PRISM-MASK FOR ANGLED PATTERNING APPLICATIONS

    公开(公告)号:US20200096873A1

    公开(公告)日:2020-03-26

    申请号:US16143206

    申请日:2018-09-26

    IPC分类号: G03F7/20 G02B5/04 H01L21/027

    摘要: Embodiments disclosed herein include a lithographic patterning system and methods of using such a system to form a microelectronic device. The lithographic patterning system includes an actinic radiation source, a stage having a surface for supporting a substrate with a resist layer, and a prism with a first surface over the stage, where the first surface has a masked layer and is substantially parallel to the surface of the stage. The prism may have a second surface that is substantially parallel to the first surface. The first and second surfaces are flat surfaces. The prism is a monolithic prism-mask, where an optical path passes through the system and exits the first surface of the prism through the mask layer. The system may include a layer disposed between the mask and resist layers. The mask layer of the prism may pattern the resist layer without an isolated mask layer.

    Synthesis of nitroalcohol diastereomers
    2.
    发明授权
    Synthesis of nitroalcohol diastereomers 失效
    硝基醇非对映异构体的合成

    公开(公告)号:US06462221B1

    公开(公告)日:2002-10-08

    申请号:US09574620

    申请日:2000-05-19

    IPC分类号: C07C20502

    摘要: The present invention relates to a method of preparing a 1-nitro-3-substituted-3-amino-2-propanol diastereomer represented by Structural Formula I: In Structural Formula I, R is an amine protecting group, and R1 is an amino acid side-chain, a protected amino acid side-chain, a substituted or unsubstituted aliphatic group, a substituted or unsubstituted aromatic group, a substituted or unsubstituted heteroaromatic group, a substituted or unsubstituted aralkyl or a substituted or unsubstituted heteroaralkyl group. The method involves contacting a 1-nitro-3-substituted-3-amino-2-propanone with a reducing agent to form a mixture of 1-nitro-3-substituted-3-amino-2-propanol diastereomers. The 1-nitro-3-substituted-3-amino-2-propanol diastereomers are then separated by simulated moving bed chromatography to obtain one or more 1-nitro-3-substituted-3-amino-2-propanol diastereomer.

    摘要翻译: 本发明涉及由结构式I表示的1-硝基-3-取代-3-氨基-2-丙醇非对映体的制备方法:在结构式I中,R是胺保护基,R 1是氨基酸 取代或未取代的芳族基团,取代或未取代的杂芳族基团,取代或未取代的芳烷基或取代或未取代的杂芳烷基。 该方法包括使1-硝基-3-取代-3-氨基-2-丙酮与还原剂接触以形成1-硝基-3-取代-3-氨基-2-丙醇非对映异构体的混合物。 然后通过模拟移动床层析分离1-硝基-3-取代-3-氨基-2-丙醇非对映异构体,得到一种或多种1-硝基-3-取代-3-氨基-2-丙醇非对映异构体。

    Non-Destructive 3-Dimensional Chemical Imaging Of Photo-Resist Material
    6.
    发明申请
    Non-Destructive 3-Dimensional Chemical Imaging Of Photo-Resist Material 审中-公开
    光致抗蚀材料的非破坏性三维化学成像

    公开(公告)号:US20150276480A1

    公开(公告)日:2015-10-01

    申请号:US14229909

    申请日:2014-03-29

    IPC分类号: G01J3/28 G01J3/04 G01J3/44

    摘要: Embodiments include devices, systems and processes for using a combined confocal Raman microscope for inspecting a photo resist film material layer formed on the top surface of a layer of a substrate package, to detect border defects between regions of light exposed (e.g., cured) and unexposed (e.g., uncured) resist film material. Use of the confocal Raman microscope may provide a 3D photo-resist chemical imaging and characterization technique based on combining (1) Raman spectroscopy to identify the borders between regions of light exposed and unexposed resist along XY planes, with (2) Confocal imaging to select a Z-height of the XY planes scanned. Such detection provides fast, high resolution, non-destructive in-line inspection, and improves technical development of polymerization profiles of the resist film material.

    摘要翻译: 实施例包括使用组合共聚焦拉曼显微镜来检查形成在衬底封装层的顶表面上的光致抗蚀剂膜材料层的装置,系统和方法,以检测暴露(例如,固化)和 未曝光(例如未固化)抗蚀膜材料。 共焦拉曼显微镜的使用可以提供基于(1)拉曼光谱法的3D光刻抗蚀剂化学成像和表征技术,以识别沿XY平面的曝光和未曝光抗蚀剂区域之间的边界,(2)共聚焦成像选择 扫描XY平面的Z高。 这种检测提供了快速,高分辨率,无损的在线检测,并且改进了抗蚀剂膜材料的聚合曲线的技术发展。