公开(公告)号：US20120196772A1

公开(公告)日：2012-08-02

申请号：US13329619

申请日：2011-12-19

申请人： Hyojin YUN ,  Changeun YOO ,  Myung-Sun KIM ,  Soo-Kyung KIM ,  Kouji NISHIKAWA ,  Hirofumi GOTO ,  Hidetoshi MIYAMOTO

发明人： Hyojin YUN ,  Changeun YOO ,  Myung-Sun KIM ,  Soo-Kyung KIM ,  Kouji NISHIKAWA ,  Hirofumi GOTO ,  Hidetoshi MIYAMOTO

IPC分类号： C40B40/06 ,  G03F7/027 ,  C40B40/12 ,  G03F7/20 ,  C40B40/10

CPC分类号： C08J7/14 ,  C09D133/08 ,  G03F7/0392 ,  C08F220/14 ,  C08F220/56 ,  C08F2220/302 ,  C08F220/54 ,  C08F2220/307

摘要： A compound synthesis method includes bonding a first compound to a substrate to form a first film. A second film is formed on the first film using an acid-transfer composition including (A) a polymer that includes a structural unit shown by a following formula (1) and a structural unit shown by a following formula (2), (B) a photoacid generator shown by a following formula (3), and (C) a sensitizer shown by a following formula (4). The second film is exposed to remove the protecting group from the first compound under an exposed are of the second film. An acid generated in the exposed area of the second film is transferred to the first film. The second film after being exposed is removed. A second compound is bonded to the first compound from which the protecting group has been removed.

摘要翻译： 复合合成方法包括将第一化合物键合到基底以形成第一膜。 使用酸转移组合物在第一膜上形成第二膜，所述酸转移组合物包含（A）包含由下式（1）表示的结构单元的聚合物和由下式（2），（B）表示的结构单元， 由下式（3）表示的光致酸发生剂和（C）下述式（4）所示的增感剂。 第二个膜暴露在暴露的第二个膜下，从第一个化合物中除去保护基团。 在第二膜的暴露区域产生的酸被转移到第一膜。 被曝光后的第二片胶片被去除。 第二化合物与已除去保护基团的第一化合物结合。

公开(公告)号：US08475998B2

公开(公告)日：2013-07-02

申请号：US13329619

申请日：2011-12-19

申请人： Hyojin Yun ,  Changeun Yoo ,  Myung-Sun Kim ,  Soo-Kyung Kim ,  Kouji Nishikawa ,  Hirofumi Goto ,  Hidetoshi Miyamoto

发明人： Hyojin Yun ,  Changeun Yoo ,  Myung-Sun Kim ,  Soo-Kyung Kim ,  Kouji Nishikawa ,  Hirofumi Goto ,  Hidetoshi Miyamoto

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/07 ,  G03F7/11 ,  C40B40/04 ,  C40B40/06 ,  C40B40/08 ,  C40B40/10 ,  C40B40/12

CPC分类号： C08J7/14 ,  C09D133/08 ,  G03F7/0392 ,  C08F220/14 ,  C08F220/56 ,  C08F2220/302 ,  C08F220/54 ,  C08F2220/307

摘要： A compound synthesis method includes bonding a first compound to a substrate to form a first film. A second film is formed on the first film using an acid-transfer composition including (A) a polymer that includes a structural unit shown by a following formula (1) and a structural unit shown by a following formula (2), (B) a photoacid generator shown by a following formula (3), and (C) a sensitizer shown by a following formula (4). The second film is exposed to remove the protecting group from the first compound under an exposed area of the second film. An acid generated in the exposed area of the second film is transferred to the first film. The second film after being exposed is removed. A second compound is bonded to the first compound from which the protecting group has been removed.

摘要翻译： 复合合成方法包括将第一化合物键合到基底以形成第一膜。 使用酸转移组合物在第一膜上形成第二膜，所述酸转移组合物包含（A）包含由下式（1）表示的结构单元的聚合物和由下式（2），（B）表示的结构单元， 由下式（3）表示的光致酸发生剂和（C）下述式（4）所示的增感剂。 在第二膜的暴露区域下暴露第二膜以从第一化合物中除去保护基。 在第二膜的暴露区域产生的酸被转移到第一膜。 被曝光后的第二片胶片被去除。 第二化合物与已除去保护基团的第一化合物结合。