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公开(公告)号:US20170092850A1
公开(公告)日:2017-03-30
申请号:US15203008
申请日:2016-07-06
申请人: Wonjun LEE , lnseak HWANG , Yongsun KO , Changkyu LEE , Jinhye BAE , Hyunchul SHIN , Shinhee HAN , Yoonsung HAN
发明人: Wonjun LEE , lnseak HWANG , Yongsun KO , Changkyu LEE , Jinhye BAE , Hyunchul SHIN , Shinhee HAN , Yoonsung HAN
摘要: Manufacturing a MRAM device may include removing etch residues from a magnetic tunnel junction (MTJ) pattern in the presence of an atmosphere. The removing may include applying a cleaning solution to one or more surfaces of the MTJ pattern. Manufacturing the MRAM device may include removing an oxide layer based on sputter etching of the MTJ pattern. The etch residues may be removed such that the oxide layer is formed. Removing the etch residues may include applying a cleaning solution to the MTJ pattern. The etch residues may be removed in the presence of an atmosphere. The MTJ pattern may be formed based on patterning an MTJ layer in a vacuum state such that the etch residues are formed on a surface of the MTJ pattern.
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公开(公告)号:US09735351B2
公开(公告)日:2017-08-15
申请号:US15203008
申请日:2016-07-06
申请人: Wonjun Lee , Inseak Hwang , Yongsun Ko , Changkyu Lee , Jinhye Bae , Hyunchul Shin , Shinhee Han , Yoonsung Han
发明人: Wonjun Lee , Inseak Hwang , Yongsun Ko , Changkyu Lee , Jinhye Bae , Hyunchul Shin , Shinhee Han , Yoonsung Han
摘要: Manufacturing a MRAM device may include removing etch residues from a magnetic tunnel junction (MTJ) pattern in the presence of an atmosphere. The removing may include applying a cleaning solution to one or more surfaces of the MTJ pattern. Manufacturing the MRAM device may include removing an oxide layer based on sputter etching of the MTJ pattern. The etch residues may be removed such that the oxide layer is formed. Removing the etch residues may include applying a cleaning solution to the MTJ pattern. The etch residues may be removed in the presence of an atmosphere. The MTJ pattern may be formed based on patterning an MTJ layer in a vacuum state such that the etch residues are formed on a surface of the MTJ pattern.
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