is introduced into the cooling chamber, the cooling chamber accommodating a solid material for cooling therewithin.
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公开(公告)号：US20230356126A1
公开(公告)日：2023-11-09
申请号：US18246438
申请日：2021-09-21
Applicant: CSK INC.
Inventor： MyeongHoon Kang , JinHong Kim
IPC: B01D46/00 , B01D46/24 , B01D46/681 , B01D53/81
CPC classification number: B01D46/0002 , B01D46/24 , B01D46/681 , B01D53/81 , B01D2258/0216
Abstract: An apparatus includes a filter body, which filters an exhaust gas and feeds it to an adsorption reaction device and is disposed below the adsorption reaction device; and a housing which provides an internal space for storing powder separated from the filter body and is installed below the adsorption reaction device, which housing includes a filter installation unit, which is a space projected below the adsorption reaction device and which provides a filter installation space internally for installing the filter body and an expansion unit that protrudes sideways from the filter installation unit and provides an expansion space which communicates internally with the filter installation space, and the internal space is expanded by the expansion space to increase the powder collection capacity. A suction port for sucking in the exhaust gas is installed in the expansion unit.
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公开(公告)号：US20230220994A1
公开(公告)日：2023-07-13
申请号：US18000475
申请日：2021-05-24
Applicant: CSK INC.
Inventor： Pil-Hyong Lee , YoungWoong Lee , MyungKeun Noh , Hyeon Yun Cho
CPC classification number: F23G7/066 , F23D14/66 , F23D14/32 , F23G2209/142
Abstract: The present invention presents a scrubber burner composed of a preheating spray ring that is formed with a porous material with certain thickness, and that preheats and sprays the fuel gas in the preheating combustion space formed inside, a preheating guide ring equipped with multiple preheating guide holes that wrap the outer circumference of the aforementioned preheating spray ring, and that penetrates from the outer circumference to the inner circumference, and a preheating burner module equipped with a housing that forms a ring shaped gas channel that is separated from the outer circumference of the aforementioned preheating guide ring and through which the aforementioned fuel gas flows.
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